KR970023003A - Glass ceramic substrate for magnetic disks and manufacturing method thereof - Google Patents

Glass ceramic substrate for magnetic disks and manufacturing method thereof Download PDF

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KR970023003A
KR970023003A KR1019960046129A KR19960046129A KR970023003A KR 970023003 A KR970023003 A KR 970023003A KR 1019960046129 A KR1019960046129 A KR 1019960046129A KR 19960046129 A KR19960046129 A KR 19960046129A KR 970023003 A KR970023003 A KR 970023003A
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나오유키 고토
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가지가와 히로시
가부시기가이샤 오하라
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/73Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739Magnetic recording media substrates
    • G11B5/73911Inorganic substrates
    • G11B5/73921Glass or ceramic substrates
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C03C10/0009Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing silica as main constituent
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/74Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
    • G11B5/82Disk carriers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
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  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Glass Compositions (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

랜딩영역에 있어서 자기헤드의 안정부상(安定浮上)을 가능하게 하는 동시에, 고기록밀도화에 대응한 데이터 영역에서의 자기헤드의 저부상화(低浮上化)를 가능하게 하는 데이터영역 및 랜딩영역을 가지는 자기디스크용 유리세라믹기판을 제공한다. 이 랜딩영역은 레이저조사(照射)에 의하여 형성된 무수한 요철(凹凸) 또는 돌기를 가진다. 이를 위하여, CO2레이저 또는 LD(laser diode)여기 (勵起) 고체레이저가 사용될 수 있다. 랜딩영역의 연마가공한 후의 표면조도 (祖度) Ra가 3Å∼9Å이고, 요철 또는 돌기의 높이가 50Å∼300Å이고, 요철 또는 돌기의 표면조도 Ra가 3Å∼9Å이고, 요철 또는 돌기의 간격이 10㎛∼200㎛이다. 유리세라믹은 SiO2- Li2O - K2O - MgO - ZnO - P2O5- Al2O3계, 또는 SiO2- Li2O - K2O - MgO - ZnO - P2O5- Al2O3-ZrO2계인 것이 바람직하다. LD여기 고체레이저에 의하여 랜딩영역에 요철 또는 돌기의 안정적인 형성을 위하여, 유리세라믹은 착색성분으로서 NiO, CoO, MnO2, V2O5, CuO, Cr2O3의 최소한 2종을 함유하는 것이 바람직하다.In the landing area, a data area and a landing area that enable stable injuries of the magnetic head and low injuries of the magnetic head in a data area corresponding to high recording density are provided. The branch provides a glass ceramic substrate for a magnetic disk. This landing area has a myriad of irregularities or protrusions formed by laser irradiation. For this purpose, a CO 2 laser or a laser diode (LD) excited solid state laser can be used. The surface roughness Ra after grinding of the landing area is 3 kW to 9 kPa, the height of the unevenness or the projection is 50 kW to 300 kW, the surface roughness Ra of the unevenness or the projection is 3 kW to 9 kPa, and the unevenness or the distance between the projections is 10 micrometers-200 micrometers. Glass ceramics are SiO 2 -Li 2 O-K 2 O-MgO-ZnO-P 2 O 5 -Al 2 O 3 system, or SiO 2 -Li 2 O-K 2 O-MgO-ZnO-P 2 O 5- to Al 2 O 3 -ZrO 2 is preferably sealed. For the stable formation of irregularities or protrusions in the landing area by LD-excited solid laser, glass ceramics contain at least two kinds of NiO, CoO, MnO 2 , V 2 O 5 , CuO and Cr 2 O 3 as coloring components. desirable.

Description

자기디스크용 유리세라믹기판 및 그 제조방법Glass ceramic substrate for magnetic disks and manufacturing method thereof

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명에 관한 자기(磁氣) 디스크용 유리세라믹기판의 중심에 있는 원형공을 둘러싸는 랜딩영역과 데이터영역을 나타낸 상면도.1 is a top view showing a landing area and a data area surrounding a circular hole in the center of a glass ceramic substrate for a magnetic disk according to the present invention.

제2도는 본 발명의 랜딩영역에 형성되는 요철(凹凸)의 형상을 나타낸 단면도.2 is a cross-sectional view showing the shape of irregularities formed in the landing region of the present invention.

