KR960018757A - How to keep your photomask flat - Google Patents
How to keep your photomask flat Download PDFInfo
- Publication number
- KR960018757A KR960018757A KR1019940032244A KR19940032244A KR960018757A KR 960018757 A KR960018757 A KR 960018757A KR 1019940032244 A KR1019940032244 A KR 1019940032244A KR 19940032244 A KR19940032244 A KR 19940032244A KR 960018757 A KR960018757 A KR 960018757A
- Authority
- KR
- South Korea
- Prior art keywords
- photomask
- flatness
- maintaining
- correction plate
- keep
- Prior art date
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
본 발명은 포토마스크의 평탄성 유지방법에 관한 것이다.The present invention relates to a method for maintaining flatness of a photomask.
본 발명의 포토마스크의 평탄성 유지방법은 기판(1)의 일측면에 임의의 형상을 갖는 패턴(10)이 형성되고 그 전면에 보호막(11)이 형성된 포토마스크의 반대측에 포토마스크와 투명한 보정판(3)이 일정한 간격을 유지하도록 포토마스크와 보정판(3)의 테두리부분에 스페이서(2)를 형성하여 합착시키고 보정판의 소정부분에 구멍을 형성하여 진공장치(5)에 연결시켜 구성하여 노광공정시 포토마스크와 보정판(3) 사이의 공간으로부터 공기를 흡입하여 포토마스크의 휘어짐을 방지한다.In the method of maintaining the flatness of the photomask of the present invention, a pattern 10 having an arbitrary shape is formed on one side of the substrate 1 and a photomask and a transparent correction plate on the opposite side of the photomask on which the protective film 11 is formed on the front surface thereof. 3) The spacers 2 are formed on the edges of the photomask and the correction plate 3 so as to maintain a constant distance therebetween, and a hole is formed in a predetermined portion of the correction plate and connected to the vacuum device 5 to form the exposure process. Air is sucked in from the space between the photomask and the compensating plate 3 to prevent the photomask from warping.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명에 따른 포토마스크 평탄성을 유지하는 방법을 나타낸 단면 구조도.2 is a cross-sectional structural view showing a method for maintaining photomask flatness according to the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940032244A KR960018757A (en) | 1994-11-30 | 1994-11-30 | How to keep your photomask flat |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940032244A KR960018757A (en) | 1994-11-30 | 1994-11-30 | How to keep your photomask flat |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960018757A true KR960018757A (en) | 1996-06-17 |
Family
ID=66648447
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940032244A KR960018757A (en) | 1994-11-30 | 1994-11-30 | How to keep your photomask flat |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960018757A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100578262B1 (en) * | 2003-11-13 | 2006-05-11 | 주식회사 디엠에스 | Apparatus for fixing mask by vacuum and exposure method of the same |
-
1994
- 1994-11-30 KR KR1019940032244A patent/KR960018757A/en active IP Right Grant
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100578262B1 (en) * | 2003-11-13 | 2006-05-11 | 주식회사 디엠에스 | Apparatus for fixing mask by vacuum and exposure method of the same |
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
NORF | Unpaid initial registration fee |