KR960018757A - How to keep your photomask flat - Google Patents

How to keep your photomask flat Download PDF

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Publication number
KR960018757A
KR960018757A KR1019940032244A KR19940032244A KR960018757A KR 960018757 A KR960018757 A KR 960018757A KR 1019940032244 A KR1019940032244 A KR 1019940032244A KR 19940032244 A KR19940032244 A KR 19940032244A KR 960018757 A KR960018757 A KR 960018757A
Authority
KR
South Korea
Prior art keywords
photomask
flatness
maintaining
correction plate
keep
Prior art date
Application number
KR1019940032244A
Other languages
Korean (ko)
Inventor
유성재
Original Assignee
엄길용
오리온전기 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엄길용, 오리온전기 주식회사 filed Critical 엄길용
Priority to KR1019940032244A priority Critical patent/KR960018757A/en
Publication of KR960018757A publication Critical patent/KR960018757A/en

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Abstract

본 발명은 포토마스크의 평탄성 유지방법에 관한 것이다.The present invention relates to a method for maintaining flatness of a photomask.

본 발명의 포토마스크의 평탄성 유지방법은 기판(1)의 일측면에 임의의 형상을 갖는 패턴(10)이 형성되고 그 전면에 보호막(11)이 형성된 포토마스크의 반대측에 포토마스크와 투명한 보정판(3)이 일정한 간격을 유지하도록 포토마스크와 보정판(3)의 테두리부분에 스페이서(2)를 형성하여 합착시키고 보정판의 소정부분에 구멍을 형성하여 진공장치(5)에 연결시켜 구성하여 노광공정시 포토마스크와 보정판(3) 사이의 공간으로부터 공기를 흡입하여 포토마스크의 휘어짐을 방지한다.In the method of maintaining the flatness of the photomask of the present invention, a pattern 10 having an arbitrary shape is formed on one side of the substrate 1 and a photomask and a transparent correction plate on the opposite side of the photomask on which the protective film 11 is formed on the front surface thereof. 3) The spacers 2 are formed on the edges of the photomask and the correction plate 3 so as to maintain a constant distance therebetween, and a hole is formed in a predetermined portion of the correction plate and connected to the vacuum device 5 to form the exposure process. Air is sucked in from the space between the photomask and the compensating plate 3 to prevent the photomask from warping.

Description

포토마스크의 평탄성 유지하는 방법How to keep your photomask flat

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명에 따른 포토마스크 평탄성을 유지하는 방법을 나타낸 단면 구조도.2 is a cross-sectional structural view showing a method for maintaining photomask flatness according to the present invention.

Claims (1)

포토마스크(1)와 투명한 보정판(3)이 일정간격을 유지하도록 테두리부분에 스페이서(2)를 형성하여 합착시키고 상기 보정판의 소정부위에 구멍을 형성하여 진공장치(5)에 연결시켜 노광공정시 상기 진공장치의 흡입력으로 포토마스크의 중심부분의 휘어짐을 방지하는 것을 특징으로 하는 포토마스크의 평탄성 유지방법.The photomask 1 and the transparent compensating plate 3 are formed by joining the spacers 2 at the edges so as to maintain a constant distance, and forming holes in predetermined portions of the compensating plate to be connected to the vacuum apparatus 5 during the exposure process. Method for maintaining the flatness of the photomask, characterized in that for preventing the bending of the central portion of the photomask by the suction force of the vacuum device. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940032244A 1994-11-30 1994-11-30 How to keep your photomask flat KR960018757A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940032244A KR960018757A (en) 1994-11-30 1994-11-30 How to keep your photomask flat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940032244A KR960018757A (en) 1994-11-30 1994-11-30 How to keep your photomask flat

Publications (1)

Publication Number Publication Date
KR960018757A true KR960018757A (en) 1996-06-17

Family

ID=66648447

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940032244A KR960018757A (en) 1994-11-30 1994-11-30 How to keep your photomask flat

Country Status (1)

Country Link
KR (1) KR960018757A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100578262B1 (en) * 2003-11-13 2006-05-11 주식회사 디엠에스 Apparatus for fixing mask by vacuum and exposure method of the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100578262B1 (en) * 2003-11-13 2006-05-11 주식회사 디엠에스 Apparatus for fixing mask by vacuum and exposure method of the same

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