KR20240008791A - Holding apparatus, exposure apparatus, and method of manufacturing article - Google Patents

Abstract

A holding device for holding an optical element having a flat surface on the outer periphery, comprising: a barrel including an abutting surface abutting the flat surface; a first elastic member that presses the optical element in the direction of the optical axis of the optical element; It has a second elastic member on the abutting surface that presses the plane.

Description

HOLDING APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE}

The present invention relates to a holding device, an exposure device, and a method of manufacturing an article.

In the lithography process in the manufacture of liquid crystal panels, organic EL displays, or semiconductor devices, an exposure device is used to transfer a pattern of an original plate to a substrate coated with a photosensitive agent. Optical elements mounted on exposure equipment require high positional accuracy. However, the optical element or the holding device holding the optical element may thermally expand due to a temperature change due to the energy of the exposure light, resulting in a change in the position of the optical element.

Patent Document 1 discloses that the position of an optical element can be maintained with high precision even when the optical element changes in the radial direction due to changes in the external environment.

Japanese Patent Publication No. 2007-188010

However, in Patent Document 1, there is a risk that the direction of rotation of the optical element with respect to the optical axis may not be maintained with high precision. Therefore, when holding an optical element having characteristics other than rotational symmetry, there is a risk that the desired optical performance may not be achieved.

Accordingly, the purpose of the present invention is to provide a holding device that is advantageous for holding an optical element with high precision.

In order to achieve the above object, a holding device as one aspect of the present invention is a holding device that holds an optical element having a flat surface on the outer periphery, a lens passage including an abutting surface abutting the flat surface, and the optical element. It is characterized by having a first elastic member that presses the optical element in the direction of the optical axis, and a second elastic member that presses the flat surface on the contact surface.

Further features of the present invention will become apparent from the following description of exemplary embodiments (see accompanying drawings).

According to the present invention, it is possible to provide a holding device that is advantageous for holding an optical element with high precision.

Fig. 1 is a perspective view of the holding device in the first embodiment.
Fig. 2 is an exploded view of the holding device in the first embodiment.
Figure 3 is a side view and a front view of the holding device in the first embodiment.
Fig. 4 is a cross-sectional view of the holding device in the first embodiment.
Fig. 5 is a perspective view of the holding device in the second embodiment.
Fig. 6 is an exploded view of the holding device in the second embodiment.
Fig. 7 is a side view and a front view of the holding device in the second embodiment.
Fig. 8 is a cross-sectional view of the holding device in the second embodiment.
Figure 9 is a schematic diagram showing the configuration of an exposure apparatus as one aspect of the present invention.
Figure 10 is a schematic diagram showing the configuration of an illumination optical system.

Below, preferred embodiments of the present invention will be described in detail based on the attached drawings. In addition, in each drawing, the same reference numbers are assigned to the same members, and overlapping descriptions are omitted.

<First embodiment>

First, with reference to FIGS. 1 to 4, the holding device of this embodiment will be described. Figure 1 is a perspective view of the holding device 101. Figure 2 is an exploded view of Figure 1. FIG. 3 (a) is a side view of the holding device 101, and FIG. 3 (b) is a front view of the holding device 101. Figure 4 is a cross-sectional view taken along line A-A shown in Figure 3(a). In this embodiment, the optical axis direction of the optical element 2 is defined as the Z direction, and directions perpendicular to the Z direction are defined as the X and Y directions. In this embodiment, the holding device 101 holds the optical element 2 (for example, a glass member such as a lens or an optical filter).

The holding device 101 includes a barrel 1, a spacer member 3, a leaf spring 4 (first elastic member), a screw 5, and a plunger 6 (second elastic member). has The optical element 2 is elastically maintained while positioned in the Z direction (optical axis direction) by being pressed by the leaf spring 4 (first elastic member) through the annular spacer member 3. The leaf spring (4) is fixed to the barrel (1) by a screw (5). In order to stably hold the optical element 2, a plurality of leaf springs 4 may be arranged along the circumferential direction of the optical element 2.

The optical element 2 is pressed by the plunger 6 (second elastic member) in the and is elastically maintained while positioned in the θ direction (angular direction centered on the optical axis). The barrel 1 is provided with a through hole, and a plunger 6 is disposed in each of the through holes. The through hole and plunger 6 may be singular or plural. The plunger 6 may be a ball plunger in which a ball at the tip moves or a pin plunger in which a pin at the tip moves.

