KR830003501A - Aminothiadiazolyl compound, preparation method thereof, pharmaceutical preparation containing the compound and use thereof - Google Patents

Aminothiadiazolyl compound, preparation method thereof, pharmaceutical preparation containing the compound and use thereof Download PDF

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Publication number
KR830003501A
KR830003501A KR1019800002679A KR800002679A KR830003501A KR 830003501 A KR830003501 A KR 830003501A KR 1019800002679 A KR1019800002679 A KR 1019800002679A KR 800002679 A KR800002679 A KR 800002679A KR 830003501 A KR830003501 A KR 830003501A
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South Korea
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compound
formula
group
prepare
salt
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KR1019800002679A
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Korean (ko)
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센데스 이반
뮐러 비이트
스카르타찌니 라카르도
Original Assignee
아놀드 자일러, 에른스트 알테르
시바-가이기 에이지
에른스트 알테르
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Publication of KR830003501A publication Critical patent/KR830003501A/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/36Methylene radicals, substituted by sulfur atoms

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Cephalosporin Compounds (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

Abstract

내용 없음No content

Description

아미노티아디아졸릴 화합물, 그의 제조방법, 이화합물을 함유하는 약제학적 제제 및 그의 용도Aminothiadiazolyl compound, preparation method thereof, pharmaceutical preparation containing the compound and use thereof

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

Claims (1)

