KR970018164A - Cleaning device of semiconductor device - Google Patents

Cleaning device of semiconductor device Download PDF

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Publication number
KR970018164A
KR970018164A KR1019950032972A KR19950032972A KR970018164A KR 970018164 A KR970018164 A KR 970018164A KR 1019950032972 A KR1019950032972 A KR 1019950032972A KR 19950032972 A KR19950032972 A KR 19950032972A KR 970018164 A KR970018164 A KR 970018164A
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KR
South Korea
Prior art keywords
pure water
cleaning
chamber
semiconductor wafer
buffer chamber
Prior art date
Application number
KR1019950032972A
Other languages
Korean (ko)
Inventor
송재인
남창현
박명준
김명진
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950032972A priority Critical patent/KR970018164A/en
Publication of KR970018164A publication Critical patent/KR970018164A/en

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  • Cleaning Or Drying Semiconductors (AREA)

Abstract

세정 효율이 향상된 세정장치에 관해 개시한다. 본 발명은 반도체용 웨이퍼의 순수 세정장치에 있어서, 순수 유입공이 형성된 안내판에 의해 구획된 하부의 완충실과 상부의 세정실, 상기 완충실의 하단면에 연결설치된 순수공급 파이프 및 상기 세정실에 연결설치된 배수파이프를 구비하는 것을 특징으로 하는 반도체용 웨이퍼의 세정장치를 제공한다.A cleaning apparatus with improved cleaning efficiency is disclosed. The present invention is a pure water cleaning device for a semiconductor wafer, the lower buffer chamber and the upper cleaning chamber partitioned by a guide plate formed with a pure water inlet hole, a pure water supply pipe connected to the lower surface of the buffer chamber and connected to the cleaning chamber A cleaning apparatus for a semiconductor wafer, comprising a drain pipe.

본 발명의 실시예에 의하면, 균일한 유량과 유압으로 카세트 내부의 웨이퍼로 순수를 공급할 수 있고, 난류에 의한 재오염이 방지되기 때문에 세정효율이 증가한다.According to the embodiment of the present invention, the pure water can be supplied to the wafer inside the cassette at a uniform flow rate and hydraulic pressure, and the cleaning efficiency is increased because recontamination by turbulence is prevented.

Description

반도체장치의 세정장치Cleaning device of semiconductor device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제2도는 본 발명의 일 실시예에 의한 반도체 장치용 웨이퍼의 세정장치를 나타내는 사시도이다.2 is a perspective view showing a cleaning apparatus for a wafer for semiconductor devices according to an embodiment of the present invention.

Claims (3)

반도체용 웨이퍼의 순수 세정장치에 있어서, 순수 유입공이 형성된 안내판에 의해 구획된 하부의 완충실과 상부의 세정실; 상기 완충실의 하단면에 연결설치된 순수공급 파이프; 및 상기 세정실에 연결설치된 배수파이프를 구비하는 것을 특징으로 하는 반도체용 웨이퍼의 세정장치.A pure water cleaning device for a semiconductor wafer, comprising: a lower buffer chamber and an upper cleaning chamber partitioned by a guide plate on which pure water inflow holes are formed; Pure water supply pipe connected to the bottom surface of the buffer chamber; And a drain pipe connected to the cleaning chamber. 제1항에 있어서, 상기 안내판은 가장자리부로부터 중앙부쪽으로 상향경사지게 형성된 것을 특징으로 하는 반도체용 웨이퍼의 세정장치.The apparatus of claim 1, wherein the guide plate is formed to be inclined upwardly from an edge portion to a center portion thereof. 제1항에 있어서, 상기 순수공급 파이프는 상기 완충실 하단면의 중앙부에 연결설치되는 것을 특징으로 하는 반도체용 웨이퍼의 세정장치.The cleaning device for a semiconductor wafer according to claim 1, wherein the pure water supply pipe is connected to a central portion of the lower end surface of the buffer chamber. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950032972A 1995-09-29 1995-09-29 Cleaning device of semiconductor device KR970018164A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950032972A KR970018164A (en) 1995-09-29 1995-09-29 Cleaning device of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950032972A KR970018164A (en) 1995-09-29 1995-09-29 Cleaning device of semiconductor device

Publications (1)

Publication Number Publication Date
KR970018164A true KR970018164A (en) 1997-04-30

Family

ID=66615458

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950032972A KR970018164A (en) 1995-09-29 1995-09-29 Cleaning device of semiconductor device

Country Status (1)

Country Link
KR (1) KR970018164A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100406853B1 (en) * 2000-10-05 2003-11-21 김하용 Drain Trap
KR100706230B1 (en) * 2004-03-04 2007-04-11 삼성전자주식회사 Wet station

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100406853B1 (en) * 2000-10-05 2003-11-21 김하용 Drain Trap
KR100706230B1 (en) * 2004-03-04 2007-04-11 삼성전자주식회사 Wet station

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