KR920007556B1 - 2-알킬 이미다졸린의 톨루엔 설포네이트염 - Google Patents

2-알킬 이미다졸린의 톨루엔 설포네이트염 Download PDF

Info

Publication number
KR920007556B1
KR920007556B1 KR1019900701506A KR900701506A KR920007556B1 KR 920007556 B1 KR920007556 B1 KR 920007556B1 KR 1019900701506 A KR1019900701506 A KR 1019900701506A KR 900701506 A KR900701506 A KR 900701506A KR 920007556 B1 KR920007556 B1 KR 920007556B1
Authority
KR
South Korea
Prior art keywords
alkyl
compound
group
hydrogen
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019900701506A
Other languages
English (en)
Korean (ko)
Other versions
KR900701757A (ko
Inventor
고빈단 체루더
Original Assignee
피피지 인더스트리즈, 인코포레이티드
헬렌 에이. 파블릭크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 피피지 인더스트리즈, 인코포레이티드, 헬렌 에이. 파블릭크 filed Critical 피피지 인더스트리즈, 인코포레이티드
Priority to KR1019920701740A priority Critical patent/KR920007618B1/ko
Publication of KR900701757A publication Critical patent/KR900701757A/ko
Application granted granted Critical
Publication of KR920007556B1 publication Critical patent/KR920007556B1/ko
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/16—Anti-static materials
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D233/06—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms
    • C07D233/08—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms with alkyl radicals, containing more than four carbon atoms, directly attached to ring carbon atoms
    • C07D233/10—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms with alkyl radicals, containing more than four carbon atoms, directly attached to ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D233/06—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms
    • C07D233/08—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms with alkyl radicals, containing more than four carbon atoms, directly attached to ring carbon atoms
    • C07D233/12—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms with alkyl radicals, containing more than four carbon atoms, directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D233/14—Radicals substituted by oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D233/20—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C07D233/22—Radicals substituted by oxygen atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1019900701506A 1988-11-14 1989-10-27 2-알킬 이미다졸린의 톨루엔 설포네이트염 Expired KR920007556B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019920701740A KR920007618B1 (ko) 1988-11-14 1989-10-27 2-알킬 이미다졸린의 톨루엔 설포네이트염

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US270,709 1988-11-14
US07/270,709 US5011937A (en) 1988-11-14 1988-11-14 Toluene sulfonate salts of 2-alkyl imidazolines
PCT/US1989/004836 WO1990005724A1 (en) 1988-11-14 1989-10-27 Toluene sulfonate salts of 2-alkyl imidazolines

Publications (2)

Publication Number Publication Date
KR900701757A KR900701757A (ko) 1990-12-04
KR920007556B1 true KR920007556B1 (ko) 1992-09-07

Family

ID=23032462

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900701506A Expired KR920007556B1 (ko) 1988-11-14 1989-10-27 2-알킬 이미다졸린의 톨루엔 설포네이트염

Country Status (7)

Country Link
US (1) US5011937A (cg-RX-API-DMAC7.html)
EP (1) EP0442965A1 (cg-RX-API-DMAC7.html)
JP (1) JPH03504386A (cg-RX-API-DMAC7.html)
KR (1) KR920007556B1 (cg-RX-API-DMAC7.html)
CA (1) CA2002778A1 (cg-RX-API-DMAC7.html)
TW (1) TW198049B (cg-RX-API-DMAC7.html)
WO (1) WO1990005724A1 (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190002236A (ko) 2017-06-29 2019-01-08 한연희 보리를 주원료로 하는 생선 숙성용 양념장

