KR940009308B1 - Manufacturing method and device of shadow mask - Google Patents

Manufacturing method and device of shadow mask Download PDF

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Publication number
KR940009308B1
KR940009308B1 KR1019880012850A KR880012850A KR940009308B1 KR 940009308 B1 KR940009308 B1 KR 940009308B1 KR 1019880012850 A KR1019880012850 A KR 1019880012850A KR 880012850 A KR880012850 A KR 880012850A KR 940009308 B1 KR940009308 B1 KR 940009308B1
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South Korea
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etching
box
shadow mask
deposition
liquid
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KR1019880012850A
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Korean (ko)
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KR900005526A (en
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김충호
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금성마이크로닉스주식회사
하태봉
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes

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  • Manufacturing & Machinery (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

The method has an advantage of improvement for color brown tube resolution and makes shadow mask dot constant. The etching solution is the compound of FeCl3 and HCl. The conditions of etching solution: the temperature of FeCl3, 45-55 deg.C; the density, 39-45 %; the specific weight, 42-48 Be', FeCl3/FeCl2 >= 3; the HCl density, 0.1-0.7 %. The etching revolution speed is 500-1000 RPM. The absorption etching box (30) is placed between the free etching box (10) and the etching box (20). The guide rolls (33)(34)(35)(36) is installed in the absorption solution (31). The alternater (32) which mixes the etching solution (31) is installed on the absorption etching box (30).

Description

새도우 마스크의 제조방법 및 그 제조장치Manufacturing method of shadow mask and apparatus for manufacturing same

제1도는 종래의 제조공정도.1 is a conventional manufacturing process diagram.

제2도는 종래 제조장치의 예시도.2 is an illustration of a conventional manufacturing apparatus.

제3a, b도는 종래기술에 의해 제작되는 새도우 마스크의 공정을 보인 부분 측단면도 및 평면도.3A and 3B are a partial side cross-sectional view and a plan view showing a process of a shadow mask produced by the prior art.

제4도는 본 발명에 따른 제조공정도.4 is a manufacturing process diagram according to the present invention.

제5도는 본 발명에 따른 제조장치의 예시도.5 is an illustration of a manufacturing apparatus according to the present invention.

제6a, b도는 본 발명에 의해 제작되는 새도우 마스크의 공정을 보인 부분 측단면도 및 평면도.6A and 6B are a partial side cross-sectional view and a plan view showing a process of a shadow mask produced by the present invention.

제7도는 본 발명 제조공정중 침적에칭이 끝난 후의 철판의 측단면도.7 is a side cross-sectional view of the iron plate after the end of the immersion etching in the manufacturing process of the present invention.

제8도는 본 발명에 의한 도트단면의 형성과정을 보인 측단면도로서, a도는 프리에칭시의 측단면도, b도는 침적에칭시의 측단면도, c, d도는 에칭시의 측단면도로서, c도는 에칭중인 상태이고, d도는 에칭이 완료된 상태의 측단면도이다.8 is a side cross-sectional view showing a process for forming a dot cross section according to the present invention, a is a side cross-sectional view at the time of pre-etching, b is a side cross-sectional view at the time of deposition etching, c, d is a side cross-sectional view at the time of etching, c is an etching D is a side cross-sectional view of the state in which etching is completed.

* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings

10 : 프리에칭상자 20 : 에칭상자10: preetching box 20: etching box

30 : 침적에칭상자 31 : 침적에칭액30: immersion etching box 31: immersion etching liquid

32 : 교반기 33,34,35,36 : 안내롤32: stirrer 33,34,35,36: guide roll

본 발명은 새도우 마스크의 제조방법 및 그 제조장치에 관한 것으로, 특히 프리에칭공정과 에칭공정의 사이에 침적에칭공정을 실시하여 새도우 마스크의 도트(Dot)를 균일하게 형성할 수 있도록 한 새도우 마스크의 제조방법 및 그 제조장치에 관한 것이다.The present invention relates to a method for manufacturing a shadow mask and a manufacturing apparatus thereof, and more particularly, to a method of manufacturing a shadow mask by performing a deposition etching process between a pre-etching process and an etching process to uniformly form a dot of a shadow mask. It relates to a manufacturing method and a manufacturing apparatus thereof.

