KR940006467U - Sputter film formation device - Google Patents

Sputter film formation device

Info

Publication number
KR940006467U
KR940006467U KR2019920014870U KR920014870U KR940006467U KR 940006467 U KR940006467 U KR 940006467U KR 2019920014870 U KR2019920014870 U KR 2019920014870U KR 920014870 U KR920014870 U KR 920014870U KR 940006467 U KR940006467 U KR 940006467U
Authority
KR
South Korea
Prior art keywords
film formation
formation device
sputter film
sputter
formation
Prior art date
Application number
KR2019920014870U
Other languages
Korean (ko)
Other versions
KR0132342Y1 (en
Inventor
이범국
Original Assignee
삼성코닝주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성코닝주식회사 filed Critical 삼성코닝주식회사
Priority to KR2019920014870U priority Critical patent/KR0132342Y1/en
Publication of KR940006467U publication Critical patent/KR940006467U/en
Application granted granted Critical
Publication of KR0132342Y1 publication Critical patent/KR0132342Y1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
KR2019920014870U 1992-08-07 1992-08-07 Sputter deposition apparatus KR0132342Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019920014870U KR0132342Y1 (en) 1992-08-07 1992-08-07 Sputter deposition apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019920014870U KR0132342Y1 (en) 1992-08-07 1992-08-07 Sputter deposition apparatus

Publications (2)

Publication Number Publication Date
KR940006467U true KR940006467U (en) 1994-03-25
KR0132342Y1 KR0132342Y1 (en) 1999-02-01

Family

ID=19338153

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019920014870U KR0132342Y1 (en) 1992-08-07 1992-08-07 Sputter deposition apparatus

Country Status (1)

Country Link
KR (1) KR0132342Y1 (en)

Also Published As

Publication number Publication date
KR0132342Y1 (en) 1999-02-01

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