In addition, the optical element 2 in this embodiment is a non-rotationally symmetric element having a plane 2a on the outer periphery. By contacting the contact surface 1a with the plane 2a, it is possible to ensure that the optical element 2 does not rotate in the Z direction. Additionally, by disposing the spacer member 3, the pressing force from the leaf spring 4 can be uniformly transmitted to the optical element 2. Additionally, since the spacer member 3 blocks light by disposing the spacer member 3, the area where the optical element 2 receives light can be set to be any area. The spacer member may have a circular opening. Additionally, when elastic holding is performed on a flat surface 2a, there is an effect of making it easier to hold compared to when elastic holding is performed on a curved surface.

In this embodiment, the contact surface 1a is a surface that serves to determine the position of the optical element 2 in the θ direction (angular direction centered on the optical axis). By providing the contact surface 1a, it is possible to prevent the optical element 2 from being rotated out of alignment in the θ direction. Additionally, the optical element 2 may have not only a flat surface 2a but also a curved surface on its outer periphery.

Next, the pressing force on the optical element 2 by the leaf spring 4 or plunger 6 will be explained. Here, the Z-direction pressing force exerted by the leaf spring 4 on the optical element 2 is referred to as F1. Additionally, the frictional force in the X direction exerted by the leaf spring 4 on the optical element 2 is referred to as Fa. Additionally, the pressing force in the X direction applied by the plunger 6 to the optical element 2 is referred to as F2. Additionally, the frictional force in the Z direction with which the plunger 6 presses against the optical element 2 is referred to as Fb.

In this embodiment, the elastic forces of the leaf spring 4 and the plunger 6 are set so that F1>Fb and F2>Fa. That is, the pressing force against the optical element 2 by the second elastic member is stronger than the frictional force against the optical element 2 by the first elastic member, and is stronger than the frictional force against the optical element 2 by the second elastic member. It is set so that the pressing force on the optical element 2 by the first elastic member becomes strong.

With the above settings, for example, even if the optical element 2 moves in the Z direction due to an impact when transporting the holding device 101 and the optical element 2, the frictional force Fb applied to the optical element 2 Moreover, since the pressing force F1 caused by the leaf spring 4 is large, the optical element 2 returns to its original position in the Z direction.

In addition, even if the optical element 2 moves in the It is returned to the determined state.

Therefore, according to the present embodiment, even if the holding device 101 is affected by temperature or transportation shock, the optical element 2 is attached to the barrel 1 by the leaf spring 4 and the plunger 6. The pressure continues. As a result, the optical element 2 does not rattle against the lens barrel 1 and can be positioned with high precision. That is, the holding device 101 can hold the optical element 2 with high precision.

<Second Embodiment>

In this embodiment, an example in which each of a plurality of planes provided in the optical element is elastically held by a plunger will be described. In addition, descriptions of configurations not described in this embodiment are omitted since they are the same as those in the first embodiment. Matters not mentioned in this embodiment follow the first embodiment.

With reference to FIGS. 5 to 8, the holding device 201 of this embodiment will be described. Figure 5 is a perspective view of the holding device 201. Figure 6 is an exploded view of Figure 5. Figure 7(a) is a side view of the holding device 201, and Figure 7(b) is a front view. Fig. 8 is a cross-sectional view taken along line A-A shown in Fig. 7(a).

The optical element 2 is positioned and elastically held in the barrel 1 by the leaf spring 4 (first elastic member) and plunger 6 (second elastic member). In addition, the optical element 2 has an abutment surface 1b (second abutment surface) provided on the barrel 1 by the plunger 7 (a third elastic member), and a flat surface of the optical element 2. (2b) It is elastically maintained while positioned in the Y direction so that (second plane) contacts it.

That is, the optical element 2 is formed by the plunger 6 and the plunger 7, and the contact surface 1a and the contact surface 1b, in the It is maintained elastically in a positioned position (direction).

With the above configuration, even if the optical element 2 and the holding device 201 are thermally expanded due to temperature changes, the optical element 2 is maintained by the leaf spring 4, plunger 6, and plunger 7. There is continuous pressure on the cervical barrel (1). Accordingly, the optical element 2 does not rattle against the lens barrel 1, and the above-described positioning state is maintained.

