KR950018685A - Radial Electroplating Apparatus and Plating Method - Google Patents

Radial Electroplating Apparatus and Plating Method Download PDF

Info

Publication number
KR950018685A
KR950018685A KR1019930028495A KR930028495A KR950018685A KR 950018685 A KR950018685 A KR 950018685A KR 1019930028495 A KR1019930028495 A KR 1019930028495A KR 930028495 A KR930028495 A KR 930028495A KR 950018685 A KR950018685 A KR 950018685A
Authority
KR
South Korea
Prior art keywords
strip
roll
drum
anode
electrolyte
Prior art date
Application number
KR1019930028495A
Other languages
Korean (ko)
Other versions
KR960007778B1 (en
Inventor
조영봉
김재봉
조영호
Original Assignee
조말수
포항종합제철주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 조말수, 포항종합제철주식회사 filed Critical 조말수
Priority to KR1019930028495A priority Critical patent/KR960007778B1/en
Publication of KR950018685A publication Critical patent/KR950018685A/en
Application granted granted Critical
Publication of KR960007778B1 publication Critical patent/KR960007778B1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0635In radial cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0642Anodes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0657Conducting rolls
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0664Isolating rolls
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0685Spraying of electrolyte

Abstract

본 발명은 금속 스트립의 전기도금 장치 및 그 도금방법에 관한 것으로서, 특히 금속 스트립의 한 표면에 아연 또는 다름 금속을 전기도금하기 위한 레이디얼형 도금장치와 이를 이용한 전기아연도금강판을 제조하기 위한 방법에 관한 것이다. 본 발명에 의하면 드럼상에 권취된 전도체 링을 사용하는 라디얼형 셀에 대한 공지된 방법의 단점 즉, 스트립상의 큰 견인력 가압에 따르 스트립의 기계적 성질열화와 전도체 링과 탄성중합체의 단차부에서의 밴드마크 및 아크 스포트 등의 결함을 방지할 수 있다. 또한, 본 발명은 드럼과 디플렉터 롤 사이에 전도체 롤 및 백업롤을 배치함으로써 도금 셀로부터 스트립의 진행에 따라 스트립 표면에 묻어 올라가는 도금액을 제거해 줌으로써 디플렉터 롤상에서의 스트립의 표면 오염을 방지할 수 있다. 본 발명에 따른 도금장치는 가용성 양극-염화물욕 계통과 불용성 양극-황산염옥 계통을 모두 사용할 수 있으며, 다수의 셀을 배치함으로써 스트립의 순환속도를 증가시켜 생산성 향상을 기할 수 있다.The present invention relates to an electroplating apparatus for a metal strip and a plating method thereof, and more particularly, to a radial plating apparatus for electroplating zinc or another metal on one surface of a metal strip and a method for manufacturing an electrogalvanized steel sheet using the same. It is about. According to the present invention a disadvantage of the known method for radial cells using a conductor ring wound on a drum is the deterioration of the mechanical properties of the strip and the step of the conductor ring and elastomer due to the large traction force on the strip. It is possible to prevent defects such as band marks and arc spots. In addition, the present invention can prevent surface contamination of the strip on the deflector roll by removing the plating liquid from the plating cell that rises on the strip surface as the strip progresses from the plating cell by disposing the conductor roll and the backup roll between the drum and the deflector roll. The plating apparatus according to the present invention can use both a soluble anode-chloride bath system and an insoluble anode-sulphate jade system, and can increase productivity by increasing the circulation speed of the strip by arranging a plurality of cells.

Description

레이디얼형 전기도금장치 및 그 도금방법Radial Electroplating Apparatus and Plating Method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 일반적인 레이디얼형 전기도금장치를 도시한 구성도,1 is a block diagram showing a general radial electroplating apparatus,

제2도는 제1도의 양측구조를 도시한 단면도,2 is a cross-sectional view showing the bilateral structure of FIG.

제3도의 가)나)도는 전도체롤의 불균일 프로파일(profile)에에 의한 스트립의 결함발생을 도시한 도면,(A) or (b) of FIG. 3 shows the occurrence of defects in the strip due to the nonuniform profile of the conductor roll,

제4도는 본 발명에 따른 전기도금장치의 단면도,4 is a cross-sectional view of the electroplating apparatus according to the present invention,

제5도는 본 발명의 전기도금장치에 갖춰진 2개의 연속전해셀을 도시한 도면5 is a view showing two continuous electrolytic cells provided in the electroplating apparatus of the present invention.

