KR20230108600A - Novel compound and organic light emitting device comprising the same - Google Patents
Novel compound and organic light emitting device comprising the same Download PDFInfo
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- KR20230108600A KR20230108600A KR1020220004213A KR20220004213A KR20230108600A KR 20230108600 A KR20230108600 A KR 20230108600A KR 1020220004213 A KR1020220004213 A KR 1020220004213A KR 20220004213 A KR20220004213 A KR 20220004213A KR 20230108600 A KR20230108600 A KR 20230108600A
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 205
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 31
- 229910052805 deuterium Inorganic materials 0.000 claims description 31
- 150000002431 hydrogen Chemical class 0.000 claims description 30
- 229910052739 hydrogen Inorganic materials 0.000 claims description 30
- 239000001257 hydrogen Substances 0.000 claims description 30
- 239000011368 organic material Substances 0.000 claims description 29
- 125000000217 alkyl group Chemical group 0.000 claims description 26
- 125000003118 aryl group Chemical group 0.000 claims description 26
- 125000001424 substituent group Chemical group 0.000 claims description 17
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 17
- RWRDLPDLKQPQOW-UHFFFAOYSA-N tetrahydropyrrole Natural products C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 claims description 16
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 12
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 10
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 claims description 9
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 9
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims description 9
- 125000002947 alkylene group Chemical group 0.000 claims description 8
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 229910052717 sulfur Inorganic materials 0.000 claims description 6
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 125000003944 tolyl group Chemical group 0.000 claims description 4
- 125000000499 benzofuranyl group Chemical group O1C(=CC2=C1C=CC=C2)* 0.000 claims description 3
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 3
- 125000001072 heteroaryl group Chemical group 0.000 claims description 3
- RFRXIWQYSOIBDI-UHFFFAOYSA-N benzarone Chemical compound CCC=1OC2=CC=CC=C2C=1C(=O)C1=CC=C(O)C=C1 RFRXIWQYSOIBDI-UHFFFAOYSA-N 0.000 claims description 2
- 125000005842 heteroatom Chemical group 0.000 claims description 2
- 150000003235 pyrrolidines Chemical class 0.000 claims description 2
- 239000000126 substance Substances 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 97
- 238000002360 preparation method Methods 0.000 description 54
- -1 sulfoxy groups Chemical group 0.000 description 47
- 238000000034 method Methods 0.000 description 37
- 239000000460 chlorine Substances 0.000 description 35
- 239000000463 material Substances 0.000 description 32
- 229940125904 compound 1 Drugs 0.000 description 30
- 238000002347 injection Methods 0.000 description 28
- 239000007924 injection Substances 0.000 description 28
- 239000000243 solution Substances 0.000 description 27
- 239000012044 organic layer Substances 0.000 description 24
- 125000004432 carbon atom Chemical group C* 0.000 description 23
- 239000000376 reactant Substances 0.000 description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 22
- 238000006243 chemical reaction Methods 0.000 description 20
- 238000004440 column chromatography Methods 0.000 description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 17
- 239000000377 silicon dioxide Substances 0.000 description 17
- 239000008199 coating composition Substances 0.000 description 16
- 230000032258 transport Effects 0.000 description 14
- 239000002904 solvent Substances 0.000 description 13
- 239000012267 brine Substances 0.000 description 12
- 230000005525 hole transport Effects 0.000 description 12
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 125000000623 heterocyclic group Chemical group 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 239000002019 doping agent Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000002096 quantum dot Substances 0.000 description 8
- 125000003342 alkenyl group Chemical group 0.000 description 7
- LJOOWESTVASNOG-UFJKPHDISA-N [(1s,3r,4ar,7s,8s,8as)-3-hydroxy-8-[2-[(4r)-4-hydroxy-6-oxooxan-2-yl]ethyl]-7-methyl-1,2,3,4,4a,7,8,8a-octahydronaphthalen-1-yl] (2s)-2-methylbutanoate Chemical compound C([C@H]1[C@@H](C)C=C[C@H]2C[C@@H](O)C[C@@H]([C@H]12)OC(=O)[C@@H](C)CC)CC1C[C@@H](O)CC(=O)O1 LJOOWESTVASNOG-UFJKPHDISA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 229940127204 compound 29 Drugs 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- ISMDILRWKSYCOD-GNKBHMEESA-N C(C1=CC=CC=C1)[C@@H]1NC(OCCCCCCCCCCCNC([C@@H](NC(C[C@@H]1O)=O)C(C)C)=O)=O Chemical compound C(C1=CC=CC=C1)[C@@H]1NC(OCCCCCCCCCCCNC([C@@H](NC(C[C@@H]1O)=O)C(C)C)=O)=O ISMDILRWKSYCOD-GNKBHMEESA-N 0.000 description 5
- 229940126639 Compound 33 Drugs 0.000 description 5
- 150000004982 aromatic amines Chemical class 0.000 description 5
- 239000012153 distilled water Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- ABJSOROVZZKJGI-OCYUSGCXSA-N (1r,2r,4r)-2-(4-bromophenyl)-n-[(4-chlorophenyl)-(2-fluoropyridin-4-yl)methyl]-4-morpholin-4-ylcyclohexane-1-carboxamide Chemical compound C1=NC(F)=CC(C(NC(=O)[C@H]2[C@@H](C[C@@H](CC2)N2CCOCC2)C=2C=CC(Br)=CC=2)C=2C=CC(Cl)=CC=2)=C1 ABJSOROVZZKJGI-OCYUSGCXSA-N 0.000 description 4
- KQZLRWGGWXJPOS-NLFPWZOASA-N 1-[(1R)-1-(2,4-dichlorophenyl)ethyl]-6-[(4S,5R)-4-[(2S)-2-(hydroxymethyl)pyrrolidin-1-yl]-5-methylcyclohexen-1-yl]pyrazolo[3,4-b]pyrazine-3-carbonitrile Chemical compound ClC1=C(C=CC(=C1)Cl)[C@@H](C)N1N=C(C=2C1=NC(=CN=2)C1=CC[C@@H]([C@@H](C1)C)N1[C@@H](CCC1)CO)C#N KQZLRWGGWXJPOS-NLFPWZOASA-N 0.000 description 4
- TVTJUIAKQFIXCE-HUKYDQBMSA-N 2-amino-9-[(2R,3S,4S,5R)-4-fluoro-3-hydroxy-5-(hydroxymethyl)oxolan-2-yl]-7-prop-2-ynyl-1H-purine-6,8-dione Chemical compound NC=1NC(C=2N(C(N(C=2N=1)[C@@H]1O[C@@H]([C@H]([C@H]1O)F)CO)=O)CC#C)=O TVTJUIAKQFIXCE-HUKYDQBMSA-N 0.000 description 4
- QBWKPGNFQQJGFY-QLFBSQMISA-N 3-[(1r)-1-[(2r,6s)-2,6-dimethylmorpholin-4-yl]ethyl]-n-[6-methyl-3-(1h-pyrazol-4-yl)imidazo[1,2-a]pyrazin-8-yl]-1,2-thiazol-5-amine Chemical compound N1([C@H](C)C2=NSC(NC=3C4=NC=C(N4C=C(C)N=3)C3=CNN=C3)=C2)C[C@H](C)O[C@H](C)C1 QBWKPGNFQQJGFY-QLFBSQMISA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 239000010405 anode material Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229940125846 compound 25 Drugs 0.000 description 4
- 229940125851 compound 27 Drugs 0.000 description 4
- 229940125877 compound 31 Drugs 0.000 description 4
- UAOUIVVJBYDFKD-XKCDOFEDSA-N (1R,9R,10S,11R,12R,15S,18S,21R)-10,11,21-trihydroxy-8,8-dimethyl-14-methylidene-4-(prop-2-enylamino)-20-oxa-5-thia-3-azahexacyclo[9.7.2.112,15.01,9.02,6.012,18]henicosa-2(6),3-dien-13-one Chemical compound C([C@@H]1[C@@H](O)[C@@]23C(C1=C)=O)C[C@H]2[C@]12C(N=C(NCC=C)S4)=C4CC(C)(C)[C@H]1[C@H](O)[C@]3(O)OC2 UAOUIVVJBYDFKD-XKCDOFEDSA-N 0.000 description 3
- AOSZTAHDEDLTLQ-AZKQZHLXSA-N (1S,2S,4R,8S,9S,11S,12R,13S,19S)-6-[(3-chlorophenyl)methyl]-12,19-difluoro-11-hydroxy-8-(2-hydroxyacetyl)-9,13-dimethyl-6-azapentacyclo[10.8.0.02,9.04,8.013,18]icosa-14,17-dien-16-one Chemical compound C([C@@H]1C[C@H]2[C@H]3[C@]([C@]4(C=CC(=O)C=C4[C@@H](F)C3)C)(F)[C@@H](O)C[C@@]2([C@@]1(C1)C(=O)CO)C)N1CC1=CC=CC(Cl)=C1 AOSZTAHDEDLTLQ-AZKQZHLXSA-N 0.000 description 3
- GLGNXYJARSMNGJ-VKTIVEEGSA-N (1s,2s,3r,4r)-3-[[5-chloro-2-[(1-ethyl-6-methoxy-2-oxo-4,5-dihydro-3h-1-benzazepin-7-yl)amino]pyrimidin-4-yl]amino]bicyclo[2.2.1]hept-5-ene-2-carboxamide Chemical compound CCN1C(=O)CCCC2=C(OC)C(NC=3N=C(C(=CN=3)Cl)N[C@H]3[C@H]([C@@]4([H])C[C@@]3(C=C4)[H])C(N)=O)=CC=C21 GLGNXYJARSMNGJ-VKTIVEEGSA-N 0.000 description 3
- SZUVGFMDDVSKSI-WIFOCOSTSA-N (1s,2s,3s,5r)-1-(carboxymethyl)-3,5-bis[(4-phenoxyphenyl)methyl-propylcarbamoyl]cyclopentane-1,2-dicarboxylic acid Chemical compound O=C([C@@H]1[C@@H]([C@](CC(O)=O)([C@H](C(=O)N(CCC)CC=2C=CC(OC=3C=CC=CC=3)=CC=2)C1)C(O)=O)C(O)=O)N(CCC)CC(C=C1)=CC=C1OC1=CC=CC=C1 SZUVGFMDDVSKSI-WIFOCOSTSA-N 0.000 description 3
- GHYOCDFICYLMRF-UTIIJYGPSA-N (2S,3R)-N-[(2S)-3-(cyclopenten-1-yl)-1-[(2R)-2-methyloxiran-2-yl]-1-oxopropan-2-yl]-3-hydroxy-3-(4-methoxyphenyl)-2-[[(2S)-2-[(2-morpholin-4-ylacetyl)amino]propanoyl]amino]propanamide Chemical compound C1(=CCCC1)C[C@@H](C(=O)[C@@]1(OC1)C)NC([C@H]([C@@H](C1=CC=C(C=C1)OC)O)NC([C@H](C)NC(CN1CCOCC1)=O)=O)=O GHYOCDFICYLMRF-UTIIJYGPSA-N 0.000 description 3
- STBLNCCBQMHSRC-BATDWUPUSA-N (2s)-n-[(3s,4s)-5-acetyl-7-cyano-4-methyl-1-[(2-methylnaphthalen-1-yl)methyl]-2-oxo-3,4-dihydro-1,5-benzodiazepin-3-yl]-2-(methylamino)propanamide Chemical compound O=C1[C@@H](NC(=O)[C@H](C)NC)[C@H](C)N(C(C)=O)C2=CC(C#N)=CC=C2N1CC1=C(C)C=CC2=CC=CC=C12 STBLNCCBQMHSRC-BATDWUPUSA-N 0.000 description 3
- QFLWZFQWSBQYPS-AWRAUJHKSA-N (3S)-3-[[(2S)-2-[[(2S)-2-[5-[(3aS,6aR)-2-oxo-1,3,3a,4,6,6a-hexahydrothieno[3,4-d]imidazol-4-yl]pentanoylamino]-3-methylbutanoyl]amino]-3-(4-hydroxyphenyl)propanoyl]amino]-4-[1-bis(4-chlorophenoxy)phosphorylbutylamino]-4-oxobutanoic acid Chemical compound CCCC(NC(=O)[C@H](CC(O)=O)NC(=O)[C@H](Cc1ccc(O)cc1)NC(=O)[C@@H](NC(=O)CCCCC1SC[C@@H]2NC(=O)N[C@H]12)C(C)C)P(=O)(Oc1ccc(Cl)cc1)Oc1ccc(Cl)cc1 QFLWZFQWSBQYPS-AWRAUJHKSA-N 0.000 description 3
- IWZSHWBGHQBIML-ZGGLMWTQSA-N (3S,8S,10R,13S,14S,17S)-17-isoquinolin-7-yl-N,N,10,13-tetramethyl-2,3,4,7,8,9,11,12,14,15,16,17-dodecahydro-1H-cyclopenta[a]phenanthren-3-amine Chemical compound CN(C)[C@H]1CC[C@]2(C)C3CC[C@@]4(C)[C@@H](CC[C@@H]4c4ccc5ccncc5c4)[C@@H]3CC=C2C1 IWZSHWBGHQBIML-ZGGLMWTQSA-N 0.000 description 3
- WZZBNLYBHUDSHF-DHLKQENFSA-N 1-[(3s,4s)-4-[8-(2-chloro-4-pyrimidin-2-yloxyphenyl)-7-fluoro-2-methylimidazo[4,5-c]quinolin-1-yl]-3-fluoropiperidin-1-yl]-2-hydroxyethanone Chemical compound CC1=NC2=CN=C3C=C(F)C(C=4C(=CC(OC=5N=CC=CN=5)=CC=4)Cl)=CC3=C2N1[C@H]1CCN(C(=O)CO)C[C@@H]1F WZZBNLYBHUDSHF-DHLKQENFSA-N 0.000 description 3
- ONBQEOIKXPHGMB-VBSBHUPXSA-N 1-[2-[(2s,3r,4s,5r)-3,4-dihydroxy-5-(hydroxymethyl)oxolan-2-yl]oxy-4,6-dihydroxyphenyl]-3-(4-hydroxyphenyl)propan-1-one Chemical compound O[C@@H]1[C@H](O)[C@@H](CO)O[C@H]1OC1=CC(O)=CC(O)=C1C(=O)CCC1=CC=C(O)C=C1 ONBQEOIKXPHGMB-VBSBHUPXSA-N 0.000 description 3
- UNILWMWFPHPYOR-KXEYIPSPSA-M 1-[6-[2-[3-[3-[3-[2-[2-[3-[[2-[2-[[(2r)-1-[[2-[[(2r)-1-[3-[2-[2-[3-[[2-(2-amino-2-oxoethoxy)acetyl]amino]propoxy]ethoxy]ethoxy]propylamino]-3-hydroxy-1-oxopropan-2-yl]amino]-2-oxoethyl]amino]-3-[(2r)-2,3-di(hexadecanoyloxy)propyl]sulfanyl-1-oxopropan-2-yl Chemical compound O=C1C(SCCC(=O)NCCCOCCOCCOCCCNC(=O)COCC(=O)N[C@@H](CSC[C@@H](COC(=O)CCCCCCCCCCCCCCC)OC(=O)CCCCCCCCCCCCCCC)C(=O)NCC(=O)N[C@H](CO)C(=O)NCCCOCCOCCOCCCNC(=O)COCC(N)=O)CC(=O)N1CCNC(=O)CCCCCN\1C2=CC=C(S([O-])(=O)=O)C=C2CC/1=C/C=C/C=C/C1=[N+](CC)C2=CC=C(S([O-])(=O)=O)C=C2C1 UNILWMWFPHPYOR-KXEYIPSPSA-M 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- YSUIQYOGTINQIN-UZFYAQMZSA-N 2-amino-9-[(1S,6R,8R,9S,10R,15R,17R,18R)-8-(6-aminopurin-9-yl)-9,18-difluoro-3,12-dihydroxy-3,12-bis(sulfanylidene)-2,4,7,11,13,16-hexaoxa-3lambda5,12lambda5-diphosphatricyclo[13.2.1.06,10]octadecan-17-yl]-1H-purin-6-one Chemical compound NC1=NC2=C(N=CN2[C@@H]2O[C@@H]3COP(S)(=O)O[C@@H]4[C@@H](COP(S)(=O)O[C@@H]2[C@@H]3F)O[C@H]([C@H]4F)N2C=NC3=C2N=CN=C3N)C(=O)N1 YSUIQYOGTINQIN-UZFYAQMZSA-N 0.000 description 3
- KCBAMQOKOLXLOX-BSZYMOERSA-N CC1=C(SC=N1)C2=CC=C(C=C2)[C@H](C)NC(=O)[C@@H]3C[C@H](CN3C(=O)[C@H](C(C)(C)C)NC(=O)CCCCCCCCCCNCCCONC(=O)C4=C(C(=C(C=C4)F)F)NC5=C(C=C(C=C5)I)F)O Chemical compound CC1=C(SC=N1)C2=CC=C(C=C2)[C@H](C)NC(=O)[C@@H]3C[C@H](CN3C(=O)[C@H](C(C)(C)C)NC(=O)CCCCCCCCCCNCCCONC(=O)C4=C(C(=C(C=C4)F)F)NC5=C(C=C(C=C5)I)F)O KCBAMQOKOLXLOX-BSZYMOERSA-N 0.000 description 3
- BQXUPNKLZNSUMC-YUQWMIPFSA-N CCN(CCCCCOCC(=O)N[C@H](C(=O)N1C[C@H](O)C[C@H]1C(=O)N[C@@H](C)c1ccc(cc1)-c1scnc1C)C(C)(C)C)CCOc1ccc(cc1)C(=O)c1c(sc2cc(O)ccc12)-c1ccc(O)cc1 Chemical compound CCN(CCCCCOCC(=O)N[C@H](C(=O)N1C[C@H](O)C[C@H]1C(=O)N[C@@H](C)c1ccc(cc1)-c1scnc1C)C(C)(C)C)CCOc1ccc(cc1)C(=O)c1c(sc2cc(O)ccc12)-c1ccc(O)cc1 BQXUPNKLZNSUMC-YUQWMIPFSA-N 0.000 description 3
- 229940126657 Compound 17 Drugs 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- OPFJDXRVMFKJJO-ZHHKINOHSA-N N-{[3-(2-benzamido-4-methyl-1,3-thiazol-5-yl)-pyrazol-5-yl]carbonyl}-G-dR-G-dD-dD-dD-NH2 Chemical compound S1C(C=2NN=C(C=2)C(=O)NCC(=O)N[C@H](CCCN=C(N)N)C(=O)NCC(=O)N[C@H](CC(O)=O)C(=O)N[C@H](CC(O)=O)C(=O)N[C@H](CC(O)=O)C(N)=O)=C(C)N=C1NC(=O)C1=CC=CC=C1 OPFJDXRVMFKJJO-ZHHKINOHSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 3
- MXZNUGFCDVAXLG-CHWSQXEVSA-N [(2S)-1-[(2R)-3-methyl-2-(pyridine-4-carbonylamino)butanoyl]pyrrolidin-2-yl]boronic acid Chemical compound CC(C)[C@@H](NC(=O)c1ccncc1)C(=O)N1CCC[C@@H]1B(O)O MXZNUGFCDVAXLG-CHWSQXEVSA-N 0.000 description 3
- LNUFLCYMSVYYNW-ZPJMAFJPSA-N [(2r,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6r)-6-[(2r,3r,4s,5r,6r)-6-[(2r,3r,4s,5r,6r)-6-[[(3s,5s,8r,9s,10s,13r,14s,17r)-10,13-dimethyl-17-[(2r)-6-methylheptan-2-yl]-2,3,4,5,6,7,8,9,11,12,14,15,16,17-tetradecahydro-1h-cyclopenta[a]phenanthren-3-yl]oxy]-4,5-disulfo Chemical compound O([C@@H]1[C@@H](COS(O)(=O)=O)O[C@@H]([C@@H]([C@H]1OS(O)(=O)=O)OS(O)(=O)=O)O[C@@H]1[C@@H](COS(O)(=O)=O)O[C@@H]([C@@H]([C@H]1OS(O)(=O)=O)OS(O)(=O)=O)O[C@@H]1[C@@H](COS(O)(=O)=O)O[C@H]([C@@H]([C@H]1OS(O)(=O)=O)OS(O)(=O)=O)O[C@@H]1C[C@@H]2CC[C@H]3[C@@H]4CC[C@@H]([C@]4(CC[C@@H]3[C@@]2(C)CC1)C)[C@H](C)CCCC(C)C)[C@H]1O[C@H](COS(O)(=O)=O)[C@@H](OS(O)(=O)=O)[C@H](OS(O)(=O)=O)[C@H]1OS(O)(=O)=O LNUFLCYMSVYYNW-ZPJMAFJPSA-N 0.000 description 3
