KR950021399U - Pecvd 장치 - Google Patents
Pecvd 장치Info
- Publication number
- KR950021399U KR950021399U KR2019930030457U KR930030457U KR950021399U KR 950021399 U KR950021399 U KR 950021399U KR 2019930030457 U KR2019930030457 U KR 2019930030457U KR 930030457 U KR930030457 U KR 930030457U KR 950021399 U KR950021399 U KR 950021399U
- Authority
- KR
- South Korea
- Prior art keywords
- pecvd equipment
- pecvd
- equipment
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019930030457U KR970001341Y1 (ko) | 1993-12-29 | 1993-12-29 | Pecvd 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019930030457U KR970001341Y1 (ko) | 1993-12-29 | 1993-12-29 | Pecvd 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950021399U true KR950021399U (ko) | 1995-07-28 |
KR970001341Y1 KR970001341Y1 (ko) | 1997-02-22 |
Family
ID=19373465
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019930030457U KR970001341Y1 (ko) | 1993-12-29 | 1993-12-29 | Pecvd 장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970001341Y1 (ko) |
-
1993
- 1993-12-29 KR KR2019930030457U patent/KR970001341Y1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR970001341Y1 (ko) | 1997-02-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20080102 Year of fee payment: 12 |
|
EXPY | Expiration of term |