KR950028727U - Piezoelectric element device - Google Patents

Piezoelectric element device

Info

Publication number
KR950028727U
KR950028727U KR2019940004660U KR19940004660U KR950028727U KR 950028727 U KR950028727 U KR 950028727U KR 2019940004660 U KR2019940004660 U KR 2019940004660U KR 19940004660 U KR19940004660 U KR 19940004660U KR 950028727 U KR950028727 U KR 950028727U
Authority
KR
South Korea
Prior art keywords
piezoelectric element
element device
piezoelectric
Prior art date
Application number
KR2019940004660U
Other languages
Korean (ko)
Other versions
KR0134583Y1 (en
Inventor
배상만
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940004660U priority Critical patent/KR0134583Y1/en
Publication of KR950028727U publication Critical patent/KR950028727U/en
Application granted granted Critical
Publication of KR0134583Y1 publication Critical patent/KR0134583Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
KR2019940004660U 1994-03-09 1994-03-09 Piezoelectric device KR0134583Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940004660U KR0134583Y1 (en) 1994-03-09 1994-03-09 Piezoelectric device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940004660U KR0134583Y1 (en) 1994-03-09 1994-03-09 Piezoelectric device

Publications (2)

Publication Number Publication Date
KR950028727U true KR950028727U (en) 1995-10-20
KR0134583Y1 KR0134583Y1 (en) 1999-03-20

Family

ID=19378624

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940004660U KR0134583Y1 (en) 1994-03-09 1994-03-09 Piezoelectric device

Country Status (1)

Country Link
KR (1) KR0134583Y1 (en)

Also Published As

Publication number Publication date
KR0134583Y1 (en) 1999-03-20

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Payment date: 20040920

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