Next, the pressing force on the optical element 2 by the leaf spring 4, plunger 6, and plunger 7 will be explained. Here, the Z-direction pressing force exerted by the leaf spring 4 on the optical element 2 is referred to as F1. Additionally, the frictional force in the Additionally, the pressing force in the X direction applied by the plunger 6 to the optical element 2 is referred to as F2. Additionally, the frictional force in the Y direction with which the plunger 6 presses against the optical element 2 is referred to as Fby, and the frictional force in the Z direction is referred to as Fbz. Additionally, the Y-direction pressing force exerted by the plunger 7 on the optical element 2 is referred to as F3. In addition, the frictional force in the

In this embodiment, the elastic forces of the leaf spring 4, plunger 6, and plunger 7 are set so that F1>Fbz+Fcz, F2>Fax+Fcx, and F3>Fay+Fby. That is, in the Z direction, the pressing force on the optical element 2 by the first elastic member is set to be stronger than the sum of the frictional forces experienced by the optical element 2. Additionally, in the Additionally, in the Y direction, the pressing force on the optical element 2 by the third elastic member is set to be stronger than the sum of the frictional forces experienced by the optical element 2.

With the above settings, for example, even if the optical element 2 moves in the Z direction due to an impact when transporting the holding device 201 and the optical element 2, the frictional force Fbz applied to the optical element 2 The pressing force F1 caused by the leaf spring 4 is greater than +Fcz. Accordingly, the optical element 2 is returned to its original position in the Z direction. Furthermore, even if the optical element 2 moves in the It returns to the positioned state. Furthermore, even if the optical element 2 moves in the Y direction, the pressing force F3 caused by the plunger 7 is greater than the friction force Fay+Fby applied to the optical element 2, so the optical element 2 moves in the original Y direction. It returns to the positioned state.

Therefore, according to this embodiment, even if the holding device 201 is affected by temperature or transportation shock, the optical element 2 is maintained by the leaf spring 4, plunger 6, and plunger 7, There is continuous pressure on the cervical barrel (1). As a result, the optical element 2 does not rattle against the lens barrel 1 and can be positioned with high precision. That is, the holding device 201 can hold the optical element 2 with high precision.

Hereinafter, the exposure apparatus 500 will be described with reference to FIG. 9 . Below, an exposure device will be described as an example, but any lithographic device that forms a pattern on a substrate will suffice. The exposure apparatus 500 is a lithography device used in a lithography process, which is a manufacturing process for semiconductor devices and liquid crystal display elements, to form a pattern on a substrate. The exposure apparatus 500 exposes the substrate through a mask (original plate or reticle) and transfers the pattern of the mask to the substrate.

As shown in FIG. 9, the exposure apparatus 500 includes an illumination optical system 510, a projection optical system 520, a mask stage 540 that holds and moves the mask 530, and a substrate 550. It has a substrate stage 560 that holds and moves. In addition, the exposure apparatus 500 is composed of a computer including a CPU, memory, etc., and operates the exposure apparatus 500 by comprehensively controlling each part of the exposure apparatus 500 according to a program stored in a storage unit. It has a control unit 570.

As shown in FIG. 10, the illumination optical system 510 includes optical elements such as a plurality of lenses 512, a fly-eye lens 513, and a mirror 514, and illuminates the mask 530 with light from the light source LS. It is an optical system that illuminates the (illuminated surface). The fly-eye lens 513 is an optical system that functions to equalize light. An aperture stop 515 may be disposed on the exit surface of the FlyEye lens, and an optical filter for forming a secondary light source in an annular shape or a quadrupole shape may be disposed. For example, in an annulus-shaped aperture, a glass filter is provided with a light-shielding portion that blocks light from the oval-shaped center. When the light-shielding portion has an elliptical shape, the position in the direction of rotation with respect to the optical axis of the glass filter is also important, so it is required to hold the angular direction with high precision by the holding device 101 or 201 described in each embodiment.

Since the illumination optical system 510 is an optical system located near the light source LS, a thermal load acts on the optical elements constituting the illumination optical system 510 and the holding device holding these optical elements. Additionally, although the optical element can be transported while being held by a holding device, there is a risk that the optical element may be subjected to shock and become misaligned when transporting the optical element. Therefore, the holding device 101 or 201 described in each embodiment is applied to the holding device that holds the optical elements constituting the illumination optical system 510. For example, the holding device 101 or 201 may be applied to hold the optical filter of the aperture stop 515 in the illumination optical system 510.

