KR960035155A - Exposure mask - Google Patents
Exposure mask Download PDFInfo
- Publication number
- KR960035155A KR960035155A KR1019950006132A KR19950006132A KR960035155A KR 960035155 A KR960035155 A KR 960035155A KR 1019950006132 A KR1019950006132 A KR 1019950006132A KR 19950006132 A KR19950006132 A KR 19950006132A KR 960035155 A KR960035155 A KR 960035155A
- Authority
- KR
- South Korea
- Prior art keywords
- pattern
- exposure mask
- exposure
- line width
- auxiliary
- Prior art date
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- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
본 발명은 노광마스크에 관한 것으로, 석영기관 상부에 크롬패턴을 형성하되, 셀부를 노광시키는 크롬패턴사이에 보조패턴을 형성함으로써 상기 노광마스크를 이용한 리소그래픽 공정시 균일한 감광막패턴을 형성하여 반도체소자의 신뢰성을 향상시킬 수 있는 기술이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure mask, in which a chromium pattern is formed on a quartz body, and an auxiliary pattern is formed between chromium patterns for exposing a cell part, thereby forming a uniform photoresist pattern during a lithographic process using the exposure mask. It is a technology that can improve the reliability.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2A도 및 제2B도는 본 발명의 실시예에 따른 노광마스크 및 감광막패턴을 도시한 개략도.2A and 2B are schematic diagrams showing an exposure mask and a photoresist pattern according to an embodiment of the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950006132A KR960035155A (en) | 1995-03-22 | 1995-03-22 | Exposure mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950006132A KR960035155A (en) | 1995-03-22 | 1995-03-22 | Exposure mask |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960035155A true KR960035155A (en) | 1996-10-24 |
Family
ID=66552997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950006132A KR960035155A (en) | 1995-03-22 | 1995-03-22 | Exposure mask |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960035155A (en) |
-
1995
- 1995-03-22 KR KR1019950006132A patent/KR960035155A/en not_active Application Discontinuation
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E902 | Notification of reason for refusal | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |