KR910021013U - Residual photoresist removal device for semiconductor wafers - Google Patents

Residual photoresist removal device for semiconductor wafers

Info

Publication number
KR910021013U
KR910021013U KR2019900006143U KR900006143U KR910021013U KR 910021013 U KR910021013 U KR 910021013U KR 2019900006143 U KR2019900006143 U KR 2019900006143U KR 900006143 U KR900006143 U KR 900006143U KR 910021013 U KR910021013 U KR 910021013U
Authority
KR
South Korea
Prior art keywords
removal device
semiconductor wafers
photoresist removal
residual photoresist
residual
Prior art date
Application number
KR2019900006143U
Other languages
Korean (ko)
Other versions
KR960008660Y1 (en
Inventor
곽병호
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019900006143U priority Critical patent/KR960008660Y1/en
Publication of KR910021013U publication Critical patent/KR910021013U/en
Application granted granted Critical
Publication of KR960008660Y1 publication Critical patent/KR960008660Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019900006143U 1990-05-10 1990-05-10 Removing apparatus of remaining photoresist for semiconductor wafer KR960008660Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019900006143U KR960008660Y1 (en) 1990-05-10 1990-05-10 Removing apparatus of remaining photoresist for semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019900006143U KR960008660Y1 (en) 1990-05-10 1990-05-10 Removing apparatus of remaining photoresist for semiconductor wafer

Publications (2)

Publication Number Publication Date
KR910021013U true KR910021013U (en) 1991-12-20
KR960008660Y1 KR960008660Y1 (en) 1996-10-07

Family

ID=19298577

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019900006143U KR960008660Y1 (en) 1990-05-10 1990-05-10 Removing apparatus of remaining photoresist for semiconductor wafer

Country Status (1)

Country Link
KR (1) KR960008660Y1 (en)

Also Published As

Publication number Publication date
KR960008660Y1 (en) 1996-10-07

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Payment date: 20040920

Year of fee payment: 9

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