KR950027966A - Method of manufacturing photoresist pattern of semiconductor device - Google Patents
Method of manufacturing photoresist pattern of semiconductor device Download PDFInfo
- Publication number
- KR950027966A KR950027966A KR1019940004576A KR19940004576A KR950027966A KR 950027966 A KR950027966 A KR 950027966A KR 1019940004576 A KR1019940004576 A KR 1019940004576A KR 19940004576 A KR19940004576 A KR 19940004576A KR 950027966 A KR950027966 A KR 950027966A
- Authority
- KR
- South Korea
- Prior art keywords
- pattern
- sog
- forming
- photosensitive film
- semiconductor device
- Prior art date
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Abstract
본 발명은 반도체 소자의 감광막 패턴 제조방법에 관한 것으로, 반도체 기판상에 감광막을 도포한 후, 상기 감광막의 패턴으로 예정된 부분을 소정두께 제거하여 요홈을 형성하고, 상기 요홈을 SOG패턴으로 메운 후, 상기 SOG패턴을 마스크로 감광막을 건식식각하여 감광막패턴을 형성하였으므로, 노광에너지가 감소되어 노광 공정여유도가 증가되고, 반사광에 의한 나칭을 방지하여 공정 수율 및 소자의 신뢰성을 향상시킬 수 있다.The present invention relates to a method for manufacturing a photosensitive film pattern of a semiconductor device, after applying a photosensitive film on a semiconductor substrate, and removing a predetermined thickness as a pattern of the photosensitive film to form a groove, and filling the groove with an SOG pattern, Since the photoresist pattern is formed by dry etching the photoresist layer using the SOG pattern as a mask, the exposure energy is reduced, the exposure process margin is increased, and the nagging by the reflected light is prevented, thereby improving process yield and device reliability.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2도 (A)-(D)는 본 발명에 따른 감광막패턴 제조 공정도.2 (A)-(D) is a process chart of the photosensitive film pattern according to the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940004576A KR100278908B1 (en) | 1994-03-09 | 1994-03-09 | Method of manufacturing photoresist pattern of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940004576A KR100278908B1 (en) | 1994-03-09 | 1994-03-09 | Method of manufacturing photoresist pattern of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950027966A true KR950027966A (en) | 1995-10-18 |
KR100278908B1 KR100278908B1 (en) | 2001-01-15 |
Family
ID=66689667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940004576A KR100278908B1 (en) | 1994-03-09 | 1994-03-09 | Method of manufacturing photoresist pattern of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100278908B1 (en) |
-
1994
- 1994-03-09 KR KR1019940004576A patent/KR100278908B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100278908B1 (en) | 2001-01-15 |
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