KR950028663U - Device for rapid heat treatment of wafers - Google Patents

Device for rapid heat treatment of wafers

Info

Publication number
KR950028663U
KR950028663U KR2019940005796U KR19940005796U KR950028663U KR 950028663 U KR950028663 U KR 950028663U KR 2019940005796 U KR2019940005796 U KR 2019940005796U KR 19940005796 U KR19940005796 U KR 19940005796U KR 950028663 U KR950028663 U KR 950028663U
Authority
KR
South Korea
Prior art keywords
wafers
heat treatment
rapid heat
rapid
treatment
Prior art date
Application number
KR2019940005796U
Other languages
Korean (ko)
Other versions
KR970003175Y1 (en
Inventor
조병진
Original Assignee
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업 주식회사 filed Critical 현대전자산업 주식회사
Priority to KR2019940005796U priority Critical patent/KR970003175Y1/en
Publication of KR950028663U publication Critical patent/KR950028663U/en
Application granted granted Critical
Publication of KR970003175Y1 publication Critical patent/KR970003175Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
KR2019940005796U 1994-03-22 1994-03-22 Rapid thermal process apparatus of wafer KR970003175Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940005796U KR970003175Y1 (en) 1994-03-22 1994-03-22 Rapid thermal process apparatus of wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940005796U KR970003175Y1 (en) 1994-03-22 1994-03-22 Rapid thermal process apparatus of wafer

Publications (2)

Publication Number Publication Date
KR950028663U true KR950028663U (en) 1995-10-20
KR970003175Y1 KR970003175Y1 (en) 1997-04-14

Family

ID=19379418

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940005796U KR970003175Y1 (en) 1994-03-22 1994-03-22 Rapid thermal process apparatus of wafer

Country Status (1)

Country Link
KR (1) KR970003175Y1 (en)

Also Published As

Publication number Publication date
KR970003175Y1 (en) 1997-04-14

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20080619

Year of fee payment: 12

EXPY Expiration of term