KR910021014U - Stepper mask structure - Google Patents

Stepper mask structure

Info

Publication number
KR910021014U
KR910021014U KR2019900006156U KR900006156U KR910021014U KR 910021014 U KR910021014 U KR 910021014U KR 2019900006156 U KR2019900006156 U KR 2019900006156U KR 900006156 U KR900006156 U KR 900006156U KR 910021014 U KR910021014 U KR 910021014U
Authority
KR
South Korea
Prior art keywords
mask structure
stepper mask
stepper
mask
Prior art date
Application number
KR2019900006156U
Other languages
Korean (ko)
Other versions
KR960009034Y1 (en
Inventor
전종빈
김흥식
신봉조
Original Assignee
엘지반도체 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체 주식회사 filed Critical 엘지반도체 주식회사
Priority to KR2019900006156U priority Critical patent/KR960009034Y1/en
Publication of KR910021014U publication Critical patent/KR910021014U/en
Application granted granted Critical
Publication of KR960009034Y1 publication Critical patent/KR960009034Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
KR2019900006156U 1990-05-10 1990-05-10 Mask structure for stepper KR960009034Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019900006156U KR960009034Y1 (en) 1990-05-10 1990-05-10 Mask structure for stepper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019900006156U KR960009034Y1 (en) 1990-05-10 1990-05-10 Mask structure for stepper

Publications (2)

Publication Number Publication Date
KR910021014U true KR910021014U (en) 1991-12-20
KR960009034Y1 KR960009034Y1 (en) 1996-10-14

Family

ID=19298591

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019900006156U KR960009034Y1 (en) 1990-05-10 1990-05-10 Mask structure for stepper

Country Status (1)

Country Link
KR (1) KR960009034Y1 (en)

Also Published As

Publication number Publication date
KR960009034Y1 (en) 1996-10-14

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