KR20230106668A - Compositions, films, optical filters, solid-state imaging devices, image display devices, and infrared sensors - Google Patents

Abstract

A composition, film, optical filter, solid-state imaging device, image display device and infrared sensor capable of forming a film excellent in infrared shielding properties are provided. The composition contains an infrared absorber and a curable compound, the infrared absorber contains a compound represented by formula (1), and the content of the compound represented by formula (1) in the total solids of the composition is 3% by mass or more.

Description

Compositions, films, optical filters, solid-state imaging devices, image display devices, and infrared sensors

The present invention relates to a composition containing an infrared absorber and a curable compound. Further, the present invention relates to a film, an optical filter, a solid-state imaging device, an image display device, and an infrared sensor using the composition described above.

BACKGROUND OF THE INVENTION In video cameras, digital still cameras, mobile phones equipped with camera functions, and the like, CCD (charge-coupled devices) and CMOS (complementary metal oxide semiconductors), which are solid-state imaging elements for color images, are used. These solid-state imaging devices use a silicon photodiode that is sensitive to infrared rays in their light receiving section. For this reason, there is a case where an infrared cut filter is provided to correct the viewing sensitivity. An infrared cut filter is manufactured using a composition containing an infrared absorber and a curable compound.

Moreover, manufacturing an infrared transmission filter using a composition containing an infrared absorber and a curable compound is also performed. By incorporating an infrared absorber into the infrared transmission filter, the infrared region of light (infrared rays) passing through the infrared transmission filter can be shifted to a longer wavelength side.

In this way, forming an optical filter such as an infrared cut filter or an infrared transmission filter is performed using a composition containing an infrared absorber and a curable compound.

Non-Patent Document 1 describes that a compound having the following structure has a maximum absorption wavelength at 922 nm in dichloromethane and no significant absorption band in the visible region.

[Formula 1]

Hiroyuki Shimogawa, Yasujiro Murata, and Atsushi Wakamiya, "NIR-Absorbing Dye Based on BF2-Bridged Azafulvene Dimer as a Strong Electron-Accepting Unit", "Organic Letters", American Chemical Society, 2018, Vol. 20, No. 17, 5135 -5138 pages

In recent years, further improvement in spectral characteristics of a film obtained by using a composition containing an infrared absorber and a curable compound has been demanded. For example, there is a demand for more excellent shielding properties of long-wavelength infrared rays.

Accordingly, an object of the present invention is to provide a composition capable of forming a film having excellent infrared shielding properties. Moreover, it is providing the film|membrane using a composition, an optical filter, a solid-state image sensor, an image display apparatus, and an infrared sensor.

As a result of an examination of a composition containing an infrared absorber and a curable compound, the inventors of the present invention found that a film having excellent infrared shielding properties could be formed by using the composition described below, and completed the present invention. Accordingly, the present invention provides the following.

<1> A composition containing an infrared absorber and a curable compound,

The infrared absorber includes a compound represented by formula (1),

a composition in which the content of the compound represented by the formula (1) in the total solid content of the composition is 3% by mass or more;

[Formula 2]

In Formula (1), Ar ¹ and Ar ² each independently represent a nitrogen-containing heterocycle which may be condensed to form a polycyclic ring;

R ¹ and R ² each independently represent a substituent;

n1 and n2 each independently represents an integer greater than or equal to 0;

Y ¹ and Y ² each independently represent -O-, -S-, or -NR ^Y1 -;

R ^Y1 represents a hydrogen atom or a substituent,

X ¹ and X ² each independently represent a hydrogen atom, -BR ^X1 R ^X2 , or a metal atom to which a ligand may be coordinated;

R ^X1 and R ^X2 each independently represent a hydrogen atom or a substituent;

R ^X1 and R ^X2 may be bonded to form a ring.

<2> n1 and n2 in the above formula (1) each independently represent an integer of 1 or more,

The composition according to <1>, wherein R ¹ and R ² in the formula (1) each independently represent an aryl group or a heteroaryl group.

