KR840000577A - Preparation of phosphonium salt herbicide of N-phosphonomethylglycine and composition thereof - Google Patents

Preparation of phosphonium salt herbicide of N-phosphonomethylglycine and composition thereof Download PDF

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KR840000577A
KR840000577A KR1019820003179A KR820003179A KR840000577A KR 840000577 A KR840000577 A KR 840000577A KR 1019820003179 A KR1019820003179 A KR 1019820003179A KR 820003179 A KR820003179 A KR 820003179A KR 840000577 A KR840000577 A KR 840000577A
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phenyl
benzyl
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substituted
independently selected
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블랙모어 라아지 외 1 죠오지
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호바트 오그덴 토마스
스타우퍼케이캄칼파니
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    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
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N-포스포노메틸글리신의 포스포늄염 제초제의 제법 및 그 조성물Preparation of phosphonium salt herbicide of N-phosphonomethylglycine and composition thereof

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (48)

실질적으로 포스포늄 양이온 및 글리실메틸포스포네이트 음이온으로 구성되는 N-포스포노메틸글리신의 포스포늄 염의 제법Preparation of phosphonium salts of N-phosphonomethylglycine substantially composed of phosphonium cations and glycylmethylphosphonate anions 실질적으로 치환 포스포늄 양이온 및 글리실메틸 포스포네이트 음이온으로 구성되는 화합물의 제초 유효량과 부동희석 담체로 이루어지는 N-포스포노메틸글리신의 포스포늄 염 제초제 조성물.A phosphonium salt herbicide composition of N-phosphonomethylglycine consisting of a herbicidally effective amount of a compound consisting essentially of a substituted phosphonium cation and a glycylmethyl phosphonate anion and a passive dilution carrier. 실질적으로 치환포스포늄 양이온 및 글리실메틸 포스포네이트 음이온으로 구성된 화합물의 제초 유효량과 부동 희석담체로 이루어지는 제초제 조성물을 발아 후 상태에서 식물체에 적용함으로써 이루어지는 바람직하지 못한 식물체의 억제방법.A method of inhibiting undesirable plants, which is achieved by applying a herbicidally effective amount of a compound consisting essentially of a substituted phosphonium cation and a glycylmethyl phosphonate anion and a herbicide composition consisting of an immobilized diluent carrier to the plant in the post-germination state. 실질적으로 치환 포스포늄 양이온 및 글리실메틸 포스포네이트 음이온 및 부동 희석담체로 구성되는 화합물의 조절, 비치사량을 식물체에 적용함으로써 이루어지는 식물의 자연생장 또는 발달의 조절방법.A method for regulating the natural growth or development of a plant by substantially controlling a compound consisting of a substituted phosphonium cation and a glycylmethyl phosphonate anion and a floating diluent carrier, by applying a non-fatal amount to the plant. 하기 구조식을 가진 N-포스포노메틸글리신의 포스포늄 염 제초제 화합물의 제법.The preparation method of the phosphonium salt herbicide compound of N-phosphonomethylglycine which has the following structural formula. 식중, R1, R2, R3및 R4는 C1-C10알킬, 벤질, 페닐, 치환페닐 및 치환벤질로 구성되는 그루우프에서 독자적으로 선택되며, 만약 R1, R2, R3및 R4중의 최소한 1개가 벤질, 치환벤질 또는 치환페닐일시에는, 치환분은 할로겐, 저급알콕시 및 전급알킬로부터 독자적으로 선택된다.Wherein R 1 , R 2 , R 3 and R 4 are independently selected from groupings consisting of C 1 -C 10 alkyl, benzyl, phenyl, substituted phenyl and substituted benzyl, if R 1 , R 2 , R 3 And when at least one of R 4 is benzyl, substituted benzyl or substituted phenyl, the substituent is independently selected from halogen, lower alkoxy and alloalkyl. R1, R2및 R3이 C1-C6알킬 