- SMNRFWMNPDABKZ-WVALLCKVSA-N [[(2R,3S,4R,5S)-5-(2,6-dioxo-3H-pyridin-3-yl)-3,4-dihydroxyoxolan-2-yl]methoxy-hydroxyphosphoryl] [[[(2R,3S,4S,5R,6R)-4-fluoro-3,5-dihydroxy-6-(hydroxymethyl)oxan-2-yl]oxy-hydroxyphosphoryl]oxy-hydroxyphosphoryl] hydrogen phosphate Chemical compound OC[C@H]1O[C@H](OP(O)(=O)OP(O)(=O)OP(O)(=O)OP(O)(=O)OC[C@H]2O[C@H]([C@H](O)[C@@H]2O)C2C=CC(=O)NC2=O)[C@H](O)[C@@H](F)[C@@H]1O SMNRFWMNPDABKZ-WVALLCKVSA-N 0.000 description 3
- 125000002877 alkyl aryl group Chemical group 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000001769 aryl amino group Chemical group 0.000 description 3
- XRWSZZJLZRKHHD-WVWIJVSJSA-N asunaprevir Chemical compound O=C([C@@H]1C[C@H](CN1C(=O)[C@@H](NC(=O)OC(C)(C)C)C(C)(C)C)OC1=NC=C(C2=CC=C(Cl)C=C21)OC)N[C@]1(C(=O)NS(=O)(=O)C2CC2)C[C@H]1C=C XRWSZZJLZRKHHD-WVWIJVSJSA-N 0.000 description 3
- 125000006267 biphenyl group Chemical group 0.000 description 3
- 239000010406 cathode material Substances 0.000 description 3
- 229940125773 compound 10 Drugs 0.000 description 3
- 229940125797 compound 12 Drugs 0.000 description 3
- 229940126543 compound 14 Drugs 0.000 description 3
- 229940125758 compound 15 Drugs 0.000 description 3
- 229940126142 compound 16 Drugs 0.000 description 3
- 229940125782 compound 2 Drugs 0.000 description 3
- 229940125810 compound 20 Drugs 0.000 description 3
- 229940126086 compound 21 Drugs 0.000 description 3
- 229940126208 compound 22 Drugs 0.000 description 3
- 229940125833 compound 23 Drugs 0.000 description 3
- 229940125961 compound 24 Drugs 0.000 description 3
- 229940126214 compound 3 Drugs 0.000 description 3
- 229940125878 compound 36 Drugs 0.000 description 3
- 229940125898 compound 5 Drugs 0.000 description 3
- 125000004185 ester group Chemical group 0.000 description 3
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- JAXFJECJQZDFJS-XHEPKHHKSA-N gtpl8555 Chemical compound OC(=O)C[C@H](N)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H](C(C)C)C(=O)N1CCC[C@@H]1C(=O)N[C@H](B1O[C@@]2(C)[C@H]3C[C@H](C3(C)C)C[C@H]2O1)CCC1=CC=C(F)C=C1 JAXFJECJQZDFJS-XHEPKHHKSA-N 0.000 description 3
- 238000004770 highest occupied molecular orbital Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 3
- 239000011133 lead Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- UWRZIZXBOLBCON-VOTSOKGWSA-N (e)-2-phenylethenamine Chemical class N\C=C\C1=CC=CC=C1 UWRZIZXBOLBCON-VOTSOKGWSA-N 0.000 description 2
- UBOXGVDOUJQMTN-UHFFFAOYSA-N 1,1,2-trichloroethane Chemical compound ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 2
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- 125000005916 2-methylpentyl group Chemical group 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- PFYHAAAQPNMZHO-UHFFFAOYSA-N Methyl 2-methoxybenzoate Chemical compound COC(=O)C1=CC=CC=C1OC PFYHAAAQPNMZHO-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 125000003282 alkyl amino group Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 125000005264 aryl amine group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- XSIFPSYPOVKYCO-UHFFFAOYSA-N butyl benzoate Chemical compound CCCCOC(=O)C1=CC=CC=C1 XSIFPSYPOVKYCO-UHFFFAOYSA-N 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- WDECIBYCCFPHNR-UHFFFAOYSA-N chrysene Chemical compound C1=CC=CC2=CC=C3C4=CC=CC=C4C=CC3=C21 WDECIBYCCFPHNR-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002219 fluoranthenes Chemical class 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000005241 heteroarylamino group Chemical group 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 125000005462 imide group Chemical group 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 2
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 125000003367 polycyclic group Chemical group 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 150000003852 triazoles Chemical group 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- 229940015975 1,2-hexanediol Drugs 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- 125000000355 1,3-benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000006218 1-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- UDONPJKEOAWFGI-UHFFFAOYSA-N 1-methyl-3-phenoxybenzene Chemical compound CC1=CC=CC(OC=2C=CC=CC=2)=C1 UDONPJKEOAWFGI-UHFFFAOYSA-N 0.000 description 1
- 125000006023 1-pentenyl group Chemical group 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- MYKQKWIPLZEVOW-UHFFFAOYSA-N 11h-benzo[a]carbazole Chemical group C1=CC2=CC=CC=C2C2=C1C1=CC=CC=C1N2 MYKQKWIPLZEVOW-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical group C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 125000006176 2-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(C([H])([H])*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006024 2-pentenyl group Chemical group 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- 125000006027 3-methyl-1-butenyl group Chemical group 0.000 description 1
- DDTHMESPCBONDT-UHFFFAOYSA-N 4-(4-oxocyclohexa-2,5-dien-1-ylidene)cyclohexa-2,5-dien-1-one Chemical compound C1=CC(=O)C=CC1=C1C=CC(=O)C=C1 DDTHMESPCBONDT-UHFFFAOYSA-N 0.000 description 1
- 125000004920 4-methyl-2-pentyl group Chemical group CC(CC(C)*)C 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical group N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- YXLXNENXOJSQEI-UHFFFAOYSA-L Oxine-copper Chemical compound [Cu+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 YXLXNENXOJSQEI-UHFFFAOYSA-L 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 108010021119 Trichosanthin Proteins 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical group C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005332 alkyl sulfoxy group Chemical group 0.000 description 1
- 125000005377 alkyl thioxy group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000001454 anthracenes Chemical class 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 description 1
- 150000003974 aralkylamines Chemical group 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 125000005165 aryl thioxy group Chemical group 0.000 description 1
- 125000003609 aryl vinyl group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- GQVWHWAWLPCBHB-UHFFFAOYSA-L beryllium;benzo[h]quinolin-10-olate Chemical compound [Be+2].C1=CC=NC2=C3C([O-])=CC=CC3=CC=C21.C1=CC=NC2=C3C([O-])=CC=CC3=CC=C21 GQVWHWAWLPCBHB-UHFFFAOYSA-L 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 150000001638 boron Chemical class 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 150000001716 carbazoles Chemical class 0.000 description 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- XOYLJNJLGBYDTH-UHFFFAOYSA-M chlorogallium Chemical compound [Ga]Cl XOYLJNJLGBYDTH-UHFFFAOYSA-M 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 125000002676 chrysenyl group Chemical group C1(=CC=CC=2C3=CC=C4C=CC=CC4=C3C=CC12)* 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000004851 cyclopentylmethyl group Chemical group C1(CCCC1)C* 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 150000004826 dibenzofurans Chemical class 0.000 description 1
- IYYZUPMFVPLQIF-ALWQSETLSA-N dibenzothiophene Chemical group C1=CC=CC=2[34S]C3=C(C=21)C=CC=C3 IYYZUPMFVPLQIF-ALWQSETLSA-N 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- KLKFAASOGCDTDT-UHFFFAOYSA-N ethoxymethoxyethane Chemical compound CCOCOCC KLKFAASOGCDTDT-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 150000002240 furans Chemical class 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- ZTQSADJAYQOCDD-UHFFFAOYSA-N ginsenoside-Rd2 Natural products C1CC(C2(CCC3C(C)(C)C(OC4C(C(O)C(O)C(CO)O4)O)CCC3(C)C2CC2O)C)(C)C2C1C(C)(CCC=C(C)C)OC(C(C(O)C1O)O)OC1COC1OCC(O)C(O)C1O ZTQSADJAYQOCDD-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005549 heteroarylene group Chemical group 0.000 description 1
- FHKSXSQHXQEMOK-UHFFFAOYSA-N hexane-1,2-diol Chemical compound CCCCC(O)CO FHKSXSQHXQEMOK-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 150000002503 iridium Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- 125000000842 isoxazolyl group Chemical group 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- XNUVVHVFAAQPQY-UHFFFAOYSA-L manganese(2+) quinolin-8-olate Chemical compound N1=CC=CC2=CC=CC(=C12)[O-].[Mn+2].N1=CC=CC2=CC=CC(=C12)[O-] XNUVVHVFAAQPQY-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002790 naphthalenes Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical group [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 150000002964 pentacenes Chemical class 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- FVDOBFPYBSDRKH-UHFFFAOYSA-N perylene-3,4,9,10-tetracarboxylic acid Chemical compound C=12C3=CC=C(C(O)=O)C2=C(C(O)=O)C=CC=1C1=CC=C(C(O)=O)C2=C1C3=CC=C2C(=O)O FVDOBFPYBSDRKH-UHFFFAOYSA-N 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 150000002987 phenanthrenes Chemical class 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000001484 phenothiazinyl group Chemical group C1(=CC=CC=2SC3=CC=CC=C3NC12)* 0.000 description 1
- XPPWLXNXHSNMKC-UHFFFAOYSA-N phenylboron Chemical group [B]C1=CC=CC=C1 XPPWLXNXHSNMKC-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 125000004592 phthalazinyl group Chemical group C1(=NN=CC2=CC=CC=C12)* 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 150000003220 pyrenes Chemical class 0.000 description 1
- 125000001725 pyrenyl group Chemical group 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical group C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 229940083082 pyrimidine derivative acting on arteriolar smooth muscle Drugs 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- JLBRGNFGBDNNSF-UHFFFAOYSA-N tert-butyl(dimethyl)borane Chemical group CB(C)C(C)(C)C JLBRGNFGBDNNSF-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- IBBLKSWSCDAPIF-UHFFFAOYSA-N thiopyran Chemical compound S1C=CC=C=C1 IBBLKSWSCDAPIF-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- KWQNQSDKCINQQP-UHFFFAOYSA-K tri(quinolin-8-yloxy)gallane Chemical compound C1=CN=C2C(O[Ga](OC=3C4=NC=CC=C4C=CC=3)OC=3C4=NC=CC=C4C=CC=3)=CC=CC2=C1 KWQNQSDKCINQQP-UHFFFAOYSA-K 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- LALRXNPLTWZJIJ-UHFFFAOYSA-N triethylborane Chemical group CCB(CC)CC LALRXNPLTWZJIJ-UHFFFAOYSA-N 0.000 description 1
- WXRGABKACDFXMG-UHFFFAOYSA-N trimethylborane Chemical group CB(C)C WXRGABKACDFXMG-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- MXSVLWZRHLXFKH-UHFFFAOYSA-N triphenylborane Chemical group C1=CC=CC=C1B(C=1C=CC=CC=1)C1=CC=CC=C1 MXSVLWZRHLXFKH-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- HTPBWAPZAJWXKY-UHFFFAOYSA-L zinc;quinolin-8-olate Chemical compound [Zn+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 HTPBWAPZAJWXKY-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
- H10K85/322—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising boron
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
본 발명은 신규한 화합물 및 이를 포함한 유기 발광 소자에 관한 것이다.The present invention relates to a novel compound and an organic light emitting device including the same.
일반적으로 유기 발광 현상이란 유기 물질을 이용하여 전기에너지를 빛에너지로 전환시켜주는 현상을 말한다. 유기 발광 현상을 이용하는 유기 발광 소자는 넓은 시야각, 우수한 콘트라스트, 빠른 응답 시간을 가지며, 휘도, 구동 전압 및 응답 속도 특성이 우수하여 많은 연구가 진행되고 있다. In general, the organic light emitting phenomenon refers to a phenomenon in which electrical energy is converted into light energy using an organic material. An organic light emitting device using an organic light emitting phenomenon has a wide viewing angle, excellent contrast, and a fast response time, and has excellent luminance, driving voltage, and response speed characteristics, and thus many studies are being conducted.
유기 발광 소자는 일반적으로 양극과 음극 및 상기 양극과 음극 사이에 유기물층을 포함하는 구조를 가진다. 상기 유기물층은 유기 발광 소자의 효율과 안정성을 높이기 위하여 각기 다른 물질로 구성된 다층의 구조로 이루어진 경우가 많으며, 예컨대 정공주입층, 정공수송층, 발광층, 전자수송층, 전자주입층 등으로 이루어질 수 있다. 이러한 유기 발광 소자의 구조에서 두 전극 사이에 전압을 걸어주게 되면 양극에서는 정공이, 음극에서는 전자가 유기물층에 주입되게 되고, 주입된 정공과 전자가 만났을 때 엑시톤(exciton)이 형성되며, 이 엑시톤이 다시 바닥상태로 떨어질 때 빛이 나게 된다. An organic light emitting device generally has a structure including an anode, a cathode, and an organic material layer between the anode and the cathode. In order to increase the efficiency and stability of the organic light emitting device, the organic material layer is often composed of a multi-layered structure composed of different materials, and may include, for example, a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer. In the structure of this organic light emitting device, when a voltage is applied between the two electrodes, holes are injected from the anode and electrons from the cathode are injected into the organic material layer, and when the injected holes and electrons meet, excitons are formed. When it falls back to the ground state, it glows.
상기와 같은 유기 발광 소자에 사용되는 유기물에 대하여 새로운 재료의 개발이 지속적으로 요구되고 있다.The development of new materials for organic materials used in the organic light emitting device as described above is continuously required.
한편, 최근에는 공정 비용 절감을 위하여 기존의 증착 공정 대신 용액 공정, 특히 잉크젯 공정을 이용한 유기 발광 소자가 개발되고 있다. 초창기에는 모든 유기 발광 소자 층을 용액 공정으로 코팅하여 유기 발광 소자를 개발하려 하였으나 현재 기술로는 한계가 있어, HIL, HTL, EML만을 용액 공정으로 진행하고 추후 공정은 기존의 증착 공정을 활용하는 하이브리드(hybrid) 공정이 연구 중이다. Meanwhile, in recent years, an organic light emitting device using a solution process, particularly an inkjet process, instead of a conventional deposition process has been developed to reduce process costs. In the early days, an attempt was made to develop an organic light emitting device by coating all organic light emitting device layers with a solution process, but current technology has limitations, so only HIL, HTL, and EML are processed as a solution process, and the subsequent process is a hybrid that utilizes the existing deposition process. (hybrid) process is under investigation.
