KR960026590U - 핫-월형 고속 열처리장치 - Google Patents
핫-월형 고속 열처리장치Info
- Publication number
- KR960026590U KR960026590U KR2019950000687U KR19950000687U KR960026590U KR 960026590 U KR960026590 U KR 960026590U KR 2019950000687 U KR2019950000687 U KR 2019950000687U KR 19950000687 U KR19950000687 U KR 19950000687U KR 960026590 U KR960026590 U KR 960026590U
- Authority
- KR
- South Korea
- Prior art keywords
- hot
- heat treatment
- treatment device
- speed heat
- wall high
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
- F27B17/0025—Especially adapted for treating semiconductor wafers
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950000687U KR0121711Y1 (ko) | 1995-01-18 | 1995-01-18 | 핫-월형 고속 열처리장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950000687U KR0121711Y1 (ko) | 1995-01-18 | 1995-01-18 | 핫-월형 고속 열처리장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960026590U true KR960026590U (ko) | 1996-08-17 |
KR0121711Y1 KR0121711Y1 (ko) | 1998-08-17 |
Family
ID=19406825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019950000687U KR0121711Y1 (ko) | 1995-01-18 | 1995-01-18 | 핫-월형 고속 열처리장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0121711Y1 (ko) |
-
1995
- 1995-01-18 KR KR2019950000687U patent/KR0121711Y1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0121711Y1 (ko) | 1998-08-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20030307 Year of fee payment: 6 |
|
LAPS | Lapse due to unpaid annual fee |