KR830000786B1 - Color water tube with improved pleated mask - Google Patents

Abstract

No content.

Description

Color water tube with improved pleated mask

1 is a partially cut away front view of a color water tube with a flat face plate and a pleated mask.

2 is a perspective view of the mask and faceplate assembly of the FIG. 1 receiving tube.

3 is a view showing a constant hole spacing effect of the wrinkled mask.

4 is an aimed view showing the improvement obtained by varying the hole spacing in accordance with one embodiment of the present invention.

5 is a view for showing a geometric relationship with a wrinkled mask.

FIG. 6 is a graph of correction coefficients for hole spacing at two different sites of a pleated mask.

7 is a graph showing the mask shape and hole spacing of a small portion of the wrinkled mask.

8 is an aimed representation of electron beam passing through a pleated mask with holes of constant size.

9 is an aimed representation of electron beam passing through a pleated mask with varying hole widths in accordance with another embodiment of the present invention.

10 is a view showing passing of an electron beam through a thin mask.

FIG. 11 is a view showing electron beam passing through a thicker mask having the same hole width as the mask hole of FIG.

FIG. 12 is a view showing electron beam passing through a mask having the same thickness as the mask of FIG. 11 but with a wider hole therein.

The present invention relates to a shadow mask type color water tube, and more particularly, to a change in the hole pattern of a shadow mask in a water tube having a corrugated shadow mask.

In a shadow mask tube, a plurality of electron beams concentrating in one place are injected onto the mosaic screen through a large number of perforated color select electrodes, ie shadow masks. The propagation of the beam is such that each beam hits the fluorescent surface and irradiates a phosphor that emits only one type of color, but is blocked by another phosphor that emits color by means of a shadow mask.

Currently, commercial color water tubes have a spherical or cylindrical front panel or faceplate, and a corresponding somewhat spherical or cylindrical shadow mask.

In the color receiving tube described in US Pat. No. 4,072,876 (published by A.M.Morrell, February 7, 1978), a horizontally corrugated mask is made in combination with a flat or substantially flat faceplate. The corrugated mask holes are slit-shaped and aligned in a vertical column.

In order to nest the phosphor lines constituting the screen, the horizontal distance between both or one of the rows of holes and the width changes as a function of the distance between the mask and the screen. By the present invention, in the prior art, the spacing spacing between the hole width and the hole row-to-hole row spacing is recognized and provides another variable to this variable, thereby giving a tilt problem related to the angle made by the electron beam on the mask surface. Is corrected so that good luminance is maintained when the fluorescent screen is irradiated.

According to the present invention, a color water tube of the type described above with a pleated mask, in which the mask comprises both or one side of the hole width and the hole-to-hole spacing function as a mask-to-screen spacing function Further corrections are made to either or both of the hole width and hole-to-hole spacing, which are functions of the electron beam projection angle relative to. An additional improvement is that the hole width is further modified due to the effective mask thickness or hole bearing height.

FIG. 1 shows a color-perforated color television tube 20 with a perforated mask consisting of a substantially rectangular flat faceplate panel 24, a funnel 26, and a vacuum glass tube 22 with a neck 28. FIG. The tricolor fluorescent surface is supported on the inner wall 32 of the faceplate panel 24. The electron gun assembly 34, located at neck 28, has three electron guns (not shown), one for each of the three color phosphors on the phosphor surface. The wrinkled and perforated mask 36 is located in a glass tube 22 facing the fluorescent film 30.

The electron gun assembly 34 is adapted to emit three electron beams through the corrugated shadow mask 36 to irradiate the fluorescent surface 30 with the corrugated shadow mask 36, the color selection electrode. The self deflecting yoke 38 is located above the glass tube 22 near the intersection of funnel 26 and neck 28. When yoke 38 is properly activated, the yoke 38 causes the electron beam to inject a screen of 30 which is a rectangular raster.

More specifically, the perforated mask 36, depicted in FIG. 2, is bent or wrinkled horizontally (in the longer dimension direction of the mask) somewhat sine curve along the long axis. This fold is spread vertically in the direction of the short axis (between the long sides of the mask, ie in the mask short dimension direction). The term “wrinkles” is to be understood here as encompassing a wide range of forms, such as sinusoids as well as sawtooth waves. While mask 36 is shown with no bends along the major and minor axis, it can be seen that the scope of the invention also includes masks with the same or different bends along these axes. Likewise, while the faceplate panel appears flat, it can be understood that it can also bend along its long and short axes.

Mask 36 has a number of slit-shaped holes arranged in a vertical row. In order to maintain a good line pattern on the screen, i.e. to maintain the desired luminance level and the desired spacing or inclusion between the phosphor lines, the pore width and horizontal spacing between the rows of pores are between the mask 36 and the screen 30 It usually changes as an interval function. For simple mounting of the screen face on a flat faceplate panel and a flat, unwrinkled mask, the pore space changes according to the following equation.

here,

a '= horizontal spacing between hole rows

q '= distance between mask and screen in the direction of electron beam passage

L = electron beam path length from center of electron beam deflection to screen

S = distance between center and outer beam on deflection plane.