Claims (25)

데이터영역과 랜딩영역을 가지는 자기디스크용 유리세라믹기판에 있어서, 이 랜딩영역은 레이저조사(照射)에 의하여 형성된 무수한 요철(凹凸) 또는 돌기를 가지는 것을 특징으로 하는 자기디스크용 유리세라믹기판.A glass ceramic substrate for a magnetic disk having a data area and a landing area, wherein the landing area has a myriad of irregularities or projections formed by laser irradiation. 청구항 1에 있어서, 상기 레이저의 종류가 CO2레이저인 것을 특징으로 하는 자기디스크용 세라믹기판.The ceramic substrate for a magnetic disc according to claim 1, wherein the type of laser is a CO 2 laser. 청구항 1에 있어서, 상기 레이저의 종류가 LD(laser diode)여기 (勵起) 고체레이저인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The glass ceramic substrate for a magnetic disk according to claim 1, wherein the laser is a laser diode (LD) excited solid state laser. 청구항 3에 있어서, 상기 LD여기 고체레이저는 Nd-YAG 또는 Nd-YVO4또는 Nd-YLF인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The glass ceramic substrate for a magnetic disk according to claim 3, wherein the LD-excited solid laser is Nd-YAG or Nd-YVO 4 or Nd-YLF. 청구항 4에 있어서, 상기 LD여기 고체레이저의 파장이 0.2㎛∼0.6㎛ 또는 1.05㎛∼1.40㎛의 범위인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The glass ceramic substrate for a magnetic disk according to claim 4, wherein the wavelength of the LD-excited solid laser is in the range of 0.2 µm to 0.6 µm or 1.05 µm to 1.40 µm. 청구항 1∼5중 어느 한 항에 있어서, 랜딩영역의 연마가공한 후의 표면조도(祖度)(Ra)가 3Å∼9Å이고, 랜딩영역에 레이저조사에 의한 무수한 요철 또는 돌기를 형성하고, 그 요철 또는 돌기의 높이가 50Å∼300Å이고, 표면조도(Ra)가 10Å∼50Å인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The surface roughness (Ra) after polishing of the landing area is 3 kW to 9 kW, and a myriad of irregularities or projections are formed in the landing area by laser irradiation, and the unevenness according to any one of claims 1 to 5. Or a projection having a height of 50 GPa to 300 GPa and a surface roughness (Ra) of 10 GPa to 50 GPa. 청구항 6에 있어서, 그 요철 또는 돌기의 간격이 10㎛∼200㎛인 것을 특징으로하는 자기디스크용 유리세라믹기판.The glass ceramic substrate for a magnetic disk according to claim 6, wherein the irregularities or protrusions have a spacing of 10 µm to 200 µm. 청구항 1∼7중 어느 한 항에 있어서, 상기 유리세라믹기판의 유리세라믹은, SiO2- Li2O - K2O - MgO - ZnO - P2O5- Al2O3계, 또는 SiO2- Li2O - K2O - MgO - ZnO - P2O5- Al2O3-ZrO2계인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The glass ceramic according to any one of claims 1 to 7, wherein the glass ceramic of the glass ceramic substrate is SiO 2 -Li 2 O-K 2 O-MgO-ZnO-P 2 O 5 -Al 2 O 3 type , or SiO 2- Li 2 O-K 2 O-MgO-ZnO-P 2 O 5 -Al 2 O 3- ZrO 2 system, characterized in that the glass ceramic substrate for magnetic disks. 청구항 2, 6, 7 또는 8항에 있어서, 상기 유리세라믹기판의 유리세라믹은 중량%로, SiO270∼80%, Li2O 9∼12%, K2O 2∼5%, MgO+ZnO 1.2∼5%, 단, MgO 0.5∼5%, ZnO 0.2∼3%, P2O51.5∼3%, Al2O32∼5%, Sb2O30∼1%, As2O30∼1%의 범위의 각 성분을 함유하는 원 (原)유리를 열처리함으로써 얻어지고, 이 유리세라믹의 주결정상 (主結晶相)은 2규산리튬(Li2Oㆍ2Sio2), 2규산리튬 및 α-쿼츠(α-SiO2)의 혼정(混晶), 또는 2규산리튬 및 α-크리스토발라이트(α-SiO2)의 혼정의 최소한 1종이고, 상기 레이저의 종류가 CO2레이저인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The glass ceramic of claim 2, 6, 7, or 8, wherein the glass ceramic of the