및 페닐로 구성되는 그루우프에서 독자적으로 선택되며, R4가 벤질, 치환벤질 또는 치환페닐인 특허청구의 범위 5기재의 N-포스포노메틸글리신의 포스포늄 염 제초제 화합물의 제법.N-phosphono of claim 5, wherein R 1 , R 2 and R 3 are independently selected from the groupings consisting of C 1 -C 6 alkyl and phenyl, and R 4 is benzyl, substituted benzyl or substituted phenyl Preparation of the phosphonium salt herbicide compound of methylglycine. R1, R2및 R3이 각기 n-부틸이며, R4가 2,4-디클로로벤질인 특허청구의 범위 5기재의 N-포스포노메틸글리신의 포스포늄염 제초제 화합물의 제법.The manufacturing method of the phosphonium salt herbicide compound of N-phosphonomethylglycine of Claim 5 in which R <1> , R <2> and R <3> are respectively n-butyl and R <4> is 2, 4- dichlorobenzyl. R1, R2및 R3이 각기 페닐이며, R4가 벤질인 특허청구의 범위 5기재의 N-포스포노메틸글리신의 포스포늄염의 제초제 화합물의 제법.The manufacturing method of the herbicide compound of the phosphonium salt of N-phosphonomethylglycine of Claim 5 whose R <1> , R <2> and R <3> is phenyl and R <4> is benzyl. R1이 에틸이며, R2, R3및 R4가 각기 페닐인 특허청구의 범위 5기재의 N-포스포노메틸글리신의 포스포노 염의 제초제 화합물의 제법.The manufacturing method of the herbicide compound of the phosphono salt of N-phosphonomethylglycine of Claim 5 whose R <1> is ethyl and R <2> , R <3> and R <4> are each phenyl. R1, R2및 R3이 각기 P-톨일이며, R4가 메틸인 특허청구의 범위 5기재의 N-포스포노메틸글리신의 포스포노 염의 제초제 화합물의 제법.The manufacturing method of the herbicide compound of the phosphono salt of N-phosphonomethylglycine of Claim 5 of which R <1> , R <2> and R <3> are each P-tolyl and R <4> is methyl. R1, R2및 R3이 각기 4-메톡시페닐이며, R4가 메틸인 특허청구의 범위 5기재의 N-포스포노메틸글리신의 포스포노 염의 제초제 화합물의 제법.The manufacturing method of the herbicide compound of the phosphono salt of N-phosphonomethylglycine of Claim 5 whose R <1> , R <2> and R <3> is respectively 4-methoxyphenyl and R <4> is methyl. R1, R2및 R3이 각기 4-클로로페닐이며, R4가 메틸인 특허청구의 범위 5기재의 N-포스포노메틸글리신의 포스포노 염의 제초제화합물의 제법.The manufacturing method of the herbicide compound of the phosphono salt of N-phosphonomethylglycine of Claim 5 whose R <1> , R <2> and R <3> is respectively 4-chlorophenyl and R <4> is methyl. 하기 구조식을 가진 N-포스포노메틸글리신의 포스포늄 염 제초제 화합물의 제법.The preparation method of the phosphonium salt herbicide compound of N-phosphonomethylglycine which has the following structural formula. 식중, R1, R2, R3및 R4는 C1-C10알킬 및 페닐로 구성되는 그루우프로부터 독자적으로 선택된다.Wherein R 1 , R 2 , R 3 and R 4 are independently selected from the groupings consisting of C 1 -C 10 alkyl and phenyl. R1, R2, R3및 R4는 C1-C6알킬 및 페닐로 구성되는 그루우프로부터 독자적으로 선택되는 특허청구의 범위 13기재의 N-포스포노메틸글리신의 포스포늄 염 제초제 화합물의 제법.R 1 , R 2 , R 3 and R 4 are compounds of the phosphonium salt herbicide compounds of N-phosphonomethylglycine described in claim 13 independently selected from groupings consisting of C 1 -C 6 alkyl and phenyl. quite. R1, R2, R3및 R4가 동일하며, C1-C4알킬 및 페닐로 구성되는 그루우프에서 선택되는 특허청구의 범위 13기재의 N-포스포노메틸글리신의 포스포늄 염 제초제 화합물의 제법.N-phosphonomethylglycine phosphonium salt herbicide compounds according to claim 13, wherein R 1 , R 2 , R 3 and R 4 are the same and are selected from groupings consisting of C 1 -C 4 alkyl and phenyl Recipe. R1, R2, R3및 R4가 각기 메틸인 특허청구의 범위 13기재의 N-포스포노메틸글리신의 포스포노염 제초제 화합물의 제법.The manufacturing method of the phosphono salt herbicide compound of N-phosphonomethylglycine of the claim 13 whose R <1> , R <2> , R <3> and R <4> is respectively methyl. R1, R2, R3및 R4가 각기 n-부틸인 특허청구의 범위 13기재의 N-포스포노메틸글리신의 포스포늄 염 제초제 화합물의 제법.The manufacturing method of the phosphonium salt herbicide compound of N-phosphonomethylglycine of Claim 13 whose R <1> , R <2> , R <3> and R <4> are n-butyl, respectively. R1, R2, R3및 R4가 각기 페닐인 특허청구의 범위 13기재의 N-포스포노메틸글리신의 포스포늄 염 제초제 화합물의 제법.The manufacturing method of the phosphonium salt herbicide compound of N-phosphonomethylglycine of Claim 13 whose R <1> , R <2> , R <3> and R <4> is phenyl, respectively. 