이에 본 발명에서는 유기 발광 소자에 사용될 수 있으면서 동시에 용액 공정에 사용 가능한 신규한 유기 발광 소자의 소재를 제공한다.Accordingly, the present invention provides a novel organic light emitting device material that can be used in an organic light emitting device and can be used in a solution process at the same time.
본 발명은 신규한 화합물 및 이를 포함하는 유기 발광 소자에 관한 것이다. The present invention relates to a novel compound and an organic light emitting device including the same.
본 발명은 하기 화학식 1로 표시되는 화합물을 제공한다:The present invention provides a compound represented by Formula 1 below:
[화학식 1][Formula 1]
상기 화학식 1에서, In Formula 1,
Ar1은 인접한 고리와 융합된 벤젠, 벤조퓨란, 또는 벤조티오펜이고,Ar 1 is benzene, benzofuran, or benzothiophene fused with an adjacent ring;
R1 내지 R4는 각각 독립적으로, 수소, 중수소, 치환 또는 비치환된 C1-60 알킬, 또는 치환 또는 비치환된 C6-60 아릴이거나, 또는 인접하는 두 개의 R1 내지 R4가 서로 결합하여 치환 또는 비치환된 C1-10 알킬렌을 형성하고,R 1 to R 4 are each independently hydrogen, deuterium, substituted or unsubstituted C 1-60 alkyl, or substituted or unsubstituted C 6-60 aryl, or two adjacent R 1 to R 4 are mutually combine to form a substituted or unsubstituted C 1-10 alkylene;
R5는 하기 화학식 2 또는 화학식 3으로 표시되는 치환기이고,R 5 is a substituent represented by Formula 2 or Formula 3 below;
[화학식 2][Formula 2]
상기 화학식 2에서,In Formula 2,
R’1은 각각 독립적으로, 수소, 중수소, 또는 치환 또는 비치환된 C1-60 알킬이고, R' 1 is each independently hydrogen, deuterium, or substituted or unsubstituted C 1-60 alkyl;
R’2는 각각 독립적으로, 수소, 중수소, 또는 치환 또는 비치환된 C1-60 알킬이고,R' 2 are each independently hydrogen, deuterium, or substituted or unsubstituted C 1-60 alkyl;
R’3은 각각 독립적으로, 수소, 중수소, 치환 또는 비치환된 C1-60 알킬, 또는 치환 또는 비치환된 N, O 및 S로 구성되는 군으로부터 선택되는 어느 하나 이상의 헤테로원자를 포함하는 C2-60 헤테로아릴이거나, 또는 서로 결합하여 치환 또는 비치환된 C3-60 사이클로알킬, 또는 치환 또는 비치환된 피롤리딘을 형성하고,R′ 3 are each independently hydrogen, deuterium, substituted or unsubstituted C 1-60 alkyl, or substituted or unsubstituted C including any one or more heteroatoms selected from the group consisting of N, O and S 2-60 heteroaryl, or combined with each other to form a substituted or unsubstituted C 3-60 cycloalkyl, or a substituted or unsubstituted pyrrolidine;
[화학식 3][Formula 3]
상기 화학식 3에서, In Formula 3,
는 단일 결합, 또는 이중 결합이고, is a single bond or a double bond,
R’4는 수소, 중수소, 치환 또는 비치환된 C1-60 알킬, 치환 또는 비치환된 C3-60 사이클로알킬, 또는 치환 또는 비치환된 C6-60 아릴이고,R′ 4 is hydrogen, deuterium, substituted or unsubstituted C 1-60 alkyl, substituted or unsubstituted C 3-60 cycloalkyl, or substituted or unsubstituted C 6-60 aryl;
n1은 1 내지 4의 정수이다.n1 is an integer from 1 to 4;
또한, 제1 전극; 상기 제1 전극과 대향하여 구비된 제2 전극; 및 상기 제1 전극과 상기 제2 전극 사이에 구비된 1층 이상의 유기물층을 포함하는 유기 발광 소자로서, 상기 유기물층 중 1층 이상은 상기 화학식 1로 표시되는 화합물을 포함하는, 유기 발광 소자를 제공한다.In addition, the first electrode; a second electrode provided to face the first electrode; and one or more organic material layers provided between the first electrode and the second electrode, wherein at least one of the organic material layers includes the compound represented by Chemical Formula 1. .
상술한 화학식 1로 표시되는 화합물은 유기 발광 소자의 유기물 층의 재료로서 사용될 수 있으며, 또한 용액 공정에 사용이 가능하며, 유기 발광 소자에서 효율의 향상, 낮은 구동전압 및/또는 수명 특성을 향상시킬 수 있다.The compound represented by Formula 1 described above can be used as a material for an organic layer of an organic light emitting device, and can also be used in a solution process, and can improve efficiency, low driving voltage and/or lifespan characteristics of an organic light emitting device. can
도 1은 기판(1), 양극(2), 발광층(3), 음극(4)으로 이루어진 유기 발광 소자의 예를 도시한 것이다.
도 2는 기판 (1), 양극(2), 정공주입층(5), 정공수송층(6), 발광층(7), 전자주입 및 수송층(8) 및 음극(4)로 이루어진 유기 발광 소자의 예를 도시한 것이다.1 shows an example of an organic light emitting device composed of a substrate 1, an anode 2, a light emitting layer 3, and a cathode 4.
2 is an example of an organic light emitting device composed of a substrate (1), an anode (2), a hole injection layer (5), a hole transport layer (6), a light emitting layer (7), an electron injection and transport layer (8) and a cathode (4). is shown.
이하, 본 발명의 이해를 돕기 위하여 보다 상세히 설명한다.Hereinafter, in order to aid understanding of the present invention, it will be described in more detail.
(용어의 정의)(Definition of Terms)
본 명세서에서, 또는 는 다른 치환기에 연결되는 결합을 의미한다. In this specification, or means a bond connected to another substituent.
본 명세서에서 "치환 또는 비치환된" 이라는 용어는 중수소; 할로겐기; 니트릴기; 니트로기; 히드록시기; 카보닐기; 에스테르기; 이미드기; 아미노기; 포스핀옥사이드기; 알콕시기; 아릴옥시기; 알킬티옥시기; 아릴티옥시기; 알킬술폭시기; 아릴술폭시기; 실릴기; 붕소기; 알킬기; 사이클로알킬기; 알케닐기; 아릴기; 아르알킬기; 아르알케닐기; 알킬아릴기; 알킬아민기; 아랄킬아민기; 헤테로아릴아민기; 아릴아민기; 아릴포스핀기; 또는 N, O 및 S 원자 중 1개 이상을 포함하는 헤테로고리기로 이루어진 군에서 선택된 1개 이상의 치환기로 치환 또는 비치환되거나, 상기 예시된 치환기 중 2 이상의 치환기가 연결된 치환 또는 비치환된 것을 의미한다. 예컨대, "2 이상의 치환기가 연결된 치환기"는 비페닐기일 수 있다. 즉, 비페닐기는 아릴기일 수도 있고, 2개의 페닐기가 연결된 치환기로 해석될 수 있다.In this specification, the term "substituted or unsubstituted" means deuterium; halogen group; nitrile group; nitro group; hydroxy group; carbonyl group; ester group; imide group; amino group; phosphine oxide group; alkoxy group; aryloxy group; Alkyl thioxy group; Arylthioxy group; an alkyl sulfoxy group; aryl sulfoxy groups; silyl group; boron group; an alkyl group; cycloalkyl group; alkenyl group; aryl group; aralkyl group; Aralkenyl group; Alkyl aryl group; Alkylamine group; Aralkylamine group; heteroarylamine group; Arylamine group; Arylphosphine group; Or substituted or unsubstituted with one or more substituents selected from the group consisting of a heterocyclic group containing at least one of N, O, and S atoms, or substituted or unsubstituted with two or more substituents linked to each other among the substituents exemplified above. . For example, "a substituent in which two or more substituents are connected" may be a biphenyl group. That is, the biphenyl group may be an aryl group, and may be interpreted as a substituent in which two phenyl groups are connected.
본 명세서에서 카보닐기의 탄소수는 특별히 한정되지 않으나, 탄소수 1 내지 40인 것이 바람직하다. 구체적으로 하기와 같은 구조의 화합물이 될 수 있으나, 이에 한정되는 것은 아니다.In the present specification, the number of carbon atoms of the carbonyl group is not particularly limited, but is preferably 1 to 40 carbon atoms. Specifically, it may be a compound having the following structure, but is not limited thereto.
본 명세서에 있어서, 에스테르기는 에스테르기의 산소가 탄소수 1 내지 25의 직쇄, 분지쇄 또는 고리쇄 알킬기 또는 탄소수 6 내지 25의 아릴기로 치환될 수 있다. 구체적으로, 하기 구조식의 화합물이 될 수 있으나, 이에 한정되는 것은 아니다.In the present specification, the ester group may be substituted with an aryl group having 6 to 25 carbon atoms or a straight-chain, branched-chain or cyclic chain alkyl group having 1 to 25 carbon atoms in the ester group. Specifically, it may be a compound of the following structural formula, but is not limited thereto.
본 명세서에 있어서, 이미드기의 탄소수는 특별히 한정되지 않으나, 탄소수 1 내지 25인 것이 바람직하다. 구체적으로 하기와 같은 구조의 화합물이 될 수 있으나, 이에 한정되는 것은 아니다.In the present specification, the number of carbon atoms of the imide group is not particularly limited, but is preferably 1 to 25 carbon atoms. Specifically, it may be a compound having the following structure, but is not limited thereto.
본 명세서에 있어서, 실릴기는 구체적으로 트리메틸실릴기, 트리에틸실릴기, t-부틸디메틸실릴기, 비닐디메틸실릴기, 프로필디메틸실릴기, 트리페닐실릴기, 디페닐실릴기, 페닐실릴기 등이 있으나 이에 한정되지 않는다. In the present specification, the silyl group is specifically a trimethylsilyl group, a triethylsilyl group, a t-butyldimethylsilyl group, a vinyldimethylsilyl group, a propyldimethylsilyl group, a triphenylsilyl group, a diphenylsilyl group, a phenylsilyl group, and the like. but not limited to
본 명세서에 있어서, 붕소기는 구체적으로 트리메틸붕소기, 트리에틸붕소기, t-부틸디메틸붕소기, 트리페닐붕소기, 페닐붕소기 등이 있으나 이에 한정되지 않는다.In the present specification, the boron group specifically includes a trimethyl boron group, a triethyl boron group, a t-butyldimethyl boron group, a triphenyl boron group, a phenyl boron group, but is not limited thereto.
본 명세서에 있어서, 할로겐기의 예로는 불소, 염소, 브롬 또는 요오드가 있다.In this specification, examples of the halogen group include fluorine, chlorine, bromine or iodine.
본 명세서에 있어서, 상기 알킬기는 직쇄 또는 분지쇄일 수 있고, 탄소수는 특별히 한정되지 않으나 1 내지 40인 것이 바람직하다. 일 실시상태에 따르면, 상기 알킬기의 탄소수는 1 내지 20이다. 또 하나의 실시상태에 따르면, 상기 알킬기의 탄소수는 1 내지 10이다. 또 하나의 실시상태에 따르면, 상기 알킬기의 탄소수는 1 내지 6이다. 알킬기의 구체적인 예로는 메틸, 에틸, 프로필, n-프로필, 이소프로필, 부틸, n-부틸, 이소부틸, tert-부틸, sec-부틸, 1-메틸-부틸, 1-에틸-부틸, 펜틸, n-펜틸, 이소펜틸, 네오펜틸, tert-펜틸, 헥실, n-헥실, 1-메틸펜틸, 2-메틸펜틸, 4-메틸-2-펜틸, 3,3-디메틸부틸, 2-에틸부틸, 헵틸, n-헵틸, 1-메틸헥실, 사이클로펜틸메틸,사이클로헥틸메틸, 옥틸, n-옥틸, tert-옥틸, 1-메틸헵틸, 2-에틸헥실, 2-프로필펜틸, n-노닐, 2,2-디메틸헵틸, 1-에틸-프로필, 1,1-디메틸-프로필, 이소헥실, 2-메틸펜틸, 4-메틸헥실, 5-메틸헥실 등이 있으나, 이들에 한정되지 않는다.In the present specification, the alkyl group may be straight-chain or branched-chain, and the number of carbon atoms is not particularly limited, but is preferably 1 to 40. According to one embodiment, the number of carbon atoms of the alkyl group is 1 to 20. According to another exemplary embodiment, the number of carbon atoms of the alkyl group is 1 to 10. According to another exemplary embodiment, the alkyl group has 1 to 6 carbon atoms. Specific examples of the alkyl group include methyl, ethyl, propyl, n-propyl, isopropyl, butyl, n-butyl, isobutyl, tert-butyl, sec-butyl, 1-methyl-butyl, 1-ethyl-butyl, pentyl, n -pentyl, isopentyl, neopentyl, tert-pentyl, hexyl, n-hexyl, 1-methylpentyl, 2-methylpentyl, 4-methyl-2-pentyl, 3,3-dimethylbutyl, 2-ethylbutyl, heptyl , n-heptyl, 1-methylhexyl, cyclopentylmethyl, cyclohexylmethyl, octyl, n-octyl, tert-octyl, 1-methylheptyl, 2-ethylhexyl, 2-propylpentyl, n-nonyl, 2,2 -Dimethylheptyl, 1-ethyl-propyl, 1,1-dimethyl-propyl, isohexyl, 2-methylpentyl, 4-methylhexyl, 5-methylhexyl, etc., but is not limited thereto.
본 명세서에 있어서, 상기 알케닐기는 직쇄 또는 분지쇄일 수 있고, 탄소수는 특별히 한정되지 않으나, 2 내지 40인 것이 바람직하다. 일 실시상태에 따르면, 상기 알케닐기의 탄소수는 2 내지 20이다. 또 하나의 실시상태에 따르면, 상기 알케닐기의 탄소수는 2 내지 10이다. 또 하나의 실시상태에 따르면, 상기 알케닐기의 탄소수는 2 내지 6이다. 구체적인 예로는 비닐, 1-프로페닐, 이소프로페닐, 1-부테닐, 2-부테닐, 3-부테닐, 1-펜테닐, 2-펜테닐, 3-펜테닐, 3-메틸-1-부테닐, 1,3-부타디에닐, 알릴, 1-페닐비닐-1-일, 2-페닐비닐-1-일, 2,2-디페닐비닐-1-일, 2-페닐-2-(나프틸-1-일)비닐-1-일, 2,2-비스(디페닐-1-일)비닐-1-일, 스틸베닐기, 스티레닐기 등이 있으나 이들에 한정되지 않는다.In the present specification, the alkenyl group may be linear or branched, and the number of carbon atoms is not particularly limited, but is preferably 2 to 40. According to one embodiment, the alkenyl group has 2 to 20 carbon atoms. According to another exemplary embodiment, the alkenyl group has 2 to 10 carbon atoms. According to another exemplary embodiment, the alkenyl group has 2 to 6 carbon atoms. Specific examples include vinyl, 1-propenyl, isopropenyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-pentenyl, 2-pentenyl, 3-pentenyl, 3-methyl-1- Butenyl, 1,3-butadienyl, allyl, 1-phenylvinyl-1-yl, 2-phenylvinyl-1-yl, 2,2-diphenylvinyl-1-yl, 2-phenyl-2-( naphthyl-1-yl)vinyl-1-yl, 2,2-bis(diphenyl-1-yl)vinyl-1-yl, stilbenyl group, styrenyl group, etc., but is not limited thereto.
본 명세서에 있어서, 사이클로알킬기는 특별히 한정되지 않으나, 탄소수 3 내지 60인 것이 바람직하며, 일 실시상태에 따르면, 상기 사이클로알킬기의 탄소수는 3 내지 30이다. 또 하나의 실시상태에 따르면, 상기 사이클로알킬기의 탄소수는 3 내지 20이다. 또 하나의 실시상태에 따르면, 상기 사이클로알킬기의 탄소수는 3 내지 6이다. 구체적으로 사이클로프로필, 사이클로부틸, 사이클로펜틸, 3-메틸사이클로펜틸, 2,3-디메틸사이클로펜틸, 사이클로헥실, 3-메틸사이클로헥실, 4-메틸사이클로헥실, 2,3-디메틸사이클로헥실, 3,4,5-트리메틸사이클로헥실, 4-tert-부틸사이클로헥실, 사이클로헵틸, 사이클로옥틸 등이 있으나, 이에 한정되지 않는다.In the present specification, the cycloalkyl group is not particularly limited, but preferably has 3 to 60 carbon atoms, and according to an exemplary embodiment, the cycloalkyl group has 3 to 30 carbon atoms. According to another exemplary embodiment, the number of carbon atoms of the cycloalkyl group is 3 to 20. According to another exemplary embodiment, the number of carbon atoms of the cycloalkyl group is 3 to 6. Specifically, cyclopropyl, cyclobutyl, cyclopentyl, 3-methylcyclopentyl, 2,3-dimethylcyclopentyl, cyclohexyl, 3-methylcyclohexyl, 4-methylcyclohexyl, 2,3-dimethylcyclohexyl, 3, 4,5-trimethylcyclohexyl, 4-tert-butylcyclohexyl, cycloheptyl, cyclooctyl, and the like, but are not limited thereto.
