KR970046632U - Uniform heating device of wafer - Google Patents

Uniform heating device of wafer

Info

Publication number
KR970046632U
KR970046632U KR2019950038655U KR19950038655U KR970046632U KR 970046632 U KR970046632 U KR 970046632U KR 2019950038655 U KR2019950038655 U KR 2019950038655U KR 19950038655 U KR19950038655 U KR 19950038655U KR 970046632 U KR970046632 U KR 970046632U
Authority
KR
South Korea
Prior art keywords
wafer
heating device
uniform heating
uniform
heating
Prior art date
Application number
KR2019950038655U
Other languages
Korean (ko)
Other versions
KR200300380Y1 (en
Inventor
박석원
조병길
Original Assignee
주식회사 하이닉스반도체
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 하이닉스반도체 filed Critical 주식회사 하이닉스반도체
Priority to KR2019950038655U priority Critical patent/KR200300380Y1/en
Publication of KR970046632U publication Critical patent/KR970046632U/en
Application granted granted Critical
Publication of KR200300380Y1 publication Critical patent/KR200300380Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
KR2019950038655U 1995-12-06 1995-12-06 Uniform Heater of Wafer KR200300380Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950038655U KR200300380Y1 (en) 1995-12-06 1995-12-06 Uniform Heater of Wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950038655U KR200300380Y1 (en) 1995-12-06 1995-12-06 Uniform Heater of Wafer

Publications (2)

Publication Number Publication Date
KR970046632U true KR970046632U (en) 1997-07-31
KR200300380Y1 KR200300380Y1 (en) 2003-03-07

Family

ID=49398379

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950038655U KR200300380Y1 (en) 1995-12-06 1995-12-06 Uniform Heater of Wafer

Country Status (1)

Country Link
KR (1) KR200300380Y1 (en)

Also Published As

Publication number Publication date
KR200300380Y1 (en) 2003-03-07

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
J201 Request for trial against refusal decision

Free format text: TRIAL NUMBER: 2001101001991; TRIAL AGAINST DECISION OF REJECTION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL

Free format text: TRIAL AGAINST DECISION OF REJECTION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL

AMND Amendment
B601 Maintenance of original decision after re-examination before a trial
N231 Notification of change of applicant
J301 Trial decision

Free format text: TRIAL NUMBER: 2001101001991; TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20010627

Effective date: 20021030

Free format text: TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20010627

Effective date: 20021030

S901 Examination by remand of revocation
GRNO Decision to grant (after opposition)
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20091126

Year of fee payment: 8

EXPY Expiration of term