To illustrate one of the problems solved by the present invention, a portion of the corrugated shadow mask 50 is shown in FIG. 3, where the hole is located at a constant dividing distance measured along the contour of the mask. For simplicity, the variation of the horizontal spacing between the rows of holes, which is a mask-to-screen spacing function, is missing from this illustration so that the gradient effect can be quite easily understood. Point 52 on the mask 50 represents the center of the hole and the line passing through the hole represents the center portion of the electron beam 54 passing through the center of the hole. Although electron beam 54 appears to be emitted from spatially fixed source 56 within the deflection plane, it should be understood that this is a rather simplified indication in practice. In the diagram, it can be seen that the electron beam 54 forms an angle with the shadow mask 50 which is a function of the mask contour and deflection angle. Because of the constant row-to-row holes shown in the figure, the gap between the electron beam 51 passing through the hole 52, which is part of the mask 50 with a large angle between the beam and the waterline to the mask surface, can be The angle between the repairs is significantly reduced on screen 58 compared to the spacing between beams 53 passing through mask 50 in a small area. Therefore, the uniform spherical spacing on the mask 50 results in an uneven line spacing pattern on the screen 58.

A modified hole pattern for obtaining the desired distribution of lines on screen 66 is illustrated in FIG. Mask 60 is shown, where the location of hole 62 is spaced as a function of the projection angle of the electron beam to the mask. This spacing can also be expressed as a function of the angle of deflection of the electron beam 64 and the angle formed between the mask 60 and the contour that will be covered by this mask when the pleat width of the central contour 68-mask passing through the mask 60 is zero. have. This contour includes not only flat contours but also curved contours such as spherical, cylindrical or non-spherical.

The relation between the horizontal component of deflection angle Q _H and the hole row spacing “a” for other system parameters is shown in FIG. In this figure, the corrugated shadow mask 69 representing the horizontal portion along the long axis is enclosed in the phosphor screen 70. Screen 70 is composed of red R, green G and blue B phosphor components. Various symbols in the drawings are defined as follows.

D = distance along the tangent to the phosphor screen between the centers of two phosphor components of the same emitting color.

CP = The contour of the center that passes through the mask, where the mask contour changes to form wrinkles.

L = distance of the mask and screenin points on the electron beam deflection center.

q '= distance between mask and screen in the direction of electron beam passage.

a '= center-to-center horizontal spacing between rows of holes by being injected by the electron beam over a plane perpendicular to the center vertical axis of the water pipe.

S = distance between the central beam or the vertical axis of the receiving pipe and the outer beam on the deflection plane.

Q _H = component of the deflection angle of the electron beam in the horizontal plane.

α = angle (in horizontal plane) between the shadow mask surface and the tangent to the central contour through the mask.

a = Center-to-center horizontal distance between mask hole rows measured along the tangent of the line to the mask with one row of holes.

b = horizontal distance between electron beams passing through a row of adjacent holes perpendicular to one electron beam.

β _PH = horizontal component of the angle between the tangent to the element of the screen surface and the plane perpendicular to the central longitudinal axis of the water pipe (for simplicity purposes this component should be considered for curved screens but omitted in the following description) ).

β _MH = horizontal component of the angle between the tangent to the center contour of the mask and a plane perpendicular to the central longitudinal axis of the water pipe.

The interval “a” is derived as follows.

으로 정의되어서,The variation of this mask relative to the center contour of the mask is K cos

As defined by

here,

peak-to-peak wavelength measured in the λ = X _M direction.

αL = peak-to-peak mask width change measured at the center contour.

X _M = horizontal distance from the center longitudinal axis of the water pipe to a point on the mask measured in a plane perpendicular to the center longitudinal axis of the water pipe.

The peak-to-peak wavelength dimension of the wrinkled change of the mask should be at least twice as large as the spacing between adjacent rows of holes.

항은 직선인 수평면과 절편(截片)을 갖는 중앙 윤곽선 CP의 특수한 경우를 위한 경사 수정계수이다. 이 수정계수의 값은 각도 α_Max=±19。를 갖는 마스크상의 굴곡점을 위해 제6도의 수평 편향각 Q_H에 대응하게끔 되어 있다. 도면에 구획된 선 “I”는(삽입에 나타난) 최소 경사도가 있는 굴곡점에 필요한 수정을 카리키고 다른선 “O”는(역시 삽입에 나타난) 최대 경사도가 있는 굴곡점에 필요안 수정을 가르킨다. 편향각이 증가하면, “I”선은 전자비임이 마스크에 거의 수직하게 되므로써 그것의 초기값 이하로 떨어지는 반면, “O”선을 전자비임과 마스크 사이의 각기 편향각과 함께 증가하므로써 증가한다.In the previous equation for "a",

The term is the slope correction factor for the special case of the central contour CP with a straight horizontal plane and intercept. The value of this correction coefficient is intended to correspond to the horizontal deflection angle Q _H of FIG. 6 for the bending point on the mask with the angle α _Max = ± 19 °. The line “I” in the drawing indicates the correction required for the bend point with the minimum slope (shown in the insert) and the other line “O” indicates the required correction at the bend point with the maximum slope (also shown in the insert). Turn on. As the deflection angle increases, the “I” line increases below its initial value as the electron beam is nearly perpendicular to the mask, while increasing the “O” line with each deflection angle between the electron beam and the mask.