본 명세서에 있어서, 아릴기는 특별히 한정되지 않으나 탄소수 6 내지 60인 것이 바람직하며, 단환식 아릴기 또는 다환식 아릴기일 수 있다. 일 실시상태에 따르면, 상기 아릴기의 탄소수는 6 내지 30이다. 일 실시상태에 따르면, 상기 아릴기의 탄소수는 6 내지 20이다. 상기 아릴기가 단환식 아릴기로는 페닐기, 바이페닐기, 터페닐기 등이 될 수 있으나, 이에 한정되는 것은 아니다. 상기 다환식 아릴기로는 나프틸기, 안트라세닐기, 페난트릴기, 파이레닐기, 페릴레닐기, 크라이세닐기, 플루오레닐기 등이 될 수 있으나, 이에 한정되는 것은 아니다.In the present specification, the aryl group is not particularly limited, but preferably has 6 to 60 carbon atoms, and may be a monocyclic aryl group or a polycyclic aryl group. According to one embodiment, the number of carbon atoms of the aryl group is 6 to 30. According to one embodiment, the number of carbon atoms of the aryl group is 6 to 20. The aryl group may be a phenyl group, a biphenyl group, a terphenyl group, etc. as a monocyclic aryl group, but is not limited thereto. The polycyclic aryl group may be a naphthyl group, anthracenyl group, phenanthryl group, pyrenyl group, perylenyl group, chrysenyl group, fluorenyl group, and the like, but is not limited thereto.
본 명세서에 있어서, 플루오레닐기는 치환될 수 있고, 치환기 2개가 서로 결합하여 스피로 구조를 형성할 수 있다. 상기 플루오레닐기가 치환되는 경우, 등이 될 수 있다. 다만, 이에 한정되는 것은 아니다.In the present specification, the fluorenyl group may be substituted, and two substituents may be bonded to each other to form a spiro structure. When the fluorenyl group is substituted, etc. However, it is not limited thereto.
본 명세서에 있어서, 헤테로고리기는 이종 원소로 O, N, Si 및 S 중 1개 이상을 포함하는 헤테로고리기로서, 탄소수는 특별히 한정되지 않으나, 탄소수 2 내지 60인 것이 바람직하다. 헤테로고리기의 예로는 티오펜기, 퓨란기, 피롤기, 이미다졸기, 티아졸기, 옥사졸기, 옥사디아졸기, 트리아졸기, 피리딜기, 비피리딜기, 피리미딜기, 트리아진기, 아크리딜기, 피리다진기, 피라지닐기, 퀴놀리닐기, 퀴나졸린기, 퀴녹살리닐기, 프탈라지닐기, 피리도 피리미디닐기, 피리도 피라지닐기, 피라지노 피라지닐기, 이소퀴놀린기, 인돌기, 카바졸기, 벤조옥사졸기, 벤조이미다졸기, 벤조티아졸기, 벤조카바졸기, 벤조티오펜기, 디벤조티오펜기, 벤조퓨라닐기, 페난쓰롤린기(phenanthroline), 이소옥사졸릴기, 티아디아졸릴기, 페노티아지닐기 및 디벤조퓨라닐기 등이 있으나, 이들에만 한정되는 것은 아니다.In the present specification, the heterocyclic group is a heterocyclic group containing at least one of O, N, Si, and S as heterogeneous elements, and the number of carbon atoms is not particularly limited, but preferably has 2 to 60 carbon atoms. Examples of the heterocyclic group include a thiophene group, a furan group, a pyrrole group, an imidazole group, a thiazole group, an oxazole group, an oxadiazole group, a triazole group, a pyridyl group, a bipyridyl group, a pyrimidyl group, a triazine group, and an acridyl group. , pyridazine group, pyrazinyl group, quinolinyl group, quinazoline group, quinoxalinyl group, phthalazinyl group, pyridopyrimidinyl group, pyridopyrazinyl group, pyrazinopyrazinyl group, isoquinoline group, indole group , carbazole group, benzoxazole group, benzoimidazole group, benzothiazole group, benzocarbazole group, benzothiophene group, dibenzothiophene group, benzofuranyl group, phenanthroline group, isoxazolyl group, thiadia A zolyl group, a phenothiazinyl group, and a dibenzofuranyl group, but are not limited thereto.
본 명세서에 있어서, 아르알킬기, 아르알케닐기, 알킬아릴기, 아릴아민기 중의 아릴기는 전술한 아릴기의 예시와 같다. 본 명세서에 있어서, 아르알킬기, 알킬아릴기, 알킬아민기 중 알킬기는 전술한 알킬기의 예시와 같다. 본 명세서에 있어서, 헤테로아릴아민 중 헤테로아릴은 전술한 헤테로고리기에 관한 설명이 적용될 수 있다. 본 명세서에 있어서, 아르알케닐기 중 알케닐기는 전술한 알케닐기의 예시와 같다. 본 명세서에 있어서, 아릴렌은 2가기인 것을 제외하고는 전술한 아릴기에 관한 설명이 적용될 수 있다. 본 명세서에 있어서, 헤테로아릴렌은 2가기인 것을 제외하고는 전술한 헤테로고리기에 관한 설명이 적용될 수 있다. 본 명세서에 있어서, 탄화수소 고리는 1가기가 아니고, 2개의 치환기가 결합하여 형성한 것을 제외하고는 전술한 아릴기 또는 사이클로알킬기에 관한 설명이 적용될 수 있다. 본 명세서에 있어서, 헤테로고리는 1가기가 아니고, 2개의 치환기가 결합하여 형성한 것을 제외하고는 전술한 헤테로고리기에 관한 설명이 적용될 수 있다.In the present specification, an aralkyl group, an aralkenyl group, an alkylaryl group, and an aryl group among arylamine groups are the same as the examples of the aryl group described above. In the present specification, the alkyl group among the aralkyl group, the alkylaryl group, and the alkylamine group is the same as the examples of the above-mentioned alkyl group. In the present specification, the description of the heterocyclic group described above may be applied to the heteroaryl of the heteroarylamine. In the present specification, the alkenyl group among the aralkenyl groups is the same as the examples of the alkenyl group described above. In the present specification, the description of the aryl group described above may be applied except that the arylene is a divalent group. In the present specification, the description of the heterocyclic group described above may be applied except that the heteroarylene is a divalent group. In the present specification, the hydrocarbon ring is not a monovalent group, and the description of the aryl group or cycloalkyl group described above may be applied, except that the hydrocarbon ring is formed by combining two substituents. In the present specification, the heterocyclic group is not a monovalent group, and the description of the above-described heterocyclic group may be applied, except that it is formed by combining two substituents.
(화합물)(compound)
본 발명은 상기 화학식 1로 표시되는 화합물을 제공한다.The present invention provides a compound represented by Formula 1 above.
바람직하게는, 상기 화학식 1은 하기 화학식 1-1 내지 화학식 1-3으로 구성되는 군으로부터 선택되는 어느 하나로 표시된다:Preferably, Formula 1 is represented by any one selected from the group consisting of Formulas 1-1 to 1-3 below:
[화학식 1-1][Formula 1-1]
[화학식 1-2][Formula 1-2]
[화학식 1-3][Formula 1-3]
상기 화학식 1-1 내지 화학식 1-3에서,In Formula 1-1 to Formula 1-3,
X는 O, 또는 S이고,X is O or S;
R1, R2, R3, R4, R5, 및 n1은 앞서 정의한 바와 같다.R 1 , R 2 , R 3 , R 4 , R 5 , and n1 are as previously defined.
바람직하게는, R1 및 R2는 각각 독립적으로, 수소, 중수소, 또는 치환 또는 비치환된 C1-10 알킬이거나, 또는 인접하는 두 개의 R1 또는 R2가 서로 결합하여 치환 또는 비치환된 C3-8 알킬렌을 형성한다.Preferably, R 1 and R 2 are each independently hydrogen, deuterium, or substituted or unsubstituted C 1-10 alkyl, or two adjacent R 1 or R 2 are bonded to each other to be substituted or unsubstituted. Forms C 3-8 alkylene.
바람직하게는, R1 및 R2는 각각 독립적으로, 수소, 중수소, 또는 터트부틸이거나, 또는 인접하는 두 개의 R1 또는 R2가 서로 결합하여 을 형성한다.Preferably, R 1 and R 2 are each independently hydrogen, deuterium, or tertbutyl, or two adjacent R 1 or R 2 are bonded to each other form
바람직하게는, R3는 각각 독립적으로, 수소, 중수소, 또는 치환 또는 비치환된 C1-10 알킬이거나, 또는 인접하는 두 개의 R3가 서로 결합하여 치환 또는 비치환된 C3-8 알킬렌을 형성한다.Preferably, R 3 are each independently hydrogen, deuterium, or substituted or unsubstituted C 1-10 alkyl, or two adjacent R 3 are bonded together to form substituted or unsubstituted C 3-8 alkylene. form
바람직하게는, Ar1이 벤젠이고, R3는 각각 독립적으로, 수소, 중수소, 또는 터트부틸이거나, 또는 인접하는 두 개의 R3가 서로 결합하여 을 형성한다.Preferably, Ar 1 is benzene, R 3 is each independently hydrogen, deuterium, or tertbutyl, or two adjacent R 3 are bonded to each other form
바람직하게는, Ar1이 벤조퓨란, 또는 벤조티오펜이고, R3는 각각 독립적으로, 수소, 중수소, 또는 터트부틸이다.Preferably, Ar 1 is benzofuran or benzothiophene, and R 3 are each independently hydrogen, deuterium, or tertbutyl.
바람직하게는, R4는 각각 독립적으로, 수소, 중수소, 치환 또는 비치환된 C1-10 알킬, 또는 치환 또는 비치환된 C6-60 아릴이거나, 또는 인접하는 두 개의 R4가 서로 결합하여 치환 또는 비치환된 C3-8 알킬렌을 형성한다.Preferably, R 4 are each independently hydrogen, deuterium, substituted or unsubstituted C 1-10 alkyl, or substituted or unsubstituted C 6-60 aryl, or two adjacent R 4 are bonded to each other Forms a substituted or unsubstituted C 3-8 alkylene.
바람직하게는, R4는 각각 독립적으로, 수소, 중수소, 터트부틸, 페닐, 또는 터트부틸로 치환된 페닐이거나, 또는 인접하는 두 개의 R4가 서로 결합하여 을 형성한다.Preferably, each R 4 is independently hydrogen, deuterium, tertbutyl, phenyl, or phenyl substituted with tertbutyl, or two adjacent R 4 are bonded to each other to form
바람직하게는, R’1은 각각 독립적으로, 수소, 중수소, 메틸, 이소프로필, 또는 터트부틸이다.Preferably, each R' 1 is independently hydrogen, deuterium, methyl, isopropyl, or tertbutyl.
바람직하게는, R’2는 각각 독립적으로, 수소, 중수소, 또는 메틸이다.Preferably, each R' 2 is independently hydrogen, deuterium, or methyl.
바람직하게는, R’3는 각각 독립적으로, 수소, 중수소, 메틸, 또는 벤조퓨라닐이거나, 또는 서로 결합하여 치환 또는 비치환된 사이클로펜틸, 사이클로헥실, 사이클로헵틸, 또는 피롤리딘을 형성한다.Preferably, each R' 3 is independently hydrogen, deuterium, methyl, or benzofuranyl, or taken together to form a substituted or unsubstituted cyclopentyl, cyclohexyl, cycloheptyl, or pyrrolidine.
보다 바람직하게는, 상기 사이클로펜틸, 또는 사이클로헥실은 비치환되거나, 또는 하나 이상의 메틸로 치환된다.More preferably, the cyclopentyl or cyclohexyl is unsubstituted or substituted with one or more methyl.
보다 바람직하게는, 상기 피롤리딘은 비치환되거나, 또는 메틸, 이소프로필, 터트부틸, 사이클로펜틸, 사이클로헥실, 페닐, 또는 톨릴로 치환된다.More preferably, the pyrrolidine is unsubstituted or substituted with methyl, isopropyl, tertbutyl, cyclopentyl, cyclohexyl, phenyl, or tolyl.
바람직하게는, 상기 화학식 2로 표시되는 치환기는 하기로 구성되는 군으로부터 선택되는 어느 하나이다:Preferably, the substituent represented by Formula 2 is any one selected from the group consisting of:
바람직하게는, R’4는 각각 독립적으로, 메틸, 이소프로필, 터트부틸, 사이클로펜틸, 사이클로헥실, 페닐, 또는 톨릴이다.Preferably, each R' 4 is independently methyl, isopropyl, tertbutyl, cyclopentyl, cyclohexyl, phenyl, or tolyl.
바람직하게는, 상기 화학식 3으로 표시되는 치환기는 하기로 구성되는 군으로부터 선택되는 어느 하나이다:Preferably, the substituent represented by Formula 3 is any one selected from the group consisting of:
상기 화학식 1로 표시되는 화합물의 대표적인 예는 하기와 같다:Representative examples of the compound represented by Formula 1 are as follows:
한편, 본 발명은 일례로 하기 반응식 1과 같은 상기 화학식 1로 표시되는 화합물의 제조방법을 제공한다:On the other hand, the present invention provides a method for producing a compound represented by Formula 1, such as the following Reaction Scheme 1, for example:
[반응식 1][Scheme 1]
상기 반응식 1에서, Y를 제외한 나머지 정의는 앞서 정의한 바와 같으며, Y는 할로겐이고, 바람직하게는 브로모, 또는 클로로이다.In Reaction Scheme 1, the definitions except for Y are as defined above, and Y is halogen, preferably bromo or chloro.
한편, 본 발명에 따른 화합물을 포함하는 유기물층은 진공 증착법, 용액 공정 등과 같은 다양한 방법을 이용하여 형성할 수 있으며, 용액 공정에 대해서는 이하 상세히 설명한다. Meanwhile, the organic layer containing the compound according to the present invention can be formed using various methods such as a vacuum deposition method and a solution process, and the solution process will be described in detail below.
(코팅 조성물)(coating composition)
한편, 본 발명에 따른 화합물은 용액 공정으로 유기 발광 소자의 유기물 층, 특히 발광층을 형성할 수 있다. 구체적으로, 상기 화합물은 발광층의 도펀트 재료로 사용될 수 있다. 이를 위하여, 본 발명은 상술한 본 발명에 따른 화합물 및 용매를 포함하는 코팅 조성물을 제공한다.Meanwhile, the compound according to the present invention may form an organic material layer of an organic light emitting device, particularly a light emitting layer, through a solution process. Specifically, the compound may be used as a dopant material of the light emitting layer. To this end, the present invention provides a coating composition comprising the above-described compound and a solvent according to the present invention.
상기 용매는 본 발명에 따른 화합물을 용해 또는 분산시킬 수 있는 용매이면 특별히 제한되지 않으며, 일례로 클로로포름, 염화메틸렌, 1,2-디클로로에탄, 1,1,2-트리클로로에탄, 클로로벤젠, o-디클로로벤젠 등의 염소계 용매; 테트라하이드로퓨란, 디옥산 등의 에테르계 용매; 톨루엔, 크실렌, 트리메틸벤젠, 메시틸렌 등의 방향족 탄화수소계 용매; 시클로헥산, 메틸시클로헥산, n-펜탄, n-헥산, n-헵탄, n-옥탄, n-노난, n-데칸 등의 지방족 탄화수소계 용매; 아세톤, 메틸에틸케톤, 시클로헥사논 등의 케톤계 용매; 아세트산에틸, 아세트산부틸, 에틸셀로솔브아세테이트 등의 에스테르계 용매; 에틸렌글리콜, 에틸렌글리콜모노부틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노메틸에테르, 디메톡시에탄, 프로필렌글리콜, 디에톡시메탄, 트리에틸렌글리콜모노에틸에테르, 글리세린, 1,2-헥산디올 등의 다가 알코올 및 그의 유도체; 메탄올, 에탄올, 프로판올, 이소프로판올, 시클로헥산올 등의 알코올계 용매; 디메틸술폭사이드 등의 술폭사이드계 용매; 및 N-메틸-2-피롤리돈, N,N-디메틸포름아미드 등의 아미드계 용매; 부틸벤조에이트, 메틸-2-메톡시벤조에이트 등의 벤조에이트계 용매; 테트랄린; 3-페녹시톨루엔 등의 용매를 들 수 있다. 또한, 상술한 용매를 1종 단독으로 사용하거나 2종 이상의 용매를 혼합하여 사용할 수 있다. 바람직하게는 상기 용매로 톨루엔을 사용할 수 있다. The solvent is not particularly limited as long as it can dissolve or disperse the compound according to the present invention, and examples thereof include chloroform, methylene chloride, 1,2-dichloroethane, 1,1,2-trichloroethane, chlorobenzene, o -Chlorinated solvents such as dichlorobenzene; ether solvents such as tetrahydrofuran and dioxane; aromatic hydrocarbon solvents such as toluene, xylene, trimethylbenzene, and mesitylene; aliphatic hydrocarbon-based solvents such as cyclohexane, methylcyclohexane, n-pentane, n-hexane, n-heptane, n-octane, n-nonane, and n-decane; Ketone solvents, such as acetone, methyl ethyl ketone, and cyclohexanone; Ester solvents, such as ethyl acetate, butyl acetate, and ethyl cellosolve acetate; Ethylene glycol, ethylene glycol monobutyl ether, ethylene glycol monoethyl ether, ethylene glycol monomethyl ether, dimethoxyethane, propylene glycol, diethoxymethane, triethylene glycol monoethyl ether, glycerin, 1,2-hexanediol, etc. alcohol and its derivatives; alcohol solvents such as methanol, ethanol, propanol, isopropanol, and cyclohexanol; sulfoxide solvents such as dimethyl sulfoxide; and amide solvents such as N-methyl-2-pyrrolidone and N,N-dimethylformamide; benzoate solvents such as butyl benzoate and methyl-2-methoxy benzoate; tetralin; Solvents, such as 3-phenoxytoluene, are mentioned. In addition, the above-mentioned solvent may be used alone or in combination of two or more solvents. Preferably, toluene may be used as the solvent.