<3> The composition according to <1> or <2>, wherein Y ¹ and Y ² in the formula (1) are -O-.

<4> X ¹ and X ² in the above formula (1) each independently represent -BR ^X1 R ^X2 , R ^X1 and R ^X2 each independently represent a hydrogen atom or a substituent, and R ^X1 and R ^X2 are a bond The composition according to any one of <1> to <3>, which may form a ring.

<5> R ^X1 and R ^X2 each independently represent a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and R ^X1 and R ^X2 are bonded to form a ring The composition according to any one of <1> to <4>, which may be formed.

<6> The composition according to any one of <1> to <5>, wherein the maximum absorption wavelength in dichloromethane of the compound represented by the formula (1) exists in a wavelength range of 1000 to 1600 nm.

<7> The composition according to any one of <1> to <6>, in which the infrared absorber contains a compound other than the compound represented by the formula (1).

<8> The composition according to any one of <1> to <7>, further comprising a chromatic colorant.

<9> The composition according to any one of <1> to <8>, in which the curable compound contains a resin having an acid group.

<10> The composition according to any one of <1> to <9>, in which the curable compound includes a polymerizable compound.

<11> The composition according to any one of <1> to <10>, in which the curable compound contains a resin having a glass transition temperature of 150°C or higher.

<12> The composition according to any one of <1> to <11> for infrared sensors.

<13> A film obtained by using the composition according to any one of <1> to <12>.

<14> An optical filter comprising the film according to <13>.

<15> A solid-state imaging device including the film according to <13>.

<16> An image display device comprising the film according to <13>.

<17> An infrared sensor comprising the film according to <13>.

ADVANTAGE OF THE INVENTION According to this invention, the composition, film|membrane, optical filter, solid-state image sensor, image display apparatus, and infrared sensor which can form a film excellent in infrared shielding property can be provided.

1 is a schematic diagram showing an embodiment of an infrared sensor.

Below, the content of this invention is demonstrated in detail.

In this specification, "-" is used by the meaning which includes the numerical value described before and after that as a lower limit value and an upper limit value.

In the notation of a group (atomic group) in this specification, the notation that does not describe substitution and unsubstitution includes a group (atomic group) having a substituent as well as a group (atomic group) having no substituent. For example, the "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).

In this specification, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. Further, examples of light used for exposure include bright line spectrum of a mercury lamp, far ultraviolet rays represented by an excimer laser, extreme ultraviolet rays (EUV light), active rays such as X-rays and electron beams, or radiation.

In the present specification, “(meth)acrylate” represents either or both of acrylate and methacrylate, and “(meth)acryl” represents both acryl and methacryl or either of them. and "(meth)acryloyl" represents either or both of acryloyl and methacryloyl.

In this specification, a weight average molecular weight and a number average molecular weight are defined as a polystyrene conversion value in a gel permeation chromatography (GPC) measurement.

In the present specification, Me in the formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group.

In the present specification, infrared rays refer to light (electromagnetic waves) having a wavelength of 700 to 2500 nm.

In this specification, the total solid content refers to the total mass of components excluding the solvent from all components of the composition.

In this specification, a pigment means a color material that is difficult to dissolve with respect to a solvent.

In this specification, the term "process" is included in this term, not only as an independent process, but also in cases where the desired action of the process is achieved even if it cannot be clearly distinguished from other processes.

<Composition>

The composition of the present invention is a composition containing an infrared absorber and a curable compound,

The infrared absorber includes a compound represented by formula (1),

It is characterized in that content of the compound represented by Formula (1) in the total solid content of a composition is 3 mass % or more.

According to the composition of the present invention, a film having excellent infrared shielding properties can be formed. In particular, it is possible to form a film superior in shielding properties of long-wavelength infrared rays compared to those having a wavelength of 1100 nm or more. Although the detailed reason why such an effect is obtained is unclear, since the content of the compound represented by formula (1) in the total solids of the composition of the present invention is 3% by mass or more, when forming a film using the composition, the film It is estimated that the association of the compound represented by Formula (1) is promoted among them. By forming an association of the compound represented by formula (1) in the film, the absorption peak of the compound represented by formula (1) shifts to the longer wave side than in the single molecule state, and as a result, longer wavelength infrared rays can be shielded. It is estimated that the film|membrane excellent in infrared shielding property was able to be formed.