Claims (6)

염화욕 또는 황산욕 전해액(2)을 함유하는 탱크(1)와 도금할 금속 스트립(14)을 권취한 채 전해액에 부분적으로 침지되어 회전하는 탄성중합체 드럼(18)과 전해액내에 침지된 드럼의 외측 실린더형 표면 반대쪽에 배치되는 가용성양극 또는 불용성 양극(23)과, 양극에 전류를 공급하기 위한 수단(17)과, 상기 드럼(18)과 양극(23) 사이에서 스트립(14)과 드럼(18)의 순환방향에 대한 역류방향으로 전채액을 분사하는 수단(25)(26)과, 스트립(14)의 전해액(2) 통과를 유도하는 탄성 중합체의 디플렉터 롤세트(13)와, 상기 디플렉터 롤(13)과 드럼(18)사이에서 스트립(14)에 접촉되어 양극전위를 공급하는 전도체롤(10)과 백업롤(11)로 구성되는 적어도 하나의 셀을 포함하는 금속 스트립의 전기아연 도금장치에 있어서, 상기 전도체롤(10)과 백업롤(11)은 각각의 셀에 대해 드럼(18)의 양측면 상부에 배치되어 드럼측(9)에 평행한 방향으로 회전가능하게 설치되며, 적어도 부분적으로는 상기 전도체롤(10)과 백업롤(11)의 상부레벨에 배치되어 스트립(14)의 유지를 보장하는 디플렉터 롤(13)로 구성되는 레이디얼 형 전기아연도금장치The tank 1 containing the chloride bath or the sulfuric acid bath solution 2 and the outer side of the drum immersed in the electrolyte and the rotating elastomer drum 18 partially immersed in the electrolyte while winding the metal strip 14 to be plated. Soluble anode or insoluble anode 23 disposed opposite the cylindrical surface, means 17 for supplying current to the anode, and strip 14 and drum 18 between the drum 18 and anode 23. Means 25, 26 for spraying the horticulture solution in the counter-current direction with respect to the circulation direction of the < RTI ID = 0.0 >), < / RTI > Electrozinc plating apparatus for metal strips comprising at least one cell consisting of a conductor roll 10 and a backup roll 11 contacting the strip 14 between the drum 13 and the drum 18 to supply a positive potential In the above, the conductor roll 10 and the backup roll 11 is a drum (for each cell) 18 is disposed on both sides of the upper side and rotatably installed in a direction parallel to the drum side (9), at least partly disposed at the upper level of the conductor roll 10 and the backup roll (11) strip 14 Radial electrogalvanizing device composed of deflector rolls (13) to ensure maintenance 제1항에 있어서, 상기 전도체롤(10)과 백업롤(11)은 적어도 전해액 레벨(15)상부에 배치되며, 스트립(14)을 사이에 두고 상호 위치변경이 가능한 것을 특징으로 하는 레이디얼형 전기아연도금장치2. The radial type electric machine according to claim 1, wherein the conductor roll 10 and the backup roll 11 are disposed at least on the electrolyte level 15, and are mutually repositionable with the strip 14 interposed therebetween. Galvanizing equipment 제1항에 있어서, 상기 디플렉터 롤(13)은 탄성중합체 재료를 가지고, 적어도 전도체롤(10)과 백업를(11)보다 상부에 배치되며, 연속적으로 2개 이상으로 배치되어 하부의 전도체를(10)의 직경을 크게할 수 있는 것을 특징으로 하는 레이디얼형 전기아연도금장치2. The deflector roll (13) according to claim 1, wherein the deflector roll (13) has an elastomeric material, at least the conductor roll (10) and the backup (11) are arranged above, and two or more are arranged in succession to form a lower conductor (10). Radial type electro zinc plating apparatus, characterized in that the diameter can be increased 금속 스트립의 전해도금용 레이디얼형 셀을 포함하는 장치내의 금속 스트립의 전기도금방법에 있어서, 스트립(14)은 전해액레벨(15)상부에 위치한 디플렉터 롤(13)에 권취되어 전해액 내로 유입되며, 양극(23)의 활성면 맞은 편에서 전해액에 부분 침지되고 절연재로 라이닝 된 드럼(18)의 표면과 접촉하여 전해액내를 순환하며, 드럼(18)과 디플렉터 롤(13) 사이에 배치된 전도체롤(10)과 백업롤(11)에 의해 음극전류를 공급함으로써 스트립의 기계적 성질 열화방지, 밴드마크 및 아크 스포트 방지, 스트립 표면 오염방지등을 수행할 수 있는 것을 특징으로 하는 금속 스트립의 전기도금방법In the method of electroplating a metal strip in an apparatus comprising a radial cell for electroplating a metal strip, the strip 14 is wound on a deflector roll 13 located above the electrolyte level 15 and flows into the electrolyte. A conductive roll disposed between the drum 18 and the deflector roll 13, circulating in the electrolyte solution, in contact with the surface of the drum 18 partially immersed in the electrolyte solution and lined with an insulating material, opposite the active surface of (23) ( 10) and the electroplating method of the metal strip, characterized in that by supplying the cathode current by the backup roll 11 can prevent the degradation of the mechanical properties of the strip, the band mark and arc spot prevention, the contamination of the strip surface, etc. 제4항에 있어서, 상기 양극(23)은 도금금속으로 구성되는 가용성 양극이나 불용성 양극 모두 사용 가능한 것을 특징으로 하는 금속스트립의 전기도금방법The electroplating method of a metal strip according to claim 4, wherein the anode (23) can use both a soluble anode and an insoluble anode composed of a plated metal. 제4항에 있어서, 상기 전해액(2)은 염화물욕과 황산염욕 모두 사용가능한 것을 특징으로 하는 금속스트립의 전기도금방법5. The electroplating method of a metal strip according to claim 4, wherein the electrolyte solution (2) can use both a chloride bath and a sulfate bath. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019930028495A 1993-12-18 1993-12-18 Electroplating apparatus of radial shape and the method therefor KR960007778B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019930028495A KR960007778B1 (en) 1993-12-18 1993-12-18 Electroplating apparatus of radial shape and the method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019930028495A KR960007778B1 (en) 1993-12-18 1993-12-18 Electroplating apparatus of radial shape and the method therefor