종래에 칼라브라운관용 새도우 마스크를 제조함에 있어서는 소재철판에 피막을 도포하고 건조한 후 마스크를 대고 노광하는 공정을 행한 다음 제1도에 도시한 바와 같이, 프리에칭(1) 및 에칭(2)공정을 행하였으며, 프리에칭(1)공정에서는 제2도와 같이, 에칭상자(10)에 담긴 수산[(COOH)2], 과산화수소(H2O2), 황산(H2SO4)의 혼합수용액인 프리에칭액(11)속에서 처리하여 산화철피막 및 철판(40)의 표면을 화학 연마시킨 후 에칭상자(20)에서 철판(40)을 에칭액(21)과 반응시켜 철판(40) 표면에 새도우 마스크의 도트(40a)를 형성시킨다.Conventionally, in manufacturing a shadow mask for a color brown tube, a film is applied to a steel sheet, dried, and then exposed to a mask, followed by a step of preetching (1) and etching (2), as shown in FIG. In the pre-etching (1) process, as shown in FIG. 2 , a pre-mixed solution of hydroxide [(COOH) 2 ], hydrogen peroxide (H 2 O 2 ), and sulfuric acid (H 2 SO 4 ) contained in the etching box 10 is used. After treating in the etching solution 11 to chemically polish the surface of the iron oxide film and the iron plate 40, the iron plate 40 is reacted with the etching solution 21 in the etching box 20 to dot the shadow mask on the surface of the iron plate 40. 40a is formed.

보다 구체적으로 설명하면, 상기 에칭상자(10)에는 피막이 도포되고, 건조 및 노광처리되어진 철판(40)이 안내롤(12)(13)(14)(15)에 안내 이송되면서 그 프리에칭상자(10)에 담긴 프리에칭액(11)을 통과하게 되고, 교반기(16)의 교반작용으로 교반되는 프리에칭액(11)에 의하여 미노광막(41)이 분해되며, 이후에 에칭상자(20)를 통과시키면서 분사노즐(22)에서 분사되는 에칭액(21)으로 에칭시켜 새도우 마스크의 도트(40a)를 형성하는 것이었다.More specifically, the etching box 10 is coated with a coating, and the iron plate 40, which has been dried and exposed, is guided to the guide rolls 12, 13, 14 and 15, and the pre-etching box ( The unetched film 41 is decomposed by the pre-etching liquid 11 contained in 10), and the pre-etching liquid 11 is stirred by the stirring action of the stirrer 16, and then passed through the etching box 20. The etching was performed with the etching liquid 21 sprayed from the spray nozzle 22 to form the dot 40a of the shadow mask.

그러나, 종래기술에 의하면 프리에칭(1) 공정후 철판(40)을 에칭상자(20) 내부로 이동시키고 철판(40)이 노광막(42)과 미노광막(41)에 에칭액(21)을 직접 분사하면서 에칭하므로 제3a도에서와 같이, 프리에칭(1)공정에서 유연해진 노광막(42)이 손상을 받아 상기 노광막(42)과 현상에 의해 제거된 미노광막(41)의 경계에서 막깨어짐(43)이나, 막들뜸현상(미도시)이 발생된다.However, according to the related art, after the preetching (1) process, the iron plate 40 is moved into the etching box 20, and the iron plate 40 directly transfers the etching solution 21 to the exposure film 42 and the unexposed film 41. Since etching is carried out by spraying, as shown in FIG. 3A, the exposure film 42 softened in the preetching (1) process is damaged and the film is exposed at the boundary between the exposure film 42 and the unexposed film 41 removed by development. A crack 43 or a film lifting phenomenon (not shown) is generated.

