KR910013477A - 불산처리 장치 및 그 처리방법 - Google Patents
불산처리 장치 및 그 처리방법 Download PDFInfo
- Publication number
- KR910013477A KR910013477A KR1019890020718A KR890020718A KR910013477A KR 910013477 A KR910013477 A KR 910013477A KR 1019890020718 A KR1019890020718 A KR 1019890020718A KR 890020718 A KR890020718 A KR 890020718A KR 910013477 A KR910013477 A KR 910013477A
- Authority
- KR
- South Korea
- Prior art keywords
- hydrofluoric acid
- ultrapure water
- tank
- supplying
- acid solution
- Prior art date
Links
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 title claims description 28
- 238000010306 acid treatment Methods 0.000 title claims description 6
- 238000000034 method Methods 0.000 title claims description 5
- 239000000243 solution Substances 0.000 claims 6
- 229910021642 ultra pure water Inorganic materials 0.000 claims 6
- 239000012498 ultrapure water Substances 0.000 claims 6
- 239000011259 mixed solution Substances 0.000 claims 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims 2
- 238000004140 cleaning Methods 0.000 claims 1
- 238000001914 filtration Methods 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
내용 없음.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 의한 불산처리 장치를 도시한 모식도,
제2A도 내지 제2I도는 본 발명에 의한 불산처리 방법을 도시한 공정 순서도.
Claims (3)
- 불산용액이 공급되는 평량조, 상기 평량조의 불산용액을 계속적으로 필터링하면서 순환시켜 깨끗한 상태의 불산용액을 유지시키는 혼합조, 상기 혼합조로부터 불산용액을 공급받아 세정하는 진행조를 구비하는 것을 특징으로 하는 불산처리장치.
- 중앙공급라인을 통하여 평량조에 불산용액을 공급하는 제1단계, 제1초순수 공급라인을 통하여 공급되는 초순수 및 상기 평량조의 불산용액을 혼합조에서 혼합하고, 이 불산혼합용액을 계속적으로 필터링하는 제2단계; 상기 혼합조의 온도가 일정하게 유지되면, 상기 불산혼합용액을 진행조로 공급하여 세정하는 제3단계, 제2초순수 공급라인을 통하여 상기 진행조에 초순수를 공급함으로써 불산혼합용액을 업 플로우시키는 제4단계 ; 상기 제4단계후 불산처리공정을 반복하기 위한 준비 상태가 되면 초순수 배수라인을 통하여 초순수를 배수하고, 상기 제1단계∼제4단계를 반복하는 제5단계로 이루어짐을 특징으로 하는 불산처리방법.
- 제2항에 있어서, 상기 제3단계의 온도는 25℃로 하는 것을 특징으로 하는 불산처리방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019890020718A KR920007189B1 (ko) | 1989-12-30 | 1989-12-30 | 불산처리 장치 및 그 처리방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019890020718A KR920007189B1 (ko) | 1989-12-30 | 1989-12-30 | 불산처리 장치 및 그 처리방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR910013477A true KR910013477A (ko) | 1991-08-08 |
| KR920007189B1 KR920007189B1 (ko) | 1992-08-27 |
Family
ID=19294772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019890020718A KR920007189B1 (ko) | 1989-12-30 | 1989-12-30 | 불산처리 장치 및 그 처리방법 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR920007189B1 (ko) |
-
1989
- 1989-12-30 KR KR1019890020718A patent/KR920007189B1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR920007189B1 (ko) | 1992-08-27 |
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|---|---|---|---|
| A201 | Request for examination | ||
| G160 | Decision to publish patent application | ||
| E701 | Decision to grant or registration of patent right | ||
| GRNT | Written decision to grant | ||
| FPAY | Annual fee payment |
Payment date: 20010706 Year of fee payment: 10 |
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| LAPS | Lapse due to unpaid annual fee |