또한, 상기 코팅 조성물은 호스트 재료로 사용되는 화합물을 더 포함할 수 있고, 상기 호스트 재료에 사용되는 화합물에 대한 설명은 후술한다. 또한, 상기 코팅 조성물은 도펀트 재료로 사용되는 화합물을 포함할 수 있고, 상기 도펀트 재료에 사용되는 화합물에 대한 설명은 후술한다.In addition, the coating composition may further include a compound used as a host material, and a description of the compound used for the host material will be described later. In addition, the coating composition may include a compound used as a dopant material, and a description of the compound used for the dopant material will be described later.
또한, 상기 코팅 조성물의 점도는 1 cP 이상이 바람직하다. 또한, 상기 코팅 조성물의 코팅 용이성을 감안하여, 상기 코팅 조성물의 점도는 10 cP 이하가 바람직하다. 또한, 상기 코팅 조성물 내 본 발명에 따른 화합물의 농도는 0.1 wt/v% 이상이 바람직하다. 또한, 상기 코팅 조성물이 최적으로 코팅될 수 있도록, 상기 코팅 조성물 내 본 발명에 따른 화합물의 농도는 20 wt/v%이하가 바람직하다. In addition, the viscosity of the coating composition is preferably 1 cP or more. In addition, considering the ease of coating of the coating composition, the viscosity of the coating composition is preferably 10 cP or less. Also, the concentration of the compound according to the present invention in the coating composition is preferably 0.1 wt/v% or more. In addition, the concentration of the compound according to the present invention in the coating composition is preferably 20 wt / v% or less so that the coating composition can be coated optimally.
또한, 본 발명은 상술한 코팅 조성물을 사용하여 발광층을 형성하는 방법을 제공한다. 구체적으로, 양극 상에, 또는 양극 상에 형성된 정공 수송층 상에 상술한 본 발명에 따른 발광층을 용액 공정으로 코팅하는 단계; 및 상기 코팅된 코팅 조성물을 열처리하는 단계를 포함한다. In addition, the present invention provides a method of forming a light emitting layer using the coating composition described above. Specifically, coating the light emitting layer according to the present invention described above on the anode or on the hole transport layer formed on the anode by a solution process; and heat-treating the coated coating composition.
상기 용액 공정은 상술한 본 발명에 따른 코팅 조성물을 사용하는 것으로, 스핀 코팅, 딥코팅, 닥터 블레이딩, 잉크젯 프린팅, 스크린 프린팅, 스프레이법, 롤 코팅 등을 의미하지만, 이들만으로 한정되는 것은 아니다.The solution process uses the above-described coating composition according to the present invention, and includes spin coating, dip coating, doctor blading, inkjet printing, screen printing, spraying, roll coating, etc., but is not limited thereto.
상기 열처리 단계에서 열처리 온도는 150 내지 230℃가 바람직하다. 또한, 상기 열처리 시간은 1분 내지 3시간이고, 보다 바람직하게는 10분 내지 1시간이다. 또한, 상기 열처리는 아르곤, 질소 등의 불활성 기체 분위기에서 수행하는 것이 바람직하다. In the heat treatment step, the heat treatment temperature is preferably 150 to 230 °C. In addition, the heat treatment time is 1 minute to 3 hours, more preferably 10 minutes to 1 hour. In addition, the heat treatment is preferably performed in an inert gas atmosphere such as argon or nitrogen.
(유기 발광 소자)(organic light emitting element)
또한, 본 발명은 상기 화학식 1로 표시되는 화합물을 포함하는 유기 발광 소자를 제공한다. 일례로, 본 발명은 제1 전극; 상기 제1 전극과 대향하여 구비된 제2 전극; 및 상기 제1 전극과 상기 제2 전극 사이에 구비된 발광층을 포함하는 유기 발광 소자로서, 상기 유기물층 중 1층 이상은 상기 화학식 1로 표시되는 화합물을 포함하는, 유기 발광 소자를 제공한다.In addition, the present invention provides an organic light emitting device including the compound represented by Formula 1 above. In one example, the present invention provides a first electrode; a second electrode provided to face the first electrode; and an emission layer provided between the first electrode and the second electrode, wherein at least one of the organic material layers includes the compound represented by Chemical Formula 1.
본 발명의 유기 발광 소자의 유기물 층은 단층 구조로 이루어질 수도 있으나, 2층 이상의 유기물층이 적층된 다층 구조로 이루어질 수 있다. 예컨대, 본 발명의 유기 발광 소자는 유기물 층으로서 정공주입층, 정공수송층, 발광층, 전자수송층, 전자주입층 등을 포함하는 구조를 가질 수 있다. 그러나 유기 발광 소자의 구조는 이에 한정되지 않고 더 적은 수의 유기층을 포함할 수 있다.The organic material layer of the organic light emitting device of the present invention may have a single-layer structure, or may have a multi-layer structure in which two or more organic material layers are stacked. For example, the organic light emitting device of the present invention may have a structure including a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, and the like as organic layers. However, the structure of the organic light emitting device is not limited thereto and may include fewer organic layers.
또한, 상기 유기물 층은 발광층을 포함할 수 있고, 상기 발광층은 상기 화학식 1로 표시되는 화합물을 포함한다. 특히, 본 발명에 따른 화합물은 발광층의 도펀트로 사용할 수 있다.Also, the organic layer may include a light emitting layer, and the light emitting layer includes the compound represented by Chemical Formula 1. In particular, the compound according to the present invention can be used as a dopant of the light emitting layer.
또한, 본 발명에 따른 유기 발광 소자는, 기판 상에 양극, 1층 이상의 유기물층 및 음극이 순차적으로 적층된 구조(normal type)의 유기 발광 소자일 수 있다. 또한, 본 발명에 따른 유기 발광 소자는 기판 상에 음극, 1층 이상의 유기물층 및 양극이 순차적으로 적층된 역방향 구조(inverted type)의 유기 발광 소자일 수 있다. 예컨대, 본 발명의 일실시예에 따른 유기 발광 소자의 구조는 도 1 및 2에 예시되어 있다.Also, the organic light emitting device according to the present invention may be a normal type organic light emitting device in which an anode, one or more organic material layers, and a cathode are sequentially stacked on a substrate. In addition, the organic light emitting device according to the present invention may be an organic light emitting device of an inverted type in which a cathode, one or more organic material layers, and an anode are sequentially stacked on a substrate. For example, the structure of an organic light emitting device according to an embodiment of the present invention is illustrated in FIGS. 1 and 2 .
도 1은 기판(1), 양극(2), 발광층(3), 음극(4)으로 이루어진 유기 발광 소자의 예를 도시한 것이다. 이와 같은 구조에 있어서, 상기 화학식 1로 표시되는 화합물은 상기 발광층에 포함될 수 있다. 1 shows an example of an organic light emitting device composed of a substrate 1, an anode 2, a light emitting layer 3, and a cathode 4. In this structure, the compound represented by Chemical Formula 1 may be included in the light emitting layer.
도 2는 기판 (1), 양극(2), 정공주입층(5), 정공수송층(6), 발광층(7), 전자주입 및 수송층(8) 및 음극(4)으로 이루어진 유기 발광 소자의 예를 도시한 것이다. 이와 같은 구조에 있어서, 상기 화학식 1로 표시되는 화합물은 상기 발광층에 포함될 수 있다.2 is an example of an organic light emitting device composed of a substrate (1), an anode (2), a hole injection layer (5), a hole transport layer (6), a light emitting layer (7), an electron injection and transport layer (8), and a cathode (4). is shown. In this structure, the compound represented by Chemical Formula 1 may be included in the light emitting layer.
본 발명에 따른 유기 발광 소자는, 상기 유기물 층 중 1층 이상이 상기 화학식 1로 표시되는 화합물을 포함하는 것을 제외하고는 당 기술분야에 알려져 있는 재료와 방법으로 제조될 수 있다. 또한, 상기 유기 발광 소자가 복수개의 유기물층을 포함하는 경우, 상기 유기물층은 동일한 물질 또는 다른 물질로 형성될 수 있다. The organic light emitting device according to the present invention may be manufactured using materials and methods known in the art, except that at least one of the organic layers includes the compound represented by Chemical Formula 1. Also, when the organic light emitting device includes a plurality of organic material layers, the organic material layers may be formed of the same material or different materials.
예컨대, 본 발명에 따른 유기 발광 소자는 기판 상에 양극, 유기물층 및 음극을 순차적으로 적층시켜 제조할 수 있다. 이때, 스퍼터링법(sputtering)이나 전자빔 증발법(e-beam evaporation)과 같은 PVD(physical Vapor Deposition) 방법을 이용하여, 기판 상에 금속 또는 전도성을 가지는 금속 산화물 또는 이들의 합금을 증착시켜 양극을 형성하고, 그 위에 정공 주입층, 정공 수송층, 발광층 및 전자 수송층을 포함하는 유기물 층을 형성한 후, 그 위에 음극으로 사용할 수 있는 물질을 증착시켜 제조할 수 있다. For example, the organic light emitting device according to the present invention may be manufactured by sequentially stacking an anode, an organic material layer, and a cathode on a substrate. At this time, using a physical vapor deposition (PVD) method such as sputtering or e-beam evaporation, depositing a metal or a metal oxide having conductivity or an alloy thereof on the substrate to form an anode After forming an organic material layer including a hole injection layer, a hole transport layer, a light emitting layer, and an electron transport layer thereon, and depositing a material that can be used as a cathode thereon, it can be prepared.
이와 같은 방법 외에도, 기판 상에 음극 물질로부터 유기물층, 양극 물질을 차례로 증착시켜 유기 발광 소자를 제조할 수 있다(WO 2003/012890). 다만, 제조 방법이 이에 한정되는 것은 아니다. In addition to this method, an organic light emitting device may be manufactured by sequentially depositing an organic material layer and an anode material on a substrate from a cathode material (WO 2003/012890). However, the manufacturing method is not limited thereto.
일례로, 상기 제1 전극은 양극이고, 상기 제2 전극은 음극이거나, 또는 상기 제1 전극은 음극이고, 상기 제2 전극은 양극이다.In one example, the first electrode is an anode and the second electrode is a cathode, or the first electrode is a cathode and the second electrode is an anode.
상기 양극 물질로는 통상 유기물층으로 정공 주입이 원활할 수 있도록 일함수가 큰 물질이 바람직하다. 상기 양극 물질의 구체적인 예로는 바나듐, 크롬, 구리, 아연, 금과 같은 금속 또는 이들의 합금; 아연 산화물, 인듐 산화물, 인듐주석 산화물(ITO), 인듐아연 산화물(IZO)과 같은 금속 산화물; ZnO:Al 또는 SnO2:Sb와 같은 금속과 산화물의 조합; 폴리(3-메틸티오펜), 폴리[3,4-(에틸렌-1,2-디옥시)티오펜](PEDOT), 폴리피롤 및 폴리아닐린과 같은 전도성 화합물 등이 있으나, 이들에만 한정되는 것은 아니다. As the anode material, a material having a high work function is generally preferable so that holes can be smoothly injected into the organic material layer. Specific examples of the cathode material include metals such as vanadium, chromium, copper, zinc, and gold or alloys thereof; metal oxides such as zinc oxide, indium oxide, indium tin oxide (ITO), and indium zinc oxide (IZO); combinations of metals and oxides such as ZnO:Al or SnO2:Sb; conductive compounds such as poly(3-methylthiophene), poly[3,4-(ethylene-1,2-dioxy)thiophene] (PEDOT), polypyrrole, and polyaniline; and the like, but are not limited thereto.
상기 음극 물질로는 통상 유기물층으로 전자 주입이 용이하도록 일함수가 작은 물질인 것이 바람직하다. 상기 음극 물질의 구체적인 예로는 마그네슘, 칼슘, 나트륨, 칼륨, 티타늄, 인듐, 이트륨, 리튬, 가돌리늄, 알루미늄, 은, 주석 및 납과 같은 금속 또는 이들의 합금; LiF/Al 또는 LiO2/Al과 같은 다층 구조 물질 등이 있으나, 이들에만 한정되는 것은 아니다. The cathode material is preferably a material having a small work function so as to easily inject electrons into the organic material layer. Specific examples of the anode material include metals such as magnesium, calcium, sodium, potassium, titanium, indium, yttrium, lithium, gadolinium, aluminum, silver, tin, and lead, or alloys thereof; There are multi-layered materials such as LiF/Al or LiO 2 /Al, but are not limited thereto.
상기 정공주입층은 전극으로부터 정공을 주입하는 층으로, 정공 주입 물질로는 정공을 수송하는 능력을 가져 양극에서의 정공 주입효과, 발광층 또는 발광재료에 대하여 우수한 정공 주입 효과를 갖고, 발광층에서 생성된 여기자의 전자주입층 또는 전자주입재료에의 이동을 방지하며, 또한, 박막 형성 능력이 우수한 화합물이 바람직하다. 정공 주입 물질의 HOMO(highest occupied molecular orbital)가 양극 물질의 일함수와 주변 유기물 층의 HOMO 사이인 것이 바람직하다. 정공 주입 물질의 구체적인 예로는 금속 포피린(porphyrin), 올리고티오펜, 아릴아민 계열의 유기물, 헥사니트릴헥사아자트리페닐렌 계열의 유기물, 퀴나크리돈(quinacridone)계열의 유기물, 페릴렌(perylene) 계열의 유기물, 안트라퀴논 및 폴리아닐린과 폴리티오펜 계열의 전도성 화합물 등이 있으나, 이들에만 한정되는 것은 아니다. The hole injection layer is a layer for injecting holes from the electrode, and the hole injection material has the ability to transport holes and has a hole injection effect at the anode, an excellent hole injection effect for the light emitting layer or the light emitting material, and generated in the light emitting layer A compound that prevents migration of excitons to the electron injecting layer or electron injecting material and has excellent thin film formation ability is preferred. It is preferable that the highest occupied molecular orbital (HOMO) of the hole injection material is between the work function of the anode material and the HOMO of the surrounding organic layer. Specific examples of the hole injection material include metal porphyrins, oligothiophenes, arylamine-based organic materials, hexanitrilehexaazatriphenylene-based organic materials, quinacridone-based organic materials, and perylene-based organic materials. of organic matter, anthraquinone, and polyaniline and polythiophene-based conductive compounds, but are not limited thereto.
상기 정공수송층은 정공주입층으로부터 정공을 수취하여 발광층까지 정공을 수송하는 층으로, 정공 수송 물질로는 양극이나 정공 주입층으로부터 정공을 수송받아 발광층으로 옮겨줄 수 있는 물질로 정공에 대한 이동성이 큰 물질이 적합하다. 구체적인 예로는 아릴아민 계열의 유기물, 전도성 화합물, 및 공액 부분과 비공액 부분이 함께 있는 블록 공중합체 등이 있으나, 이들에만 한정되는 것은 아니다. The hole transport layer is a layer that receives holes from the hole injection layer and transports the holes to the light emitting layer. The hole transport material is a material that can receive holes from the anode or the hole injection layer and transfer them to the light emitting layer, and has high hole mobility. material is suitable. Specific examples include, but are not limited to, arylamine-based organic materials, conductive compounds, and block copolymers having both conjugated and non-conjugated parts.
상기 발광층은 호스트 재료 및 도펀트 재료를 포함할 수 있다. 호스트 재료로는 축합 방향족환 유도체 또는 헤테로환 함유 화합물 등을 사용할 수 있다. 구체적으로 축합 방향족환 유도체로는 안트라센 유도체, 피렌 유도체, 나프탈렌 유도체, 펜타센 유도체, 페난트렌 화합물, 플루오란텐 화합물 등이 있고, 헤테로환 함유 화합물로는 카바졸 유도체, 디벤조퓨란 유도체, 래더형 퓨란 화합물, 피리미딘 유도체 등이 있으나, 이에 한정되지 않는다. The light emitting layer may include a host material and a dopant material. As the host material, a condensed aromatic ring derivative or a compound containing a heterocyclic ring can be used. Specifically, condensed aromatic ring derivatives include anthracene derivatives, pyrene derivatives, naphthalene derivatives, pentacene derivatives, phenanthrene compounds, fluoranthene compounds, etc., and heterocyclic-containing compounds include carbazole derivatives, dibenzofuran derivatives, ladder type furan compounds, pyrimidine derivatives, etc., but are not limited thereto.
도펀트 재료로는 방향족 아민 유도체, 스트릴아민 화합물, 붕소 착체, 플루오란텐 화합물, 금속 착체 등이 있다. 구체적으로 방향족 아민 유도체로는 치환 또는 비치환된 아릴아미노기를 갖는 축합 방향족환 유도체로서, 아릴아미노기를 갖는 피렌, 안트라센, 크리센, 페리플란텐 등이 있으며, 스티릴아민 화합물로는 치환 또는 비치환된 아릴아민에 적어도 1개의 아릴비닐기가 치환되어 있는 화합물로, 아릴기, 실릴기, 알킬기, 사이클로알킬기 및 아릴아미노기로 이루어진 군에서 1 또는 2 이상 선택되는 치환기가 치환 또는 비치환된다. 구체적으로 스티릴아민, 스티릴디아민, 스티릴트리아민, 스티릴테트라아민 등이 있으나, 이에 한정되지 않는다. 또한, 금속 착체로는 이리듐 착체, 백금 착체 등이 있으나, 이에 한정되지 않는다.Dopant materials include aromatic amine derivatives, strylamine compounds, boron complexes, fluoranthene compounds, metal complexes, and the like. Specifically, aromatic amine derivatives are condensed aromatic ring derivatives having a substituted or unsubstituted arylamino group, such as pyrene, anthracene, chrysene, periplanthene, etc. having an arylamino group, and styrylamine compounds include substituted or unsubstituted arylamine is substituted with at least one arylvinyl group, wherein one or two or more substituents selected from the group consisting of an aryl group, a silyl group, an alkyl group, a cycloalkyl group, and an arylamino group are substituted or unsubstituted. Specifically, there are styrylamine, styryldiamine, styryltriamine, styryltetraamine, etc., but is not limited thereto. In addition, metal complexes include, but are not limited to, iridium complexes and platinum complexes.