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2681517B2 (ja) * 1989-08-01 1997-11-26 三洋化成工業株式会社 帯電防止剤および樹脂組成物
US5534053A (en) * 1993-01-12 1996-07-09 Rodel, Inc. Composition for reducing or eliminating static charge in adhesive film
US6121457A (en) 1997-11-14 2000-09-19 Megabios Corporation Compositions and methods using novel substituted imidazolium lipids
IL131299A0 (en) * 1998-08-19 2001-01-28 Mitsui Chemicals Inc Tetraalkylfluoroformamidinium trifluoroacetate and preparatin process of same
US6521683B1 (en) 1999-04-26 2003-02-18 Witco Corporation Antistatic agents and resin compositions incorporated therein
CL2007001829A1 (es) * 2006-06-23 2008-01-25 Smithkline Beecham Corp P-toluensulfonato de n-[4-cloro-2-hidroxi-3-(piperazina-1-sulfonil)fenil]-n-(2-cloro-3-fluorofenil)urea;procedimiento de preparacion;composicion farmaceutica;combinacion farmaceutica;y uso en el tratamiento de una enfermedad mediada por la quiimioquina il-8, tales como asma y epoc.
DE102007063149A1 (de) 2007-12-29 2009-07-02 Evonik Goldschmidt Gmbh Neuartige Imidazolinium-Salze mit niedrigem Schmelzpunkt, Verfahren zu deren Herstellung und deren Verwendung als Schmiermittel
JP5457596B1 (ja) * 2013-07-19 2014-04-02 日本乳化剤株式会社 Ａｂｓ樹脂組成物用帯電防止剤およびａｂｓ樹脂組成物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB933465A (en) * 1960-03-01 1963-08-08 Grace W R & Co New hydrazinium salts their production, and compositions containing them
US3916058A (en) * 1973-06-25 1975-10-28 Nalco Chemical Co Method of treating paper and textiles with organically modified sio' 2 'aquasols
JPS5235399B2 (cg-RX-API-DMAC7.html) * 1973-07-31 1977-09-08
US3933779A (en) * 1974-02-21 1976-01-20 Fine Organics Inc. Antistatic polymer blend
US4259373A (en) * 1976-07-12 1981-03-31 The Procter & Gamble Company Fabric treating articles and process
US4118525A (en) * 1977-03-25 1978-10-03 The Procter & Gamble Company Article and method for fabric softening and static control
US4681948A (en) * 1986-03-31 1987-07-21 Ppg Industries, Inc. N,N'dihalo-2-imidazolidinones

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190002236A (ko) 2017-06-29 2019-01-08 한연희 보리를 주원료로 하는 생선 숙성용 양념장

Also Published As

Publication number Publication date
EP0442965A1 (en) 1991-08-28
CA2002778A1 (en) 1990-05-14
US5011937A (en) 1991-04-30
TW198049B (cg-RX-API-DMAC7.html) 1993-01-11
KR900701757A (ko) 1990-12-04
JPH03504386A (ja) 1991-09-26
WO1990005724A1 (en) 1990-05-31

Similar Documents

Publication Publication Date Title
US6372829B1 (en) Antistatic composition
EP1242670B1 (en) Water- and oil-repellent, antistatic composition
US5187214A (en) Quaternary ammonium antistatic polymer compositions
US4904825A (en) Quaternary ammonium antistatic compounds
US7678941B2 (en) Polyoxyalkylene ammonium salts and their use as antistatic agents
US4476323A (en) Surface-active quaternary ammonium compounds for treatment of textiles and cellulosic materials
US6924329B2 (en) Water- and oil-repellent, antistatic compositions
US20030099802A1 (en) Antistatic compositions
US5534192A (en) Composition and method for treating substrates to reduce electrostatic charge and resultant article
SE428223B (sv) Forfarande for paforing av ett textilmjukningsmedel pa textilier
US5508099A (en) Composition and method for treating substrates to reduce electrostatic charge and resultant article
US3646153A (en) Synthetic fibers having improved soil and stain repellency
US4104175A (en) Aqueous solutions of quaternary ammonium compounds
US5011937A (en) Toluene sulfonate salts of 2-alkyl imidazolines
US3932495A (en) Process for preparing quaternary ammonium compounds
US5053531A (en) Quaternary ammonium antistatic compounds
KR920007618B1 (ko) 2-알킬 이미다졸린의 톨루엔 설포네이트염
US4973616A (en) Toluene sulfonate salts of 2-alkyl imidazolines
US6521683B1 (en) Antistatic agents and resin compositions incorporated therein
US2282702A (en) Dimethylene quaternary ammonium salts
US4164535A (en) Antistatic textile materials
US3767625A (en) Synthetic fibers having improved soil and stain repellency
US3852254A (en) Acrylonitrile-(co)-polymers with reduced surface resistance
SU1747462A1 (ru) Антистатический состав

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

G160 Decision to publish patent application
PG1605 Publication of application before grant of patent

St.27 status event code: A-2-2-Q10-Q13-nap-PG1605

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

FPAY Annual fee payment

Payment date: 19950904

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 19960908

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 19960908

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000