KR930003179A - Magnetic material based on FeGaSi with Ir as additive - Google Patents

Magnetic material based on FeGaSi with Ir as additive Download PDF

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Publication number
KR930003179A
KR930003179A KR1019920011551A KR920011551A KR930003179A KR 930003179 A KR930003179 A KR 930003179A KR 1019920011551 A KR1019920011551 A KR 1019920011551A KR 920011551 A KR920011551 A KR 920011551A KR 930003179 A KR930003179 A KR 930003179A
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KR
South Korea
Prior art keywords
magnetic
feirgasi
fegasi
thin film
atomic percent
Prior art date
Application number
KR1019920011551A
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Korean (ko)
Inventor
마이클 젯서 알렉산더
Original Assignee
알프레드 피. 로렌조
이스트만 코닥 컴퍼니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 알프레드 피. 로렌조, 이스트만 코닥 컴퍼니 filed Critical 알프레드 피. 로렌조
Publication of KR930003179A publication Critical patent/KR930003179A/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/22—Heat treatment; Thermal decomposition; Chemical vapour deposition

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Thermal Sciences (AREA)
  • Electromagnetism (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Heads (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

내용 없음.No content.

Description

부가제로서 Ir을 갖는 FeGaSi을 기본으로 하는 자기 물질Magnetic material based on FeGaSi with Ir as additive

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 DC스퍼터링에 의한 세라믹 기판(12)위에 형성된 FeIrGaSi박막(10)의 단면도이다,1 is a cross-sectional view of a FeIrGaSi thin film 10 formed on a ceramic substrate 12 by DC sputtering.

제2도는 FeIrGaSi 박막(10)을 스퍼터링 침적시키기 위한 장치(16)의 구조이다,2 is a structure of an apparatus 16 for sputter depositing a FeIrGaSi thin film 10,

제3도는 Ir함량에 따른 FeIrGaSi필름의 단축이방성을 나타낸 그래프이다.3 is a graph showing the uniaxial anisotropy of the FeIrGaSi film according to the Ir content.

제4도는 Ir항량에 따른 FeIrGaSi필름의 고주파투자율을 나타낸 그래프이다,4 is a graph showing the high-frequency permeability of the FeIrGaSi film according to the Ir content.

제5도는 FeGaSi필름 및 FeRuGaSi필름과 샘플인 FeIrGaSi필름의 어닐링 온도에 따른 포화보자력을 나타낸 그래프이다,5 is a graph showing the saturation coercive force according to the annealing temperature of the FeGaSi film, FeRuGaSi film and the sample FeIrGaSi film,

제6도는 FeGaSi필름 및 FeRuGaSi필름과 샘플인 FeIrGaSi필름의 Tc를 나타낸 도표이다.6 is a chart showing the Tc of the FeGaSi film, the FeRuGaSi film and the FeIrGaSi film as a sample.

Claims (6)

FeIrGaSi으로 이루어진 단축 자기이방성을 갖는 박막물질.Thin film material having uniaxial magnetic anisotropy composed of FeIrGaSi. 박막형태로 스퍼터된 FeIrGaSi을 자기적으로 어닐링시키므로서 유도된 다양한 Oersted의 단축 자기이방성을 갖는 FeIrGaSi 연질자성박막.FeIrGaSi soft magnetic thin film having a variety of Oersted uniaxial magnetic anisotropy induced by magnetically annealing FeIrGaSi sputtered in a thin film form. 350 내지 600℃ 온도에서 박막형태의 스퍼터된 FeIrGaSi을 자기어닐링시키므로써 야기된 내마모성과 향상된 고주파투자율 및 단축 이방성을 특징으로 하는 FeIrGaSi으로 이루어진 자기물질.A magnetic material made of FeIrGaSi characterized by wear resistance, improved high-frequency permeability and uniaxial anisotropy caused by magnetic annealing of sputtered FeIrGaSi in the form of a thin film at a temperature of 350 to 600 ° C. 고주파 연질자성을 향상시키기 위해 1.0 내지 4.0원자% 농도로 Ir을 함유하는 FeGaSi을 기본으로 하는 자기 필름.A magnetic film based on FeGaSi containing Ir at 1.0 to 4.0 atomic percent concentration to improve high frequency soft magnetic properties. 고주파 연질자성을 향상시키기 위해 1.0 내지 4.0원자% 농도인 Ir을 부가하는 대신 Fe로 주로 대체한 Fe이 우세한 FeGaSi을 기초로한 자기 필름.A magnetic film based on FeGaSi, in which Fe predominantly replaced with Fe instead of adding Ir having a concentration of 1.0 to 4.0 atomic percent to improve high frequency soft magnetic properties. 일반적으로 Curie온도를 증가시키기 위해 약 4.0원자퍼센트 이하 농도로 Ir을 함유하는 FeGaSi을 기본으로 하는 자기 필름.Magnetic film based on FeGaSi, which typically contains Ir at a concentration of about 4.0 atomic percent or less to increase the Curie temperature. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920011551A 1991-07-01 1992-06-30 Magnetic material based on FeGaSi with Ir as additive KR930003179A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US72406891A 1991-07-01 1991-07-01
US91-724,068 1991-07-01

Publications (1)

Publication Number Publication Date
KR930003179A true KR930003179A (en) 1993-02-24

Family

ID=24908835

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920011551A KR930003179A (en) 1991-07-01 1992-06-30 Magnetic material based on FeGaSi with Ir as additive

Country Status (4)

Country Link
EP (1) EP0522982B1 (en)
JP (1) JPH05291038A (en)
KR (1) KR930003179A (en)
DE (1) DE69201836T2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5411813A (en) * 1993-04-08 1995-05-02 Eastman Kodak Company Ferhgasi soft magnetic materials for inductive magnetic heads

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4762755A (en) * 1983-11-02 1988-08-09 Hitachi, Ltd. Ferromagnetic material and a magnetic head using the same material
DE3681056D1 (en) * 1985-04-11 1991-10-02 Sony Corp SOFT MAGNETIC THIN FILM.
JP2508462B2 (en) * 1986-07-04 1996-06-19 ソニー株式会社 Soft magnetic thin film

Also Published As

Publication number Publication date
EP0522982A3 (en) 1993-05-12
EP0522982A2 (en) 1993-01-13
DE69201836T2 (en) 1995-12-07
JPH05291038A (en) 1993-11-05
DE69201836D1 (en) 1995-05-04
EP0522982B1 (en) 1995-03-29

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