KR960019847A - Late photobleaching to precisely control the effective refractive index of polymer optical waveguides - Google Patents

Late photobleaching to precisely control the effective refractive index of polymer optical waveguides Download PDF

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Publication number
KR960019847A
KR960019847A KR1019940030102A KR19940030102A KR960019847A KR 960019847 A KR960019847 A KR 960019847A KR 1019940030102 A KR1019940030102 A KR 1019940030102A KR 19940030102 A KR19940030102 A KR 19940030102A KR 960019847 A KR960019847 A KR 960019847A
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South Korea
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optical waveguide
late
photobleaching
refractive index
manufacturing
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KR1019940030102A
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Korean (ko)
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KR0162754B1 (en
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오민철
황월연
정태형
김장주
신상영
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양승택
재단법인 한국전자통신연구소
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G02B2006/12173—Masking

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

본 발명은 폴리머 광도파로 소자의 출력특성을 최적화시키는 방법으로서 후기 광표백법에 관한 것이다.The present invention relates to a late photobleaching method as a method of optimizing the output characteristics of a polymer optical waveguide device.

후기 광표백법이란 폴리머 광도파로 소자를 제조한 뒤 소자의 출력특성을 측정하면서 자외선을 소자의 전면에 조사하여 광도파로의 유효 굴절율을 미세하고 정확하게 변화시킬 수 있으며, 이를 이용하여 소자의 출력특성이 최적화 되도록 만드는 방법을 말한다.In the late photobleaching method, a polymer optical waveguide device is manufactured, and then the ultraviolet ray is irradiated to the front surface of the device while measuring the output characteristics of the device, thereby effectively and accurately changing the effective refractive index of the optical waveguide. Tell how to make it possible.

이러한 후기 광표백법은 매우 짧은 길이의 이중 모드 간섭형 소자나 방향성 결합기형 광 스위치의 동작특성을 최적화시키는 방법으로 사용될 수도 있을 것이다.The late photobleaching method may be used as a method for optimizing the operating characteristics of a very short length dual mode interference device or a directional coupler type optical switch.

Description

폴리머 광도파로의 유효굴절율을 정밀하게 조절하기 위한 후기 광표백법Late photobleaching to precisely control the effective refractive index of polymer optical waveguides

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도의 (a)∼(e)는 광표백법(photo bleaching method)을 이용하여 채널 광도파로를 제작하는 공정 흐름도,(A)-(e) of FIG. 1 is a process flow chart of manufacturing a channel optical waveguide using a photo bleaching method,

제2도의 (가)는 공정상의 초기 광표백법(initial photo bleaching)에 의한 광도파로의 단면도.2A is a cross-sectional view of an optical waveguide by the initial photobleaching process.

Claims (7)

광도파로를 제조하는 방법으로서, 실리콘 기판을 준비하는 단계; 상기 실리콘 기판 위에 클래딩 층을 코팅하는 단계; 상기 클래딩층 위에 이 클래딩층 보다 굴절률이 더 낮은 코아층을 코팅하는 단계; 마스크를 사용하여 상기 코아층의 소정부분에만 자외선을 조사하는 광표백 단계로 이루어진 광도파로 제조방법에 있어서, 상기 자외선을 조사하는 단계 이후에, 광도파로 상부 표면에 자외선을 조사하여 상기 광도파로의 유효 굴절률을 조절하는 후기 광표백 단계가 더 추가되는 것을 특징으로 하는 광도파로 제조방법.CLAIMS 1. A method for manufacturing an optical waveguide, comprising: preparing a silicon substrate; Coating a cladding layer over the silicon substrate; Coating a core layer on the cladding layer with a lower refractive index than the cladding layer; In the optical waveguide manufacturing method comprising a photobleaching step of irradiating ultraviolet rays only to a predetermined portion of the core layer using a mask, after the step of irradiating the ultraviolet rays, the effective refractive index of the optical waveguide by irradiating ultraviolet rays to the upper surface of the optical waveguide The optical waveguide manufacturing method, characterized in that further late bleaching step for adjusting the. 제1항에 있어서, 상기 후기 광표백 단계는 상기 광도파로 소자의 전체 또는 일부의 유효 굴절율을 변화시키는 단계인 것을 특징으로 하는 광도파로 제조방법.The optical waveguide manufacturing method according to claim 1, wherein the late photobleaching step is a step of changing an effective refractive index of all or part of the optical waveguide device. 제2항에 있어서, 상기 후기 광표백 단계에서 형성되는 후기 광표백 영역의 두께는 후기 광표백 시간이나 상기 자외선의 세기에 따라 결정되며, 상기 후기 광표백 시간이나 상기 자외선의 세기는 광도파로 소자의 출력 특성의 측정값에 따라 결정되는 것을 특징으로 하는 광도파로 제조방법.3. The method of claim 2, wherein the thickness of the late photobleaching region formed in the late photobleaching step is determined according to the late photobleaching time or the intensity of the ultraviolet rays, and the late photobleaching time or the intensity of the ultraviolet rays is measured for the output characteristics of the optical waveguide device. The optical waveguide manufacturing method, characterized in that determined according to the value. 제1항 또는 제3항에 있어서, 상기 광도파로 소자는 이중 모드 간섭형 소자(two mode interference device)인 것을 특징으로 하는 광도파로 제조방법.The optical waveguide manufacturing method according to claim 1 or 3, wherein the optical waveguide device is a two mode interference device. 제4항에 있어서, 상기 후기 광표백 단계는 상기 이중모드 간섭형 소자의 제1모드와 제2모드간의 맥놀이 거리(beating length)를 조절하는 단계인 것을 특징으로 하는 광도파로 제조방법.5. The method of claim 4, wherein the late photobleaching step is a step of adjusting a beating length between a first mode and a second mode of the dual mode interference type device. 제1항 또는 제3항에 있어서, 상기 광도파로 소자는 방향성 결합기(directional coupler)인 것을 특징으로 하는 광도파로 제조방법.The method of claim 1, wherein the optical waveguide device is a directional coupler. 제6항에 있어서, 상기 후기 광표백 단계는 상기 방향성 결합기의 초기 천이 상태를 조절하는 단계인 것을 특징으로 하는 광도파로 제조방법.The optical waveguide manufacturing method of claim 6, wherein the late photobleaching step is a step of adjusting an initial transition state of the directional coupler. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940030102A 1994-11-16 1994-11-16 Post photo-bleaching method for the fine tuning of the effective refractive index of polymer waveguide device KR0162754B1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100364761B1 (en) * 2000-06-02 2002-12-16 엘지전자 주식회사 A polarization splitter in electro-optic polymer and method for fabricating the same
KR100698166B1 (en) * 2000-06-02 2007-03-22 엘지전자 주식회사 A waveguide polarization in an Electrooptic polymer and method for fabricating the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010008005A (en) * 2000-11-02 2001-02-05 이형종 A Star Coupler with UV-Written Tapered Waveguide and a Waveguide Grating Router based on the Star Coupler

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100364761B1 (en) * 2000-06-02 2002-12-16 엘지전자 주식회사 A polarization splitter in electro-optic polymer and method for fabricating the same
KR100698166B1 (en) * 2000-06-02 2007-03-22 엘지전자 주식회사 A waveguide polarization in an Electrooptic polymer and method for fabricating the same

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