따라서 제3b도와 같이 에칭(2) 공정후 마스크의 도트(40a)가 불균일하고 또한 일정한 형상의 새도우 마스크 도트(40a)를 형성할 수 없으므로, 빛의 투과율 등에 영향을 주어 칼라브라운관의 해상도를 열화시키는 등의 문제점이 있었다.Therefore, as shown in FIG. 3B, the mask 40a of the mask after the etching (2) process is uneven and cannot form the shadow mask dot 40a having a constant shape, thereby affecting light transmittance and the like, thereby degrading the resolution of the color CRT. There was a problem.

본 발명은 이와같은 종래의 결함을 해소하기 위하여 창안한 것으로, 프리에칭 공정후 침적에칭공정을 행하여 소재철판의 도트형성부분을 4－5㎛ 깊이로 약간 에칭한 다음 에칭(2)을 실시함으로써 새도우 마스크의 도트를 보다 균일하게 제작할 수 있게 되는 제조방법 및 제조장치를 제공하기 위한 것인 바, 이를 첨부한 도면 제4도 내지 제7도에 의하여 상세히 설명하면 다음과 같다.The present invention was devised to solve such a conventional defect, and after the preetching step, the deposition etching step is performed to etch the dot forming portion of the raw steel sheet to a depth of 4 to 5 탆, and then to perform the etching (2). It is to provide a manufacturing method and a manufacturing apparatus that can be produced more uniformly the dot of the mask, it will be described in detail with reference to Figures 4 to 7 attached to this.

제4도는 본 발명 제조방법을 표시한 것으로, 이에 도시한 바와같이 프리에칭(1)공정, 침적에칭(3)공정 및 에칭(2)고정을 순차적으로 행하는 것으로 되어 있다.4 shows the manufacturing method of the present invention, and as shown therein, the preetching (1) step, the deposition etching (3) step, and the etching (2) fixation are sequentially performed.

상기 프리에칭(1)공정 및 에칭(2)공정은 종래기술과 같이 행하게 된다.The pre-etching (1) process and the etching (2) process are carried out as in the prior art.

상기 침적에칭(3)공정은 프리에칭(1)공정에서 미노광막(41)이 제거된 이후에 실시하며, 프리에칭액(11)이 담긴 에칭상자(10)에서 프리에칭(1)이 끝난 철판(40)을 침적에칭상자(30)내의 에칭액(31)에 침적시키고 에칭하는 공정이다.The immersion etching (3) process is performed after the unexposed film 41 is removed in the preetching (1) process, and the pre-etching (1) is completed in the etching box 10 containing the preetching liquid 11 ( 40 is a step of immersing and etching the etching liquid 31 in the immersion etching box 30.

이러한 침적에칭(3)공정은 프리에칭(1)공정시 미노광막(41)이 제거되고 노출되는 철판(40)의 노출부분을 제7도와 같이, 4－5㎛으로 부식시킨 면(40a')과 같이 일차적으로 약간 부식시키기 위하여 실시하게 되며, 이와 같이 에칭(2)의 전단계에서 침적에칭(3)을 행하게 되면 노광막(42)에 손상을 주지 않고 철판(40) 표면에 4－5㎛으로 부식시킨 면(40a')을 부여함으로써 에칭공정에서 노광막(42)의 들뜸이나 떨어짐 현상을 제거하여 새도우 마스크 도트(40a)를 균일하게 형성할 수 있는 것이다.In the deposition etching (3) process, the unexposed film 41 is removed during the preetching (1) process, and the exposed portion of the iron plate 40 exposed to the surface 40a 'is corroded to 4-5 탆 as shown in FIG. As described above, in order to firstly corrode slightly, if the deposition etching (3) is performed in the previous step of etching (2), the surface of the iron plate 40 is 4-5 탆 without damaging the exposure film 42. By providing the corroded surface 40a ', the lifting and dropping phenomenon of the exposure film 42 can be eliminated in the etching process so that the shadow mask dot 40a can be formed uniformly.