The composition of the present invention can be used as a composition for optical filters. Examples of optical filters include infrared cut-off filters and infrared transmission filters. In addition, the composition of the present invention is preferably used for infrared sensors. More specifically, it is preferably used as the above-described composition for an optical filter of an infrared sensor having an optical filter.

Hereinafter, each component used in the composition of the present invention will be described.

<<Infrared Absorber>>

The composition of the present invention includes an infrared absorber. The infrared absorber used for the composition of this invention contains the compound represented by Formula (1). Hereinafter, the compound represented by Formula (1) is also referred to as a specific infrared absorbing compound.

[Formula 3]

In Formula (1), Ar ¹ and Ar ² each independently represent a nitrogen-containing heterocycle;

R ¹ and R ² each independently represent a substituent;

n1 and n2 each independently represents an integer greater than or equal to 0;

Y ¹ and Y ² each independently represent -O-, -S-, or -NR ^Y1 -;

R ^Y1 represents a hydrogen atom or a substituent,

X ¹ and X ² each independently represent a hydrogen atom, -BR ^X1 R ^X2 , or a metal atom to which a ligand may be coordinated;

R ^X1 and R ^X2 each independently represent a hydrogen atom or a substituent;

R ^X1 and R ^X2 may be bonded to form a ring.

The nitrogen-containing heterocycle represented by Ar ¹ and Ar ² in Formula (1) may be a monocyclic ring or a condensed ring. The condensed number of the condensed ring is preferably 2 to 8, more preferably 2 to 4, and still more preferably 2 or 3. It is preferable that the nitrogen-containing heterocycle represented by Ar ¹ and Ar ² is a nitrogen-containing heteroaromatic ring.

Examples of the nitrogen-containing heterocycle represented by Ar ¹ and Ar ² include a pyrrole ring, an imidazole ring, a pyrazole ring, an oxazole ring, a thiazole ring, a triazole ring, a tetrazole ring, a pyridine ring, a pyridazine ring, a pyrimidine ring, and a pyrazine ring. and condensed rings containing these rings. Examples of the condensed ring include an indole ring, an isoindole ring, a benzimidazole ring, a benzoxazole ring, a benzothiazole ring, a benzotriazole ring, a purine ring, a quinoline ring, an isoquinoline ring, a quinazoline ring, a quinoxaline ring, and a cinnoline. A ring, a pteridine ring, etc. are mentioned. The nitrogen-containing heterocycle represented by Ar ¹ and Ar ² is preferably a pyrrole ring, an imidazole ring or a condensed ring containing these rings, and more preferably a pyrrole ring, an imidazole ring or a condensed ring containing these rings.

R ¹ and R ² in Formula (1) each independently represent a substituent. Examples of the substituent include groups listed as the substituent T described later, preferably an aryl group or a heteroaryl group, and more preferably a heteroaryl group because the absorption wavelength can be made longer.

6-20 are preferable and, as for carbon number of an aryl group, 6-12 are more preferable. The aryl group may have a substituent.

The heteroaryl group is preferably a monocyclic or condensed-ring heteroaryl group having 2 to 8 condensed atoms, and more preferably a monocyclic or condensed-cyclic heteroaryl group having 2 to 4 condensed atoms. As for the number of hetero atoms which comprise the ring of a heteroaryl group, 1-3 are preferable. As for the hetero atom which comprises the ring of a heteroaryl group, a nitrogen atom, an oxygen atom, and a sulfur atom are mentioned. 3-20 are preferable, as for the number of carbon atoms which comprise the ring of a heteroaryl group, 3-18 are more preferable, and 3-12 are more preferable. The heteroaryl group is preferably a 5- or 6-membered heteroaryl group. Specific examples of the heteroaryl group include a pyrrole ring group, a furan ring group, a thiophene ring group, an imidazole ring group, a pyrazole ring group, an oxazole ring group, a thiazole ring group, a triazole ring group, a tetrazole ring group, a pyridine ring group, a pyridazine ring group, and a pyrimidine ring. cyclic groups, pyrazine cyclic groups, and condensed rings containing these rings.