glass ceramic substrate is in weight percent, SiO 2 70 to 80%, Li 2 O 9 to 12%, K 2 O 2 to 5%, MgO + ZnO 1.2-5%, MgO 0.5-5%, ZnO 0.2-3%, P 2 O 5 1.5-3%, Al 2 O 3 2-5%, Sb 2 O 3 0-1%, As 2 O 3 Obtained by heat-treating raw glass containing each component in the range of 0 to 1%, and the main crystal phase of this glass ceramic is lithium disilicate (Li 2 O.2Sio 2 ), lithium disilicate. And at least one of a mixed crystal of α-quartz (α-SiO 2 ) or a mixture of lithium disilicate and α-cristobalite (α-SiO 2 ), wherein the type of the laser is a CO 2 laser. Glass ceramic substrates for magnetic disks. 청구항 2, 6, 7 또는 8항에 있어서, 상기 유리세라믹기판의 유리세라믹은 중량%로, SiO270∼80%, Li2O 9∼12%, K2O 2∼5%, MgO+ZnO 1.2∼5%, 단, MgO 0.5∼5%, ZnO 0.2∼3%, P2O51.5∼3%, Al2O32∼5%, ZrO20.5∼5%, Sb2O30∼1%, As2O30∼1%의 범위의 각 성분을 함유하는 원 (原)유리를 열처리함으로써 얻어지고, 이 유리세라믹의 주결정상은 2규산리튬(Li2Oㆍ2Sio2), 2규산리튬 및 α-쿼츠(α-SiO2)의 혼정, 또는 2규산리튬 및 α-크리스토발라이트(α-SiO2)의 혼정의 최소한 1종이고, 상기 레이저의 종류가 CO2레이저인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The glass ceramic of claim 2, 6, 7, or 8, wherein the glass ceramic of the glass ceramic substrate is in weight percent, SiO 2 70 to 80%, Li 2 O 9 to 12%, K 2 O 2 to 5%, MgO + ZnO 1.2-5%, MgO 0.5-5%, ZnO 0.2-3%, P 2 O 5 1.5-3%, Al 2 O 3 2-5%, ZrO 2 0.5-5%, Sb 2 O 3 0- 1%, As 2 O 3 is obtained by heat-treating the source (原) glass containing the components of the range of 0-1%, main crystal phase of this glass-ceramic is lithium silicate 2 (Li 2 O and 2Sio 2), 2 At least one of a mixture of lithium silicate and α-quartz (α-SiO 2 ) or a mixture of lithium silicate and α-cristobalite (α-SiO 2 ), wherein the type of the laser is a CO 2 laser Glass ceramic substrates for magnetic discs. 청구항 8에 있어서, 착색성분으로서 NiO, CoO, MnO2, V2O5, CuO, Cr2O3의 최소한 2종을 함유하는 것을 특징으로 하는 자기디스크용 유리세라믹기판.The glass ceramic substrate for a magnetic disk according to claim 8, wherein at least two of NiO, CoO, MnO 2 , V 2 O 5 , CuO, and Cr 2 O 3 are contained as a coloring component. 청구항 11에 있어서, 상기 유리세라믹기판은 중량%로, SiO270∼80%, Li2O 9∼12%, K2O 2∼5%, MgO+ZnO 1.2∼5%, 단, MgO 0.5∼5%, ZnO 0.2∼3%, P2O51.5∼3%, Al2O32∼5%, Sb2O30∼1%, As2O30∼1%, V2O5+CuO+Cr2O3+MnO2+CoO+NiO 0.08∼2.5% 단, V2O50.02∼0.08%, CuO 0.02∼0.8%, Cr2O3 0∼0.8%, MnO20.02∼0.8%, CoO 0∼0.8% NiO 0∼0.8%의 각 성분을 함유하는 원유리를 열처리함으로써 얻어지고, 이 유리세라믹의 주결정상은 2규산리튬(Li2Oㆍ2Sio2), 2규산리튬 및 α-쿼츠(0α-SiO2)의 혼정, 또는 2규산리튬 및 α-크리스토발라이트(α-SiO2)의 혼정의 최소한 1종이고, 상기 레이저의 종류가 상기 LD 여기 고체레이저인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The method according to claim 11, wherein the glass-ceramic substrate is by weight%, SiO 2 70~80%, Li 2 O 9~12%, K 2 O 2~5%, MgO + ZnO 1.2~5%, However, MgO 0.5~ 5%, ZnO 0.2-3%, P 2 O 5 1.5-3%, Al 2 O 3 2-5%, Sb 2 O 3 0-1%, As 2 O 3 0-1%, V 2 O 5 + CuO + Cr 2 O 3 + MnO 2 + CoO + NiO 0.08 to 2.5% However, V 2 O 5 0.02 to 0.08%, CuO 0.02 to 0.8%, Cr 2 O 3 0 to 0.8%, MnO 2 0.02 to 0.8%, CoO is obtained by heat treating the raw glass containing respective components of 0~0.8% NiO 0~0.8%, predominant crystal phase of this glass-ceramic is lithium silicate 2 (Li 2 O and 2Sio 2), 2 lithium silicate and quartz α- At least one of a mixed crystal of (0α-SiO 2 ) or a mixed mixture of lithium disilicate and α-cristobalite (α-SiO 2 ), wherein the type of the laser is the LD-excited solid-state laser. Ceramic substrate. 