침적에칭(3)시에는 에칭액(31)인 염화제2철(FeCl3)과 염산(HCl)을 적정비율로 혼합하여 사용하며, 이때 에칭액(31)의 조건은 염화제2철의 온도 45℃－55℃, 농도 39－45%, 비중 42－48보메(Be'), FeCl3/FeCl2≥3(중량비), 유리산도 0.1－0.7%, 염산의 농도 0.1－0.7%로 하여 사용하며, 염화제이철의 온도 50±5℃, 농도 42±3%, 비중 45±3Be', FeCl3/FeCl2≥3, 유리산도 0.4±0.3%, 염산농도 0.4±0.3%로 선정하여 사용함이 보다 바람직하다.In immersion etching (3), ferric chloride (FeCl 3 ), which is an etching solution 31, and hydrochloric acid (HCl) are mixed and used at an appropriate ratio, and the etching solution 31 has a 45 ° C ferric chloride temperature. It is used with -55 ℃, concentration 39-45%, specific gravity 42-48 bome (Be '), FeCl 3 / FeCl 2 ≥ 3 (weight ratio), free acidity 0.1-0.7%, hydrochloric acid concentration 0.1-0.7%, It is more preferable to select the ferric chloride at a temperature of 50 ± 5 ℃, a concentration of 42 ± 3%, a specific gravity of 45 ± 3Be ', FeCl 3 / FeCl 2 ≥ 3, a free acidity of 0.4 ± 0.3%, and a hydrochloric acid concentration of 0.4 ± 0.3%. .

제5도는 본 발명을 실시하기 위한 장치의 예시도로서, 침적에칭상자(30)의 내부에는 상기의 에칭액(31)이 담기어 있고, 교반기(32)는 침적에칭상자(30)의 측면에 고정되어 침적에칭상자(30)의 중심 상부에 설치되어 있으며, 철판(40)은 수개의 안내롤(33)(34)(35)(36)에 안내되어 이송되게 되어 있다.5 is an exemplary view of a device for implementing the present invention, the etching liquid 31 is contained in the inside of the deposition etching box 30, the stirrer 32 is fixed to the side of the deposition etching box 30 Is installed in the upper center of the immersion etching box 30, the iron plate 40 is guided to several guide rolls 33, 34, 35, 36 are conveyed.

그외 프리에칭상자(10)와 에칭상자(20)의 구성은 종래와 동일하다.Other configurations of the preetching box 10 and the etching box 20 are the same as in the prior art.

제조작업을 설명하면, 먼저 종래의 기술과 같이 프리에칭(1)공정을 행한 후 철판(40)을 침적에칭상자(30)내부의 에칭액(31)에 침적시키고, 교반기(32)로 에칭액(31)을 교반시키면서 철판(40)의 표면을 미세하게 에칭시켜 4－5㎛으로 부식시킨 면(40a')을 형성한다. 이때 교반기(32)는 500－1000RPM으로 회전시킴이 좋다.Referring to the manufacturing operation, first, after performing the pre-etching (1) process as in the prior art, the iron plate 40 is immersed in the etching liquid 31 inside the deposition etching box 30, and the etching liquid 31 with the stirrer 32. The surface of the iron plate 40 is finely etched while stirring to form a surface 40a 'which is corroded to 4-5 탆. At this time, the stirrer 32 may be rotated at 500 to 1000 RPM.

이와같이 침적에칭(3)공정을 행한 후, 철판(40)을 에칭상자(20)로 이송시켜 종래와 같이 에칭(2)을 실시하게 된다.After the immersion etching (3) process as described above, the iron plate 40 is transferred to the etching box 20 to perform the etching (2) as in the prior art.

