KR970003851A - Metal wiring formation method of semiconductor device - Google Patents
Metal wiring formation method of semiconductor device Download PDFInfo
- Publication number
- KR970003851A KR970003851A KR1019950018540A KR19950018540A KR970003851A KR 970003851 A KR970003851 A KR 970003851A KR 1019950018540 A KR1019950018540 A KR 1019950018540A KR 19950018540 A KR19950018540 A KR 19950018540A KR 970003851 A KR970003851 A KR 970003851A
- Authority
- KR
- South Korea
- Prior art keywords
- photoresist film
- forming
- semiconductor device
- etching
- metal
- Prior art date
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- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
본 발명은 반도체 소자의 금속배선 형성방법에 관한 것으로, 낫칭 및 넥킹 현상의 발생으로 인한 불량을 방지하기 위하여 절연층에 소정 깊이의 트렌치 (Trench)를 형성하고, 그 트렌치 내부에 금속(Metal)을 매립시키므로써 소자의 수율 및 전기적특성을 향상시킬 수 있도록 한 반도체 소자의 금속배선 형성방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a metal wiring of a semiconductor device, and to form a trench of a predetermined depth in an insulating layer in order to prevent a defect due to the hardening and necking phenomenon, and to form a metal in the trench The present invention relates to a method for forming metal wirings in a semiconductor device, which allows the device to improve yield and electrical characteristics of the device by being buried.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2A 내지 제2E도는 본 발명에 따른 반도체 소자의 금속배선 형성방법을 설명하기 위한 소자의 단면도.2A through 2E are cross-sectional views of a device for explaining a method for forming metal wirings of a semiconductor device according to the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950018540A KR970003851A (en) | 1995-06-30 | 1995-06-30 | Metal wiring formation method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950018540A KR970003851A (en) | 1995-06-30 | 1995-06-30 | Metal wiring formation method of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970003851A true KR970003851A (en) | 1997-01-29 |
Family
ID=66526155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950018540A KR970003851A (en) | 1995-06-30 | 1995-06-30 | Metal wiring formation method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970003851A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7132791B2 (en) | 2003-04-11 | 2006-11-07 | Kabushiki Kaisha Toyota Jidoshokki | Electroluminescence display |
-
1995
- 1995-06-30 KR KR1019950018540A patent/KR970003851A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7132791B2 (en) | 2003-04-11 | 2006-11-07 | Kabushiki Kaisha Toyota Jidoshokki | Electroluminescence display |
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