청구항 11에 있어서, 상기 유리세라믹기판의 유리세라믹은 중량%로, SiO270∼80%, Li2O 9∼12%, K2O 2∼5%, MgO+ZnO 1.2∼5%, 단, MgO 0.5∼5%, ZnO 0.2∼3%, P2O51.5∼3%, Al2O32∼5%, ZrO20.5∼5%, Sb2O30∼1%, As2O30∼1%, V2O5+CuO+Cr2O3+MnO2+CoO+NiO 0.08∼2.5% 단, V2O50.02∼0.8%, CuO 0.02∼0.8%, Cr2O3 0∼0.8%, MnO20.02∼0.8%, CoO 0∼0.8% NiO 0∼0.8%의 범위의 각 성분을 함유하는 원유리를 열처리함으로써 얻어지고, 이 유리세라믹의 주결정상은 2규산리튬(Li2Oㆍ2SiO2), 2규산리튬 및 α-쿼츠(α-SiO2)의 혼정, 또는 2규산리튬 및 α-크리스토발라이트(α-SiO2)의 혼정의 최소한 1종이고, 상기 레이저의 종류가 상기 LD 여기 고체레이저인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The glass ceramic of claim 11, wherein the glass ceramic of the glass ceramic substrate is in weight percent, SiO 2 70-80%, Li 2 O 9-12%, K 2 O 2-5%, MgO + ZnO 1.2-5%, MgO 0.5-5%, ZnO 0.2-3%, P 2 O 5 1.5-3%, Al 2 O 3 2-5%, ZrO 2 0.5-5%, Sb 2 O 3 0-1%, As 2 O 3 0 to 1%, V 2 O 5 + CuO + Cr 2 O 3 + MnO 2 + CoO + NiO 0.08 to 2.5% However, V 2 O 5 0.02 to 0.8%, CuO 0.02 to 0.8%, Cr 2 O 3 0 to 0.8%, MnO 2 0.02~0.8%, CoO 0~0.8% NiO is obtained by heat treating the raw glass containing respective components in the range 0~0.8%, predominant crystal phase of this glass-ceramic is lithium silicate 2 (Li 2 O At least one of a mixed crystal of 2SiO 2 ), lithium disilicate and α-quartz (α-SiO 2 ) or a mixture of lithium disilicate and α-cristobalite (α-SiO 2 ), and the type of the laser is LD A glass ceramic substrate for a magnetic disk, characterized in that the solid laser. 청구항 12 또는 13에 있어서, LD 여기 고체레이저파장 1.06㎛에 있어서의 투과율이 두께 0.635㎜에서 80%∼40%인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The glass ceramic substrate for a magnetic disk according to claim 12 or 13, wherein a transmittance at LD excitation solid laser wavelength of 1.06 mu m is 80% to 40% at a thickness of 0.635 mm. 청구항 8∼14중 어느 한 항에 있어서, 상기 유리세라믹의 결정상은 2규산리튬(Li2Oㆍ2SiO2), 2규산리튬 및 α-쿼츠(α-SiO2)의 혼정이고, 2규산리튬의 결정입자는 구상(球牀) 입자형체를 가지고, 그 크기는 0.1㎛∼0.5㎛의 범위내의 직경을 가지고, 또 α-쿼츠의 결정입자는 복수의 입자가 응집한 구상 입자구조를 가지고, 그 크기는 0.3㎛∼1.0㎛의 범위내의 직경을 가지는 것을 특징으로 하는 자기디스크용 유리세라믹기판.The crystal phase of the glass ceramic is a mixed crystal of lithium disilicate (Li 2 O.2SiO 2 ), lithium disilicate and α-quartz (α-SiO 2 ). The crystal grains have a spherical grain shape, the size thereof has a diameter in the range of 0.1 µm to 0.5 µm, and the α-quartz crystal grains have a spherical grain structure in which a plurality of particles are aggregated. The glass ceramic substrate for magnetic disks which has a diameter within the range of 0.3 micrometer-1.0 micrometer. 