상기 전자 주입 및 수송층은 전극으로부터 전자를 주입하고, 수취된 전자를 발광층까지 수송하는 전자수송층 및 전자주입층의 역할을 동시에 수행하는 층으로, 상기 발광층 또는 상기 전자조절층 상에 형성된다. 이러한 전자 주입 및 수송물질로는 음극으로부터 전자를 잘 주입 받아 발광층으로 옮겨줄 수 있는 물질로서, 전자에 대한 이동성이 큰 물질이 적합하다. 구체적인 전자 주입 및 수송물질의 예로는 8-히드록시퀴놀린의 Al 착물; Alq3를 포함한 착물; 유기 라디칼 화합물; 히드록시플라본-금속 착물; 트리아진 유도체 등이 있으나, 이들에만 한정되는 것은 아니다. 또는 LiF, NaF, NaCl, CsF, Li2O, BaO, 플루오레논, 안트라퀴노다이메탄, 다이페노퀴논, 티오피란 다이옥사이드, 옥사졸, 옥사다이아졸, 트리아졸, 이미다졸, 페릴렌테트라카복실산, 프레오레닐리덴 메탄, 안트론 등과 그들의 유도체, 금속 착체 화합물, 또는 질소 함유 5원환 유도체 등을 사용할 수도 있으나, 이에 한정되는 것은 아니다. The electron injection and transport layer is a layer that simultaneously serves as an electron transport layer and an electron injection layer for injecting electrons from an electrode and transporting the received electrons to the light emitting layer, and is formed on the light emitting layer or the electron control layer. As such an electron injecting and transporting material, a material capable of receiving electrons from the cathode and transferring them to the light emitting layer is suitable. Examples of specific electron injection and transport materials include Al complexes of 8-hydroxyquinoline; Complexes containing Alq 3 ; organic radical compounds; hydroxyflavone-metal complexes; triazine derivatives, etc., but are not limited thereto. or LiF, NaF, NaCl, CsF, Li 2 O, BaO, fluorenone, anthraquinodimethane, diphenoquinone, thiopyran dioxide, oxazole, oxadiazole, triazole, imidazole, perylenetetracarboxylic acid, pre Orenylidene methane, anthrone, and the like and derivatives thereof, metal complex compounds, or nitrogen-containing 5-membered ring derivatives may be used, but are not limited thereto.
상기 금속 착체 화합물로서는 8-하이드록시퀴놀리나토 리튬, 비스(8-하이드록시퀴놀리나토)아연, 비스(8-하이드록시퀴놀리나토)구리, 비스(8-하이드록시퀴놀리나토)망간, 트리스(8-하이드록시퀴놀리나토)알루미늄, 트리스(2-메틸-8-하이드록시퀴놀리나토)알루미늄, 트리스(8-하이드록시퀴놀리나토)갈륨, 비스(10-하이드록시벤조[h]퀴놀리나토)베릴륨, 비스(10-하이드록시벤조[h]퀴놀리나토)아연, 비스(2-메틸-8-퀴놀리나토)클로로갈륨, 비스(2-메틸-8-퀴놀리나토)(o-크레졸라토)갈륨, 비스(2-메틸-8-퀴놀리나토)(1-나프톨라토)알루미늄, 비스(2-메틸-8-퀴놀리나토)(2-나프톨라토)갈륨 등이 있으나, 이에 한정되지 않는다.Examples of the metal complex compound include 8-hydroxyquinolinato lithium, bis(8-hydroxyquinolinato)zinc, bis(8-hydroxyquinolinato)copper, bis(8-hydroxyquinolinato)manganese, Tris(8-hydroxyquinolinato) aluminum, tris(2-methyl-8-hydroxyquinolinato) aluminum, tris(8-hydroxyquinolinato) gallium, bis(10-hydroxybenzo[h] Quinolinato) beryllium, bis(10-hydroxybenzo[h]quinolinato)zinc, bis(2-methyl-8-quinolinato)chlorogallium, bis(2-methyl-8-quinolinato)( There are o-cresolato) gallium, bis(2-methyl-8-quinolinato)(1-naphtolato)aluminum, and bis(2-methyl-8-quinolinato)(2-naphtolato)gallium. Not limited to this.
상술한 재료 외에도, 상기 발광층, 정공 주입층, 정공 수송층, 전자 수송층, 및 전자 주입층에는 퀀텀닷 등의 무기 화합물 또는 고분자 화합물을 추가로 포함할 수 있다.In addition to the above-described materials, an inorganic compound such as a quantum dot or a polymer compound may be further included in the light emitting layer, the hole injection layer, the hole transport layer, the electron transport layer, and the electron injection layer.
상기 퀀텀닷은 예를 들어, 콜로이드 퀀텀닷, 합금 퀀텀닷, 코어셸 퀀텀닷, 또는 코어 퀀텀닷일 수 있다. 제2족 및 제16족에 속하는 원소, 제13족 및 제15족에 속하는 원소, 제13족 및 제17족에 속하는 원소, 제11족 및 제17족에 속하는 원소, 또는 제14족 및 제15족에 속하는 원소를 포함하는 퀀텀닷일 수 있으며, 카드뮴(Cd), 셀레늄(Se), 아연(Zn), 황(S), 인(P), 인듐(In), 텔루륨(Te), 납(Pb), 갈륨(Ga), 비소(As) 등의 원소를 포함하는 퀀텀닷이 사용될 수 있다.The quantum dot may be, for example, a colloidal quantum dot, an alloy quantum dot, a core-shell quantum dot, or a core quantum dot. An element belonging to groups 2 and 16, an element belonging to groups 13 and 15, an element belonging to groups 13 and 17, an element belonging to groups 11 and 17, or an element belonging to groups 14 and 17 It may be a quantum dot containing elements belonging to group 15, such as cadmium (Cd), selenium (Se), zinc (Zn), sulfur (S), phosphorus (P), indium (In), tellurium (Te), lead Quantum dots including elements such as (Pb), gallium (Ga), and arsenic (As) may be used.
본 발명에 따른 유기 발광 소자는 배면 발광(bottom emission) 소자, 전면 발광(top emission) 소자, 또는 양면 발광 소자일 수 있으며, 특히 상대적으로 높은 발광 효율이 요구되는 배면 발광 소자일 수 있다.The organic light emitting device according to the present invention may be a bottom emission device, a top emission device, or a double-sided light emitting device, and in particular, may be a bottom emission device requiring relatively high light emitting efficiency.
또한, 본 발명에 따른 화합물은 유기 발광 소자 외에도 유기 태양 전지 또는 유기 트랜지스터에 포함될 수 있다.In addition, the compound according to the present invention may be included in an organic solar cell or an organic transistor in addition to an organic light emitting device.
상기 화학식 1로 표시되는 화합물 및 이를 포함하는 유기 발광 소자의 제조는 이하 실시예에서 구체적으로 설명한다. 그러나 하기 실시예는 본 발명을 예시하기 위한 것이며, 본 발명의 범위가 이들에 의하여 한정되는 것은 아니다.Preparation of the compound represented by Chemical Formula 1 and the organic light emitting device including the same will be described in detail in the following examples. However, the following examples are intended to illustrate the present invention, and the scope of the present invention is not limited thereto.
[실시예][Example]
실시예 1: 화합물 1의 제조Example 1: Preparation of Compound 1
화합물 1-a(1.0 eq.), NaOt-Bu(4 eq.), 및 화합물 1-b(1.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.1 M)에 용해시켰다. Bath 온도 120 °C 하에서 Pd(t-Bu3P)2(5 mol%)를 적가하고 2시간 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 1-c(91% 수율)를 제조하였다.Compound 1-a (1.0 eq.), NaO t -Bu (4 eq.), and compound 1-b (1.05 eq.) were placed in a round bottom flask and dissolved in anhydrous PhMe (0.1 M). Pd( t -Bu 3 P) 2 (5 mol%) was added dropwise under a bath temperature of 120 °C and stirred for 2 hours. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to prepare compound 1-c (91% yield).
화합물 1-d(1.0 eq.), NaOt-Bu(4 eq.), 및 화합물 1-c(2.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.1 M)에 용해시켰다. Bath 온도 120 °C 하에서 Pd(t-Bu3P)2(5 mol%)를 적가하고 4시간 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 1-e(83% 수율)를 제조하였다.Compound 1-d (1.0 eq.), NaO t -Bu (4 eq.), and compound 1-c (2.05 eq.) were placed in a round bottom flask and dissolved in anhydrous PhMe (0.1 M). Pd( t -Bu 3 P) 2 (5 mol%) was added dropwise under a bath temperature of 120 °C and stirred for 4 hours. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to prepare compound 1-e (83% yield).
화합물 1-e(1.0 eq.), NaOt-Bu(4 eq.), 및 화합물 1-f(1.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.1 M)에 용해시켰다. Bath 온도 120 °C 하에서 Pd(t-Bu3P)2(5 mol%)를 적가하고 하룻밤 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 1-g(76% 수율)를 제조하였다.Compound 1-e (1.0 eq.), NaO t -Bu (4 eq.), and compound 1-f (1.05 eq.) were placed in a round bottom flask and dissolved in anhydrous PhMe (0.1 M). Pd( t -Bu 3 P) 2 (5 mol%) was added dropwise under a bath temperature of 120 °C and stirred overnight. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to prepare compound 1-g (76% yield).
화합물 1-g(1.0 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.03 M)에 용해시켰다. 반응물에 BI3(2.0 eq.)를 천천히 적가하고 bath 온도 80 °C 하에서 하룻밤 동안 교반하였다. 반응 후, 반응물을 상온에서 충분히 식히고 CH2Cl2로 묽힌다. 반응물에 EtNi-Pr2(15.0 eq.)와 sat.Na2S2O3(aq.)를 차례로 적가하고, CH2Cl2/H2O로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 1(70% 수율)를 제조하였다.Compound 1-g (1.0 eq.) was placed in a round bottom flask and dissolved in anhydrous PhMe (0.03 M). BI 3 (2.0 eq.) was slowly added dropwise to the reaction mixture and stirred overnight under a bath temperature of 80 °C. After the reaction, the reactant was sufficiently cooled at room temperature and diluted with CH 2 Cl 2 . EtN i -Pr 2 (15.0 eq.) and sat.Na 2 S 2 O 3 (aq.) were sequentially added dropwise to the reactant, washed with CH 2 Cl 2 /H 2 O, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to prepare Compound 1 (70% yield).
m/z [M+H]+ 978.9m/z [M+H] + 978.9
실시예 2: 화합물 2의 제조Example 2: Preparation of Compound 2
화합물 1-f 대신 화합물 2-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 2를 제조하였다.Compound 2 was prepared in the same manner as in Compound 1, except that Compound 2-a was used instead of Compound 1-f.
m/z [M+H]+ 1006.8m/z [M+H] + 1006.8
실시예 3: 화합물 3의 제조Example 3: Preparation of Compound 3
화합물 1-f 대신 화합물 3-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 3을 제조하였다.Compound 3 was prepared in the same manner as the method for preparing compound 1, except that compound 3-a was used instead of compound 1-f.
m/z [M+H]+ 1062.9m/z [M+H] + 1062.9
실시예 4: 화합물 4의 제조Example 4: Preparation of Compound 4
화합물 1-f 대신 화합물 4-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 4을 제조하였다.Compound 4 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 4-a was used instead of Compound 1-f.
m/z [M+H]+ 1090.6m/z [M+H] + 1090.6
실시예 5: 화합물 5의 제조Example 5: Preparation of Compound 5
화합물 1-f 대신 화합물 5-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 5를 제조하였다.Compound 5 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 5-a was used instead of Compound 1-f.
m/z [M+H]+ 1006.4m/z [M+H] + 1006.4
실시예 6: 화합물 6의 제조Example 6: Preparation of Compound 6
화합물 1-f 대신 화합물 6-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 6을 제조하였다.Compound 6 was prepared in the same manner as the method for preparing compound 1, except that compound 6-a was used instead of compound 1-f.
m/z [M+H]+ 1034.8m/z [M+H] + 1034.8
실시예 7: 화합물 7의 제조Example 7: Preparation of compound 7
화합물 1-f 대신 화합물 7-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 7을 제조하였다.Compound 7 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 7-a was used instead of Compound 1-f.
m/z [M+H]+ 1032.6m/z [M+H] + 1032.6
실시예 8: 화합물 8의 제조Example 8: Preparation of Compound 8
화합물 1-f 대신 화합물 8-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 8을 제조하였다.Compound 8 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 8-a was used instead of Compound 1-f.
m/z [M+H]+ 1018.7m/z [M+H] + 1018.7
실시예 9: 화합물 9의 제조Example 9: Preparation of compound 9
화합물 1-f 대신 화합물 9-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 9를 제조하였다.Compound 9 was prepared in the same manner as the method for preparing compound 1, except that compound 9-a was used instead of compound 1-f.
m/z [M+H]+ 1088.6m/z [M+H] + 1088.6
실시예 10: 화합물 10의 제조Example 10: Preparation of compound 10
화합물 1-f 대신 화합물 10-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 10을 제조하였다.Compound 10 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 10-a was used instead of Compound 1-f.
m/z [M+H]+ 1046.4m/z [M+H] + 1046.4
실시예 11: 화합물 11의 제조Example 11: Preparation of Compound 11
화합물 1-f 대신 화합물 11-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 11을 제조하였다.Compound 11 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 11-a was used instead of Compound 1-f.
m/z [M+H]+ 1033.5m/z [M+H] + 1033.5
실시예 12: 화합물 12의 제조Example 12: Preparation of compound 12
화합물 1-f 대신 화합물 12-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 12를 제조하였다.Compound 12 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 12-a was used instead of Compound 1-f.
m/z [M+H]+ 1061.2m/z [M+H] + 1061.2
실시예 13: 화합물 13의 제조Example 13: Preparation of compound 13
화합물 1-f 대신 화합물 13-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 13을 제조하였다.Compound 13 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 13-a was used instead of Compound 1-f.
m/z [M+H]+ 1075.8m/z [M+H] + 1075.8
실시예 14: 화합물 14의 제조Example 14: Preparation of compound 14
화합물 1-f 대신 화합물 14-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 14를 제조하였다.Compound 14 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 14-a was used instead of Compound 1-f.
m/z [M+H]+ 1101.6m/z [M+H] + 1101.6
실시예 15: 화합물 15의 제조Example 15: Preparation of compound 15
화합물 1-f 대신 화합물 15-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 15를 제조하였다.Compound 15 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 15-a was used instead of Compound 1-f.
m/z [M+H]+ 1095.4m/z [M+H] + 1095.4
실시예 16: 화합물 16의 제조Example 16: Preparation of compound 16
화합물 1-f 대신 화합물 16-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 16을 제조하였다.Compound 16 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 16-a was used instead of Compound 1-f.
m/z [M+H]+ 985.7m/z [M+H] + 985.7
실시예 17: 화합물 17의 제조Example 17: Preparation of compound 17
화합물 1-f 대신 화합물 17-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 17을 제조하였다.Compound 17 was prepared in the same manner as in Compound 1, except that Compound 17-a was used instead of Compound 1-f.
m/z [M+H]+ 1027.8m/z [M+H] + 1027.8
실시예 18: 화합물 18의 제조Example 18: Preparation of compound 18
화합물 1-f 대신 화합물 18-a를 사용한 것을 제외하고는 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 18을 제조하였다.Compound 18 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 18-a was used instead of Compound 1-f.
m/z [M+H]+ 1053.8m/z [M+H] + 1053.8
실시예 19: 화합물 19의 제조Example 19: Preparation of compound 19
화합물 1-f 대신 화합물 19-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 19를 제조하였다.Compound 19 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 19-a was used instead of Compound 1-f.
m/z [M+H]+ 1047.6m/z [M+H] + 1047.6
실시예 20: 화합물 20의 제조Example 20: Preparation of compound 20
화합물 1-f 대신 화합물 20-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 20을 제조하였다.Compound 20 was prepared in the same manner as in the method for preparing compound 1, except that compound 20-a was used instead of compound 1-f.
m/z [M+H]+ 983.7m/z [M+H] + 983.7
실시예 21: 화합물 21의 제조Example 21: Preparation of compound 21
화합물 1-f 대신 화합물 21-a를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 21을 제조하였다.Compound 21 was prepared in the same manner as in the preparation method of Compound 1, except that Compound 21-a was used instead of Compound 1-f.
m/z [M+H]+ 1025.8m/z [M+H] + 1025.8
실시예 22: 화합물 22의 제조Example 22: Preparation of compound 22
화합물 1-f 대신 화합물 22-a를 사용한 것을 제외하고는, 상기 화합물 1와 동일하게 화합물 22를 제조하였다.Compound 22 was prepared in the same manner as in Compound 1, except that Compound 22-a was used instead of Compound 1-f.
m/z [M+H]+ 1051.8m/z [M+H] + 1051.8
실시예 23: 화합물 23의 제조Example 23: Preparation of compound 23
화합물 1-f 대신 화합물 23-a를 사용한 것을 제외하고는, 상기 화합물 1와 동일하게 화합물 23을 제조하였다.Compound 23 was prepared in the same manner as in Compound 1, except that Compound 23-a was used instead of Compound 1-f.
m/z [M+H]+ 1045.7m/z [M+H] + 1045.7
실시예 24: 화합물 24의 제조Example 24: Preparation of compound 24
화합물 24-a(1.0 eq.), 화합물 24-b(1.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 THF(0.12 M)에 용해시켰다. K2CO3(aq.)(1.5 eq.)를 반응물에 적가한다. Bath 온도 80 °C 하에서 Pd(PPh3)4(1.5 mol%)를 적가하고 하룻밤 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 24-c(83% 수율)를 제조하였다.Compound 24-a (1.0 eq.), compound 24-b (1.05 eq.) were placed in a round bottom flask and dissolved in anhydrous THF (0.12 M). K 2 CO 3 (aq.) (1.5 eq.) is added dropwise to the reaction. Pd(PPh 3 ) 4 (1.5 mol%) was added dropwise under a bath temperature of 80 °C and stirred overnight. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to obtain compound 24-c (83% yield).
