KR960018768A - Leveling method and system of exposure equipment - Google Patents
Leveling method and system of exposure equipment Download PDFInfo
- Publication number
- KR960018768A KR960018768A KR1019940031856A KR19940031856A KR960018768A KR 960018768 A KR960018768 A KR 960018768A KR 1019940031856 A KR1019940031856 A KR 1019940031856A KR 19940031856 A KR19940031856 A KR 19940031856A KR 960018768 A KR960018768 A KR 960018768A
- Authority
- KR
- South Korea
- Prior art keywords
- light
- leveling
- projection lens
- lens
- transmitted
- Prior art date
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
본 발명은 레벨링을 위한 빛이 실제 노광 빛이 투과되는 노광장비의 프로젝션 렌즈를 투과하도록 하고 상기 투과되어 웨이퍼에 반사된 빛을 다시 프로젝션 렌즈를 통해 검출하여 레벨링하는 것을 특징으로 하는 노광장비의 레벨링 방법 및 그 시스템에 관한 것으로, 본 발명의 레벨링 시스템은 종래의 레벨링 시스템에서는 보상할 수 없었던 프로젝션 렌즈의 기울어짐도 효과적으로 보상할 수 있어, 감광막 패턴의 프로파일 불량을 감소시켜 소자의 수율 향상은 물론 장비의 점검 및 보수에 편리함을 가져다주는 효과가 있다.The present invention provides a leveling method of exposure equipment, characterized in that the light for leveling is transmitted through the projection lens of the exposure equipment through which the actual exposure light is transmitted, and the light transmitted through the projection lens is detected again through the projection lens. And the system, the leveling system of the present invention can effectively compensate for the inclination of the projection lens that could not be compensated in the conventional leveling system, reducing the poor profile of the photoresist pattern to improve the yield of the device as well as the equipment It is effective to bring convenience to inspection and repair.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명의 일실시예에 따른 레벨링 시스템의 구조를 나타내는 단면도.2 is a cross-sectional view showing the structure of a leveling system according to an embodiment of the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940031856A KR960018768A (en) | 1994-11-29 | 1994-11-29 | Leveling method and system of exposure equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940031856A KR960018768A (en) | 1994-11-29 | 1994-11-29 | Leveling method and system of exposure equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960018768A true KR960018768A (en) | 1996-06-17 |
Family
ID=66648840
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940031856A KR960018768A (en) | 1994-11-29 | 1994-11-29 | Leveling method and system of exposure equipment |
Country Status (1)
Country | Link |
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KR (1) | KR960018768A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7535551B2 (en) | 2004-09-02 | 2009-05-19 | Samsung Electronics Co., Ltd. | Projection lens unit with focus and level control, related exposure apparatus and method |
US9083164B2 (en) | 2011-09-27 | 2015-07-14 | Yazaki Corporation | Support structure for boss |
-
1994
- 1994-11-29 KR KR1019940031856A patent/KR960018768A/en not_active Application Discontinuation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7535551B2 (en) | 2004-09-02 | 2009-05-19 | Samsung Electronics Co., Ltd. | Projection lens unit with focus and level control, related exposure apparatus and method |
US8102509B2 (en) | 2004-09-02 | 2012-01-24 | Samsung Electronics Co., Ltd. | Focus and level control method for projection lens unit by comparing intensities of measurement light and reference light |
US9083164B2 (en) | 2011-09-27 | 2015-07-14 | Yazaki Corporation | Support structure for boss |
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Legal Events
Date | Code | Title | Description |
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WITN | Withdrawal due to no request for examination |