KR960003072U - Chemical vapor deposition process tube - Google Patents

Chemical vapor deposition process tube

Info

Publication number
KR960003072U
KR960003072U KR2019940013963U KR19940013963U KR960003072U KR 960003072 U KR960003072 U KR 960003072U KR 2019940013963 U KR2019940013963 U KR 2019940013963U KR 19940013963 U KR19940013963 U KR 19940013963U KR 960003072 U KR960003072 U KR 960003072U
Authority
KR
South Korea
Prior art keywords
vapor deposition
chemical vapor
deposition process
process tube
tube
Prior art date
Application number
KR2019940013963U
Other languages
Korean (ko)
Other versions
KR0115438Y1 (en
Inventor
오영균
김진태
권오성
박영택
김의식
홍흥기
구영모
Original Assignee
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업 주식회사 filed Critical 현대전자산업 주식회사
Priority to KR2019940013963U priority Critical patent/KR0115438Y1/en
Publication of KR960003072U publication Critical patent/KR960003072U/en
Application granted granted Critical
Publication of KR0115438Y1 publication Critical patent/KR0115438Y1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45519—Inert gas curtains
    • C23C16/45521—Inert gas curtains the gas, other than thermal contact gas, being introduced the rear of the substrate to flow around its periphery
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019940013963U 1994-06-15 1994-06-15 Gas processing tube KR0115438Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940013963U KR0115438Y1 (en) 1994-06-15 1994-06-15 Gas processing tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940013963U KR0115438Y1 (en) 1994-06-15 1994-06-15 Gas processing tube

Publications (2)

Publication Number Publication Date
KR960003072U true KR960003072U (en) 1996-01-22
KR0115438Y1 KR0115438Y1 (en) 1998-04-15

Family

ID=19385694

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940013963U KR0115438Y1 (en) 1994-06-15 1994-06-15 Gas processing tube

Country Status (1)

Country Link
KR (1) KR0115438Y1 (en)

Also Published As

Publication number Publication date
KR0115438Y1 (en) 1998-04-15

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20081125

Year of fee payment: 12

EXPY Expiration of term