제초유료량의 하기 구조식을 가진 화합물 및 부동 희석담체로 이루어지는 제초제 조성물.A herbicide composition comprising a compound having the following structural formula in the herbicidal amount and an antifreeze dilution carrier. 식중, R1, R2, R3및 R4는 C1-C10알킬, 벤질, 페닐, 치환 페닐 및 치환벤질로 구성되는 그루우프에서 독자적으로 선택되며, 만약 R1, R2, R3및 R4중의 최소한 1개가 벤질, 치환벤질 또는 치환페닐일시에는, 치환분은 할로겐, 저급알콕시 및 저급알킬로부터 독자적으로 선택된다.Wherein R 1 , R 2 , R 3 and R 4 are independently selected from groupings consisting of C 1 -C 10 alkyl, benzyl, phenyl, substituted phenyl and substituted benzyl, if R 1 , R 2 , R 3 And when at least one of R 4 is benzyl, substituted benzyl or substituted phenyl, the substituent is independently selected from halogen, lower alkoxy and lower alkyl. R1, R2, R3및 C1-C6은 알킬 및 페닐로 구성되는 그루우프에서 독자적으로 선택되며, R4는 벤질, 치환벤질 또는 치환페닐인 특허청구의 범위 19기재의 제초제 조성물R 1 , R 2 , R 3 and C 1 -C 6 are independently selected from groupings consisting of alkyl and phenyl, and R 4 is a herbicide composition according to claim 19 wherein benzyl, substituted benzyl or substituted phenyl 제초유효량의 하기 구조식을 가진 화합물 및 부동 희석담체로 이루어지는 제초제 조성물Herbicide composition comprising a compound having the following structural formula in a herbicidal effective amount and an antifreeze diluent carrier: 식중, R1, R2, R3및 R4는 C1-C10알킬 및 페닐로 구성된 그루우프에서 독자적으로 선택된다.Wherein R 1 , R 2 , R 3 and R 4 are independently selected from the groupings consisting of C 1 -C 10 alkyl and phenyl. 제초유효량의 하기 구조식을 가진 화합물 및 부동희석담체로 구성된 제초제 조성물을 발아 수 상태에서 식물체에 적용함으로써 이루어지는 바람직하지 못한 식물체 억제방법.An undesired method for inhibiting plants, comprising applying a herbicide composition comprising a compound having the following structural formula in an effective herbicidal amount and a passive diluent carrier to the plant in the germinated water state. 식중, R1, R2, R3및 R4는 C1-C10알킬, 벤질, 페닐, 치환페닐 및 치환벤질로 구성되는 그루우프에서 독자적으로 선택되며, 만약 R1, R2, R3또는 R4중의 최소한 1개가 벤질, 치환벤질 또는 치환페닐일시에는, 치환분은 할로겐, 저급알콕시 및 전급알킬로부터 독자적으로 선택된다.Wherein R 1 , R 2 , R 3 and R 4 are independently selected from groupings consisting of C 1 -C 10 alkyl, benzyl, phenyl, substituted phenyl and substituted benzyl, if R 1 , R 2 , R 3 Or when at least one of R 4 is benzyl, substituted benzyl or substituted phenyl, the substituent is independently selected from halogen, lower alkoxy and alloalkyl. R1, R2및 R3은 C1-C6알킬 및 페닐로 구성된 그루우프에서 독자적으로 선택되며, R4는 벤질, 치환벤질 또는 치환페닐인 특허청구의 범위 22기재의 식물체 억제방법.R 1 , R 2 and R 3 are independently selected from the groupings consisting of C 1 -C 6 alkyl and phenyl, and R 4 is benzyl, substituted benzyl or substituted phenyl. 제초유효량의 하기 구조식을 가진 화합물 및 부동희석담체로 구성된 제초제조성물을 발아 후 상태에서 식물체에 적용함으로써 아루어지는 바람직하지 못한 식물체의 억제방법.A method of inhibiting undesirable plants, which is achieved by applying a herbicidal composition consisting of a compound having the following structural formula in a herbicidal effective amount and a passive diluent carrier to the plant in the post-germination state. 