KR960019098U - Spin dryer - Google Patents

Spin dryer

Info

Publication number
KR960019098U
KR960019098U KR2019940031672U KR19940031672U KR960019098U KR 960019098 U KR960019098 U KR 960019098U KR 2019940031672 U KR2019940031672 U KR 2019940031672U KR 19940031672 U KR19940031672 U KR 19940031672U KR 960019098 U KR960019098 U KR 960019098U
Authority
KR
South Korea
Prior art keywords
spin dryer
dryer
spin
Prior art date
Application number
KR2019940031672U
Other languages
Korean (ko)
Other versions
KR0119134Y1 (en
Inventor
지재풍
심우익
안경대
유해산
김진영
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940031672U priority Critical patent/KR0119134Y1/en
Publication of KR960019098U publication Critical patent/KR960019098U/en
Application granted granted Critical
Publication of KR0119134Y1 publication Critical patent/KR0119134Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019940031672U 1994-11-28 1994-11-28 Spin dryer KR0119134Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940031672U KR0119134Y1 (en) 1994-11-28 1994-11-28 Spin dryer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940031672U KR0119134Y1 (en) 1994-11-28 1994-11-28 Spin dryer

Publications (2)

Publication Number Publication Date
KR960019098U true KR960019098U (en) 1996-06-19
KR0119134Y1 KR0119134Y1 (en) 1998-08-01

Family

ID=19399405

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940031672U KR0119134Y1 (en) 1994-11-28 1994-11-28 Spin dryer

Country Status (1)

Country Link
KR (1) KR0119134Y1 (en)

Also Published As

Publication number Publication date
KR0119134Y1 (en) 1998-08-01

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
O032 Opposition [utility model]: request for opposition
O072 Maintenance of registration after opposition [utility model]: final registration of opposition
O131 Decision on opposition [utility model]
FPAY Annual fee payment

Payment date: 20090223

Year of fee payment: 12

EXPY Expiration of term