Publications (2)

Publication Number Publication Date
KR950018685A true KR950018685A (en) 1995-07-22
KR960007778B1 KR960007778B1 (en) 1996-06-12

Family

ID=19371669

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930028495A KR960007778B1 (en) 1993-12-18 1993-12-18 Electroplating apparatus of radial shape and the method therefor

Country Status (1)

Country Link
KR (1) KR960007778B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000029143A (en) * 1998-10-23 2000-05-25 발트 빌프리트;로데 볼프강 Apparatus for metal coating of bands by electroplating
KR100349153B1 (en) * 1997-12-26 2002-11-18 주식회사 포스코 An electic plating apparatus, and a method for eliminating band mark on strip using it

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100349153B1 (en) * 1997-12-26 2002-11-18 주식회사 포스코 An electic plating apparatus, and a method for eliminating band mark on strip using it
KR20000029143A (en) * 1998-10-23 2000-05-25 발트 빌프리트;로데 볼프강 Apparatus for metal coating of bands by electroplating

Also Published As

Publication number Publication date
KR960007778B1 (en) 1996-06-12

Similar Documents

Publication Publication Date Title
US5188720A (en) Installation and process for electrolytic coating of a metal strip
EP4089211A1 (en) Device and method for preventing conductive roller from being plated with copper
KR100487646B1 (en) Process and a device for electrolytic pickling of metallic strip
US4430166A (en) Method and apparatus for electro-treating a metal strip
US4304653A (en) Device for continuously electrodepositing with high current density, a coating metal on a metal sheet
KR20120063824A (en) Electric plating apparatus with horizontal cell
KR950018685A (en) Radial Electroplating Apparatus and Plating Method
KR102333203B1 (en) Manufacturing apparatus for metal sheet
US4248674A (en) Anodizing method and apparatus
KR20130065940A (en) Electro plating equipment using virtual cathode
KR200260904Y1 (en) Conductor roll with solution diffusion barrier
KR960004269B1 (en) Method of eliminating a fern-like pattern during electroplating of metal strip
SU1712471A2 (en) Apparatus for electrochemical etching of long articles
KR100349153B1 (en) An electic plating apparatus, and a method for eliminating band mark on strip using it
JP2901461B2 (en) Electrode unit for electric treatment tank of metal strip
KR850000790B1 (en) Apparatus for producing electrodeposited wires
JPS6032121Y2 (en) Horizontal electric mesh cell made of strip metal plate
KR970009433B1 (en) Process for the prevention of arc-spot in electroplating
KR100373677B1 (en) Electroplating Conduction Roll
KR970043330A (en) Storage energization device and method of carousel type electroplating equipment
JPH01205100A (en) Method for protecting anode electrifier for electroplating
KR200161715Y1 (en) Device for suppressing generation of arc-spot and sludge in zn-ni plating
JPS6145719B2 (en)
JPS63183192A (en) Continuous electroplating device for band steel
JPS624478B2 (en)

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20010605

Year of fee payment: 6

LAPS Lapse due to unpaid annual fee