KR940006706A - Surface polishing method of plank and its device - Google Patents

Surface polishing method of plank and its device Download PDF

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Publication number
KR940006706A
KR940006706A KR1019920016154A KR920016154A KR940006706A KR 940006706 A KR940006706 A KR 940006706A KR 1019920016154 A KR1019920016154 A KR 1019920016154A KR 920016154 A KR920016154 A KR 920016154A KR 940006706 A KR940006706 A KR 940006706A
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KR
South Korea
Prior art keywords
roller
polishing
plank
transfer
support frame
Prior art date
Application number
KR1019920016154A
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Korean (ko)
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KR950011379B1 (en
Inventor
인복식
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인복식
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Priority to KR1019920016154A priority Critical patent/KR950011379B1/en
Publication of KR940006706A publication Critical patent/KR940006706A/en
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Publication of KR950011379B1 publication Critical patent/KR950011379B1/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

본 발명은 판자개의 표면 연마방법 및 그 장치에 관한 것으로 특히, 연마 로울러와 이송 로울러 사이에 판자개를 소정방향으로 이송 통과시켜서 이의 표면부가 회전하는 연마 로울러에 의하여 연마되도록 하되, 이송 로울러의 회전 방향과 반대 방향으로 회전하는 연마 로울러와 면접촉 상태에서 일측표면을 연마처리 되도록한 판자개의 표면 연마 방법 및 그 장치에 관한 것으로, 본 발명의 첫째목적은 소정방향으로 이송시키는 이송 로울러의 회전방향과 반대방향으로 회전하는 연마 로울러 사이에 판자개를 이송 통과시켜서 일측 표면부를 연마하는 역회전 방식을 적용한 판자개의 표면 연마 방법을 제공함에 있고, 본 발명의 둘째목적은 소정방향으로 이송시키는 이송 로울러의 회전방향과 반대 방향으로 회전하는 연마 로울러 사이에 판재개를 이송 통과시켜서 일측 표면부를 연마하는 판자개의 표면 연마장치를 제공함에 있으며, 본 발명의 세째목적은 기존의 정회전 방식에 비하여 역회전 방식을 적용하여 연마 로울러와 이송 로울러의 속도 제어의 용이성과 판자개에 따른 두께 조절이 필요치 않는 판자개의 표면 연마 방법 및 그 장치를 제공함에 있고, 본 발명의 네째목적은, 판자개의 가공에 따른 노련한 기술이 필요없이 적용될 수 있어 생산성의 향상을 제공할 수 있는 판자개의 표면 연마 방법 및 그 장치를 제공함에 그 특징이 있는 것이다.The present invention relates to a method for polishing a surface of a plank and a device therefor, and in particular, to transfer the plank through a predetermined direction between the polishing roller and the transport roller to be polished by a rotating polishing roller to rotate the surface portion thereof, the rotation direction of the transport roller The present invention relates to a method for polishing a surface of a plank and a device for polishing one side surface in a surface contact state with a polishing roller rotating in a direction opposite to the first direction. The first object of the present invention is to reverse the direction of rotation of a feed roller for feeding in a predetermined direction. The present invention provides a method for polishing a surface of a plank by applying a reverse rotation method in which a plank is transferred between abrasive rollers rotating in a direction to polish one surface portion, and a second object of the present invention is a rotation direction of a transfer roller for feeding in a predetermined direction. Between the grinding rollers rotating in the opposite direction The present invention provides a surface polishing apparatus for a plank for polishing one surface portion by passing through it, and a third object of the present invention is to apply the reverse rotation method to the ease and speed control of the polishing roller and the transfer roller as compared to the conventional forward rotation method. The present invention provides a method and apparatus for polishing a surface of a plank that does not require a thickness control according to the present invention. A fourth object of the present invention is to provide a surface of the plank that can be applied without requiring a skilled technique according to the processing of the plank. It is characterized by providing a polishing method and an apparatus thereof.

Description

판자개의 표면 연마방법 및 그 장치Surface polishing method of plank and its device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명인 장치와 외관 사시도.1 is a perspective view of the device and the appearance of the present invention.

제2도는 본 발명인 장치의 요부 발췌 확대사시도.Figure 2 is an enlarged perspective view of the main portion excerpts of the device of the present invention.

제3도는 본 발명인 장치의 확대 측단면도.3 is an enlarged side cross-sectional view of the device of the present invention.

제4도는 본 발명인 장치의 정면도.4 is a front view of the device of the present invention.