본 발명은 상기한 바와 같이 프리에칭(1)과 에칭(2)의 공정사이에서 침적에칭(3)을 행하여 철판(40)의 도트(40a)형성부분에 미리 4－5㎛으로 부식시킨 면(40a')을 형성함으로써 에칭(2)시 노광막(42)이 부분적으로 들뜨거나 떨어지는 현상이 없이 제6a, b도와 같이 새도우 마스크 도트(40a)를 매우 깨끗하게 균일하게 형성할 수 있게 된다.As described above, the present invention performs the deposition etching 3 between the steps of the pre-etching 1 and the etching 2, so that the surface of the steel sheet 40 which has been previously corroded to 4-5 mu m in the forming portion of the dot 40a ( By forming 40a ', the shadow mask dot 40a can be formed very cleanly and uniformly as shown in FIGS. 6a and b without the phenomenon that the exposure film 42 partially lifts or falls during the etching (2).

제8도는 본 발명에 의한 도트단면의 형성과정을 보인 측단면도로서, a도는 프리에칭시의 측단면도, b도는 침적에칭시의 측단면도, c, d도는 에칭시의 측단면도로서, c도는 에칭중의 상태이고, d도는 에칭이 완료된 상태의 측단면도로서, 도트의 형성과정을 순차적으로 보인 것이다.8 is a side cross-sectional view showing a process for forming a dot cross section according to the present invention, a is a side cross-sectional view at the time of pre-etching, b is a side cross-sectional view at the time of deposition etching, c, d is a side cross-sectional view at the time of etching, c is an etching Is a side cross-sectional view of the state where etching is completed, showing the formation process of a dot sequentially.

상기 침적에칭(3)시 사용하는 침적에칭액의 조건을 본 발명의 아래조건 즉, 온도 45℃ 이하, 농도 30% 이하, 비중 42Be' 이하, FeCl3/FeCl2＜3, 유리산도 0.1% 이하, 염산농도 0.1% 이하, 교반기의 회전수를 500RPM 이하로 하면 에칭속도가 저하되어 생산성이 저하되고, 침적에칭이 부족함으로 인하여 에칭시 막들뜸 및 막떨어짐을 충분히 방지할 수 없고, 새도우 마스크 에칭공정이 규격보다 적게 형성될 우려가 있으며, 침적에칭액의 조건을 본 발명의 윗조건 즉, 온도 55℃ 이상, 농도 45% 이상, 비중 48Be' 이상, FeCl3/FeCl2＞3, 유리산도 0.7% 이상, 염산농도 0.7% 이상, 교반기의 회전수를 1000RPM으로 하면 에칭속도가 빠르나 에칭이 과다하게 되어 공정의 주변부가 거칠게 에칭되고, 따라서 에칭을 거쳐도 균일한 도트가 형성되지 않게 되며, 도트가 규격보다 크게 형성되는 문제점이 있는 것이다.The conditions of the deposition etchant used in the deposition etching (3) are the following conditions of the present invention, that is, the temperature of 45 ℃ or less, concentration 30% or less, specific gravity 42Be 'or less, FeCl 3 / FeCl 2 <3, free acidity 0.1% or less, When the hydrochloric acid concentration is 0.1% or less and the rotation speed of the stirrer is 500 RPM or less, the etching rate is lowered, the productivity is lowered, and due to the lack of deposition etching, it is not possible to sufficiently prevent film lifting and film drop during etching. It may be formed less than the specification, the conditions of the immersion etching solution is the upper conditions of the present invention, that is, the temperature 55 ℃ or more, concentration 45% or more, specific gravity 48Be 'or more, FeCl 3 / FeCl 2 > 3, free acid 0.7% or more, When the hydrochloric acid concentration is 0.7% or more and the rotation speed of the stirrer is 1000 RPM, the etching speed is high, but the etching is excessive and the peripheral part of the process is roughly etched, so that even dots are not formed evenly, and the dots are larger than the standard Formed Is a problem.