청구항 8∼14중 어느 한 항에 있어서, 상기 유리세라믹의 결정상은 2규산리튬(Li2Oㆍ2SiO2), 또는 2규산리튬 및 α-크리스토발라이트(α-SiO2)의 혼정이고, 2규산리튬의 결정입자는 구상 입자형체를 가지고, 그 크기는 0.1㎛∼0.5㎛의 범위내의 직경을 가지고, 또 α-크리스토발라이트(α-SiO2)의 혼정의 결정입자는 복수의 입자가 응집한 구상 입자구조를 가지고, 그 크기는 0.2㎛∼1.0㎛의 범위내의 직경을 가지는 것을 특징으로 하는 자기디스크용 유리세라믹기판.The crystal phase of the glass ceramic is a mixed crystal of lithium disilicate (Li 2 O.2SiO 2 ) or lithium disilicate and α-cristobalite (α-SiO 2 ). The crystal grains of spherical particles have a spherical particle shape, the size of which is in the range of 0.1 μm to 0.5 μm, and the crystal grains of α-cristobalite (α-SiO 2 ) are spherical particle structures in which a plurality of particles are aggregated. The glass ceramic substrate for a magnetic disk having a diameter in the range of 0.2 micrometer-1.0 micrometer. 청구항 11항에 있어서, 상기 유리세라믹기판의 유리세라믹은 중량%로, SiO270∼80%, Li2O 9∼12%, K2O 2∼5%, MgO+ZnO 1.2∼5%, 단, MgO 0.5∼5%, ZnO 0.2∼3%, P2O51.5∼3%, ZrO20.5∼5% Al2O32∼5%, Sb2O30∼1%, As2O30∼1%, NiO 0.5∼3%, CoO 0.5∼3%, MnO20∼0.5%, V2O5 0∼0.5%, CuO 0∼1%, Cr2O30∼1.5% 범위의 각 성분을 함유하는 원유리를 열처리함으로써 얻어지고, 이 유리세라믹의 주결정상은 2규산리튬(Li2Oㆍ2SiO2), 2규산리튬 및 α-쿼츠(α-SiO2)의 혼정, 또는 2규산리튬 및 α-크리스토발라이트(α-SiO2)의 혼정의 최소한 1종이고, 상기 레이저의 종류가 상기 LD 여기 고체레이저인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The glass ceramic of claim 11, wherein the glass ceramic of the glass ceramic substrate is in weight percent, SiO 2 70-80%, Li 2 O 9-12%, K 2 O 2-5%, MgO + ZnO 1.2-5%, , MgO 0.5-5%, ZnO 0.2-3%, P 2 O 5 1.5-3%, ZrO 2 0.5-5% Al 2 O 3 2-5%, Sb 2 O 3 0-1%, As 2 O 3 Each in the range of 0 to 1%, NiO 0.5 to 3%, CoO 0.5 to 3%, MnO 2 0 to 0.5%, V 2 O 5 0 to 0.5%, CuO 0 to 1%, Cr 2 O 3 0 to 1.5% Obtained by heat-treating the raw glass containing a component, the main crystal phase of this glass ceramic is a mixed crystal of lithium silicate (Li 2 O.2SiO 2 ), lithium silicate and α-quartz (α-SiO 2 ), or disilicate At least one kind of mixed crystal of lithium and α-cristobalite (α-SiO 2 ), wherein the type of the laser is the LD-excited solid-state laser. 청구항 17에 있어서, LD 여기 고체레이저파장 0.2㎛∼0.6㎛ 또는 1.05㎛∼1.40㎛에 있어서의 투과율이 두께 0.635㎜에 있어서 0∼40%인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The glass ceramic substrate for a magnetic disk according to claim 17, wherein the transmittance at LD excitation solid laser wavelength of 0.2 µm to 0.6 µm or 1.05 µm to 1.40 µm is 0 to 40% at a thickness of 0.635 mm. 청구항 17에 있어서, 상기 유리세라믹의 결정상은 2규산리튬(Li2Oㆍ2SiO2), 또는 2규산리튬 및 α-쿼츠(α-SiO2)의 혼정, 또는 2규산리튬 및 α-크리스토발라이트(α-SiO2)의 혼정이고, 2규산리튬의 결정입자는 구상 입자형체를 가지고, 그 입자경은 0.05㎛∼0.30㎛의 범위내이고, 또 α-크리스토발라이트의 결정입자는 구상 입자형체를 가지고, 그 입자경은 0.10㎛∼0.50㎛의 범위내이고, 또 α-쿼츠의 결정입자는 복수의 입자가 응집한 구상 입자형체를 가지고, 그 입자경은 0.10㎛∼1.00㎛의 범위내인 것을 특징으로 하는 자기디스크용 유리세라믹기판.The method of claim 17, wherein the crystal phase of the glass ceramic is lithium disilicate (Li 2 O.2SiO 2 ), or a mixed crystal of lithium disilicate and α-quartz (α-SiO 2 ), or lithium disilicate and α-cristobalite (α) Is a mixed crystal of -SiO 2 ), the crystal grains of lithium disilicate have a spherical grain shape, the particle diameter is in the range of 0.05 µm to 0.30 µm, and the crystal grains of α-cristobalite have a spherical grain shape, Is in the range of 0.10 µm to 0.50 µm, and the α-quartz crystal grains have a spherical particle form in which a plurality of particles are agglomerated, and the particle diameter is in the range of 0.10 µm to 1.00 µm. Glass ceramic substrate. 