Said aryl group and heteroaryl group may have a substituent further. Examples of the additional substituent include -NR ¹⁰¹ R ¹⁰² , an alkoxy group and an aryloxy group, and -NR ¹⁰¹ R ¹⁰² is preferable because the absorption wavelength can be made longer. R ¹⁰¹ and R ¹⁰² each independently represent a hydrogen atom or a substituent, and R ¹⁰¹ and R ¹⁰² may be bonded to form a ring.

It is preferable that R ¹⁰¹ and R ¹⁰² are each independently a substituent. Examples of the substituent represented by R ¹⁰¹ and R ¹⁰² include groups referred to as substituent T described later, and are preferably an alkyl group, an alkenyl group, an alkynyl group, or an aryl group, and more preferably an alkyl group or an aryl group.

The number of carbon atoms in the alkyl group represented by R ¹⁰¹ and R ¹⁰² is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 6. The alkyl group may be straight-chain, branched or cyclic. The alkyl group may have a substituent. Examples of the substituent include groups referred to as the substituent T described below, and a halogen atom, an aryl group, or an alkoxy group is preferable. There may be two or more substituents.

The number of carbon atoms in the alkenyl group represented by R ¹⁰¹ and R ¹⁰² is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 6. The alkenyl group may be linear, branched or cyclic. The alkenyl group may have a substituent. Examples of the substituent include groups referred to as the substituent T described below, and a halogen atom, an aryl group, or an alkoxy group is preferable. There may be two or more substituents.

The number of carbon atoms in the alkynyl group represented by R ¹⁰¹ and R ¹⁰² is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 6. The alkynyl group may be linear, branched or cyclic. The alkynyl group may have a substituent. Examples of the substituent include groups referred to as the substituent T described below, and a halogen atom, an aryl group, or an alkoxy group is preferable. There may be two or more substituents.

6-20 are preferable and, as for carbon number of the aryl group represented by ^R101 and ^R102 , 6-12 are more preferable. The aryl group may have a substituent. A group referred to as the substituent T described later is exemplified, and a halogen atom, an alkyl group, or an alkoxy group is preferable. There may be two or more substituents.

n1 and n2 of Formula (1) represent an integer greater than or equal to 0 each independently. n1 and n2 are each independently preferably an integer of 1 or greater, more preferably an integer of 1 to 3, still more preferably 1 or 2, particularly preferably 1.

Y ¹ and Y ² in formula (1) each independently represents -O-, -S-, or -NR ^Y1 -, and R ^Y1 represents a hydrogen atom or a substituent.

Examples of the substituent represented by R ^Y1 include groups mentioned as the substituent T described later, preferably an alkyl group, an aryl group or a heteroaryl group, more preferably an alkyl group or an aryl group, and still more preferably an alkyl group. R ^Y1 is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom.

It is preferable that ^Y1 and ^Y2 of Formula (1) are respectively independently -O- or -S-, and it is more preferable that they are -O-.

X ¹ and X ² in formula (1) each independently represent a hydrogen atom, -BR ^X1 R ^X2 , or a metal atom to which a ligand may be coordinated, and R ^X1 and R ^X2 each independently represent a hydrogen atom or a substituent , and R ^X1 and R ^X2 may be bonded to form a ring. X ¹ and X ² in formula (1) are each independently -BR ^X1 R ^X2 , or preferably a metal atom to which a ligand may be coordinated, -BR ^X1 for the reason that a film having excellent heat resistance can be formed. It is more preferably R ^X2 . When X ¹ in Formula (1) is -BR ^X1 R ^X2 or a metal atom to which a ligand may be coordinated, X ¹ may be coordinated to the nitrogen atom of the nitrogen-containing heterocycle represented by Ar ¹ . Further, when X ² in Formula (1) is -BR ^X1 R ^X2 or a metal atom to which a ligand may be coordinated, X ² may be coordinated to the nitrogen atom of the nitrogen-containing heterocycle represented by Ar ² .