7β-아미노그룹이 아실화를 허용하는 그룹에 의해 임의 치환된 구조식(Ⅱ)화합물을 구조식(Ⅲ)인 카복실산의 아실 잔기를 도입시켜주는 아실화제로 처리함으로써 구조식(Ⅱ)화합물중의 7β-아미노그룹을 아실화시키거나, 구조식(Ⅳ)화합물을 구조식 H2N-O-R1(Ⅴ)의 하이드록실아민과 반응시키거나, 구조식(Ⅵ)의 2-세펨화합물을 이성질화하거나, Am이 1급 또는 2급 아미노 그룹을 나타내는 구조식(I)화합물을 제조하기 위해 구조식(Ⅶ)화합물을 티오시안산의 염 또는 2소티오시안산 에스테르로 처리하거나 X가 수소를 나타내는 구조식(Ⅶ)화합물을 티오시아노겐으로 처리함으로써, 또는 R1이 수소를 나타내는 구조식(I) 화합물을 제조하기 위해 구조식(Ⅷ)화합물을 니트로소화제로 처리하거나, R1이 임의 치환된 저급알킬 또는 사이클로알킬 또는 임의로 N-치환된 카바모일을 나타내는 구조식(I)화합물을 제조하기 위해 구조식(If)화합물 중의 하이드록시이미노 그룹을 잔기 R1도입제로 처리하거나, R2가 저급 알콕시를 나타내는 구조식(I)화합물을 제조하기 위해 기능그룹이 보호된 구조식(Ig) 화합물의 α-위치에 저급 알콕시 그룹을 도입시키거나, R3가 헤테로 사이클릴티오를 나타내는 구조식(I)화합물을 제조하기 위해 구조식(Ih)화합물을 메르캅탄H-R3로 처리하거나, R3가 아실옥시를 나타내는 구조식(I)화합물을 제조하기 위해 구조식(Ii)화합물을 아실화제로 처리하거나, R4가 유리카복실을 나타내는 구조식(I)화합물을 제조하기 위해 R4가 보호된 카복실 그룹을 나타내는 구조식(Ij)화합물에서 카복실-보호 그룹을 제거하고 수소로 치환시킴으로써, R4가 에스테르화된 카복실 그룹을 나타내는 구조식(Ⅰ)화합물을 제조하기 위해 구조식(Ⅰk)화합물중 4-카복실그룹을 에스테르화 함으로써, Am이 1급, 2급 또는 3급 아미노 그룹인 구조식(Ⅰ)화합물을 제조하기 위해 구조식(ⅩⅤⅢ)화합물을 암모니아나 1급 또는 2급 아민 Am-H과 또는 그의 금속아미드와 반응시키고 필요하면 생성된 화합물에서 원치않는 보호그룹을 분해시키고 원한다면 생성된 염-생성 그룹을 갖는 화합물을 염으로 변환시키거나 생성된 염을 유리 화합물 또는 타 염으로 변환시킴을 특징으로 하여 구조식(Ⅰ)의 7β-아미노티아디아졸릴 아세트아미도-3-세펨-4-카복실산 화합물 및 염-생성 그룹을 갖는 이들 화합물의 염을 제조하는 방법.7β-amino in the compound of formula (II) by treating a compound of formula (II), wherein the 7β-amino group is optionally substituted by a group allowing acylation, with an acylating agent that introduces an acyl moiety of the carboxylic acid of formula Acylating the group, or reacting a compound of formula (IV) with a hydroxylamine of formula H 2 NOR 1 (V), or isomerizing a 2-cefem compound of formula (VI), or wherein Am is primary or 2 To prepare a compound of formula (I) representing a tertiary amino group, the compound of formula (II) is treated with a salt of thiocyanic acid or a diisothiocyanate ester or a compound of formula (X) representing hydrogen is thiocyanogen. Or by treating a compound of formula (I) with a nitrosizing agent to produce a compound of formula (I) wherein R 1 represents hydrogen, or lower alkyl or cycloalkyl optionally substituted by R 1 To prepare a compound of formula (I) representing a substituted carbamoyl, a hydroxyimino group in the compound of formula (If) with a residue R 1 introducing agent, or to prepare a compound of formula (I) wherein R 2 represents lower alkoxy. The mercaptanHR 3 compound is introduced to form a lower alkoxy group at the α-position of the protected group (Ig) or to prepare a compound of formula (I) wherein R 3 represents heterocyclylthio. to handle, or, R 3 is or process the structural formula (Ii) compound to produce the structural formula (I) compound that exhibits an acyloxy as acylating agent R 4 is manufactured by the following structural formula (I) compound that free carboxyl as R 4 Is a structural formula (Ij) wherein R 4 represents an esterified carboxyl group by removing the carboxyl-protecting group and substituting with hydrogen in the compound of formula (Ij) In order to prepare a compound of formula (I) wherein Am is a primary, secondary or tertiary amino group by esterifying a 4-carboxyl group in the compound of formula (Ik), B) reacting with the primary or secondary amine Am-H or metal amides thereof and decomposing unwanted protecting groups in the resulting compounds, if desired, and converting the compounds with the resulting salt-producing groups to salts or salts formed To prepare a salt of these compounds having the 7β-aminothiadiazolyl acetamido-3-cepem-4-carboxylic acid compound of formula (I) and a salt-producing group, Way. 상기 구조식중In the above structural formula Am은 임의 보호된 아미노그룹을 나타내고Am represents an optionally protected amino group R1은 수소, 임의 치환된 저급알킬 또는 사이클로알킬, 또는 임의 N-치환된 카바모일을 나타내며R 1 represents hydrogen, optionally substituted loweralkyl or cycloalkyl, or optionally N-substituted carbamoyl R2는 수소, 또는 저급 알콕시를 나타내고R 2 represents hydrogen or lower alkoxy R3는 수소, 아실옥시 또는 헤테로 사이클릴티오를 나타내며R 3 represents hydrogen, acyloxy or heterocyclylthio R4는 임의 보호된 카복실 그룹을 나타낸다.R 4 represents an optionally protected carboxyl group. R0 3는 헤테로사이클릴티오 잔기 R3에 의해 치환될 수 있는 잔기를 나타내고,R 0 3 represents a moiety which may be substituted by a heterocyclylthio moiety R 3 , Y는 할로겐이다.Y is halogen. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019800002679A 1979-07-05 1980-07-05 Aminothiadiazolyl compound, preparation method thereof, pharmaceutical preparation containing the compound and use thereof KR830003501A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH6294/79 1979-07-05
CH629479 1979-07-05

Publications (1)

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KR830003501A true KR830003501A (en) 1983-06-21

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JP (1) JPS5618988A (en)
KR (1) KR830003501A (en)
ZA (1) ZA804038B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2068361B (en) * 1979-12-31 1983-01-12 Fujisawa Pharmaceutical Co Thiadiazolyl(lower)alkanoic acid derivatives and processes for the preparation thereof
JPS5888386A (en) * 1981-10-22 1983-05-26 Fujisawa Pharmaceut Co Ltd Cephem compound and its preparation
JPS61267584A (en) * 1985-01-16 1986-11-27 Fujisawa Pharmaceut Co Ltd Cephalosporanic acid derivative or pharmaceutically acceptable salt thereof
JP2500807Y2 (en) * 1985-04-26 1996-06-12 カシオ計算機株式会社 Image printer

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ZA804038B (en) 1981-06-24
JPS5618988A (en) 1981-02-23

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