데이터영역과 랜딩영역을 가지는 자기디스크용 유리세라믹기판의 제조방법에 있어서, 중량%로, SiO270∼80%, Li2O 9∼12%, K2O 2∼5%, MgO+ZnO 1.2∼5%, 단, MgO 0.5∼5%, ZnO 0.2∼3%, P2O51.5∼3%, Al2O32∼5%, Sb2O30∼1%, As2O30∼1%의 범위의 각 성분을 함유하는 원유리를 용융하고, 용융유리를 원하는 형태로 형성하고, 결정핵형성을 위하여 450℃∼550℃의 핵형성온도로 1∼12시간의 범위에서 열처리하고, 다시 결정성장을 위하여 680℃∼750℃의 결정화온도로 1∼12시간의 범위에서 열처리한 후, 유리의 표면을 3Å∼9Å의 표면조도(Ra)로 연마하고, 또한 랜딩영역에 CO2레이저조사에 의하여 무수한 요철 또는 돌기를 형성함으로써 이 랜딩영역의 요철 또는 돌기의 높이를 50Å∼300Å, 표면조도(Ra)를 10Å∼50Å로 한 것을 특징으로 하는 자기디스크용 유리세라믹기판의 제조방법.In the method for manufacturing a glass ceramic substrate for a magnetic disk having a data area and a landing area, in weight percent, SiO 2 70 to 80%, Li 2 O 9 to 12%, K 2 O 2 to 5%, MgO + ZnO 1.2 -5%, MgO 0.5-5%, ZnO 0.2-3%, P 2 O 5 1.5-3%, Al 2 O 3 2-5%, Sb 2 O 3 0-1%, As 2 O 3 0 The raw glass containing each component in the range of -1% is melted, the molten glass is formed into a desired shape, and heat-treated in the range of 1 to 12 hours at a nucleation temperature of 450 ° C to 550 ° C for crystal nucleation. After heat treatment at a crystallization temperature of 680 ° C to 750 ° C for 1 to 12 hours for crystal growth, the surface of the glass was polished to a surface roughness (Ra) of 3 to 9 ° C, and the CO 2 laser was applied to the landing region. The magnetic disk for magnetic disks characterized in that a number of unevenness or protrusions are formed by irradiation to have a height of 50 to 300 높이 and a surface roughness Ra of 10 to 50Å. The method of re-ceramic substrate. 데이터영역과 랜딩영역을 가지는 자기디스크용 유리세라믹기판의 제조방법에 있어서, 중량%로, SiO270∼80%, Li2O 9∼12%, K2O 2∼5%, MgO+ZnO 1.2∼5%, 단, MgO 0.5∼5%, ZnO 0.2∼3%, P2O51.5∼3%, Al2O32∼5%, Sb2O30∼1%, As2O30∼1%의 범위의 각 성분을 함유하는 원유리를 용융하고, 용융유리를 원하는 형태로 형성하고, 결정핵형성을 위하여 450℃∼550℃의 핵형성온도로 1∼12시간의 범위에서 열처리하고, 다시 결정성장을 위하여 680℃∼750℃의 결정화온도로 1∼12시간의 범위에서 열처리한 후, 유리의 표면을 3Å∼9Å의 표면조도(Ra)로 연마하고, 또한 랜딩영역에 CO2레이저조사에 의하여 무수한 요철 또는 돌기를 형성함으로써 이 랜딩영역의 요철 또는 돌기의 높이를 50Å∼300Å, 표면조도(Ra)를 10Å∼50Å로 한 것을 특징으로 하는 자기디스크용 유리세라믹기판의 제조방법.In the method for manufacturing a glass ceramic substrate for a magnetic disk having a data area and a landing area, in weight percent, SiO 2 70 to 80%, Li 2 O 9 to 12%, K 2 O 2 to 5%, MgO + ZnO 1.2 -5%, MgO 0.5-5%, ZnO 0.2-3%, P 2 O 5 1.5-3%, Al 2 O 3 2-5%, Sb 2 O 3 0-1%, As 2 O 3 0 The raw glass containing each component in the range of -1% is melted, the molten glass is formed into a desired shape, and heat-treated in the range of 1 to 12 hours at a nucleation temperature of 450 ° C to 550 ° C for crystal nucleation. After heat treatment at a crystallization temperature of 680 ° C to 750 ° C for 1 to 12 hours for crystal growth, the surface of the glass was polished to a surface roughness (Ra) of 3 to 9 ° C, and the CO 2 laser was applied to the landing region. The magnetic disk for magnetic disks characterized in that a number of unevenness or protrusions are formed by irradiation to have a height of 50 to 300 높이 and a surface roughness Ra of 10 to 50Å. The method of re-ceramic substrate. 