KR960004250A - Low reflection coated glass and its manufacturing method - Google Patents

Low reflection coated glass and its manufacturing method Download PDF

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KR960004250A
KR960004250A KR1019940016424A KR19940016424A KR960004250A KR 960004250 A KR960004250 A KR 960004250A KR 1019940016424 A KR1019940016424 A KR 1019940016424A KR 19940016424 A KR19940016424 A KR 19940016424A KR 960004250 A KR960004250 A KR 960004250A
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refractive index
low
oxide layer
layer
high refractive
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KR1019940016424A
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KR970000382B1 (en
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유병석
김의수
황인호
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최영증
한국유리공업 주식회사
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3482—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising silicon, hydrogenated silicon or a silicide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

증착속도가 매우 향상된 저반사 코팅유리 및 그 제조방법이 개시된다.Disclosed are a low reflection coated glass having a very high deposition rate and a method of manufacturing the same.

본 발명의 저반사 코팅유리는, 유리기판(10)상에 제1고굴절률 질화산화물층(12), 제1저굴절률 물질층(14), 제2고굴절률 질화산화물층(16), 제2저굴절률 물질층(18)이 차례로 코팅되어 있다. 질화산화물층(12)은 TiNXOY박막 또는 NbNXOY박막으로 이루어지며, 상기 제1고굴절률 질화산화물층(12)은 TiO2등이 고굴절률 산화물층이나, 1TO 박막등의 전도성 산화물층으로 형성시켜줄 수 있다.The low reflection coating glass of the present invention includes a first high refractive index nitride layer 12, a first low refractive index material layer 14, a second high refractive index nitride layer 16, and a second layer on a glass substrate 10. The low refractive index material layer 18 is coated in sequence. The nitride oxide layer 12 is formed of a TiN X O Y thin film or an NbN X O Y thin film, and the first high refractive index nitride oxide layer 12 includes a high refractive index oxide layer such as TiO 2 or a conductive oxide such as a 1TO thin film. It can be formed in layers.

Description

저반사 코팅유리 및 그 제조방법Low reflection coated glass and its manufacturing method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명에 따라 제조되는 저반사 코팅유리의 층 단면도이다.1 is a cross sectional view of a layer of low reflection coated glass made in accordance with the present invention.

Claims (20)

