KR920010683A - Etching method - Google Patents

Etching method Download PDF

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Publication number
KR920010683A
KR920010683A KR1019900018147A KR900018147A KR920010683A KR 920010683 A KR920010683 A KR 920010683A KR 1019900018147 A KR1019900018147 A KR 1019900018147A KR 900018147 A KR900018147 A KR 900018147A KR 920010683 A KR920010683 A KR 920010683A
Authority
KR
South Korea
Prior art keywords
etching method
etching
clamped
absolute value
value
Prior art date
Application number
KR1019900018147A
Other languages
Korean (ko)
Other versions
KR920010627B1 (en
Inventor
신종철
Original Assignee
서주인
삼성전기 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 서주인, 삼성전기 주식회사 filed Critical 서주인
Priority to KR1019900018147A priority Critical patent/KR920010627B1/en
Publication of KR920010683A publication Critical patent/KR920010683A/en
Application granted granted Critical
Publication of KR920010627B1 publication Critical patent/KR920010627B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004—Details
    • H01G9/04—Electrodes or formation of dielectric layers thereon

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

내용 없음No content

Description

에칭 방법Etching method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (2)

알미늄박의 표면적을 넓히기 위하여 에칭 처리를 하는데 있어서, 에칭 전원으로 클램프된 삼각파를 사용하는 것을 특징으로 하는 에칭 방법.An etching method characterized by using a triangular wave clamped by an etching power supply in performing an etching process to increase the surface area of an aluminum foil. 제1항에 있어서, 상기 클램프된 삼각파의 최대치의 절대값은 최저치의 절대값의 2-4배인 것을 특징으로 하는 에칭 방법.The etching method according to claim 1, wherein the absolute value of the maximum value of the clamped triangle wave is 2-4 times the absolute value of the minimum value. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019900018147A 1990-11-09 1990-11-09 Etching method KR920010627B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019900018147A KR920010627B1 (en) 1990-11-09 1990-11-09 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900018147A KR920010627B1 (en) 1990-11-09 1990-11-09 Etching method

Publications (2)

Publication Number Publication Date
KR920010683A true KR920010683A (en) 1992-06-27
KR920010627B1 KR920010627B1 (en) 1992-12-12

Family

ID=19305826

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900018147A KR920010627B1 (en) 1990-11-09 1990-11-09 Etching method

Country Status (1)

Country Link
KR (1) KR920010627B1 (en)

Also Published As

Publication number Publication date
KR920010627B1 (en) 1992-12-12

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