KR910003346A - Vacuum Heater - Google Patents

Vacuum Heater Download PDF

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Publication number
KR910003346A
KR910003346A KR1019900011498A KR900011498A KR910003346A KR 910003346 A KR910003346 A KR 910003346A KR 1019900011498 A KR1019900011498 A KR 1019900011498A KR 900011498 A KR900011498 A KR 900011498A KR 910003346 A KR910003346 A KR 910003346A
Authority
KR
South Korea
Prior art keywords
vacuum
heating plates
vacuum chamber
conduit
state
Prior art date
Application number
KR1019900011498A
Other languages
Korean (ko)
Other versions
KR930010481B1 (en
Inventor
유이찌로오 야마다
요시나리 마쯔시다
히데도시 가와
Original Assignee
다니이 아끼오
마쯔시다덴기 산교 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다니이 아끼오, 마쯔시다덴기 산교 가부시기가이샤 filed Critical 다니이 아끼오
Publication of KR910003346A publication Critical patent/KR910003346A/en
Application granted granted Critical
Publication of KR930010481B1 publication Critical patent/KR930010481B1/en

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Classifications

    • H01L21/205—
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D13/00—Apparatus for preheating charges; Arrangements for preheating charges

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

내용 없음.No content.

Description

진공가열 처리장치Vacuum Heater

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도 및 제2도는 본 발명을 CVD 장치의 로우드록실에 적용한 일실시예를 표시하며, 제1도는 종단면도,1 and 2 show an embodiment in which the present invention is applied to a lock lock chamber of a CVD apparatus, and FIG. 1 is a longitudinal sectional view,

제2도는 요부의 사시도.2 is a perspective view of the main portion.

Claims (2)

소정의 진공상태로 배기가능한 진공실과, 이 진공실내에 상하방향으로 서로 간격을 형성해서 배설된 복수단의 가열플레이트와, 이들 가열 플레이트의 승강 구동수단을 구비한 것을 특징으로 하는 진공가열처리장치.And a vacuum chamber capable of evacuating a predetermined vacuum state, a plurality of stage heating plates disposed so as to be spaced apart from each other in the vacuum chamber in a vertical direction, and lifting and lowering driving means for the heating plates. 제1항에 있어서, 상기 각 가열플레이트에 내장된 시이즈히이터의 외관에 대해서 진공시일상태로 접속되는 동시에 진공실 밖으로 도출된 도관과, 도관내의 삽통된 시이즈히이터에의 전력공급선을 구비한 것을 특징으로 하는 진공가열처리장치.A conduit drawn out of the vacuum chamber while being connected to a vacuum seal state with respect to the appearance of the sheath heaters embedded in the heating plates, and a power supply line to the inserted sheath heater in the conduit. Vacuum heating processing apparatus. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019900011498A 1989-07-28 1990-07-27 Vacuum heating processor KR930010481B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP197748 1985-03-19
JP1197748A JPH0362515A (en) 1989-07-28 1989-07-28 Vacuum heating processor
JP1-197748 1989-07-28

Publications (2)

Publication Number Publication Date
KR910003346A true KR910003346A (en) 1991-02-27
KR930010481B1 KR930010481B1 (en) 1993-10-25

Family

ID=16379688

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900011498A KR930010481B1 (en) 1989-07-28 1990-07-27 Vacuum heating processor

Country Status (2)

Country Link
JP (1) JPH0362515A (en)
KR (1) KR930010481B1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2917642B2 (en) * 1992-01-24 1999-07-12 三菱電機株式会社 Laser output control device
KR100572304B1 (en) * 1998-09-22 2006-08-30 삼성전자주식회사 Deposition equipment for semiconductor device manufacturing
US20040040504A1 (en) 2002-08-01 2004-03-04 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
JP4515060B2 (en) * 2002-08-30 2010-07-28 株式会社半導体エネルギー研究所 Manufacturing apparatus and method for producing layer containing organic compound
ATE398193T1 (en) * 2002-10-24 2008-07-15 Goodrich Corp METHOD AND DEVICE FOR PITCHWISE AND CONTINUOUS COMPACTION BY CHEMICAL VAPOR PHASE INFITRATION (CVI)

Also Published As

Publication number Publication date
JPH0362515A (en) 1991-03-18
KR930010481B1 (en) 1993-10-25

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