유리기판(10)상에 제1고굴절률 질화산화물층(12), 제1저굴절률 물질층(14), 제2고굴절률 질화산화물층(16), 제2저굴절률 물질층(18)이 차례로 코팅되어 이루어진 저반사 코팅유리.The first high refractive index nitride layer 12, the first low refractive index material layer 14, the second high refractive index nitride layer 16, and the second low refractive index material layer 18 are sequentially formed on the glass substrate 10. Coated low reflection coating glass. 제1항에 있어서, 상기 유리기판(10)은 무기질 성분의 유리기판 또는 유기질 성분의 유리기판 중 어느 하나인 것을 특징으로 하는 저반사 코팅유리.The low reflection coating glass according to claim 1, wherein the glass substrate (10) is any one of an inorganic component glass substrate or an organic component glass substrate. 제1항에 있어서, 상기 제1고굴절률 질화산화물층(12)은 TiNXOY또는 NbNXOY로 형성되며, 제2고굴절률 질화산화물층(16)은 TiNXOY또는 NbNXOY로 형성된 것을 특징으로 하는 저반사 코팅유리.The method of claim 1, wherein the first high refractive index nitride oxide layer 12 is formed of TiN X O Y or NbN X O Y , the second high refractive index nitride oxide layer 16 is TiN X O Y or NbN X O Low reflection coating glass, characterized in that formed of Y. 제1항 내지 제3항 중 어느 한 항에 있어서, 상기 제1, 제2고굴절률 물질층(14), (18)은 SiO2인 것을 특징으로 하는 저반사 코팅유리.Any one of claims 1 to A method according to any one of claim 3, wherein the first and second high-index material layer 14, 18 is low reflection coated glass, characterized in that SiO 2. 유리기판(10)상에 고굴절률 산화물층(12), 제1저굴절률 물질층(14), 고굴절률 질화산화물층(16), 제2저굴절률 물질층(18)이 차례로 코팅되어 이루어진 저반사 코팅유리.Low reflection formed by coating the high refractive index oxide layer 12, the first low refractive index material layer 14, the high refractive index nitride layer 16, and the second low refractive index material layer 18 on the glass substrate 10 in this order. Coated glass. 제5항에 있어서, 상기 고굴절률 산화물층(12)은 TiO2인 특징으로 하는 저반사 코팅유리.The low reflection coating glass according to claim 5, wherein the high refractive index oxide layer (12) is TiO 2 . 제5항 또는 제6항 중 어느 한 항에 있어서, 상기 고굴절률 질화산화물층(16)은 TiNXOY또는 NbNXOY중 어느 하나로 형성되는 것을 특징으로 하는 저반사 코팅유리.The low reflection coating glass according to any one of claims 5 to 6, wherein the high refractive index nitride oxide layer (16) is formed of any one of TiN X O Y and NbN X O Y. 제5항 또는 제6항 중 어느 한 항에 있어서, 상기 제1, 제2저굴절률 물질층(14), (18)은 SiO2인 것을 특징으로 하는 저반사 코팅유리.Claim 5 or 6 according to any one of claims, wherein the first and second low-index material layer 14, 18 is advantageously a low-reflective coating, characterized in that SiO 2. 제7항에 있어서, 상기 제1, 제2저굴절률 물질층(14), (18)은 SiO2인 것을 특징으로 하는 저반사 코팅유리.The method of claim 7, wherein the first and second low-index material layer 14, 18 is low reflection coated glass, characterized in that SiO 2. 유리기판(10)상에 전도성 산화물층(12), 제1저굴절률 물질층(14), 고굴절률 질화산화물층(16), 제2저굴절률 물질층(18)이 차례로 코팅되어 이루어진 저반사 코팅유리.Low reflection coating formed by coating the conductive oxide layer 12, the first low refractive index material layer 14, the high refractive index nitride layer 16, and the second low refractive index material layer 18 on the glass substrate 10 in this order. Glass. 제10항에 있어서, 상기 전도성 산호물층(12)은 In/Sn, Sn/Sb, Sn/F, Zn/A1의 산화물로 이루어진 군으로부터 선택되는 하나 이상의 산화물로 형성되는 것을 특징으로 하는 저반사 코팅유리.The low reflection coating of claim 10, wherein the conductive coral layer 12 is formed of at least one oxide selected from the group consisting of oxides of In / Sn, Sn / Sb, Sn / F, and Zn / A1. Glass. 제10항 또는 제11항 중 어느 한 항에 있어서, 상기 고굴절률 질화산화물층(16)은 TiNXOY또는 NbNXOY중 어느 하나로 형성되는 것을 특징으로 하는 저반사 코팅유리.The low reflection coating glass according to any one of claims 10 to 11, wherein the high refractive index nitride layer (16) is formed of any one of TiN X O Y and NbN X O Y. 제10항 내지 제11항 중 어느 한 항에 있어서, 상기 제1, 제2저굴절률 물질층(14), (18)은 SiO2인 것을 특징으로 하는 저반사 코팅유리.Claim 10 to 11 according to any one of claims, wherein the first and second low-index material layer 14, 18 is low reflection coated glass, characterized in that SiO 2. 제12항에 있어서, 상기 제1, 제2저굴절률 물질층(14), (18)은 SiO2인 것을 특징으로 하는 저반사 코팅유리.The method of claim 12, wherein the first and second low-index material layer 14, 18 is low reflection coated glass, characterized in that SiO 2. 