데이터영역과 랜딩영역을 가지는 자기디스크용 유리세라믹기판의 제조방법에 있어서, 중량%로, SiO270∼80%, Li2O 9∼12%, K2O 2∼5%, MgO+ZnO 1.2∼5%, 단, MgO 0.5∼5%, ZnO 0.2∼3%, P2O51.5∼3%, Al2O32∼5%, Sb2O30∼1%, As2O30∼1%, V2O5+CuO+Cr2O3+MnO2+CoO+NiO 0.08∼2.5% 단, V2O50.02∼0.8%, CuO 0.02∼0.8%, Cr2O3 0∼0.8%, MnO20.02∼0.8%, CoO 0∼0.8% NiO 0∼0.8%의 범위의 각 성분을 함유하는 원유리를 용융하고, 용융유리를 원하는 형태로 결정핵형성을 위하여 450℃∼550℃의 핵형성온도로 1∼12시간의 범위에서 열처리하고, 다시 결정성장을 위하여 680℃∼750℃의 결정화온도로 1∼12시간의 범위에서 열처리한 후, 유리의 표면을 3Å∼9Å의 표면조도(Ra)로 연마하고, 또한 랜딩영역에 LD레이저조사에 의하여 무수한 요철 또는 돌기를 형성함으로써 이 랜딩영역의 요철 또는 돌기의 높이를 50Å∼300Å, 표면조도(Ra)를 10Å∼50Å로 한 것을 특징으로 하는 자기디스크용 자기디스크기판의 제조방법.In the method for manufacturing a glass ceramic substrate for a magnetic disk having a data area and a landing area, in weight percent, SiO 2 70 to 80%, Li 2 O 9 to 12%, K 2 O 2 to 5%, MgO + ZnO 1.2 -5%, MgO 0.5-5%, ZnO 0.2-3%, P 2 O 5 1.5-3%, Al 2 O 3 2-5%, Sb 2 O 3 0-1%, As 2 O 3 0 1%, V 2 O 5 + CuO + Cr 2 O 3 + MnO 2 + CoO + NiO 0.08 to 2.5% However, V 2 O 5 0.02 to 0.8%, CuO 0.02 to 0.8%, Cr 2 O 3 0 to 0.8 %, MnO 2 0.02 to 0.8%, CoO 0 to 0.8% NiO 0 to 0.8% of the primary glass containing each component is melted, the molten glass in the desired form of 450 ℃ to 550 ℃ for crystal nucleation After heat treatment at a nucleation temperature for 1 to 12 hours, and heat treatment at a crystallization temperature of 680 ° C to 750 ° C for 1 to 12 hours for crystal growth, the surface of the glass was subjected to a surface roughness of 3 to 9 Ra) and by forming LD innumerable irregularities or protrusions in the landing area by LD laser irradiation The method of landing area irregularities or magnetic disks, magnetic disk substrate for the height of the projections characterized in that the 50Å~300Å, surface roughness (Ra) in the 10Å~50Å. 데이터영역과 랜딩영역을 가지는 자기디스크용 유리세라믹기판의 제조방법에 있어서, 중량%로, SiO270∼80%, Li2O 9∼12%, K2O 2∼5%, MgO+ZnO 1.2∼5%, 단, MgO 0.5∼5%, ZnO 0.2∼3%, P2O51.5∼3%, Al2O32∼5%, ZrO20.5∼5%, Sb2O30∼1%, As2O30∼1%, V2O5+CuO+Cr2O3+MnO2+CoO+NiO 0.08∼2.5% 단, V2O50.02∼0.8%, CuO 0.02∼0.8%, Cr2O3 0∼0.8%, MnO20.02∼0.8%, CoO 0∼0.8% NiO 0∼0.8%의 범위의 각 성분을 함유하는 원유리를 용융하고, 용융유리를 원하는 형태로 결정핵형성을 위하여 450℃∼550℃의 핵형성온도로 1∼12시간의 범위에서 열처리하고, 다시 결정성장을 위하여 680℃∼750℃의 결정화온도로 1∼12시간의 범위에서 열처리한 후, 유리의 표면을 3Å∼9Å의 표면조도(Ra)로 연마하고, 또한 랜딩영역에 LD 여기 고체레이저조사에 의하여 무수한 요철 또는 돌기를 형성함으로써 이 랜딩영역의 요철 또는 돌기의 높이를 50Å∼300Å, 표면조도(Ra)를 10Å∼50Å로 한 것을 특징으로 하는 자기디스크용 자기디스크기판의 제조방법.In the method for manufacturing a glass ceramic substrate for a magnetic disk having a data area and a landing area, in weight percent, SiO 2 70 to 80%, Li 2 O 9 to 12%, K 2 O 2 to 5%, MgO + ZnO 1.2 -5%, except that MgO 0.5-5%, ZnO 0.2-3%, P 2 O 5 1.5-3%, Al 2 O 3 2-5%, ZrO 2 0.5-5%, Sb 2 O 3 0-1 %, As 2 O 3 0-1%, V 2 O 5 + CuO + Cr 2 O 3 + MnO 2 + CoO + NiO 0.08-2.5% However, V 2 O 5 0.02-0.8%, CuO 