추후 합성은 화합물 1-f 대신 화합물 24-c를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 24를 제조하였다.In the subsequent synthesis, compound 24 was prepared in the same manner as the method for preparing compound 1, except that compound 24-c was used instead of compound 1-f.
m/z [M+H]+ 1094.6m/z [M+H] + 1094.6
실시예 25: 화합물 25의 제조Example 25: Preparation of compound 25
화합물 1-a 대신 화합물 25-a를, 화합물 1-b 대신 25-b를 사용한 것을 제외하고는, 상기 화합물 1의 제조 방법과 동일한 방법으로 화합물 25를 제조하였다.Compound 25 was prepared in the same manner as in the method for preparing Compound 1, except that Compound 25-a was used instead of Compound 1-a and 25-b was used instead of Compound 1-b.
m/z [M+H]+ 762.6m/z [M+H] + 762.6
실시예 26: 화합물 26의 제조Example 26: Preparation of compound 26
화합물 1-f 대신 화합물 11-a를 사용한 것을 제외하고는, 상기 화합물 25의 제조 방법과 동일한 방법으로 화합물 26을 제조하였다.Compound 26 was prepared in the same manner as in the method for preparing compound 25, except that compound 11-a was used instead of compound 1-f.
m/z [M+H]+ 817.6m/z [M+H] + 817.6
실시예 27: 화합물 27의 제조Example 27: Preparation of compound 27
화합물 1-d(1.0 eq.), NaOt-Bu(2 eq.), 및 화합물 1-c(1.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.1 M)에 용해시켰다. Bath 온도 80 °C 하에서 Pd(t-Bu3P)2(2.5 mol%)를 적가하고 2시간 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 27-a(67% 수율)를 제조하였다.Compound 1-d (1.0 eq.), NaO t -Bu (2 eq.), and compound 1-c (1.05 eq.) were placed in a round bottom flask and dissolved in anhydrous PhMe (0.1 M). Pd( t -Bu 3 P) 2 (2.5 mol%) was added dropwise under a bath temperature of 80 °C and stirred for 2 hours. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to obtain compound 27-a (67% yield).
화합물 27-a(1.0 eq.), NaOt-Bu(4 eq.), 및 화합물 25-c(1.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.1 M)에 용해시켰다. Bath 온도 120 °C 하에서 Pd(t-Bu3P)2(5mol%)를 적가하고 4시간 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 27-b(78% 수율)를 제조하였다.Compound 27-a (1.0 eq.), NaO t -Bu (4 eq.), and compound 25-c (1.05 eq.) were placed in a round bottom flask and dissolved in anhydrous PhMe (0.1 M). Pd( t -Bu 3 P) 2 (5 mol%) was added dropwise under a bath temperature of 120 °C and stirred for 4 hours. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to obtain compound 27-b (78% yield).
화합물 27-b(1.0 eq.), NaOt-Bu(4 eq.), 및 화합물 1-f(1.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.1 M)에 용해시켰다. Bath 온도 120 °C 하에서 Pd(t-Bu3P)2 (5 mol%)를 적가하고 하룻밤 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 27-c(90% 수율)를 제조하였다.Compound 27-b (1.0 eq.), NaO t -Bu (4 eq.), and compound 1-f (1.05 eq.) were placed in a round bottom flask and dissolved in anhydrous PhMe (0.1 M). Pd( t -Bu 3 P) 2 (5 mol%) was added dropwise under a bath temperature of 120 °C and stirred overnight. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to obtain compound 27-c (90% yield).
화합물 27-c(1.0 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.03 M)에 용해시켰다. 반응물에 BI3(2.0 eq.)를 천천히 적가하고 bath 온도 80 °C 하에서 하룻밤 동안 교반하였다. 반응 후, 반응물을 상온에서 충분히 식히고 CH2Cl2로 묽힌다. 반응물에 EtNi-Pr2(15.0 eq.)와 sat.Na2S2O3(aq.)를 차례로 적가하고, CH2Cl2/H2O로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 27(70% 수율)을 제조하였다.Compound 27-c (1.0 eq.) was placed in a round bottom flask and dissolved in anhydrous PhMe (0.03 M). BI 3 (2.0 eq.) was slowly added dropwise to the reaction mixture and stirred overnight under a bath temperature of 80 °C. After the reaction, the reactant was sufficiently cooled at room temperature and diluted with CH 2 Cl 2 . EtN i -Pr 2 (15.0 eq.) and sat.Na 2 S 2 O 3 (aq.) were sequentially added dropwise to the reactant, washed with CH 2 Cl 2 /H 2 O, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to obtain compound 27 (70% yield).
m/z [M+H]+ 870.6m/z [M+H] + 870.6
실시예 28: 화합물 28의 제조Example 28: Preparation of compound 28
화합물 1-f 대신 화합물 11-a를 사용한 것을 제외하고는, 상기 화합물 27의 제조 방법과 동일한 방법으로 화합물 28을 제조하였다.Compound 28 was prepared in the same manner as the method for preparing compound 27, except that compound 11-a was used instead of compound 1-f.
m/z [M+H]+ 925.4m/z [M+H] + 925.4
실시예 29: 화합물 29의 제조Example 29: Preparation of compound 29
화합물 29-a(1.0 eq.), NaOt-Bu(4 eq.), 및 화합물 1-b(1.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.1 M)에 용해시켰다. Bath 온도 120 °C 하에서 Pd(t-Bu3P)2(5 mol%)를 적가하고 2시간 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 29-b(88% 수율)를 제조하였다.Compound 29-a (1.0 eq.), NaO t -Bu (4 eq.), and compound 1-b (1.05 eq.) were placed in a round bottom flask and dissolved in anhydrous PhMe (0.1 M). Pd( t -Bu 3 P) 2 (5 mol%) was added dropwise under a bath temperature of 120 °C and stirred for 2 hours. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to obtain compound 29-b (88% yield).
화합물 27-a(1.0 eq.), NaOt-Bu(4 eq.), 및 화합물 29-b(1.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.1 M)에 용해시켰다. Bath 온도 120 °C 하에서 Pd(t-Bu3P)2(5 mol%)를 적가하고 4시간 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 29-c(87% 수율)를 제조하였다.Compound 27-a (1.0 eq.), NaO t -Bu (4 eq.), and compound 29-b (1.05 eq.) were placed in a round bottom flask and dissolved in anhydrous PhMe (0.1 M). Pd( t -Bu 3 P) 2 (5 mol%) was added dropwise under a bath temperature of 120 °C and stirred for 4 hours. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to obtain compound 29-c (87% yield).
화합물 29-c(1.0 eq.), NaOt-Bu(4 eq.), 및 화합물 1-f(1.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.1 M)에 용해시켰다. Bath 온도 120 °C 하에서 Pd(t-Bu3P)2(5 mol%)를 적가하고 하룻밤 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 29-d(82% 수율)를 제조하였다.Compound 29-c (1.0 eq.), NaO t -Bu (4 eq.), and compound 1-f (1.05 eq.) were placed in a round bottom flask and dissolved in anhydrous PhMe (0.1 M). Pd( t -Bu 3 P) 2 (5 mol%) was added dropwise under a bath temperature of 120 °C and stirred overnight. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to obtain compound 29-d (82% yield).
화합물 29-d(1.0 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.03 M)에 용해시켰다. 반응물에 BI3(2.0 eq.)를 천천히 적가하고 bath 온도 80 °C 하에서 하룻밤 동안 교반하였다. 반응 후, 반응물을 상온에서 충분히 식히고 CH2Cl2로 묽힌다. 반응물에 EtNi-Pr2(15.0 eq.)와 sat.Na2S2O3(aq.)를 차례로 적가하고, CH2Cl2/H2O로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 29(71% 수율)를 제조하였다.Compound 29-d (1.0 eq.) was placed in a round bottom flask and dissolved in anhydrous PhMe (0.03 M). BI 3 (2.0 eq.) was slowly added dropwise to the reaction mixture and stirred overnight under a bath temperature of 80 °C. After the reaction, the reactant was sufficiently cooled at room temperature and diluted with CH 2 Cl 2 . EtN i -Pr 2 (15.0 eq.) and sat.Na 2 S 2 O 3 (aq.) were sequentially added dropwise to the reactant, washed with CH 2 Cl 2 /H 2 O, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to obtain compound 29 (71% yield).
m/z [M+H]+ 980.4m/z [M+H] + 980.4
실시예 30: 화합물 30의 제조Example 30: Preparation of compound 30
화합물 1-f 대신 화합물 11-a를 사용한 것을 제외하고는, 상기 화합물 29의 제조 방법과 동일한 방법으로 화합물 30을 제조하였다.Compound 30 was prepared in the same manner as the method for preparing compound 29, except that compound 11-a was used instead of compound 1-f.
m/z [M+H]+ 1035.6m/z [M+H] + 1035.6
실시예 31: 화합물 31의 제조Example 31: Preparation of Compound 31
화합물 29-a 대신 화합물 31-a를 사용한 것을 제외하고는, 상기 화합물 29의 제조 방법과 동일한 방법으로 화합물 31을 제조하였다.Compound 31 was prepared in the same manner as in the method for preparing compound 29, except that compound 31-a was used instead of compound 29-a.
m/z [M+H]+ 964.6m/z [M+H] + 964.6
실시예 32: 화합물 32의 제조Example 32: Preparation of compound 32
화합물 1-f 대신 화합물 11-a를 사용한 것을 제외하고는, 상기 화합물 31의 제조 방법과 동일한 방법으로 화합물 32를 제조하였다.Compound 32 was prepared in the same manner as in the method for preparing compound 31, except that compound 11-a was used instead of compound 1-f.
m/z [M+H]+ 1019.8m/z [M+H] + 1019.8
실시예 33: 화합물 33의 제조Example 33: Preparation of compound 33
화합물 29-a 대신 화합물 25-a를, 화합물 1-b 대신 화합물 33-a를 사용한 것을 제외하고는, 상기 화합물 29의 제조 방법과 동일한 방법으로 화합물 33을 제조하였다.Compound 33 was prepared in the same manner as in the method for preparing compound 29, except that compound 25-a was used instead of compound 29-a and compound 33-a was used instead of compound 1-b.
m/z [M+H]+ 946.6m/z [M+H] + 946.6
실시예 34: 화합물 34의 제조Example 34: Preparation of Compound 34
화합물 1-f 대신 화합물 11-a를 사용한 것을 제외하고는, 상기 화합물 33의 제조 방법과 동일한 방법으로 화합물 34를 제조하였다.Compound 34 was prepared in the same manner as the method for preparing compound 33, except that compound 11-a was used instead of compound 1-f.
m/z [M+H]+ 1001.7m/z [M+H] + 1001.7
실시예 35: 화합물 35의 제조Example 35: Preparation of compound 35
화합물 33-a 대신 35-a를 사용한 것을 제외하고는, 상기 화합물 33의 제조 방법과 동일한 방법으로 화합물 35를 제조하였다.Compound 35 was prepared in the same manner as in the method for preparing compound 33, except that 35-a was used instead of compound 33-a.
m/z [M+H]+ 1078.8m/z [M+H] + 1078.8
실시예 36: 화합물 36의 제조Example 36: Preparation of compound 36
화합물 1-f 대신 화합물 11-a를 사용한 것을 제외하고는, 상기 화합물 35의 제조 방법과 동일한 방법으로 화합물 36을 제조하였다.Compound 36 was prepared in the same manner as the method for preparing compound 35, except that compound 11-a was used instead of compound 1-f.
m/z [M+H]+ 1133.6m/z [M+H] + 1133.6
비교예comparative example
비교예 1: 화합물 F의 제조Comparative Example 1: Preparation of Compound F
화합물 1-d(1.0 eq.), NaOt-Bu(4.0 eq.), 및 화합물 F-a(2.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.1 M)에 용해시켰다. Bath 온도 120 °C 하에서 Pd(t-Bu3P)2(5 mol%)를 적가하고 하룻밤 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 F-b(75% 수율)를 제조하였다.Compound 1-d (1.0 eq.), NaO t -Bu (4.0 eq.), and compound Fa (2.05 eq.) were placed in a round bottom flask and dissolved in anhydrous PhMe (0.1 M). Pd( t -Bu 3 P) 2 (5 mol%) was added dropwise under a bath temperature of 120 °C and stirred overnight. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to prepare compound Fb (75% yield).
화합물 F-b(1.0 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.03 M)에 용해시켰다. 반응물에 BI3(2.0 eq.)를 천천히 적가하고 bath 온도 80 °C 하에서 하룻밤 동안 교반하였다. 반응 후, 반응물을 상온에서 충분히 식히고 CH2Cl2로 묽힌다. 반응물에 EtNi-Pr2(15.0 eq.)와 sat.Na2S2O3(aq.)를 차례로 적가하고, CH2Cl2/H2O로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 F(87% 수율)를 제조하였다.Compound Fb (1.0 eq.) was placed in a round bottom flask and dissolved in anhydrous PhMe (0.03 M). BI 3 (2.0 eq.) was slowly added dropwise to the reaction mixture and stirred overnight under a bath temperature of 80 °C. After the reaction, the reactant was sufficiently cooled at room temperature and diluted with CH 2 Cl 2 . EtN i -Pr 2 (15.0 eq.) and sat.Na 2 S 2 O 3 (aq.) were sequentially added dropwise to the reactant, washed with CH 2 Cl 2 /H 2 O, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to prepare compound F (87% yield).
m/z [M+H]+= 659.6m/z [M+H] + = 659.6
비교예 2: 화합물 G의 제조Comparative Example 2: Preparation of Compound G
화합물 F-a 대신 화합물 G-a를 사용한 것을 제외하고는, 상기 화합물 F의 제조 방법과 동일한 방법으로 화합물 G를 제조하였다. Compound G was prepared in the same manner as in the method for preparing compound F, except that compound G-a was used instead of compound F-a.
m/z [M+H]+= 659.5m/z [M+H] + = 659.5
비교예 3: 화합물 H의 제조Comparative Example 3: Preparation of Compound H
화합물 H-a(1.0 eq.), NaOt-Bu(4.0 eq.), 및 화합물 H-b(1.05 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.1 M)에 용해시켰다. Bath 온도 120 °C 하에서 Pd(t-Bu3P)2(5 mol%)를 적가하고 하룻밤 동안 교반하였다. 반응 후, 반응물을 상온에서 식히고 CH2Cl2에 충분히 묽힌 뒤, CH2Cl2/brine로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 H-c(79% 수율)를 제조하였다.Compound Ha (1.0 eq.), NaO t -Bu (4.0 eq.), and compound Hb (1.05 eq.) were placed in a round bottom flask and dissolved in anhydrous PhMe (0.1 M). Pd( t -Bu 3 P) 2 (5 mol%) was added dropwise under a bath temperature of 120 °C and stirred overnight. After the reaction, the reactant was cooled at room temperature, sufficiently diluted with CH 2 Cl 2 , washed with CH 2 Cl 2 /brine, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to obtain compound Hc (79% yield).
화합물 H-c(1.0 eq.)를 둥근 바닥 플라스크에 넣고 무수 PhMe(0.03 M)에 용해시켰다. 반응물에 BI3(2.0 eq.)를 천천히 적가하고 bath 온도 80 °C 하에서 하룻밤 동안 교반하였다. 반응 후, 반응물을 상온에서 충분히 식히고 CH2Cl2로 묽힌다. 반응물에 EtNi-Pr2(15.0 eq.)와 sat.Na2S2O3(aq.)를 차례로 적가하고, CH2Cl2/H2O로 수세하여 유기층을 분리하였다. MgSO4로 물을 제거하고 Celite-Florisil-Silica pad에 통과시켰다. 통과된 용액을 감압 하에 농축시킨 뒤, Column Chromatography 정제하여 화합물 H(73% 수율)를 제조하였다.Compound Hc (1.0 eq.) was placed in a round bottom flask and dissolved in anhydrous PhMe (0.03 M). BI 3 (2.0 eq.) was slowly added dropwise to the reaction mixture and stirred overnight under a bath temperature of 80 °C. After the reaction, the reactant was sufficiently cooled at room temperature and diluted with CH 2 Cl 2 . EtN i -Pr 2 (15.0 eq.) and sat.Na 2 S 2 O 3 (aq.) were sequentially added dropwise to the reactant, washed with CH 2 Cl 2 /H 2 O, and the organic layer was separated. Water was removed with MgSO 4 and passed through a Celite-Florisil-Silica pad. The passed solution was concentrated under reduced pressure and purified by column chromatography to obtain compound H (73% yield).
m/z [M+H]+= 725.5m/z [M+H] + = 725.5
[실험예][Experimental Example]
실험예 1Experimental Example 1
ITO(indium tin oxide)가 500 Å의 두께로 박막 코팅된 유리 기판을 세제를 녹인 증류수에 넣고 초음파로 세척하였다. 이때, 세제로는 피셔사(Fischer Co.) 제품을 사용하였으며, 증류수로는 밀리포어사(Millipore Co.) 제품의 필터(Filter)로 2차로 걸러진 증류수를 사용하였다. ITO를 30 분간 세척한 후, 증류수로 2 회 반복하여 초음파 세척을 10 분간 진행하였다. 증류수 세척이 끝난 후, 이소프로필, 아세톤의 용제로 초음파 세척을 하고 건조시킨 후, 상기 기판을 5 분 간 세정한 후 글로브박스로 기판을 수송시켰다.A glass substrate coated with indium tin oxide (ITO) to a thickness of 500 Å was put in distilled water in which detergent was dissolved and washed with ultrasonic waves. At this time, a product of Fischer Co. was used as a detergent, and distilled water filtered through a second filter of a product of Millipore Co. was used as distilled water. After washing the ITO for 30 minutes, ultrasonic cleaning was performed twice with distilled water for 10 minutes. After washing with distilled water, ultrasonic cleaning was performed with solvents such as isopropyl and acetone, and after drying, the substrate was cleaned for 5 minutes and transported to a glove box.