The substituent represented by R ^X1 and R ^X2 is shown. Examples of the substituent include groups referred to as the substituent T described later, preferably a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and a halogen atom or an aryl group Alternatively, it is more preferably an alkoxy group, and is more preferably an aryl group or an alkoxy group because it is easy to form a film having excellent heat resistance or light resistance.

As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are mentioned, and it is preferable that it is a fluorine atom.

1-20 are preferable, as for carbon number of an alkyl group and an alkoxy group, 1-15 are more preferable, and 1-6 are more preferable. The alkyl group and the alkoxy group may be linear, branched or cyclic. The alkyl group and the alkoxy group may have a substituent. Examples of the substituent include groups referred to as the substituent T described below, and a halogen atom or an acyl group is preferable. There may be two or more substituents.

1-20 are preferable, as for carbon number of an alkenyl group, 1-15 are more preferable, and 1-6 are more preferable. The alkenyl group may be linear, branched or cyclic. The alkenyl group may have a substituent. Examples of the substituent include groups referred to as the substituent T described later, and a halogen atom, an acyl group, or an alkoxy group is preferable. There may be two or more substituents.

1-20 are preferable, as for carbon number of an alkynyl group, 1-15 are more preferable, and 1-6 are more preferable. The alkynyl group may be linear, branched or cyclic. The alkynyl group may have a substituent. Examples of the substituent include groups referred to as the substituent T described later, and a halogen atom, an acyl group, or an alkoxy group is preferable. There may be two or more substituents.

6-20 are preferable and, as for carbon number of an aryl group and an aryloxy group, 6-12 are more preferable. The aryl group and aryloxy group may have a substituent. A group referred to as the substituent T described later is exemplified, and a halogen atom, an acyl group, or an alkoxy group is preferable. There may be two or more substituents.

The heteroaryl group is preferably a monocyclic or condensed-ring heteroaryl group having 2 to 8 condensed atoms, and more preferably a monocyclic or condensed-cyclic heteroaryl group having 2 to 4 condensed atoms. As for the number of hetero atoms which comprise the ring of a heteroaryl group, 1-3 are preferable. The heteroatom constituting the ring of the heteroaryl group includes a nitrogen atom, an oxygen atom and a sulfur atom, and is preferably a nitrogen atom. 3-20 are preferable, as for the number of carbon atoms which comprise the ring of a heteroaryl group, 3-18 are more preferable, and 3-12 are more preferable. The heteroaryl group is preferably a 5- or 6-membered heteroaryl group. The heteroaryl group may have a substituent. A group referred to as the substituent T described later is exemplified, and a halogen atom, an acyl group, or an alkoxy group is preferable. There may be two or more substituents.

R ^X1 and R ^X2 may be bonded to form a ring. For example, the structure etc. shown to following (X-1) - (X-4) are mentioned. In the following, Rx represents a substituent, Rx ¹ to Rx ⁴ each independently represents a hydrogen atom or a substituent, x1 to x3 each independently represents an integer of 0 to 4, and * represents the formula (1 ) represents a binding position with Y ¹ or Y ² . Examples of the substituent represented by Rx and Rx ¹ to Rx ⁴ include groups referred to as substituent T described later, and those which are a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group, or an aryloxy group It is preferable, and it is more preferable that it is a halogen atom, an alkyl group, or an alkoxy group.

[Formula 4]

As a metal atom represented by X ¹ and X ² , Mg, Al, Si, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Mo, Ru, Rh, Pd, Ag, Pt, Au, Er Zn, Cu, or Co is preferable because the atomic radius is appropriate, the stability of the complex is high, and the resistance is high.