0.02-0.8%, The primary glass containing each component in the range of Cr 2 O 3 0 to 0.8%, MnO 2 0.02 to 0.8%, CoO 0 to 0.8% NiO 0 to 0.8% is melted, and crystallization is carried out to form molten glass in a desired form. Heat treatment at a nucleation temperature of 450 ° C. to 550 ° C. for 1 to 12 hours, and heat treatment at a crystallization temperature of 680 ° C. to 750 ° C. for 1 to 12 hours for crystal growth. After polishing with a surface roughness (Ra) of 3 Å to 9 Å and irradiating LD landing to the landing area, A method of manufacturing a magnetic disk substrate for a magnetic disk, characterized in that the projections have irregularities or projection heights of 50 kPa to 300 kPa and surface roughness Ra of 10 kPa to 50 kPa. 데이터영역과 랜딩영역을 가지는 자기디스크용 유리세라믹기판의 제조방법에 있어서, 중량%로, SiO270∼80%, Li2O 9∼12%, K2O 2∼5%, MgO+ZnO 1.2∼5%, 단, MgO 0.5∼5%, ZnO 0.2∼3%, P2O51.5∼3%, ZrO20.5∼5% Al2O32∼5%, Sb2O30∼1%, As2O30∼1%, NiO 0.5∼3%, CoO 0.5∼3%, MnO20∼0.5%, V2O5 0∼0.5%, CuO 0∼1%, Cr2O30∼1.5%의 범위의 각 성분을 함유하는 원유리를 용융하고, 용융유리를 원하는 형태로 형성하고, 결정핵형성을 위하여 450℃∼550℃의 핵형성온도로 1∼12시간의 범위에서 열처리하고, 다시 결정성장을 위하여 680℃∼750℃의 결정화온도로 1∼12시간의 범위에서 열처리한 후, 유리의 표면을 3Å∼9Å의 표면조도(Ra)로 연마하고, 또한 랜딩영역에 LD 여기 고체레이저조사에 의하여 무수한 요철 또는 돌기를 형성함으로써 이 랜딩영역의 요철 또는 돌기의 높이를 50Å∼300Å, 표면조도(Ra)를 10Å∼50Å로 한 것을 특징으로 하는 자기디스크용 유리세라믹기판의 제조방법.In the method for manufacturing a glass ceramic substrate for a magnetic disk having a data area and a landing area, in weight percent, SiO 2 70 to 80%, Li 2 O 9 to 12%, K 2 O 2 to 5%, MgO + ZnO 1.2 -5%, MgO 0.5-5%, ZnO 0.2-3%, P 2 O 5 1.5-3%, ZrO 2 0.5-5% Al 2 O 3 2-5%, Sb 2 O 3 0-1% , As 2 O 3 0-1%, NiO 0.5-3%, CoO 0.5-3%, MnO 2 0-0.5%, V 2 O 5 0-0.5%, CuO 0-1%, Cr 2 O 3 0- The raw glass containing each component in the range of 1.5% is melted, the molten glass is formed into a desired shape, and heat-treated in the range of 1 to 12 hours at a nucleation temperature of 450 ° C to 550 ° C for crystal nucleation, After heat treatment at a crystallization temperature of 680 ° C to 750 ° C for 1 to 12 hours for crystal growth, the surface of the glass is polished to a surface roughness (Ra) of 3 to 9 ° C, and the LD excitation solid laser is applied to the landing region. Irradiation of this landing area by forming countless irregularities or protrusions by irradiation 50Å~300Å or the height of the projections, the surface roughness method for manufacturing a glass-ceramic substrate for a magnetic disk, characterized in that the (Ra) to 10Å~50Å. 청구항 1∼19중 어느 한 항에 기재한 자기디스크용 유리세라믹기판상에 자기매체의 피막을 형성하여 이루어지는 자기디스크.A magnetic disk formed by forming a film of a magnetic medium on a glass ceramic substrate for a magnetic disk according to any one of claims 1 to 19. ※ 최초출원 내용에 의하여 공개하는 것임.※ According to the contents of the initial application.
KR1019960046129A 1995-10-31 1996-10-16 A glass-ceramic substrate for a magnetic disk and a method for manufacturing the same KR100245281B1 (en)

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