상기 ITO 투명 전극 위에, 하기 화합물 O 및 화합물 P(2:8의 중량비)를 20 wt/v%로 사이클로헥사논에 녹인 코팅 조성물을 스핀 코팅(4000 rpm)하고 200 ℃에서 30 분 동안 열처리(경화)하여 400 Å 두께로 정공주입층을 형성하였다. 상기 정공주입층 위에 하기 화합물 Q(Mn: 27,900; Mw: 35,600; Agilent 1200 series를 이용하여 PC 스텐다드(Standard)를 이용한 GPC로 측정)를 6 wt/v%로 톨루엔에 녹인 코팅 조성물을 스핀 코팅(4000 rpm)하고 200 ℃에서 30 분 동안 열처리하여 200 Å 두께의 정공수송층을 형성하였다. 상기 정공수송층 위에 앞서 제조한 화합물 1과 하기 화합물 R(2:98의 중량비)을 2 wt/v%로 사이클로헥사논에 녹인 코팅 조성물을 스핀 코팅(4000 rpm)하고 180 ℃에서 30 분 동안 열처리하여 400 Å 두께로 발광층을 형성하였다. 진공 증착기로 이송한 후, 상기 발광층 위에 하기 화합물 S를 350 Å 두께로 진공 증착하여 전자 주입 및 수송층을 형성하였다. 상기 전자 주입 및 수송층 위에 순차적으로 10 Å 두께로 LiF와 1000 Å 두께로 알루미늄을 증착하여 캐소드를 형성하였다. On the ITO transparent electrode, a coating composition in which the following compound O and compound P (weight ratio of 2:8) were dissolved in cyclohexanone at 20 wt/v% was spin-coated (4000 rpm) and heat-treated (curing) for 30 minutes at 200 ° C. ) to form a hole injection layer with a thickness of 400 Å. On the hole injection layer, a coating composition in which the following compound Q (Mn: 27,900; Mw: 35,600; measured by GPC using PC Standard using an Agilent 1200 series) was dissolved in toluene at 6 wt/v% was spin-coated ( 4000 rpm) and heat treatment at 200° C. for 30 minutes to form a hole transport layer having a thickness of 200 Å. On the hole transport layer, a coating composition prepared by dissolving Compound 1 and Compound R (2:98 in weight ratio) at 2 wt/v% in cyclohexanone was spin-coated (4000 rpm) and heat-treated at 180° C. for 30 minutes. A light emitting layer was formed to a thickness of 400 Å. After transferring to a vacuum evaporator, the following compound S was vacuum deposited to a thickness of 350 Å on the light emitting layer to form an electron injection and transport layer. A cathode was formed by sequentially depositing LiF to a thickness of 10 Å and aluminum to a thickness of 1000 Å on the electron injection and transport layer.
상기의 과정에서 유기물의 증착 속도는 0.4 내지 0.7 Å/sec를 유지하였고, LiF는 0.3 Å/sec, 알루미늄은 2 Å/sec의 증착 속도를 유지하였으며, 증착 시 진공도는 2*10-7 내지 5*10-8 torr를 유지하였다.In the above process, the deposition rate of organic materials was maintained at 0.4 to 0.7 Å / sec, LiF was maintained at 0.3 Å / sec, and aluminum was maintained at 2 Å / sec, and the vacuum degree during deposition was 2 * 10 -7 to 5 *10 -8 torr was maintained.
실험예 2 내지 36Experimental Examples 2 to 36
발광층의 도펀트로 화합물 1 대신 하기 표 1에 기재된 화합물을 사용하는 것을 제외하고, 상기 실험예 1과 동일한 방법으로 유기 발광 소자를 제조하였다. An organic light emitting device was manufactured in the same manner as in Experimental Example 1, except that the compound shown in Table 1 was used instead of Compound 1 as the dopant of the light emitting layer.
비교실험예 1 내지 3Comparative Experimental Examples 1 to 3
발광층의 도펀트로 화합물 1 대신 하기 표 1에 기재된 화합물을 사용하는 것을 제외하고, 상기 실험예 1과 동일한 방법으로 유기 발광 소자를 제조하였다.An organic light emitting device was manufactured in the same manner as in Experimental Example 1, except that the compound shown in Table 1 was used instead of Compound 1 as the dopant of the light emitting layer.
상기 실험예 및 비교실험예에서 제조한 유기 발광 소자에 전류를 인가하였을 때, 10 mA/cm2의 전류 밀도에서의 구동 전압, 외부 양자 효율(external quantum efficiency, EQE) 및 수명을 측정한 결과를 하기 표 1에 나타내었다. 이때, 외부양자효율(EQE)은 "(방출된 광자 수)/(주입된 전하운반체 수)*100"으로 구하였고, T90는 휘도가 초기 휘도(500 nit)에서 90 %로 감소하는데 소요되는 시간을 의미한다.When a current was applied to the organic light emitting device prepared in the above Experimental Examples and Comparative Experimental Examples, the driving voltage at a current density of 10 mA / cm 2 , the external quantum efficiency (EQE) and the lifespan measurement results It is shown in Table 1 below. At this time, the external quantum efficiency (EQE) was obtained as “(number of photons emitted) / (number of charge carriers injected) * 100”, and T90 is the time required for the luminance to decrease from the initial luminance (500 nit) to 90% means
도펀트light emitting layer
dopant
(V@10mA/cm2)drive voltage
(V@10mA/cm 2 )
(%@10mA/cm2)EQE
(%@10mA/cm 2 )
(T90@500 nit)Life (hr)
(T90@500 nits)
상기 표 1에 나타난 바와 같이, 본 발명의 화합물을 발광층에 포함하는 유기 발광 소자는, 유기 발광 소자의 효율, 구동 전압 및 수명 면에서 우수한 특성을 나타내었다.As shown in Table 1, the organic light emitting device including the compound of the present invention in the light emitting layer exhibited excellent characteristics in terms of efficiency, driving voltage, and lifetime of the organic light emitting device.
1: 기판
2: 양극
3: 발광층
4: 음극
5: 정공주입층
6: 정공수송층
7: 발광층
8: 전자주입 및 수송층1: substrate 2: anode
3: light emitting layer 4: cathode
5: hole injection layer 6: hole transport layer
7: light emitting layer 8: electron injection and transport layer
Claims (20)
[화학식 1]
상기 화학식 1에서,
Ar1은 인접한 고리와 융합된 벤젠, 벤조퓨란, 또는 벤조티오펜이고,
R1 내지 R4는 각각 독립적으로, 수소, 중수소, 치환 또는 비치환된 C1-60 알킬, 또는 치환 또는 비치환된 C6-60 아릴이거나, 또는 인접하는 두 개의 R1 내지 R4가 서로 결합하여 치환 또는 비치환된 C1-10 알킬렌을 형성하고,
R5는 하기 화학식 2 또는 화학식 3으로 표시되는 치환기이고,
[화학식 2]
상기 화학식 2에서,
R’1은 각각 독립적으로, 수소, 중수소, 또는 치환 또는 비치환된 C1-60 알킬이고,
R’2는 각각 독립적으로, 수소, 중수소, 또는 치환 또는 비치환된 C1-60 알킬이고,
R’3은 각각 독립적으로, 수소, 중수소, 치환 또는 비치환된 C1-60 알킬, 또는 치환 또는 비치환된 N, O 및 S로 구성되는 군으로부터 선택되는 어느 하나 이상의 헤테로원자를 포함하는 C2-60 헤테로아릴이거나, 또는 서로 결합하여 치환 또는 비치환된 C3-60 사이클로알킬, 또는 치환 또는 비치환된 피롤리딘을 형성하고,
[화학식 3]
상기 화학식 3에서,
는 단일 결합, 또는 이중 결합이고,
R’4는 수소, 중수소, 치환 또는 비치환된 C1-60 알킬, 치환 또는 비치환된 C3-60 사이클로알킬, 또는 치환 또는 비치환된 C6-60 아릴이고,
n1은 1 내지 4의 정수이다.
A compound represented by Formula 1 below:
[Formula 1]
In Formula 1,
Ar 1 is benzene, benzofuran, or benzothiophene fused with an adjacent ring;
R 1 to R 4 are each independently hydrogen, deuterium, substituted or unsubstituted C 1-60 alkyl, or substituted or unsubstituted C 6-60 aryl, or two adjacent R 1 to R 4 are mutually combine to form a substituted or unsubstituted C 1-10 alkylene;
R 5 is a substituent represented by Formula 2 or Formula 3 below;
[Formula 2]
In Formula 2,
R' 1 is each independently hydrogen, deuterium, or substituted or unsubstituted C 1-60 alkyl;
R' 2 are each independently hydrogen, deuterium, or substituted or unsubstituted C 1-60 alkyl;
R′ 3 are each independently hydrogen, deuterium, substituted or unsubstituted C 1-60 alkyl, or substituted or unsubstituted C including any one or more heteroatoms selected from the group consisting of N, O and S 2-60 heteroaryl, or combined with each other to form a substituted or unsubstituted C 3-60 cycloalkyl, or a substituted or unsubstituted pyrrolidine;
[Formula 3]
In Formula 3,
is a single bond or a double bond,
R′ 4 is hydrogen, deuterium, substituted or unsubstituted C 1-60 alkyl, substituted or unsubstituted C 3-60 cycloalkyl, or substituted or unsubstituted C 6-60 aryl;
n1 is an integer from 1 to 4;
상기 화학식 1은 하기 화학식 1-1 내지 화학식 1-3으로 구성되는 군으로부터 선택되는 어느 하나로 표시되는,
화합물:
[화학식 1-1]
[화학식 1-2]
[화학식 1-3]
상기 화학식 1-1 내지 화학식 1-3에서,
X는 O, 또는 S이고,
R1, R2, R3, R4, R5, 및 n1은 제1항에서 정의한 바와 같다.
According to claim 1,
Formula 1 is represented by any one selected from the group consisting of Formula 1-1 to Formula 1-3,
compound:
[Formula 1-1]
[Formula 1-2]
[Formula 1-3]
In Formula 1-1 to Formula 1-3,
X is O or S;
R 1 , R 2 , R 3 , R 4 , R 5 , and n1 are as defined in claim 1.
R1 및 R2는 각각 독립적으로, 수소, 중수소, 또는 치환 또는 비치환된 C1-10 알킬이거나, 또는 인접하는 두 개의 R1 또는 R2가 서로 결합하여 치환 또는 비치환된 C3-8 알킬렌을 형성하는,
화합물.
According to claim 1,
R 1 and R 2 are each independently hydrogen, deuterium, or substituted or unsubstituted C 1-10 alkyl, or two adjacent R 1 or R 2 are bonded together to form substituted or unsubstituted C 3-8 to form an alkylene,
compound.
R1 및 R2는 각각 독립적으로, 수소, 중수소, 또는 터트부틸이거나, 또는 인접하는 두 개의 R1 또는 R2가 서로 결합하여 을 형성하는,
화합물.
According to claim 1,
R 1 and R 2 are each independently hydrogen, deuterium, or tertbutyl, or two adjacent R 1 or R 2 are bonded to each other to form,
compound.
R3는 각각 독립적으로, 수소, 중수소, 또는 치환 또는 비치환된 C1-10 알킬이거나, 또는 인접하는 두 개의 R3가 서로 결합하여 치환 또는 비치환된 C3-8 알킬렌을 형성하는,
화합물.
According to claim 1,
Each R 3 is independently hydrogen, deuterium, or substituted or unsubstituted C 1-10 alkyl, or two adjacent R 3 are bonded together to form a substituted or unsubstituted C 3-8 alkylene;
compound.
Ar1이 벤젠이고,
R3는 각각 독립적으로, 수소, 중수소, 또는 터트부틸이거나, 또는 인접하는 두 개의 R3가 서로 결합하여 을 형성하는,
화합물.
According to claim 1,
Ar 1 is benzene;
Each R 3 is independently hydrogen, deuterium, or tertbutyl, or two adjacent R 3 are bonded to each other to form,
compound.
Ar1이 벤조퓨란, 또는 벤조티오펜이고,
R3는 각각 독립적으로, 수소, 중수소, 또는 터트부틸인,
화합물.
According to claim 1,
Ar 1 is benzofuran or benzothiophene;
R 3 are each independently hydrogen, deuterium, or tertbutyl;
compound.
R4는 각각 독립적으로, 수소, 중수소, 치환 또는 비치환된 C1-10 알킬, 또는 치환 또는 비치환된 C6-60 아릴이거나, 또는 인접하는 두 개의 R4가 서로 결합하여 치환 또는 비치환된 C3-8 알킬렌을 형성하는,
화합물.
According to claim 1,
R 4 are each independently hydrogen, deuterium, substituted or unsubstituted C 1-10 alkyl, or substituted or unsubstituted C 6-60 aryl, or two adjacent R 4 are bonded to each other to be substituted or unsubstituted to form a C 3-8 alkylene;
compound.
R4는 각각 독립적으로, 수소, 중수소, 터트부틸, 페닐, 또는 터트부틸로 치환된 페닐이거나, 또는 인접하는 두 개의 R4가 서로 결합하여 을 형성하는,
화합물.
According to claim 1,
Each R 4 is independently hydrogen, deuterium, tertbutyl, phenyl, or phenyl substituted with tertbutyl, or two adjacent R 4 are bonded to each other to to form,
compound.
R’1은 각각 독립적으로, 수소, 중수소, 메틸, 이소프로필, 또는 터트부틸인,
화합물.
According to claim 1,
each R' 1 is independently hydrogen, deuterium, methyl, isopropyl, or tertbutyl;
compound.
R’2는 각각 독립적으로, 수소, 중수소, 또는 메틸인,
화합물.
According to claim 1,
R' 2 are each independently hydrogen, deuterium, or methyl;
compound.
R’3는 각각 독립적으로, 수소, 중수소, 메틸, 또는 벤조퓨라닐이거나, 또는 서로 결합하여 치환 또는 비치환된 사이클로펜틸, 사이클로헥실, 사이클로헵틸, 또는 피롤리딘을 형성하는,
화합물.
According to claim 1,
each R' 3 is independently hydrogen, deuterium, methyl, or benzofuranyl, or taken together to form a substituted or unsubstituted cyclopentyl, cyclohexyl, cycloheptyl, or pyrrolidine;
compound.
상기 사이클로펜틸, 또는 사이클로헥실은 비치환되거나, 또는 하나 이상의 메틸로 치환된,
화합물.
According to claim 12,
The cyclopentyl or cyclohexyl is unsubstituted, or substituted with one or more methyl,
compound.
상기 피롤리딘은 비치환되거나, 또는 메틸, 이소프로필, 터트부틸, 사이클로펜틸, 사이클로헥실, 페닐, 또는 톨릴로 치환된,
화합물.
According to claim 12,
The pyrrolidine is unsubstituted or substituted with methyl, isopropyl, tertbutyl, cyclopentyl, cyclohexyl, phenyl, or tolyl,
compound.
상기 화학식 2로 표시되는 치환기는 하기로 구성되는 군으로부터 선택되는 어느 하나인,
화합물:
According to claim 1,
The substituent represented by Formula 2 is any one selected from the group consisting of
compound:
R’4는 각각 독립적으로, 메틸, 이소프로필, 터트부틸, 사이클로펜틸, 사이클로헥실, 페닐, 또는 톨릴인,
화합물.
According to claim 1,
each R'4 is independently methyl, isopropyl, tertbutyl, cyclopentyl, cyclohexyl, phenyl, or tolyl;
compound.
상기 화학식 3으로 표시되는 치환기는 하기로 구성되는 군으로부터 선택되는 어느 하나인,
화합물:
According to claim 1,
The substituent represented by Formula 3 is any one selected from the group consisting of
compound:
상기 화학식 1로 표시되는 화합물은 하기로 구성되는 군으로부터 선택되는 어느 하나인,
화합물:
According to claim 1,
The compound represented by Formula 1 is any one selected from the group consisting of
compound:
a first electrode; a second electrode provided to face the first electrode; and one or more organic material layers provided between the first electrode and the second electrode, wherein at least one of the organic material layers includes the compound according to any one of claims 1 to 18. , an organic light emitting device.
상기 유기물층은 발광층인,
유기 발광 소자.According to claim 19,
The organic material layer is a light emitting layer,
organic light emitting device.
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