KR910004634A - Purification Recovery of Sepharoserin C Using Polyphase Resin Column - Google Patents

Abstract

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Description

Purification Recovery of Sepharoserin C Using Polyphase Resin Column

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Figure 1 shows the results of high pressure liquid chromatography analysis of the fermentation filtrate, WA-30 tower pass, HP-20 pass and XAD-2000 adsorption, eluent, SK-1B pass through

2 is an elution graph of Sepharoserin C from anion exchange resin, diion HP-20 decolorizing resin, XAD-2000 adsorption resin and cation exchange resin.

Claims (20)

The fermentation filtrate in the fermentation broth containing cephalosporin C is purified using weakly basic anion exchange resins, nonionic macroporous adsorptive resins I, II and strongly acidic cation exchange resins, and concentrated with a reverse osmosis membrane and thin film concentrator (centrisome). Separation method of Separosporin C, characterized in that the spray drying. The method of claim 1, wherein in the case of weakly basic anion exchange resins, an acrylic gel-type WA-10 or a styrene-based porous WA-30 and a diion HP-20 resin are used. The method according to claim 1, wherein XAD-2000 resin is used as the nonionic macroporous adsorptive resin. The method according to claim 1, wherein SP-850 resin is used as the nonionic macroporous adsorptive resin II. The method of claim 1, wherein the cation is substituted with cation using a ionic resin, diion SK-1B resin, as a strongly acidic cation exchange resin to purify cephalosporin C in the form of sodium salt. The method according to claim 1, wherein the reverse osmosis membrane is made of polyamide, cellulose acetate, and polystyrene, and the cellulosporin C concentration is concentrated to 40-80 g / L. The method of claim 1 wherein the thin film concentrator is concentrated to 100-300 g / l. The method according to claim 1, wherein the nozzle spray temperature is controlled to be 150 deg. C-200 deg. C during spray drying. The method of claim 1, wherein the pH of the fermentation filtrate is adjusted to 2.5-7.0 using an inorganic acid. The method of claim 1, wherein the resin column is used alone or in series. The method of claim 1, wherein the WA-based and HP-based resins used for removing impurities and decolorizing are washed with water having a pH of 2.5-7.0. 12. The method of claim 11, wherein the conductivity is analyzed to complete water washing at 5.0 ms / cm or less. The method of claim 1 or 12, wherein the flow rate is 0.5-2.0SV. 5. Process according to claim 3 or 4, characterized in that eluting with lower alkoxy, in particular isopropyl alcohol, in eluting Sepharo-Sporin C adsorbed on XAD-2000 resin and SP-850 resin. 15. The method of claim 14, wherein the flow rate is 0.2-2.0 SV and the alcohol concentration is 3-20%. The method of claim 5, wherein the conductivity is analyzed to connect the SK-1B resin at the time point of cephalosporin C eluting. 7. The method of claim 6, wherein the pH is adjusted to 3-7 using sodium hydroxide, sodium bicarbonate prior to concentration on the reverse osmosis membrane. 18. The method of claim 6 and 17, wherein the temperature is adjusted to 10-20 [deg.] C. pressure to 15-40 kg / cm < 2 >. The method of claim 1, wherein the pH is adjusted to 1-3 using an inorganic acid to recover the remaining separosporin C during the filtration process. 20. The method according to claim 19, wherein hydrochloric acid, sulfuric acid, hydroxyl acid, or the like is used as the inorganic acid. ※ Note: The disclosure is based on the initial application.