이상에서 설명한 바와 같은 본 발명은 칼라브라운관의 새도우 마스크의 도트를 형성하면서 프리에칭후 침적에칭을 실시하여 도트가 형성될 부분을 미리 소정깊이로 침적에칭하고, 에칭을 실시함으로써 노광막의 들뜸이나 깨짐을 방지하여 새도우 마스크 도트를 매우 균일하게 형성할 수 있으므로 칼라브라운관의 해상도를 향상시키는 이점이 있다.As described above, the present invention forms a dot of a shadow mask of a color brown tube, performs pre-etching, and then immerses the portion where the dot is to be formed in a predetermined depth, and then performs etching to remove the lifting or cracking of the exposure film. Since it is possible to form a shadow mask dot very uniformly, there is an advantage of improving the resolution of the color CRT.

Claims (4)

칼라브라운관용 새도우 마스크를 제조하는 방법에 있어서, 금속시트재를 에칭하여 도트를 형성하는 단계에서, 노광 및 현상이 끝난 금속시트재를 프리에칭공정에서 미노광막을 제거한 다음, 모터에 의해 교반되는 에칭액에 침적을 시켜 철판표면으로부터 4－5㎛깊이로 에칭하고, 이후에 에칭공정을 행하여 도트를 형성함을 특징으로 하는 새도우 마스크 제조방법.In the method for producing a shadow mask for color brown tube, in the step of etching the metal sheet material to form a dot, the etching solution is stirred by the motor after removing the unexposed film in the pre-etching step of the exposed and developed metal sheet material A shadow mask manufacturing method, characterized in that the film is etched to a depth of 4 to 5 占 퐉 from the surface of the iron plate and subsequently subjected to an etching step to form dots. 제1항에 있어서, 상기 침적에칭시 사용되는 에칭액은 염화제2철과 염산의 혼합액이고, 그 에칭액의 조건은 염화제2철의 온도 45－55℃, 농도 39－45%, 비중 42－48Be', FeCl3/FeCl2≥3(중량비), 유리산도 0.1－0.7%, 염산의 농도 0.1－0.7%로 하는 것을 특징으로 하는 새도우 마스크 제조방법.The etching liquid used in the said immersion etching is a mixed liquid of ferric chloride and hydrochloric acid, The conditions of the etching liquid are the temperature of ferric chloride 45-55 degreeC, concentration 39-45%, specific gravity 42-48Be. FeCl 3 / FeCl 2 ≧ 3 (weight ratio), free acidity 0.1-0.7%, hydrochloric acid concentration 0.1-0.7% characterized in that the shadow mask manufacturing method. 제1항에 있어서, 침적에칭시 침적에칭상자에 담긴 에칭액을 교반기로 그 회전속도를 500－1000RPM으로 하여 교반시킴을 특징으로 하는 새도우 마스크 제조방법.The shadow mask manufacturing method according to claim 1, wherein the etching liquid contained in the deposition etching box is stirred at a rotation speed of 500 to 1000 RPM with a stirrer. 프리에칭을 행하는 프리에칭상자(10)와 에칭을 행하는 에칭상자(20) 사이에 침적에칭상자(30)를 설치하고, 그 내부에 담긴 침적에칭액(31)속으로 프리에칭이 끝난 철판(40)을 이동시키는 4개의 안내롤(33)(34)(35)(36)을 설치하며, 에칭액(31)을 교반하기 위한 교반기(32)를 침적에칭상자(30)의 상부에 고정 및 적치하여 구성함을 특징으로 하는 새도우 마스크 제조방법.The pre-etching box 30 is installed between the pre-etching box 10 for pre-etching and the etching-box 20 for etching, and the pre-etched iron plate 40 is immersed in the deposition-etching liquid 31 contained therein. Four guide rolls 33, 34, 35, 36 are installed to move them, and the stirrer 32 for stirring the etching liquid 31 is fixed and placed on the upper part of the deposition etching box 30. Shadow mask manufacturing method characterized in that.
KR1019880012850A 1988-09-30 1988-09-30 Manufacturing method and device of shadow mask KR940009308B1 (en)

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