KR910008795A - 가열처리장치 - Google Patents

가열처리장치 Download PDF

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Publication number
KR910008795A
KR910008795A KR1019890014445A KR890014445A KR910008795A KR 910008795 A KR910008795 A KR 910008795A KR 1019890014445 A KR1019890014445 A KR 1019890014445A KR 890014445 A KR890014445 A KR 890014445A KR 910008795 A KR910008795 A KR 910008795A
Authority
KR
South Korea
Prior art keywords
thermostat
hot air
heat treatment
substrate
treatment device
Prior art date
Application number
KR1019890014445A
Other languages
English (en)
Other versions
KR930002593B1 (ko
Inventor
하르히로 후지타
미쯔로오 코바야시
마따가쯔 모리타니
Original Assignee
후지타 마사유끼
카부시키가이샤 후지타세이사쿠쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지타 마사유끼, 카부시키가이샤 후지타세이사쿠쇼 filed Critical 후지타 마사유끼
Priority to KR1019890014445A priority Critical patent/KR930002593B1/ko
Publication of KR910008795A publication Critical patent/KR910008795A/ko
Application granted granted Critical
Publication of KR930002593B1 publication Critical patent/KR930002593B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Furnace Details (AREA)

Abstract

내용 없음.

Description

가열처리장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 본발명의 일실시예를 도시한 측면도
제3도는 제2도에 도시한 가열처리장치의 상면을 표시한 상면도
제4도는 온도조정수단을 도시한 블록도

Claims (1)

  1. IC를 장착한 기판을 고온조내에 넣어서 가열상태에서 가열처리를 할수 있는 가열처리장치에 있어서, 상기 항온조를, 정면으로부터 상기 기판을 삽입할 수 있는 전부항온조와 배후로부터 기판을 삽입할 수 있는 후부항온조로 분할함과 동시에, 상기 전부항온조와 상기 후부항온조에 의해서 열풍이 순환하는 열풍순환통로를 형성하고, 전부항온조와 후부항온조에 가열수단 및 열풍을 순환시키는 열풍순환수단을 배설하고, 전부항온조내 및 후부항온조내에 열풍을 균일하게 흐르게 하는 풍향조정수단을 배설하고, 전부항온조내 및 후부항온조내의 온도를 일정하게 유지하는 온도조정수단을 배설해서 이루어진 것을 특징으로 하는 가열처리장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890014445A 1989-10-07 1989-10-07 가열처리장치 KR930002593B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019890014445A KR930002593B1 (ko) 1989-10-07 1989-10-07 가열처리장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019890014445A KR930002593B1 (ko) 1989-10-07 1989-10-07 가열처리장치

Publications (2)

Publication Number Publication Date
KR910008795A true KR910008795A (ko) 1991-05-31
KR930002593B1 KR930002593B1 (ko) 1993-04-03

Family

ID=19290526

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890014445A KR930002593B1 (ko) 1989-10-07 1989-10-07 가열처리장치

Country Status (1)

Country Link
KR (1) KR930002593B1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100679850B1 (ko) * 2005-07-13 2007-02-07 오성엘에스티(주) 기판 내열성 검사장치

Also Published As

Publication number Publication date
KR930002593B1 (ko) 1993-04-03

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