KR960026590U - 핫-월형 고속 열처리장치 - Google Patents

핫-월형 고속 열처리장치

Info

Publication number
KR960026590U
KR960026590U KR2019950000687U KR19950000687U KR960026590U KR 960026590 U KR960026590 U KR 960026590U KR 2019950000687 U KR2019950000687 U KR 2019950000687U KR 19950000687 U KR19950000687 U KR 19950000687U KR 960026590 U KR960026590 U KR 960026590U
Authority
KR
South Korea
Prior art keywords
hot
heat treatment
treatment device
speed heat
wall high
Prior art date
Application number
KR2019950000687U
Other languages
English (en)
Other versions
KR0121711Y1 (ko
Inventor
이길광
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019950000687U priority Critical patent/KR0121711Y1/ko
Publication of KR960026590U publication Critical patent/KR960026590U/ko
Application granted granted Critical
Publication of KR0121711Y1 publication Critical patent/KR0121711Y1/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67115Apparatus for thermal treatment mainly by radiation
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • F27B17/0016Chamber type furnaces
    • F27B17/0025Especially adapted for treating semiconductor wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR2019950000687U 1995-01-18 1995-01-18 핫-월형 고속 열처리장치 KR0121711Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950000687U KR0121711Y1 (ko) 1995-01-18 1995-01-18 핫-월형 고속 열처리장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950000687U KR0121711Y1 (ko) 1995-01-18 1995-01-18 핫-월형 고속 열처리장치

Publications (2)

Publication Number Publication Date
KR960026590U true KR960026590U (ko) 1996-08-17
KR0121711Y1 KR0121711Y1 (ko) 1998-08-17

Family

ID=19406825

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950000687U KR0121711Y1 (ko) 1995-01-18 1995-01-18 핫-월형 고속 열처리장치

Country Status (1)

Country Link
KR (1) KR0121711Y1 (ko)

Also Published As

Publication number Publication date
KR0121711Y1 (ko) 1998-08-17

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