KR940017897U - Grid for microwave reflection - Google Patents

Grid for microwave reflection

Info

Publication number
KR940017897U
KR940017897U KR2019920025631U KR920025631U KR940017897U KR 940017897 U KR940017897 U KR 940017897U KR 2019920025631 U KR2019920025631 U KR 2019920025631U KR 920025631 U KR920025631 U KR 920025631U KR 940017897 U KR940017897 U KR 940017897U
Authority
KR
South Korea
Prior art keywords
grid
microwave reflection
microwave
reflection
Prior art date
Application number
KR2019920025631U
Other languages
Korean (ko)
Other versions
KR960005588Y1 (en
Inventor
김근태
Original Assignee
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업 주식회사 filed Critical 현대전자산업 주식회사
Priority to KR92025631U priority Critical patent/KR960005588Y1/en
Publication of KR940017897U publication Critical patent/KR940017897U/en
Application granted granted Critical
Publication of KR960005588Y1 publication Critical patent/KR960005588Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32201—Generating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
KR92025631U 1992-12-16 1992-12-16 Grid for microwave reflection KR960005588Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92025631U KR960005588Y1 (en) 1992-12-16 1992-12-16 Grid for microwave reflection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92025631U KR960005588Y1 (en) 1992-12-16 1992-12-16 Grid for microwave reflection

Publications (2)

Publication Number Publication Date
KR940017897U true KR940017897U (en) 1994-07-28
KR960005588Y1 KR960005588Y1 (en) 1996-07-06

Family

ID=19346771

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92025631U KR960005588Y1 (en) 1992-12-16 1992-12-16 Grid for microwave reflection

Country Status (1)

Country Link
KR (1) KR960005588Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100428813B1 (en) * 2001-09-18 2004-04-29 주성엔지니어링(주) Plama generation apparatus and SiO2 thin film etching method using the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100378624B1 (en) * 2000-07-13 2003-04-08 (주)보부하이테크 A Microwave Deionized Water Heating Device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100428813B1 (en) * 2001-09-18 2004-04-29 주성엔지니어링(주) Plama generation apparatus and SiO2 thin film etching method using the same

Also Published As

Publication number Publication date
KR960005588Y1 (en) 1996-07-06

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20040618

Year of fee payment: 9

LAPS Lapse due to unpaid annual fee