KR960043116A - Planarization method of semiconductor device - Google Patents

Planarization method of semiconductor device Download PDF

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Publication number
KR960043116A
KR960043116A KR1019950011921A KR19950011921A KR960043116A KR 960043116 A KR960043116 A KR 960043116A KR 1019950011921 A KR1019950011921 A KR 1019950011921A KR 19950011921 A KR19950011921 A KR 19950011921A KR 960043116 A KR960043116 A KR 960043116A
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KR
South Korea
Prior art keywords
photoresist film
film
semiconductor device
planarization
spin
Prior art date
Application number
KR1019950011921A
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Korean (ko)
Inventor
황준
Original Assignee
김주용
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019950011921A priority Critical patent/KR960043116A/en
Publication of KR960043116A publication Critical patent/KR960043116A/en

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Abstract

본 발명은 간단한 공정을 통해 국부 평탄화는 물론 광영 평탄화를 동시에 이룰 수 있는 반도체 소자의 평탄화 방법에 관한 것으로, 상층 금속막 형성후 층간절연막, 스핀 온 클래스막, 감광막을 차례로 형성하는 단계; 블랫킹 노광 및 현상공정을 통해 상기 감광막을 일정정도 제거하되, 스테퍼의 초점 위치를 조절하여 상대적으로 높은 토폴로지에 위치하는 감광막을 부분적으로 제거하는 단계; 잔류하는 상기감광막을 제거하고, 에치백공정을 통해 상기 스핀 온 글래스막을 식각하여 상기 상층 금속막을 노출시키는 단계; 잔류하는 상기 감광막 제거후 전체 상부에 절연층을 형성하여 평탄화하는 단계를 포함하여 이루어지는 것을 특징으로 한다.The present invention relates to a planarization method of a semiconductor device capable of simultaneously performing local planarization and photolithographic planarization through a simple process. Removing the photoresist film to a certain degree through a blacking exposure and developing process, and partially removing the photoresist film positioned in a relatively high topology by adjusting a focal position of the stepper; Removing the remaining photoresist layer and etching the spin-on glass layer through an etch back process to expose the upper metal layer; And removing the remaining photoresist film to form an insulating layer over the entire upper portion of the photoresist film.

Description

반도체 소자의 평탄화 방법Planarization method of semiconductor device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1B도 내지 제1C도는 본 발명의 일실시예에 따른 평탄화 과정을 나타내는 단면도.1B to 1C are cross-sectional views showing a planarization process according to an embodiment of the present invention.

Claims (1)

다층금속구조를 포함하는 반도체 소자 제조공정 중 발생되는 소자간 단차를 완화시키기 위한 평탄화 방법에 있어서, 상층 금속막 형성후 층간절연막, 스핀 온 글래스막, 감광막을 차례로 형성하는 단계; 블랭킷 노광 및 현상공정을 통해 상기 감광막을 일정정도 제거하되, 스테퍼의 초점 위치를 조절하여 상대적으로 높은 토폴로지에 위치하는 감광막을 부분적으로 제거하는 단계; 에치백 공정을 통해 상기 스핀 온 글래스막을 식각하여 상기 상층 금속막을 노출시키는 단계; 잔류하는 상기 감광막 제거후 전체 상부에 절연층을 형성하여 평탄화하는 단계를 포함하여 이루어지는 것을 특징으로 하는 반도체 소자의 평탄화 방법.A planarization method for alleviating the step difference between devices generated during a semiconductor device manufacturing process including a multilayer metal structure, the method comprising: sequentially forming an interlayer insulating film, a spin on glass film, and a photoresist film after forming an upper metal film; Removing the photoresist film to some extent through a blanket exposure and developing process, and partially removing the photoresist film positioned in a relatively high topology by adjusting a focal position of the stepper; Etching the spin-on glass film through an etch back process to expose the upper metal film; And removing the remaining photoresist film to form an insulating layer on the entire upper portion thereof to planarize the semiconductor device. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950011921A 1995-05-15 1995-05-15 Planarization method of semiconductor device KR960043116A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950011921A KR960043116A (en) 1995-05-15 1995-05-15 Planarization method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950011921A KR960043116A (en) 1995-05-15 1995-05-15 Planarization method of semiconductor device

Publications (1)

Publication Number Publication Date
KR960043116A true KR960043116A (en) 1996-12-23

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950011921A KR960043116A (en) 1995-05-15 1995-05-15 Planarization method of semiconductor device

Country Status (1)

Country Link
KR (1) KR960043116A (en)

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