KR970001693B1 - Preparation process of phase shift optical mask - Google Patents

Preparation process of phase shift optical mask

Info

Publication number
KR970001693B1
KR970001693B1 KR94021647A KR19940021647A KR970001693B1 KR 970001693 B1 KR970001693 B1 KR 970001693B1 KR 94021647 A KR94021647 A KR 94021647A KR 19940021647 A KR19940021647 A KR 19940021647A KR 970001693 B1 KR970001693 B1 KR 970001693B1
Authority
KR
South Korea
Prior art keywords
phase shift
preparation process
optical mask
shift optical
mask
Prior art date
Application number
KR94021647A
Other languages
Korean (ko)
Inventor
Yoshihiko Okamoto
Original Assignee
Hitachi Mfg Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP29535088A external-priority patent/JP2710967B2/en
Application filed by Hitachi Mfg Kk filed Critical Hitachi Mfg Kk
Application granted granted Critical
Publication of KR970001693B1 publication Critical patent/KR970001693B1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
KR94021647A 1988-11-22 1994-08-30 Preparation process of phase shift optical mask KR970001693B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP29535088A JP2710967B2 (en) 1988-11-22 1988-11-22 Manufacturing method of integrated circuit device
KR1019890016931A KR960006817B1 (en) 1988-11-22 1989-11-21 Mask for manufacturing semiconductor device and the method of manufacture thereof

Publications (1)

Publication Number Publication Date
KR970001693B1 true KR970001693B1 (en) 1997-02-13

Family

ID=26560220

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1019920018201A KR960006818B1 (en) 1988-11-22 1992-10-05 Method of manufacturing photomask
KR1019920018202A KR960006819B1 (en) 1988-11-22 1992-10-05 Method of manufacturing i.c. devices and photomask using them
KR94021647A KR970001693B1 (en) 1988-11-22 1994-08-30 Preparation process of phase shift optical mask

Family Applications Before (2)

Application Number Title Priority Date Filing Date
KR1019920018201A KR960006818B1 (en) 1988-11-22 1992-10-05 Method of manufacturing photomask
KR1019920018202A KR960006819B1 (en) 1988-11-22 1992-10-05 Method of manufacturing i.c. devices and photomask using them

Country Status (1)

Country Link
KR (3) KR960006818B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7026081B2 (en) * 2001-09-28 2006-04-11 Asml Masktools B.V. Optical proximity correction method utilizing phase-edges as sub-resolution assist features

Also Published As

Publication number Publication date
KR960006819B1 (en) 1996-05-23
KR960006818B1 (en) 1996-05-23

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Legal Events

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Year of fee payment: 15

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