Claims (4)

연마 로울러와 이송로울러를 병렬로 설치하고 상기 양 로울러 사이에 판자개를 이송 통과시켜서 연마처리하는 방법에 있어서, 탄성 고무소재에 의하여 외주 표면부가 부착 고정된 이송 로울러에 의하여 공급되는 판자개를 소정 방향으로 이송시키되, 상기 이송 로울러의 회전방향과 반대 방향으로 회전하는 연마 로울러와 면접촉상태로 이송되면서 일측 표면이 연마처리 되는 것을 특징으로하는 판자개의 표면 연마 방법.In the polishing roller and the transfer roller is installed in parallel and the transfer of the plank through the two rollers in the polishing process, the planks supplied by the feed roller fixed to the outer peripheral surface portion by the elastic rubber material fixed direction The surface of the plank surface grinding method characterized in that the transfer to the surface, while the surface is in contact with the polishing roller that rotates in a direction opposite to the rotation direction of the feed roller is polished. 다리 역할을 하는 하부 지지프레임(13)이 형성되고 상부 지지프레임(11)(11')과 중앙 지지 프레임(12)의 각각에 연마 로울러(14)와 이송 로울러(26)가 병렬로 축설된 판자개의 표면 연마장치에 있어서, 상기 연마 로울러(14)는 회전축(15)일방에 연동풀리(16)가 고정 설치되어서 상기 하부 지지 프레임(13)에 설치되는 통상의 구동모타(46)의 구동폴리(47)와 벨트(48)로 연결되고, 상기 이송 로울러(26)는 외주표면이 탄성 고무재(26a)가 부착 고정되고, 상기 중앙 지지 프레임(12)의 양벽(12a)(12b)에 천공된 이송공(25a)(25b)으로 유설되는 이송 베드(28)에 회전축(27)으로 회전자재롭게 축설되되, 상기 회전축(27)의 일방에 워엄 휘일(30)이 고정 설치되어서 상기 중앙 지지프레임(12) 일측벽(12a)에 설치되는 감속기(34)의 워엄(33)과 상호 치합되어 이루어지어서 상기 이송 로울러(26)의 회전 방향과 반대 방향으로 연마 로울러(14)가 회전되도록 이루어지는 것을 특징으로하는 판자개의 표면 연마 장치.A lower support frame 13 serving as a leg is formed and a board having an abrasive roller 14 and a transfer roller 26 arranged in parallel on each of the upper support frame 11, 11 ′ and the central support frame 12. In one surface polishing apparatus, the polishing roller 14 is a drive pulley of a conventional drive motor 46, which is provided on the lower support frame 13 with a linkage pulley 16 fixed to one of the rotation shafts 15 ( 47) and the belt 48, and the transfer roller 26 has an outer circumferential surface to which an elastic rubber material 26a is attached and fixed, and perforated on both walls 12a and 12b of the central support frame 12. Rotating freely to the rotating shaft 27 in the transfer bed (28a) (25b), which is installed as a transfer hole (25a) (25b), the worm wheel (30) is fixed to one of the rotating shaft (27) to the center support frame ( 12) the transfer roller 26 is formed by being engaged with the worm 33 of the reducer 34 installed on one side wall 12a. The board of the surface polishing apparatus composed so that the direction of rotation and the grinding roller (14) against the direction of rotation, characterized. 제2항에 있어서, 상기 연마 로울러(14)의 전방 저부에는 가압판(18)이 지지봉(19)으로 상기 상부 지지프레임(11)(11')사이에 축설되되, 이의 양측이 스프링(22)에 의하여 탄력설치되어서 상기 스프링(22)의 인장 방향으로 가압판(18)이 탄력설치되는 것을 특징으로하는 판자개의 표면 연마 장치.The front plate of the polishing roller 14, the pressing plate 18 is arranged between the upper support frame (11) (11 ') with a support bar 19, both sides of the spring 22, Resilient installation by means of the surface of the plank surface polishing apparatus, characterized in that the pressing plate 18 is elastically installed in the tension direction of the spring (22). 제2항에 있어서, 상기 이송 베드(28) 저부에는 리드 스크류(35)가 고정설치되되 상기 하부 지지 프레임(13)에 설치되는 기억 박스(36)내에 상하단의 지지 베어링(38a)(38b)사이에 유실되는 워엄 휘일(37)의 내주나공(37a)과 나합되고, 상기 워엄 휘일(37)에는 통상의 조정 핸들의 작동로드(39a)에 고정결합된 워엄(40)과 상호 치합되어서 이루어지는 것을 특징으로하는 판자개의 표면 연마 장치.The upper and lower support bearings (38a, 38b) of claim 2, wherein a lead screw (35) is fixedly installed at the bottom of the transfer bed (28), and in a storage box (36) installed in the lower support frame (13). The inner worm hole 37a of the worm wheel 37 lost to the worm, and the worm wheel 37 is mutually engaged with the worm 40 fixedly coupled to the operation rod 39a of the ordinary adjustment handle. The surface polishing apparatus of the plank. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920016154A 1992-09-04 1992-09-04 Nacre face grinding method and device KR950011379B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019920016154A KR950011379B1 (en) 1992-09-04 1992-09-04 Nacre face grinding method and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019920016154A KR950011379B1 (en) 1992-09-04 1992-09-04 Nacre face grinding method and device

Publications (2)

Publication Number Publication Date
KR940006706A true KR940006706A (en) 1994-04-25
KR950011379B1 KR950011379B1 (en) 1995-10-02

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KR1019920016154A KR950011379B1 (en) 1992-09-04 1992-09-04 Nacre face grinding method and device

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000015170A (en) * 1998-08-27 2000-03-15 김영환 Method of manufacturing a thin film transistor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000015170A (en) * 1998-08-27 2000-03-15 김영환 Method of manufacturing a thin film transistor

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Publication number Publication date
KR950011379B1 (en) 1995-10-02

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