KR960002607A - Side Bead Removal Device of SOG Membrane - Google Patents

Side Bead Removal Device of SOG Membrane Download PDF

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Publication number
KR960002607A
KR960002607A KR1019940013725A KR19940013725A KR960002607A KR 960002607 A KR960002607 A KR 960002607A KR 1019940013725 A KR1019940013725 A KR 1019940013725A KR 19940013725 A KR19940013725 A KR 19940013725A KR 960002607 A KR960002607 A KR 960002607A
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KR
South Korea
Prior art keywords
wafer
bead
nitrogen
nozzle
film
Prior art date
Application number
KR1019940013725A
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Korean (ko)
Other versions
KR0123844B1 (en
Inventor
심상현
김명수
박종근
Original Assignee
김주용
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019940013725A priority Critical patent/KR0123844B1/en
Publication of KR960002607A publication Critical patent/KR960002607A/en
Application granted granted Critical
Publication of KR0123844B1 publication Critical patent/KR0123844B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명은 웨이퍼상에 코팅된 에스오지(SOG)막의 에지부에 발생하는 에스오지막의 둔턱을 제거하는 에스오지막 사이드 비드(Bead) 제거장치에 관한 것으로, 종래의 아이피에이 분사노즐만을 부착하고 있는 아암의 일측 단부에 아이피에이 분사노즐과 인접하여 질소 분사노즐을 설치하므로서, 종래의 아이피에이 분사노즐만으로 에스오지막의 사이드 비드부를 제거할 때, 웨이퍼 에지부 쪽에서 웨이퍼 중심부쪽으로 생기는 분력에 의해 에스오지막을 웨이퍼 중심부 쪽으로 밀어올려 둔턱이 진 사이드 비드를 형성하는데, 이 비드를 질소노즐을 통해 질소를 분사시켜 깎아내림으로써 에스오지막의 에지부에 형성되는 잔류비드의 높이를 최소화시키는 에스오지막 사이드 비드 제거장치이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an SOH film side bead removal device for removing a barrier of an SG film generated at an edge portion of a SG film coated on a wafer, and having an arm attached only to a conventional API injection nozzle. When the nitrogen bead nozzle is installed at one end of the wafer adjacent to the IPA spray nozzle, the side bead portion of the SOH film is removed only by the conventional IPA spray nozzle. It pushes toward the center to form a side-sided bead, and the bead-side side bead removing device which minimizes the height of the residual beads formed at the edge of the esot-film by shaving off the beads by injecting nitrogen through the nitrogen nozzle.

Description

에스오지(SOG)막의 사이드 비드(Bead) 제거장치Side Bead Removal Device of SOG Membrane

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제3a도는 제3b도의 본 발명에 따른 장치에 의해 에스오지막의 사이드 비드를 제거한 후의 상태를 도시한 단면도.FIG. 3A is a cross-sectional view showing a state after removing the side beads of the SOH membrane by the apparatus according to the present invention of FIG. 3B.

Claims (2)

웨이퍼상에 코팅된 에스오지막의 에지부에 발생하는 비드를 제거하는 에스오지막 사이드 비드 제거장치에 있어서, 내부에 아이피에이 공급라인과 질소 공급라인을 포함하고 있는 아암과, 상기 아이피에이 공급라인과 연결되어 아암의 일측 단부에 부착된 아이피에이 분사노즐과, 웨이퍼 중심부측 방향으로 상기 아이피에이 분사노즐에 인접하여 상기 아암의 단부에 부착된 질소노즐로 구성되어, 상기 질소 분사노즐로써 아이피에이 분사노즐로부터 분사되는 아이피에이의 힘의 성분중 웨이퍼 중심부 쪽으로 향하는 힘에 의해 형성되는 에스오지막의 비드를 깎아내려 웨이퍼 에지부에 형성되는 에스오지막의 사이드 비드의 높이를 최소화 시키도록 한 것을 특징으로 하는 에스오지막 사이드 비드 제거장치.An SG film side bead removing device for removing beads generated at an edge portion of an SG film coated on a wafer, comprising: an arm including an IP supply line and a nitrogen supply line therein, and connected to the IP supply line; And a nitrogen nozzle attached to one end of the arm adjacent to the IP injection nozzle in the direction toward the center of the wafer, and the nitrogen nozzle attached to the end of the arm. Among the components of the force of the injected IP, the beads of the sedge film formed by the force directed toward the center of the wafer are scraped off so that the height of the side beads of the sedge film formed on the edge of the wafer is minimized. Bead Removal Device. 제1항에 있어서, 상기 질소 분사노즐은 분사되는 방향이 웨이퍼 중심부측에서 웨이퍼 에지부쪽을 향하도록 상기 아암에 부착된 것을 특징으로 하는 에스오지막 사이드 비드 제거장치.2. The apparatus of claim 1, wherein the nitrogen jet nozzle is attached to the arm such that a direction in which the nitrogen jet nozzle is injected is directed from the wafer center side toward the wafer edge portion. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940013725A 1994-06-17 1994-06-17 Removing apparatus of sog side bead KR0123844B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940013725A KR0123844B1 (en) 1994-06-17 1994-06-17 Removing apparatus of sog side bead

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940013725A KR0123844B1 (en) 1994-06-17 1994-06-17 Removing apparatus of sog side bead

Publications (2)

Publication Number Publication Date
KR960002607A true KR960002607A (en) 1996-01-26
KR0123844B1 KR0123844B1 (en) 1997-11-25

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940013725A KR0123844B1 (en) 1994-06-17 1994-06-17 Removing apparatus of sog side bead

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102021087B1 (en) 2017-12-12 2019-09-11 주식회사 포엠일렉트로옵틱 Concentrate light device for sunlight generation of electric power

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Publication number Publication date
KR0123844B1 (en) 1997-11-25

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