식중, R1, R2, R3및 R4는 C1-C10알킬 및 페닐로 구성된 그루우프에서 독자적으로 선택된다.Wherein R 1 , R 2 , R 3 and R 4 are independently selected from the groupings consisting of C 1 -C 10 alkyl and phenyl. R1, R2, R3및 R4는 C1-C6알킬 및 페닐로 구성되는 그루우프에서 독자적으로 선택되는 특허청구의 범위 24기재의 식물체의 억제방법.R 1 , R 2 , R 3, and R 4 are methods for inhibiting plants according to claim 24, wherein the group is independently selected from a grouping consisting of C 1 -C 6 alkyl and phenyl. R1, R2, R3및 R4는 동일하며, C1-C6알킬 및 페닐로 구성되는 그루우프에서 선택되는 특허청구의 범위 24기재의 식물체의 억제방법.R 1 , R 2 , R 3 and R 4 are the same, and the method according to claim 24, wherein the plant is selected from the group consisting of C 1 -C 6 alkyl and phenyl. 조절, 비치사량의 하기 구조식을 가진 화합물 및 부동희석담체를 식물체에 적용함으로써 이루어지는 식물의 자연생장 및 발달의 조절방법.A method of regulating the natural growth and development of a plant made by applying a compound having the following structural formula of control and non-fatal dose and a floating diluent carrier to the plant. 식중, R1, R2, R3및 R4는 C1-C10알킬, 벤질, 페닐, 치환페닐 및 치환벤질로 구성되는 그루우프에서 독자적으로 선택되며, 만약 R1, R2, R3또는 R2중의 최소한 1개가 벤질, 치환벤질, 또는 치환페닐일시에는 치환분은 할로겐, 저급알콕시 및 저급알킬로부터 독자적으로 선택된다.Wherein R 1 , R 2 , R 3 and R 4 are independently selected from groupings consisting of C 1 -C 10 alkyl, benzyl, phenyl, substituted phenyl and substituted benzyl, if R 1 , R 2 , R 3 Or when at least one of R 2 is benzyl, substituted benzyl, or substituted phenyl, the substituent is independently selected from halogen, lower alkoxy and lower alkyl. R1, R2및 R3은 C1-C6알킬 및 페닐로 구성된 그루우프에서 독자적으로 선택되며, R4는 벤질, 치환벤질 또는 치환페닐인 특허청구의 범위 27기재의 식물의 자연생장 및 발달의 조절방달R 1 , R 2 and R 3 are independently selected from the groupings consisting of C 1 -C 6 alkyl and phenyl, R 4 is the natural growth of plants in the scope of claim 27 in which benzyl, substituted benzyl or substituted phenyl and Regulation of development 조절, 비치사량의 하기 구조식을 가진 화합물 물 부동희석담체를 식물체에 적용함으로써 이루어지는 식물의 자연생장 및 발달의 조절방법.A method for regulating the natural growth and development of a plant made by applying a compound water immobilized diluent carrier having the following structural formula of control and non-fatal dose to a plant. 식중, R1, R2, R3및 R4는 C1-C10알킬 및 페닐로 구성된 그루우프에서 독자적으로 선택된다.Wherein R 1 , R 2 , R 3 and R 4 are independently selected from the groupings consisting of C 1 -C 10 alkyl and phenyl. R1, R2, R3및 R4는 독자적으로 C1-C10알킬인 특허청구의 범위 29기재의 식물의 자연생장 및 발달의 조절방법.R 1 , R 2 , R 3 and R 4 are independently C 1 -C 10 alkyl. The method for controlling natural growth and development of plants according to claim 29. R1, R2, R3및 R4는 동일하며, 각기 C1-C4알킬인 특허청구의 범위 29기재의 식물의 자연생장 및 발달의 조절방법.R 1 , R 2 , R 3 and R 4 are the same, each of which is a C 1 -C 4 alkyl method of controlling the natural growth and development of the plant according to claim 29. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것※ Note: Disclosure based on the initial application
KR1019820003179A 1981-08-24 1982-07-16 Preparation of phosphonium salt herbicide of N-phosphonomethylglycine and composition thereof KR840000577A (en)

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US06/295,345 US4341549A (en) 1981-08-24 1981-08-24 Phosphonium salts of N-phosphonomethylglycine and their use as herbicides and plant growth regulants
US295345 1981-08-24
US37433982A 1982-05-05 1982-05-05
US374.339 1982-05-05

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