KR960022661U - Specimen ball and rotating device for vacuum deposition and ion plating - Google Patents

Specimen ball and rotating device for vacuum deposition and ion plating

Info

Publication number
KR960022661U
KR960022661U KR2019940038975U KR19940038975U KR960022661U KR 960022661 U KR960022661 U KR 960022661U KR 2019940038975 U KR2019940038975 U KR 2019940038975U KR 19940038975 U KR19940038975 U KR 19940038975U KR 960022661 U KR960022661 U KR 960022661U
Authority
KR
South Korea
Prior art keywords
rotating device
vacuum deposition
ion plating
specimen ball
specimen
Prior art date
Application number
KR2019940038975U
Other languages
Korean (ko)
Other versions
KR0123917Y1 (en
Inventor
송영익
홍재화
우덕제
문종호
Original Assignee
포항종합제철주식회사
재단법인산업과학기술연구소
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 포항종합제철주식회사, 재단법인산업과학기술연구소 filed Critical 포항종합제철주식회사
Priority to KR2019940038975U priority Critical patent/KR0123917Y1/en
Publication of KR960022661U publication Critical patent/KR960022661U/en
Application granted granted Critical
Publication of KR0123917Y1 publication Critical patent/KR0123917Y1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR2019940038975U 1994-12-30 1994-12-30 Rotation apparatus for vacuum coating and ion plating KR0123917Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940038975U KR0123917Y1 (en) 1994-12-30 1994-12-30 Rotation apparatus for vacuum coating and ion plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940038975U KR0123917Y1 (en) 1994-12-30 1994-12-30 Rotation apparatus for vacuum coating and ion plating

Publications (2)

Publication Number Publication Date
KR960022661U true KR960022661U (en) 1996-07-20
KR0123917Y1 KR0123917Y1 (en) 1998-11-02

Family

ID=19405175

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940038975U KR0123917Y1 (en) 1994-12-30 1994-12-30 Rotation apparatus for vacuum coating and ion plating

Country Status (1)

Country Link
KR (1) KR0123917Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102107446B1 (en) 2019-11-17 2020-05-07 주식회사 지에스아이 Coating Apparatus, Coating Method And Coating Layer manufactured using the same method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101475417B1 (en) * 2013-02-04 2014-12-22 (주) 한일진공 Vacuum evaporator
KR101642188B1 (en) * 2014-08-19 2016-07-22 재단법인 하이브리드 인터페이스기반 미래소재 연구단 Jig system with playing torsion angle for uniform deposition of structural article

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102107446B1 (en) 2019-11-17 2020-05-07 주식회사 지에스아이 Coating Apparatus, Coating Method And Coating Layer manufactured using the same method

Also Published As

Publication number Publication date
KR0123917Y1 (en) 1998-11-02

Similar Documents

Publication Publication Date Title
DE69021243D1 (en) In-line rotating inserting device.
DE69008228T2 (en) Plasma processing device.
EP1033750A4 (en) Vacuum processing device
DE69030744D1 (en) Plasma processing device
DE69500565T2 (en) Plasma processing device
DE19781631T1 (en) Thermally conductive chuck for vacuum processing device
EP1061155A4 (en) Vacuum processing apparatus
DE69719670T2 (en) Tape processing device
AU7370891A (en) Metal-free buffer for ion selective electrode-based assays
NO902896D0 (en) ANTISTATIC COATING Abrasive.
GB9913275D0 (en) Sample processing device
TR199700116A2 (en) Device and method for carrying the clothings.
DE69700339D1 (en) Coating shield for PVD device
TW458486U (en) Plasma processing device
TW399773U (en) Plasma processing device
DE68909262T2 (en) Device for RF plasma processing.
KR960022661U (en) Specimen ball and rotating device for vacuum deposition and ion plating
DE69719436T2 (en) Composite processing device
DE69131391D1 (en) Plasma processing device
DE9402252U1 (en) Vacuum clamping device
DE69500830T2 (en) Plasma processing device
DE29609486U1 (en) Vacuum holding device
DE59909953D1 (en) processing device
DE9405808U1 (en) Plasma processing device
DE69512376D1 (en) PLASMA PROCESSING DEVICE

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20010601

Year of fee payment: 4

LAPS Lapse due to unpaid annual fee