A ligand (substituent) may be coordinated to these metal atoms. As the ligand, a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, -OR ^X11 , -OC(=O)R ^X12 , -OP(=O)R ^X13 R ^X14 and -OS( =O) ₂ R ^X15 ; and the like. R ^X11 and R ^X12 each independently represent an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group. R ^X13 to R ^X15 each independently represent a hydroxy group, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and R ^X13 and R ^X14 combine with each other to form a ring can also Preferred embodiments of the halogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, heteroaryl group, alkoxy group, and aryloxy group are the same as those described for the substituent represented by R ^X1 and R ^X2 described above.

As the substituent T, the following groups are exemplified. A halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms) , Alkynyl group (preferably C2-C30 alkynyl group), aryl group (preferably C6-C30 aryl group), heteroaryl group (preferably C1-C30 heteroaryl group), An amino group (preferably an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), a heteroaryloxy group ( preferably a heteroaryloxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably a C7-C30 aryloxycarbonyl group), a heteroaryloxycarbonyl group (preferably a C2-C30 heteroaryloxycarbonyl group), an acyloxy group (preferably a C2-C30 acyloxy group) period), an acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), an aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably having 2 to 30 carbon atoms) alkoxycarbonylamino group), aryloxycarbonylamino group (preferably aryloxycarbonylamino group having 7 to 30 carbon atoms), sulfamoyl group (preferably sulfamoyl group having 0 to 30 carbon atoms), sulfamoylamino group (preferably is a sulfamoylamino group having 0 to 30 carbon atoms), a carbamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably a carbamoyl group having 1 to 30 carbon atoms) Specifically, an arylthio group having 6 to 30 carbon atoms), a heteroarylthio group (preferably a heteroarylthio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonyl group, A phonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), an arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms), an arylsulfonylamino group (preferably an arylsulfonyl group having 6 to 30 carbon atoms) amino group), a heteroarylsulfonyl group (preferably a heteroarylsulfonyl group having 1 to 30 carbon atoms), a heteroarylsulfonylamino group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably a heteroarylsulfonyl group having 1 to 30 carbon atoms) Alkyl sulfinyl group having 1 to 30 carbon atoms), aryl sulfinyl group (preferably aryl sulfinyl group having 6 to 30 carbon atoms), heteroaryl sulfinyl group (preferably heteroaryl sulfinyl group having 1 to 30 carbon atoms), ureido group (preferably aryl sulfinyl group having 1 to 30 carbon atoms) Specifically, a ureido group having 1 to 30 carbon atoms), a hydroxy group, a nitro group, a carboxyl group, a sulfo group, a phosphoric acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imide group, a phosphino group, a mercapto group, a cyano group, An alkyl sulfino group, an aryl sulfino group, an arylazo group, a heteroarylazo group, a phosphinyl group, a phosphinyloxy group, a phosphinylamino group, a silyl group, a hydrazino group, an imino group. These groups may further have a substituent in the case of a group capable of being further substituted. As an additional substituent, the group described for substituent T above can be mentioned.

It is preferable that the compound represented by Formula (1) is a compound represented by Formula (1-1).

[Formula 5]

In formula (1-1), Ar ¹ and Ar ² each independently represent a nitrogen-containing heterocycle;

R ³ and R ⁴ each independently represent a substituent;

n3 and n4 each independently represents an integer greater than or equal to 0;

Ar ¹¹ and Ar ¹² each independently represent an aromatic hydrocarbon ring or a heteroaromatic ring;

R ¹¹ and R ¹² each independently represent a substituent;

n11 and n12 each independently represent an integer greater than or equal to 0;

R ¹¹¹ to R ¹¹⁴ each independently represent a hydrogen atom or a substituent;

R ¹¹¹ and R ¹¹² , R ¹¹³ and R ¹¹⁴ may combine to form a ring;

Y ¹ and Y ² each independently represent -O-, -S-, or -NR ^Y1 -;

R ^Y1 represents a hydrogen atom or a substituent,

X ¹ and X ² each independently represent a hydrogen atom, -BR ^X1 R ^X2 , or a metal atom to which a ligand may be coordinated;

R ^X1 and R ^X2 each independently represent a hydrogen atom or a substituent;

R ^X1 and R ^X2 may be bonded to form a ring.

