KR930020597A - Cleaning equipment - Google Patents

Cleaning equipment Download PDF

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Publication number
KR930020597A
KR930020597A KR1019930003345A KR930003345A KR930020597A KR 930020597 A KR930020597 A KR 930020597A KR 1019930003345 A KR1019930003345 A KR 1019930003345A KR 930003345 A KR930003345 A KR 930003345A KR 930020597 A KR930020597 A KR 930020597A
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KR
South Korea
Prior art keywords
cassette
wafer
cleaning
cleaning processing
conveying
Prior art date
Application number
KR1019930003345A
Other languages
Korean (ko)
Other versions
KR0163361B1 (en
Inventor
요시유키 혼다
에이이치 무카이
유우지 가미카와
고오키 구로다
미쓰오 니시
Original Assignee
이노우에 아키라
도오교오 에레구토론 가부시끼가이샤
다카시마 히로시
도오교오 에레구토론 사가 가부시끼가이샤
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Publication date
Application filed by 이노우에 아키라, 도오교오 에레구토론 가부시끼가이샤, 다카시마 히로시, 도오교오 에레구토론 사가 가부시끼가이샤 filed Critical 이노우에 아키라
Publication of KR930020597A publication Critical patent/KR930020597A/en
Application granted granted Critical
Publication of KR0163361B1 publication Critical patent/KR0163361B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Abstract

세정장치는, 반도체 웨이퍼를 약액으로 세정하고, 물로 씻고, 건조하는 웨이퍼 세정처리부와, 웨이퍼 수납용의 카세트를 물로 씻고, 건조하는 카세트 세정처리부와, 카세트로부터 웨이퍼를 꺼내고, 웨이퍼를 웨이퍼 세정처리부에 로드하는 로더부와, 카세트 웨이퍼를 수용하고, 웨이퍼를 웨이퍼 세정처리부로부터 언로드하는 언로드부와, 웨이퍼를 웨이퍼 세정처리부내에서 반송하는 웨이퍼 반송기구와, 카세트를 로더부로부터 카세트 세정처리부에 반송하는 카세트 리프트와, 카세트 카세트 세정 처리부내에서 반송하는 와이어 구동기구를 가진다.The cleaning apparatus includes a wafer cleaning processing unit for cleaning a semiconductor wafer with a chemical solution, washing with water and drying, a cassette cleaning processing unit for washing and drying a cassette for wafer storage with water, and taking out the wafer from the cassette, and placing the wafer into the wafer cleaning processing unit. A loader for loading, a unloading unit for accommodating a cassette wafer and unloading the wafer from the wafer cleaning processing unit, a wafer conveying mechanism for conveying the wafer in the wafer cleaning processing unit, and a cassette for transferring the cassette from the loader unit to the cassette cleaning processing unit. It has a lift and a wire drive mechanism to convey in a cassette cassette cleaning process part.

Description

세정장치Cleaning equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명의 실시예에 관계되는 세정시스템의의 전체개요를 나타낸 투시사시도.1 is a perspective view showing an overview of a cleaning system according to an embodiment of the present invention.

제2도는 세정시스템의 인푸트버퍼부 및 아우트 푸트버퍼부의 각각에 설치된 웨이퍼반송기구를 나타낸 사시도.2 is a perspective view showing a wafer transport mechanism provided in each of an in-foot buffer portion and an outer foot buffer portion of a cleaning system.

제3도는 카세트 스토커를 나타낸 투시 사시도.3 is a perspective view of a cassette stocker.

Claims (12)

