KR840002464A - Continuous plating method and device using anode box - Google Patents

Continuous plating method and device using anode box Download PDF

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Publication number
KR840002464A
KR840002464A KR1019820005194A KR820005194A KR840002464A KR 840002464 A KR840002464 A KR 840002464A KR 1019820005194 A KR1019820005194 A KR 1019820005194A KR 820005194 A KR820005194 A KR 820005194A KR 840002464 A KR840002464 A KR 840002464A
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KR
South Korea
Prior art keywords
anode
continuous plating
box
metal wire
plated metal
Prior art date
Application number
KR1019820005194A
Other languages
Korean (ko)
Inventor
김금식
Original Assignee
김금식
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김금식 filed Critical 김금식
Priority to KR1019820005194A priority Critical patent/KR840002464A/en
Publication of KR840002464A publication Critical patent/KR840002464A/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02Tanks; Installations therefor

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

내용 없음.No content.

Description

양극 상자를 이용한 연속 도금방법 및 장치Continuous plating method and device using anode box

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명 도금장치의 횡단면도.1 is a cross-sectional view of the plating apparatus of the present invention.

제2도는 본 발명 양극 상자의 일실시예 확대 사시도.Figure 2 is an enlarged perspective view of one embodiment of the present invention anode box.

제3도는 본 발명 양극 상자의 다른 실시예 단면도.3 is a cross-sectional view of another embodiment of the present invention positive electrode box.

Claims (4)

동심상으로 배설된 내, 외측 양극 사이에서 나선형 코일의 피도금 금속선(3)을 회전롤러(2)(2)에 걸어 회동시켜 고속연속도금하는 방법에 있어서 상부가 개방(7)되고 피도금금속선(3)에 향한 면에 일정 크기와 간격으로 다수의 구멍(8)이 천설된 양극상자(4)(5)의 내면에 포대(9)를 주설하고 도체(6′)를 넣은 후구리조각(10)을 충진하여서 된 양극을 사용함을 특징으로 한 양극상자를 이용한 연속도금 방법.In the method of high speed continuous plating by rotating the plated metal wire 3 of the spiral coil on the rotating roller 2, 2 between concentrically disposed inner and outer anodes, the upper part is opened 7 and the plated metal wire (3) After installing a bag (9) in the inner surface of the anode box (4) (5) in which a plurality of holes (8) are laid in a predetermined size and spacing on the surface facing the (3) and then put a conductor (6 ') 10) A continuous plating method using a positive electrode box, characterized in that the use of the anode by filling. 동심상으로 배설된 내, 외측 양극 사이에서 나선형 코일의 피도금 금속선(3)을 회전롤러(2)(2)에 걸어 회동시켜 고속연속도금하는 방법에 있어서 상부가 개방(7)되고 피도금금속선(3)에 향한 면에 일정 크기와 간격으로 다수의 구멍(8)이 천설된 양극상자(4)(5)의 내면에 포대(9)를 주설하고 도체(6′)를 넣은 후 구리조각(10)을 충진하여서 된 양극을 사용함을 특징으로 한 양극상자를 이용한 연속도금 장치.In the method of high speed continuous plating by rotating the plated metal wire 3 of the spiral coil on the rotating roller 2, 2 between concentrically disposed inner and outer anodes, the upper part is opened 7 and the plated metal wire On the surface facing (3), a bag (9) is placed on the inner surface of the anode boxes (4) and (5) in which a plurality of holes (8) are installed at predetermined sizes and intervals. 10) A continuous plating apparatus using a positive electrode box, characterized in that the use of the anode by filling. 상기 내, 외측 양극상자(4)(5)는 도금조의 크기 및 모양에 따라 적당한 크기로 반원상으로 프라스틱으로 형됨성을 특징으로 한 제2항기재의 양극상자를 이용한 연속 도금장치.The inner and outer anode boxes (4) (5) is a continuous plating apparatus using the anode box of claim 2, characterized in that the plastic shape in a semi-circular shape with a suitable size according to the size and shape of the plating bath. 상기 외측 양극상자(5)는 도금조(1)의 양측면에 형성된 격벽(11)으로 됨을 특징으로 한 양극상자를 이용한 연속 도금장치.The outer anode box (5) is a continuous plating apparatus using a cathode box, characterized in that the partition wall (11) formed on both sides of the plating bath (1). ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019820005194A 1982-11-17 1982-11-17 Continuous plating method and device using anode box KR840002464A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019820005194A KR840002464A (en) 1982-11-17 1982-11-17 Continuous plating method and device using anode box

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019820005194A KR840002464A (en) 1982-11-17 1982-11-17 Continuous plating method and device using anode box

Publications (1)

Publication Number Publication Date
KR840002464A true KR840002464A (en) 1984-07-02

Family

ID=57217288

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019820005194A KR840002464A (en) 1982-11-17 1982-11-17 Continuous plating method and device using anode box

Country Status (1)

Country Link
KR (1) KR840002464A (en)

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