7 shows hole spacing curves 72 for shadow mask contour 71 and mask contour 71. Curve 72 includes the modifications related to the mask-to-screen spacing as well as the correction for the slope. Since the hole spacing curve 72 spans the mask area where the electron beam deflection is less than 10 °, the curve 72 is only slightly curved relative to the mask wrinkle peak. As the deflection angle increases, the curve of curve 72 also increases.

In addition to the slope correction required for the hole spacing of the corrugated shadow mask, it is also necessary to correct the slope at the hole width to maintain the desired beam transmission. 8 shows a portion of the simplified corrugated shadow mask 74, with two holes 76 and 78 (it should be understood that the density of the holes in the wrinkled mask is much greater and only two holes are shown for illustrative purposes). The widths of the two holes 76 and 78 are the same as measured by the tangent to the surface of the mask 74. Some electron beams passing through holes 76 and 78, respectively, are shown as dashed lines 80 and 82, respectively. As can be seen, the width A of the electron beam passing through the hole 76 is much larger than the width B of the electron beam passing through the hole 78. Therefore, in order to assure the desired screening of the screen, the size of the spherer must also be modified in a similar manner to the dimension "a" modified.

Mask 84, in which the hole size is corrected for tilt, is shown in FIG. Since the width of one hole 86 is the same as the hole 76 of the mask 74 of FIG. 8, the electron beam of the same width A defined by line 88-the approach at the same angle as in the previous example-is transmitted. However, the other hole 90 is wide enough to allow the transmission of an electron beam portion of width A, which is thus defined by line 92. You can see that the width modification depends on the angle mask and the bird mask of the specific hole location. This gig is a function of the angle between the mask area and the inclination of the mask center contour and the center contour through the electron beam deflection angle. Therefore, the slope correction for hole width is very similar to the slope correction required for hole spacing, which can be determined by the following equation.

Where W 'is the hole width emitted by the electron beam on a plane perpendicular to the center longitudinal axis of the tube and is a function of a' and the preferred electron beam transmission.

For a central contour CP having a straight horizontal plane and intercept, this equation is abbreviated as follows.

There is another slope problem that can be corrected by changing the hole width. This problem is related to the thickness of the mask material or the height of the side stand at the edge of the hole. When the electron beam reaches the mask axis vertically, the mask thickness does not matter, but when the electron beam arrives at an angle other than vertical, the thickness of the mask must be taken into account. 10 shows electron beam 94 reaching mask 96 at a small angle. The width C produced by beam 94 passing through hole 98 in mask 96 is slightly narrower than the width of hole 98 due to the slope. Thicker mask 100 with holes 102 of the same width is shown in FIG. Because of this increased thickness, the width D of the electron beam 104 passing through the hole 102 at the same beam angle of incidence is reduced. Therefore, as shown in FIG. 12, the width of the hole 106 of the mask 108 increases by equally transmitting the electron beam 110. Given a certain mask thickness, this modification to the effective mask thickness or hole bearing height is likewise a function of the electron beam projection angle relative to any particular mask area. This angle of incidence can likewise be related to the angle that the mask area makes relative to the center plane through the tilt and deflection angles of the mask center contour plane. The equation for hole widths, including slope correction and mask thickness or bearing height correction, is as follows:

Where t is the effective mask thickness or bearing height. For a central contour plane CP having a horizontal plane and intercepting a straight line, this equation is abbreviated as follows.

Claims (1)

A faceplate, a fluorescent screen on the faceplate, a pleated, perforated mask adjacent to the screen, and a plurality of electron beams generated and controlled through the mask to impinge the beam onto the screen. The mask pleat with electron gun means is substantially parallel and has a pleated waveform extending in the second direction and the force spreading in the first direction, and the hole-to-life spacing changes as a function of the mask-to-screen spacing in the mask, respectively. Perforated mask type water tube containing both or one side of the hole abyss change in the second direction, furthermore a hole-to-hole spacing change and hole width change in the mask, respectively, which are reduced in relation to the mask Coincident with the incident angle of the electron beam which increases simultaneously with the incident angle of and increases with respect to the mask Perforated, masked color water tubes, characterized by the inclusion of either or both sides of the decreasing.

Images