KR950027914A - Method for preventing contamination of chemical vapor deposition film - Google Patents
Method for preventing contamination of chemical vapor deposition film Download PDFInfo
- Publication number
- KR950027914A KR950027914A KR1019940005518A KR19940005518A KR950027914A KR 950027914 A KR950027914 A KR 950027914A KR 1019940005518 A KR1019940005518 A KR 1019940005518A KR 19940005518 A KR19940005518 A KR 19940005518A KR 950027914 A KR950027914 A KR 950027914A
- Authority
- KR
- South Korea
- Prior art keywords
- vapor deposition
- chemical vapor
- reaction chamber
- preventing contamination
- deposition film
- Prior art date
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- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Abstract
본 발명은 화학기상증착 장비를 이용한 박막 형성시 반응실벽 등 기판외의 원하지 않는 부위에 형성된 막을 제거학 위한 화학기상증착막의 오염방지 방법에 관한 것으로 냉각수의 흐름을 차단하여 반응실 벽의 온도를 40℃이상 상승시키는 단계; 반응실의 가스 밸브를 최대한 열어주어 0mTorr로 하는 단계를 포함하여 이루어지는 것을 특징으로 함으로써 본 발명은 반응실 내의 진공도가 증진됨으로써 화학기상증착막의 오염을 막고, 플라즈마 크리닝 후 고진공을 위한 회복 시간이 감소되어 장비가동 효율이 증대되는 효과를 얻을 수 있다.The present invention relates to a method for preventing contamination of chemical vapor deposition membranes for removing films formed on unwanted portions of the substrate, such as reaction chamber walls, when forming thin films using chemical vapor deposition equipment. Elevating step; By opening the gas valve of the reaction chamber to the maximum to 0mTorr characterized in that the present invention is to improve the vacuum in the reaction chamber to prevent contamination of the chemical vapor deposition membrane, the recovery time for high vacuum after plasma cleaning is reduced The effect of increasing the efficiency of equipment operation can be obtained.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940005518A KR950027914A (en) | 1994-03-18 | 1994-03-18 | Method for preventing contamination of chemical vapor deposition film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940005518A KR950027914A (en) | 1994-03-18 | 1994-03-18 | Method for preventing contamination of chemical vapor deposition film |
Publications (1)
Publication Number | Publication Date |
---|---|
KR950027914A true KR950027914A (en) | 1995-10-18 |
Family
ID=66689759
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940005518A KR950027914A (en) | 1994-03-18 | 1994-03-18 | Method for preventing contamination of chemical vapor deposition film |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950027914A (en) |
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1994
- 1994-03-18 KR KR1019940005518A patent/KR950027914A/en not_active Application Discontinuation
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