유리기판(10)을 연속식 스퍼터링장치에 넣은 후 진공을 형성하는 단계; 질소+산소 분위기 하에서 상기 유리기판(10)상에 제1고굴절률 질화산화물층(12)을 형성하는 단계; 산소 분위기하에서 상기 제1고굴절률 질화산화물층(12)상에 제1저굴절률 산화물층(14)을 형성하는 단계; 질소+산소 분위기 하에서 상기 제1저굴절률 산화물층(14)상에 제2고굴절률 질화산화물층(16)을 형성하는 단계; 및 산소 분위기하에서 상기 제2고굴절률 질화산화물층(16)상에 제2저굴절률 산화물층(18)을 형성하는 단계를 구비하여 이루어진 저반사 코팅유리의 제조방법.Placing the glass substrate 10 in a continuous sputtering apparatus and then forming a vacuum; Forming a first high refractive index nitride oxide layer (12) on the glass substrate (10) under a nitrogen + oxygen atmosphere; Forming a first low refractive index oxide layer (14) on the first high refractive index nitride layer (12) under an oxygen atmosphere; Forming a second high refractive index nitride oxide layer (16) on the first low refractive index oxide layer (14) under a nitrogen + oxygen atmosphere; And forming a second low refractive index oxide layer (18) on the second high refractive index nitride layer (16) in an oxygen atmosphere. 제15항에 있어서, 상기 제1고굴절률 질화산화물층(12)은 Ti 타켓을 사용하여 형성된 TiNXOY또는 Nb 타켓을 사용하여 형성된 NbNXOY로 이루어지며, 제2고굴절률 질화산화물층(16)은 Ti 타켓을 사용하여 형성된 TiNXOY또는 Nb 타켓을 사용하여 형성된 NbNXOY로 이루어진 것을 특징으로 하는 저반사 코팅유리의 제조방법.The method of claim 15, wherein the first high refractive index nitride oxide layer 12 is made of TiN X O Y formed using a Ti target or NbN X O Y formed using an Nb target, the second high refractive index nitride oxide layer (16) is a method of manufacturing a low reflection coating glass, characterized in that consisting of TiN X O Y formed using a Ti target or NbN X O Y formed using an Nb target. 유리기판(10)을 연속식 스퍼터링장치에 넣은 후 진공을 형성하는 단계; 산소 분위기 하에서 상기 유리기판(10)상에 산화물층(12)을 형성하는 단계; 산소 분위기하에서 상기 산화물층(12)상에 제1저굴절률 물질층(14)을 형성하는 단계; 질소+산소 분위기 하에서 상기 제1저굴절 산화물질층(14)상에 고굴절률 질화산화물층(16)을 형성하는 단계; 및 산소 분위기하에서 상기 고굴절률 질화산화물층(16)상에 제2저굴절률 물리층(18)을 형성하는 단계를 구비하여 이루어진 저반사 코팅유리의 제조방법.Placing the glass substrate 10 in a continuous sputtering apparatus and then forming a vacuum; Forming an oxide layer (12) on the glass substrate (10) in an oxygen atmosphere; Forming a first low refractive index material layer (14) on the oxide layer (12) in an oxygen atmosphere; Forming a high refractive index nitride oxide layer (16) on the first low refractive index oxide layer (14) under a nitrogen + oxygen atmosphere; And forming a second low refractive index physical layer (18) on the high refractive index nitride oxide layer (16) in an oxygen atmosphere. 제17항에 있어서, 상기 유리기판(10)상에 형성되는 산화물층(12)은 TiO2,Nb2O3,ZrO2으로 이루어진 군으로부터 선택되는 하나 이상의 고굴절률 물질로 형성되는 것을 특징으로 하는 저반사 코팅유리의 제조방법.The method of claim 17, wherein the oxide layer 12 formed on the glass substrate 10 is characterized in that formed of one or more high refractive index material selected from the group consisting of TiO 2, Nb 2 O 3, ZrO 2 . Method for producing low reflection coated glass. 제17항에 있어서, 상기 유리기판(10)상에 형성되는 산화물층(12)은 In/Sn, Sn/Sb, Sn/F, Zn/A1의 산화물로 이루어진 군으로부터 선택되는 하나 이상의 전도성 산화물층으로 형성되는 것을 특징으로 하는 저반사 코팅유리의 제조방법.18. The method of claim 17, wherein the oxide layer 12 formed on the glass substrate 10 is at least one conductive oxide layer selected from the group consisting of oxides of In / Sn, Sn / Sb, Sn / F, Zn / A1 Method for producing a low reflection coating glass, characterized in that formed as. 제17항 내지 제19항 중 어느 한 항에 있어서, 상기 질화산화물층(16)은 TiNXOY또는 NbNXOY중 어느 하나로 형성되는 것을 특징으로 하는 저반사 코팅유리의 제조방법.20. The method of claim 17, wherein the nitride oxide layer is formed of any one of TiN X O Y and NbN X O Y. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940016424A 1994-07-08 1994-07-08 Low-reflection coating glass and its process KR970000382B1 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970071488A (en) * 1996-04-25 1997-11-07 김광호 A method of forming a semi-reflective coating layer on a nonlinear single crystal device
KR20170035998A (en) * 2014-07-22 2017-03-31 인테벡, 인코포레이티드 Coating for glass with improved scratch/wear resistance and oleophobic properties
US11261128B2 (en) 2017-02-10 2022-03-01 Kcc Glass Corporation Low-reflection coating glass

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970071488A (en) * 1996-04-25 1997-11-07 김광호 A method of forming a semi-reflective coating layer on a nonlinear single crystal device
KR20170035998A (en) * 2014-07-22 2017-03-31 인테벡, 인코포레이티드 Coating for glass with improved scratch/wear resistance and oleophobic properties
US11261128B2 (en) 2017-02-10 2022-03-01 Kcc Glass Corporation Low-reflection coating glass

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