KR940006472U - Ion implantation device with protection against burr wall - Google Patents

Ion implantation device with protection against burr wall

Info

Publication number
KR940006472U
KR940006472U KR2019920015625U KR920015625U KR940006472U KR 940006472 U KR940006472 U KR 940006472U KR 2019920015625 U KR2019920015625 U KR 2019920015625U KR 920015625 U KR920015625 U KR 920015625U KR 940006472 U KR940006472 U KR 940006472U
Authority
KR
South Korea
Prior art keywords
ion implantation
protection against
implantation device
burr wall
against burr
Prior art date
Application number
KR2019920015625U
Other languages
Korean (ko)
Other versions
KR950004154Y1 (en
Inventor
김인수
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR92015625U priority Critical patent/KR950004154Y1/en
Publication of KR940006472U publication Critical patent/KR940006472U/en
Application granted granted Critical
Publication of KR950004154Y1 publication Critical patent/KR950004154Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
KR92015625U 1992-08-19 1992-08-19 Ion implantation apparatus having chamber protection function KR950004154Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92015625U KR950004154Y1 (en) 1992-08-19 1992-08-19 Ion implantation apparatus having chamber protection function

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92015625U KR950004154Y1 (en) 1992-08-19 1992-08-19 Ion implantation apparatus having chamber protection function

Publications (2)

Publication Number Publication Date
KR940006472U true KR940006472U (en) 1994-03-25
KR950004154Y1 KR950004154Y1 (en) 1995-05-22

Family

ID=19338686

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92015625U KR950004154Y1 (en) 1992-08-19 1992-08-19 Ion implantation apparatus having chamber protection function

Country Status (1)

Country Link
KR (1) KR950004154Y1 (en)

Also Published As

Publication number Publication date
KR950004154Y1 (en) 1995-05-22

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Legal Events

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E701 Decision to grant or registration of patent right
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FPAY Annual fee payment

Payment date: 20030417

Year of fee payment: 9

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