The mask 530 is held on the mask stage 540 . A pattern corresponding to the pattern to be formed on the substrate 550 is formed on the mask 530 . The substrate 550 is held on the substrate stage 560 . The mask 530 and the substrate 550 are optically disposed through the projection optical system 520 at approximately conjugate positions (positions of the object surface and image surface of the projection optical system 520). The projection optical system 520 is an optical system that projects an object onto an image surface. In addition to the reflection system shown in FIG. 9, a refractometer or catadioptric system can also be applied to the projection optical system 520. In this embodiment, the projection optical system 520 has a predetermined projection magnification and projects the pattern formed on the mask 530 onto the substrate 550. Then, the mask stage 540 and the substrate stage 560 are scanned in a direction parallel to the object plane of the projection optical system 520 (for example, the X direction) at a speed ratio according to the projection magnification of the projection optical system 520. do. As a result, the pattern formed on the mask 530 can be transferred to the substrate 550.

<Embodiment of manufacturing method of article>

The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing articles such as, for example, a flat panel display (FPD), a semiconductor device, a sensor, or an optical element. The manufacturing method of the article of this embodiment includes a forming process (forming process) of forming a pattern on a substrate using the above-described lithography apparatus, and a process of processing the substrate on which the pattern was formed in this process (processing process). Additionally, this manufacturing method may include other well-known processes (oxidation, film formation, deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). The method for manufacturing an article of this embodiment is advantageous compared to a conventional method in at least one of product performance, quality, productivity, and production cost.

Although preferred embodiments of the present invention have been described above, the present invention is not limited to these embodiments, and various modifications and changes are possible within the scope of the gist. The holding device may be used to hold and support optical elements used in substrate processing devices such as semiconductor manufacturing equipment (film formation equipment, sputtering equipment, annealing equipment, etc.), organic EL deposition equipment, and nanoimprint equipment. .

1: Tube
1a: Contact surface
2: Optical element
2a: flat
4: Leaf spring (first elastic member)
6: Plunger (second elastic member)
101, 201: holding support device

Claims (13)

It is a holding device that holds and supports an optical element having a flat surface on the outer periphery,
A barrel including an abutment surface in contact with the plane,
a first elastic member that presses the optical element in the optical axis direction of the optical element;
A holding device characterized by having a second elastic member on the abutment surface that presses the plane. According to paragraph 1,
The pressing force against the optical element by the second elastic member is stronger than the frictional force against the optical element by the first elastic member, and the first elastic member is stronger than the frictional force against the optical element by the second elastic member. A holding device characterized in that the pressing force against the optical element is strong. According to paragraph 1,
A holding device characterized in that an annular spacer member is disposed between the optical element and the first elastic member. According to paragraph 1,
A holding device, characterized in that the plane is pressed by a plurality of the second elastic members. According to paragraph 1,
The optical element further has a second plane different from the plane,
The barrel is,
It contacts the second plane and further includes a second contact surface different from the contact surface,
The holding device further includes a third elastic member disposed in a through hole provided in the second abutment surface and pressing the second plane. According to clause 5,
The pressing force against the optical element by the third elastic member is stronger than the frictional force against the optical element by the first elastic member and the second elastic member, and the pressing force by the second elastic member and the third elastic member is stronger than the frictional force against the optical element by the first elastic member and the second elastic member. The pressing force against the optical element by the first elastic member is stronger than the frictional force against the optical element, and the pressing force against the optical element by the first elastic member and the third elastic member is stronger than the frictional force against the optical element by the first elastic member and the third elastic member. A holding device characterized in that the pressing force against the optical element is strong. According to paragraph 1,
A holding device, characterized in that the first elastic member is a leaf spring. According to paragraph 1,
A holding device, characterized in that the second elastic member is a plunger. According to paragraph 1,
The holding device is characterized in that it holds an optical filter provided with a light blocking portion. According to paragraph 1,
A holding device characterized in that the contact surface is a surface that determines the position in the angular direction centered on the optical axis of the optical element. According to paragraph 1,
The optical element further includes a curved surface on the outer periphery,
The holding device, wherein the barrel further includes a surface that abuts the curved surface. It is a lithographic device that forms a pattern on a substrate,
an illumination optical system that illuminates a mask on which a pattern corresponding to the pattern to be formed on the substrate is formed;
comprising a holding support device,
The illumination optical system includes an optical element,
A lithographic apparatus, wherein the holding device includes the holding device according to any one of claims 1 to 11 for holding the optical element. A forming process of forming a pattern on a substrate using the lithography apparatus according to claim 12;
A processing step of processing the substrate on which the pattern is formed in the forming step,
A method for manufacturing an article, characterized in that an article is manufactured from the substrate treated in the treatment process.

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