반도체 웨이퍼(W)를 약액으로 세정하고, 물로 씻고, 건조하는 웨이퍼 세정처리부와, 웨이퍼 수납용의 카세트를 물로 씻고, 건조하는 카세트 세정처리부와, 카세트로부터 웨이퍼(W)를 꺼내고, 웨이퍼(W)를 상기 웨이퍼 세정처리부에 로드하는 로더부(5)와, 카세트에 웨이퍼(W)를 수용하고, 웨이퍼(W)를 상기 웨이퍼 세정처리부로부터 언로드하는 언로더부(6)와, 웨이퍼(W)를 상기 웨이퍼 세정처리부내에 반송하는 웨이퍼 반송수단(8)과, 카세트를 상기 로더부(5)로부터 상기 카세트 세정처리부에 반송하는 반송수단(12)을 가지는 것으로 구성하는 세정장치.The semiconductor wafer W is cleaned with a chemical solution, washed with water and dried, the wafer cleaning process for washing the wafer, the cassette for wafer storage with water, the cassette cleaning process for drying and the wafer W is removed from the cassette, and the wafer W is removed. A loader section 5 for loading the wafers into the wafer cleaning processing section, an unloader section 6 for accommodating the wafers W in a cassette, and unloading the wafers W from the wafer cleaning processing section; And a conveying means (12) for conveying the cassette from the loader portion (5) to the cassette cleaning processing portion. 제1항에 있어서, 상기 카세트 세정처리부는 상기 웨이퍼 세정처리부 보다 윗쪽에 설치되어 있는 세정장치.The cleaning apparatus according to claim 1, wherein the cassette cleaning processing section is provided above the wafer cleaning processing section. 제1항에 있어서, 상기 카세트 세정처리부는 실질적으로 수평면내에서 카세트를 반송하기 위한 반송로르 가진 세정장치.The cleaning apparatus according to claim 1, wherein the cassette cleaning processing portion has a conveying path for conveying a cassette in a substantially horizontal plane. 제1항에 있어서, 상기 카세트 반송로의 입구 및 출구에는 개폐셔터 수단이 추가로 설치되어 있는 세정장치.The cleaning apparatus according to claim 1, wherein an opening and closing shutter means is further provided at the inlet and the outlet of the cassette conveying path. 제1항에 있어서, 상기 카세트 반송수단은, 카세트롤 로더부(5)로부터 카세트 세정처리부에 반송하는 카세트리프터(70)와, 카세트를 카세트 세정처리부내에서 반송하는 와이어 구동기구를 가지는 세정장치.The cleaning apparatus according to claim 1, wherein the cassette conveying means has a cassette lifter (70) for conveying the cassette from the cassette roll loader (5) to the cassette cleaning processing unit and a wire drive mechanism for conveying the cassette in the cassette cleaning processing unit. 제1항에 있어서, 상기 웨이퍼 반송수단은, 구동부에서 생긴 파티클의 외부 비산을 방지하는 시이벨트(53)를 가진 벨트 구동기구를 가지는 세정장치.The cleaning apparatus according to claim 1, wherein the wafer conveying means has a belt driving mechanism having a seat belt (53) for preventing external scattering of particles generated in the driving unit. 제1항에 있어서, 상기 카세트 세정처리부는, 카세트에 물을 스프레이하여 물로 씻는 수세수단을 가지는 세정장치.The cleaning apparatus according to claim 1, wherein the cassette cleaning processing unit has a washing means for spraying water on the cassette to wash with water. 제1항에 있어서, 상기 카세트 세정처리부는 카세트에 드라이 가스를 내뿜어서, 가열하는 건조수단을 가지는 세정장치.The cleaning apparatus according to claim 1, wherein the cassette cleaning processing unit has drying means for blowing dry gas into the cassette and heating the cassette. 제1항에 있어서, 카세트를 받아들이기 위한 인푸트 버퍼부(3)를 추가로 가지며, 이 인푸트버퍼부(3)는 상기로더부(5)에 인접하고 있는 세정장치.The cleaning apparatus according to claim 1, further comprising an input buffer portion (3) for receiving a cassette, the input buffer portion (3) adjacent to the loader portion (5). 제1항에 있어서, 상기 인푸트버퍼부(3)에는 카세트를 수납하기 위하 카세트 스토커(13)가 추가로 설치되어 있는 세정장치.The cleaning apparatus according to claim 1, wherein a cassette stocker (13) is additionally provided in said inbuffer portion (3) for storing a cassette. 제1항에 있어서, 카세트를 불출하기 위한 아우트 푸트 버퍼부(4)를 추가로 가지며, 이 아우트 푸트 버퍼부(4)에는 상기 언로더부(6)에 인접하고 있는 세정장치.The washing apparatus according to claim 1, further comprising an outer foot buffer portion (4) for dispensing a cassette, said outer foot buffer portion (4) being adjacent to said unloader portion (6). 제1항에 있어서, 상기 아우트 푸트 버퍼부(4)에는 카세트를 수납하기 위한 카세트 스토커(13)가 추가로 설치되어 있는 세정장치.The cleaning apparatus according to claim 1, wherein a cassette stocker (13) for accommodating a cassette is further provided in said outer foot buffer portion (4). ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019930003345A 1992-03-05 1993-03-05 Cleaning apparatus KR0163361B1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP4083216A JPH05251414A (en) 1992-03-05 1992-03-05 Cleaning equipment
JP92-83216 1992-03-05
JP92-62083 1992-03-18
JP92-96073 1992-03-24
JP92-249252 1992-09-18

Publications (2)

Publication Number Publication Date
KR930020597A true KR930020597A (en) 1993-10-20
KR0163361B1 KR0163361B1 (en) 1999-02-01

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ID=13796126

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930003345A KR0163361B1 (en) 1992-03-05 1993-03-05 Cleaning apparatus

Country Status (2)

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JP (1) JPH05251414A (en)
KR (1) KR0163361B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101243360B1 (en) * 2012-07-20 2013-03-13 주식회사 쓰리디플러스 Complex apparatus for wafer post-process

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100476062B1 (en) * 2002-06-28 2005-03-10 조재연 Apparatus for Processing Board

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101243360B1 (en) * 2012-07-20 2013-03-13 주식회사 쓰리디플러스 Complex apparatus for wafer post-process

Also Published As

Publication number Publication date
JPH05251414A (en) 1993-09-28
KR0163361B1 (en) 1999-02-01

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