KR910017574A - Method of manufacturing interlayer wiring metal - Google Patents

Method of manufacturing interlayer wiring metal

Info

Publication number
KR910017574A
KR910017574A KR1019900003420A KR900003420A KR910017574A KR 910017574 A KR910017574 A KR 910017574A KR 1019900003420 A KR1019900003420 A KR 1019900003420A KR 900003420 A KR900003420 A KR 900003420A KR 910017574 A KR910017574 A KR 910017574A
Authority
KR
South Korea
Prior art keywords
wiring metal
interlayer wiring
manufacturing interlayer
manufacturing
metal
Prior art date
Application number
KR1019900003420A
Other languages
Korean (ko)
Other versions
KR920007067B1 (en
Inventor
권광호
전영진
Original Assignee
한국전기통신공사
재단법인 한국전자통신 연구소
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한국전기통신공사, 재단법인 한국전자통신 연구소 filed Critical 한국전기통신공사
Priority to KR1019900003420A priority Critical patent/KR920007067B1/en
Publication of KR910017574A publication Critical patent/KR910017574A/en
Application granted granted Critical
Publication of KR920007067B1 publication Critical patent/KR920007067B1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
KR1019900003420A 1990-03-14 1990-03-14 Manufacturing method of semiconductor device KR920007067B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019900003420A KR920007067B1 (en) 1990-03-14 1990-03-14 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900003420A KR920007067B1 (en) 1990-03-14 1990-03-14 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
KR910017574A true KR910017574A (en) 1991-11-05
KR920007067B1 KR920007067B1 (en) 1992-08-24

Family

ID=19296975

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900003420A KR920007067B1 (en) 1990-03-14 1990-03-14 Manufacturing method of semiconductor device

Country Status (1)

Country Link
KR (1) KR920007067B1 (en)

Also Published As

Publication number Publication date
KR920007067B1 (en) 1992-08-24

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Legal Events

Date Code Title Description
A201 Request for examination
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 19980616

Year of fee payment: 7

LAPS Lapse due to unpaid annual fee