KR970015301U - 반도체소자 제조용 세척조의 탈이온수 자동 유속 조절 장치 - Google Patents

반도체소자 제조용 세척조의 탈이온수 자동 유속 조절 장치

Info

Publication number
KR970015301U
KR970015301U KR2019950024234U KR19950024234U KR970015301U KR 970015301 U KR970015301 U KR 970015301U KR 2019950024234 U KR2019950024234 U KR 2019950024234U KR 19950024234 U KR19950024234 U KR 19950024234U KR 970015301 U KR970015301 U KR 970015301U
Authority
KR
South Korea
Prior art keywords
flow rate
deionized water
rate control
control device
cleaning bath
Prior art date
Application number
KR2019950024234U
Other languages
English (en)
Other versions
KR0127365Y1 (ko
Inventor
김희석
윤철수
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950024234U priority Critical patent/KR0127365Y1/ko
Publication of KR970015301U publication Critical patent/KR970015301U/ko
Application granted granted Critical
Publication of KR0127365Y1 publication Critical patent/KR0127365Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019950024234U 1995-09-06 1995-09-06 반도체소자 제조용 세척조의 탈이온수 자동 유속 조절 장치 KR0127365Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950024234U KR0127365Y1 (ko) 1995-09-06 1995-09-06 반도체소자 제조용 세척조의 탈이온수 자동 유속 조절 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950024234U KR0127365Y1 (ko) 1995-09-06 1995-09-06 반도체소자 제조용 세척조의 탈이온수 자동 유속 조절 장치

Publications (2)

Publication Number Publication Date
KR970015301U true KR970015301U (ko) 1997-04-28
KR0127365Y1 KR0127365Y1 (ko) 1998-12-01

Family

ID=19422968

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950024234U KR0127365Y1 (ko) 1995-09-06 1995-09-06 반도체소자 제조용 세척조의 탈이온수 자동 유속 조절 장치

Country Status (1)

Country Link
KR (1) KR0127365Y1 (ko)

Also Published As

Publication number Publication date
KR0127365Y1 (ko) 1998-12-01

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