KR920018862A - Resist removal equipment - Google Patents

Resist removal equipment Download PDF

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Publication number
KR920018862A
KR920018862A KR1019920005155A KR920005155A KR920018862A KR 920018862 A KR920018862 A KR 920018862A KR 1019920005155 A KR1019920005155 A KR 1019920005155A KR 920005155 A KR920005155 A KR 920005155A KR 920018862 A KR920018862 A KR 920018862A
Authority
KR
South Korea
Prior art keywords
sample holder
vacuum chamber
gas
resist removal
oxygen gas
Prior art date
Application number
KR1019920005155A
Other languages
Korean (ko)
Other versions
KR960013256B1 (en
Inventor
이찌로 나까야마
류죠 호찐
Original Assignee
다니이 아끼오
마쯔시다덴기산교 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다니이 아끼오, 마쯔시다덴기산교 가부시기가이샤 filed Critical 다니이 아끼오
Publication of KR920018862A publication Critical patent/KR920018862A/en
Application granted granted Critical
Publication of KR960013256B1 publication Critical patent/KR960013256B1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

내용 없음No content

Description

레지스트 제거장치Resist removal equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명의 제1실시예를 표시한 단면도.1 is a cross-sectional view showing a first embodiment of the present invention.

제2도는 본 발명의 제2실시예를 표시한 단면도.2 is a cross-sectional view showing a second embodiment of the present invention.

제3도는 본 발명의 제3실시예를 표시한 단면도.3 is a cross-sectional view showing a third embodiment of the present invention.

Claims (4)

진공체임버와, 진공체임버 내에 배치되어 200℃이상의 온도에 유지되는 시료유지대와, 산소가스 또는 산소가를 주성분으로 하는 가스를 시료유지대위의 피처리물에 내뿜는 가스공급수단을 구비한 것을 특징으로 하는 레지스트 제거장치.A vacuum chamber, a sample holder disposed in the vacuum chamber and maintained at a temperature of 200 ° C. or higher, and a gas supply means for ejecting oxygen gas or a gas containing oxygen value as a main component to the workpiece on the sample holder; Resist removal apparatus. 제1항에 있어서, 방전시간이 방전정지시간에 비교해서 근소한 고주파방전장치를 구비한 것을 특징으로 하는 레지스터 제거장치.2. The resistor removing device according to claim 1, wherein a high frequency discharge device having a discharge time slightly smaller than the discharge stop time is provided. 진공체임버와, 진공체임버내에 배치된 시료유지대와, 산소가스 또는 산소가스를 주성분으로 하는 가스를 시료유지대위의 피처리물에 내뿜는 가스공급수단과, 간헐적으로 방전하는 고주파방전장치와, 방전중에는 상기 피처리물을 차폐하고, 방전정지중에는, 상기 피처리물을 개방하는 셔터를 구비한 것을 특징으로 하는 레지스트 제거장치.A vacuum chamber, a sample holder disposed in the vacuum chamber, a gas supply means for blowing oxygen gas or a gas mainly containing oxygen gas into the object on the sample holder, a high frequency discharge device intermittently discharging, and And a shutter for shielding the object and opening the object during discharge stop. 제3항에 있어서, 시료유지대가 200℃이상의 온도로 유지된 것을 특징으로 하는 레지스트 제거장치.4. The resist removal apparatus according to claim 3, wherein the sample holder is maintained at a temperature of 200 deg. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920005155A 1991-03-28 1992-03-28 Resist removing device KR960013256B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP91-64157 1991-03-28
JP3064157A JPH04299516A (en) 1991-03-28 1991-03-28 Resist removing device

Publications (2)

Publication Number Publication Date
KR920018862A true KR920018862A (en) 1992-10-22
KR960013256B1 KR960013256B1 (en) 1996-10-02

Family

ID=13249958

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920005155A KR960013256B1 (en) 1991-03-28 1992-03-28 Resist removing device

Country Status (2)

Country Link
JP (1) JPH04299516A (en)
KR (1) KR960013256B1 (en)

Also Published As

Publication number Publication date
JPH04299516A (en) 1992-10-22
KR960013256B1 (en) 1996-10-02

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