KR970018164A - Cleaning device of semiconductor device - Google Patents
Cleaning device of semiconductor device Download PDFInfo
- Publication number
- KR970018164A KR970018164A KR1019950032972A KR19950032972A KR970018164A KR 970018164 A KR970018164 A KR 970018164A KR 1019950032972 A KR1019950032972 A KR 1019950032972A KR 19950032972 A KR19950032972 A KR 19950032972A KR 970018164 A KR970018164 A KR 970018164A
- Authority
- KR
- South Korea
- Prior art keywords
- pure water
- cleaning
- chamber
- semiconductor wafer
- buffer chamber
- Prior art date
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
세정 효율이 향상된 세정장치에 관해 개시한다. 본 발명은 반도체용 웨이퍼의 순수 세정장치에 있어서, 순수 유입공이 형성된 안내판에 의해 구획된 하부의 완충실과 상부의 세정실, 상기 완충실의 하단면에 연결설치된 순수공급 파이프 및 상기 세정실에 연결설치된 배수파이프를 구비하는 것을 특징으로 하는 반도체용 웨이퍼의 세정장치를 제공한다.A cleaning apparatus with improved cleaning efficiency is disclosed. The present invention is a pure water cleaning device for a semiconductor wafer, the lower buffer chamber and the upper cleaning chamber partitioned by a guide plate formed with a pure water inlet hole, a pure water supply pipe connected to the lower surface of the buffer chamber and connected to the cleaning chamber A cleaning apparatus for a semiconductor wafer, comprising a drain pipe.
본 발명의 실시예에 의하면, 균일한 유량과 유압으로 카세트 내부의 웨이퍼로 순수를 공급할 수 있고, 난류에 의한 재오염이 방지되기 때문에 세정효율이 증가한다.According to the embodiment of the present invention, the pure water can be supplied to the wafer inside the cassette at a uniform flow rate and hydraulic pressure, and the cleaning efficiency is increased because recontamination by turbulence is prevented.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2도는 본 발명의 일 실시예에 의한 반도체 장치용 웨이퍼의 세정장치를 나타내는 사시도이다.2 is a perspective view showing a cleaning apparatus for a wafer for semiconductor devices according to an embodiment of the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950032972A KR970018164A (en) | 1995-09-29 | 1995-09-29 | Cleaning device of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950032972A KR970018164A (en) | 1995-09-29 | 1995-09-29 | Cleaning device of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970018164A true KR970018164A (en) | 1997-04-30 |
Family
ID=66615458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950032972A KR970018164A (en) | 1995-09-29 | 1995-09-29 | Cleaning device of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970018164A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100406853B1 (en) * | 2000-10-05 | 2003-11-21 | 김하용 | Drain Trap |
KR100706230B1 (en) * | 2004-03-04 | 2007-04-11 | 삼성전자주식회사 | Wet station |
-
1995
- 1995-09-29 KR KR1019950032972A patent/KR970018164A/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100406853B1 (en) * | 2000-10-05 | 2003-11-21 | 김하용 | Drain Trap |
KR100706230B1 (en) * | 2004-03-04 | 2007-04-11 | 삼성전자주식회사 | Wet station |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR860006195A (en) | Cultivator using a mixture of water and air | |
KR980006022A (en) | Treatment device and treatment method | |
EA199700457A1 (en) | HORIZONTAL PLATE AND COLUMN FOR CONTACTING GAS AND LIQUID | |
ATE270738T1 (en) | WATER INLET DEVICE OF A PUMP INSTALLATION FLOATING ON THE SURFACE OF A BASIN | |
ATE306587T1 (en) | METHOD AND DEVICE FOR RECEIVING A FLOATING LAYER FROM A LIQUID | |
JPH04192419A (en) | Substrate cleaning apparatus | |
KR970018164A (en) | Cleaning device of semiconductor device | |
DE68904963D1 (en) | SPLASH PROTECTION DEVICE. | |
RU95118759A (en) | WATER DRAINAGE STRUCTURE | |
JP2001102351A (en) | Rinsing tank equipped with ultra-clean liquid | |
KR970052651A (en) | Semiconductor Wafer Cleaning Equipment | |
DE29907721U1 (en) | Emergency drain device | |
EA199800883A1 (en) | LIQUID PRESSURE BOOSTER | |
KR900019160A (en) | Overflow Tank for Semiconductor Wafer Cleaner | |
KR900015271A (en) | Cleaning method for semiconductor device and cleaning device therefor | |
SE8005969L (en) | DEVICE FOR RADIATORS | |
KR900701210A (en) | Washing head | |
KR0177697B1 (en) | Checking device of water valve | |
SU980844A1 (en) | Pressure tank | |
DE50310093D1 (en) | Water drainage device for a washing machine | |
RU93032601A (en) | DEVICE FOR REMOVING LIQUID FROM GAS AND GAS-CONDENSATE WELLS | |
JPH0254528A (en) | Manufacturing device for semiconductor device | |
KR970052686A (en) | Wafer Surface Cleaner | |
KR940008364B1 (en) | Cleaning bath of semiconductor wafer | |
KR200246005Y1 (en) | bal valve |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Withdrawal due to no request for examination |