KR950030245A - Misalignment measurement method between gate and contact formed on gate - Google Patents
Misalignment measurement method between gate and contact formed on gate Download PDFInfo
- Publication number
- KR950030245A KR950030245A KR1019940008040A KR19940008040A KR950030245A KR 950030245 A KR950030245 A KR 950030245A KR 1019940008040 A KR1019940008040 A KR 1019940008040A KR 19940008040 A KR19940008040 A KR 19940008040A KR 950030245 A KR950030245 A KR 950030245A
- Authority
- KR
- South Korea
- Prior art keywords
- gate
- contact
- field oxide
- contact formed
- misalignment
- Prior art date
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- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
본 발명은 트랜지스터를 사용하는 반도체 집적회로 제조시 게이트와 게이트 상에 형성되는 콘택간의 오정렬 측정방법에 관한 것으로, 콘택이 게이트에서 벗어났을 경우 콘택식각시 식각되는 필드산화막 부분의 두께를 줄여 전도막(4)과 기판(1)간의 전도성을 측정할 수 있게 하기 위해 필드산화막(2)의 버즈빅 형상 부분을 게이트(3)의 가장자리에 배치함으로써 게이트와 게이트 상에 형성되는 콘택의 오정렬에 의한 불량을 정확히 감지할 수 있어 반도체 설계 및 불량분석시 유용하게 적용된다.The present invention relates to a method for measuring misalignment between a gate and a contact formed on a gate when fabricating a semiconductor integrated circuit using a transistor. When the contact is out of the gate, the present invention reduces the thickness of a portion of the field oxide layer that is etched during contact etching. 4) the defects due to misalignment of the contacts formed on the gate and the gate are disposed by arranging the burjbig-shaped portion of the field oxide film 2 at the edge of the gate 3 so that the conductivity between the substrate 1 and the substrate 1 can be measured. It can be accurately detected, which is useful for semiconductor design and defect analysis.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2도는 본 발명에 따른 게이트와 게이트 상에 형성되는 콘택간의 오정렬 측정방법을 나타내는 단면도.2 is a cross-sectional view showing a method for measuring misalignment between a gate and a contact formed on the gate according to the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940008040A KR950030245A (en) | 1994-04-16 | 1994-04-16 | Misalignment measurement method between gate and contact formed on gate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940008040A KR950030245A (en) | 1994-04-16 | 1994-04-16 | Misalignment measurement method between gate and contact formed on gate |
Publications (1)
Publication Number | Publication Date |
---|---|
KR950030245A true KR950030245A (en) | 1995-11-24 |
Family
ID=66677580
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940008040A KR950030245A (en) | 1994-04-16 | 1994-04-16 | Misalignment measurement method between gate and contact formed on gate |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950030245A (en) |
-
1994
- 1994-04-16 KR KR1019940008040A patent/KR950030245A/en not_active Application Discontinuation
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Legal Events
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WITN | Withdrawal due to no request for examination |