KR960042845A - Surface Modification System of Field Emitter Using Continuous Oscillation Laser - Google Patents

Abstract

When surface modification of field emitters is performed using a continuous oscillation (CW) laser, the surface of the tip emitter irradiated with the continuous oscillation (CW) laser is subjected to continuous oscillation by 12 solid-laser interaction. CW) A portion of the laser is absorbed by the emitter surface and the emitter surface is instantaneously heated to repeat the local heating, melting and quenching of the tip surface. At this time, some of the atoms that were weakly bonded at the emitter surface are vaporized or sublimed. As a result, the emitter surface is mechanically hardened and structurally compacted, and impurities adsorbed on the emitter surface during the manufacturing process are desorbed to reduce the work function of the emitter. It is possible to provide a field emission device capable of preventing tip breakage during operation, remarkably improving electron emission characteristics, and allowing stable electron emission for a long time.

Description

Surface Modification System of Field Emitter Using Continuous Oscillation Laser

As this is a public information case, the full text was not included.

1A to 1C are front cross-sectional views sequentially illustrating a method of surface modification of a field emitter using a continuous wave (CW) laser according to the present invention, and FIGS. 2A to 2C are continuous oscillations according to the present invention. (CW) A cross sectional view showing another method of surface modification of a field emitter using a laser sequentially, FIG. 3 is a schematic view showing a surface modification apparatus of a field emitter using a continuous oscillation (CW) laser according to the present invention. Figure 4A is a diagram showing the zigzag scanning of the pulse laser and the direction of movement of the substrate holder during surface modification of the field emitter using a continuous oscillation (CW) laser according to the present invention, Figure 4B is a continuous oscillation according to the present invention (CW) Schematic diagram showing the spiral scanning of a pulsed laser and the direction of movement of the substrate holder during surface modification of another field emitter using a (CW) laser.

Claims (6)

Continuous oscillation (CW) laser generator for generating a continuous oscillation (CW) laser, an optical system for passing the continuous oscillation (CW) laser from the continuous oscillation (CW) laser generator, and continuous oscillation passing through the optical system ( CW) a portion of the continuous oscillation (CW) laser that has passed through the optical system, including a vacuum chamber through which the laser arrives, and a substrate holder in which the field emission element having one or more field emitters is installed in the vacuum chamber. The field emitter surface modification system using a continuous oscillation (CW) laser which modifies the surface of the field emitter by irradiating a part or more of the field emission element above the substrate holder installed inside the vacuum chamber. . According to claim 1, wherein the optical system, the continuous oscillation (CW) laser generated in the continuous oscillation (CW) laser generator, the wavelength of the continuous oscillation (CW) laser or the path of the wavelength change or rotation of the periodic periodic or rotational movement The surface modification system of the field emitter using a continuous oscillation (CW) laser, characterized in that it further comprises a beam splitter (beam splitter) that can be separated from one laser light source to a plurality of laser light sources. 2. The system of claim 1, wherein the substrate holder is in a linear or rotary motion. The continuous oscillation (CW) laser generated in the continuous oscillation (CW) laser generator, wherein Nd: YAG laser, Nd: glass laser, argon (Ar) laser, or carbon dioxide (CO ₂ ) laser is used. A field emitter surface modification system using a continuous oscillation (CW) laser, characterized in that. The system of claim 1, wherein a reaction gas is injected into the vacuum chamber. [Claim 6] The field emitter of claim 5, wherein a hydrocarbon gas containing hydrogen or a gas containing hydrogen gas or a hydrocarbon gas containing carbon is used as the reaction gas injected into the vacuum chamber. Surface modification system. ※ Note: The disclosure is based on the initial application.