Ar ¹ , Ar ² , Y ¹ , Y ² , X ¹ and X ² in formula (1-1) are the same as Ar ¹ , Ar ² , Y ¹ , Y ² , X ¹ and X ² in formula (1) meaning, and the preferred range is also the same.

Examples of the substituent represented by R ³ , R ⁴ , R ¹¹ and R ¹² in formula (1-1) include the groups mentioned above as substituent T.

n3 and n4 in formula (1-1) each independently represents an integer greater than or equal to 0, preferably 0 to 2, more preferably 0 or 1, still more preferably 0.

n11 and n12 in Formula (1-1) each independently represents an integer greater than or equal to 0, preferably 0 to 2, more preferably 0 or 1, and still more preferably 0.

Ar ¹¹ and Ar ¹² in formula (1-1) each independently represents an aromatic hydrocarbon ring or a heteroaromatic ring, and is preferably a heteroaromatic ring. The aromatic hydrocarbon ring and aromatic heterocycle represented by Ar ¹¹ and Ar ¹² may be monocyclic or condensed. The condensed number of the condensed ring is preferably 2 to 8, more preferably 2 to 4, and still more preferably 2 or 3. As a specific example of an aromatic hydrocarbon ring, a benzene ring, a naphthalene ring, etc. are mentioned. Specific examples of the heteroaromatic ring include a pyrrole ring, a furan ring, a thiophene ring, an imidazole ring, a pyrazole ring, an oxazole ring, a thiazole ring, a triazole ring, a tetrazole ring, a pyridine ring, a pyridazine ring, a pyrimidine ring, and a pyrazine ring. and condensed rings containing these rings, preferably a pyrrole ring, a furan ring or a thiophene ring.

R ¹¹¹ to R ¹¹⁴ in formula (1-1) each independently represent a hydrogen atom or a substituent, and are preferably substituents. Examples of the substituent include groups referred to as the substituent T described above, preferably an alkyl group, an alkenyl group, an alkynyl group or an aryl group, and more preferably an alkyl group or an aryl group.

The number of carbon atoms in the alkyl group represented by R ¹¹¹ to R ¹¹⁴ is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 6. The alkyl group and the alkoxy group may be linear, branched or cyclic. The alkyl group and the alkoxy group may have a substituent. Examples of the substituent include groups referred to as the substituent T described above, and a halogen atom, an aryl group, or an alkoxy group is preferable. There may be two or more substituents.

The number of carbon atoms in the alkenyl group represented by R ¹¹¹ to R ¹¹⁴ is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 6. The alkenyl group may be linear, branched or cyclic. The alkenyl group may have a substituent. Examples of the substituent include groups referred to as the substituent T described above, and a halogen atom, an aryl group, or an alkoxy group is preferable. There may be two or more substituents.

The number of carbon atoms in the alkynyl group represented by R ¹¹¹ to R ¹¹⁴ is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 6. The alkynyl group may be linear, branched or cyclic. The alkynyl group may have a substituent. Examples of the substituent include groups referred to as the substituent T described above, and a halogen atom, an aryl group, or an alkoxy group is preferable. There may be two or more substituents.

6-20 are preferable and, as for carbon number of the aryl group represented by ^R111 - ^R114 , 6-12 are more preferable. The aryl group and aryloxy group may have a substituent. The group mentioned as the substituent T mentioned above is mentioned, A halogen atom, an alkyl group, or an alkoxy group etc. are preferable. There may be two or more substituents.

The heteroaryl group represented by R ¹¹¹ to R ¹¹⁴ is preferably a monocyclic or condensed-ring heteroaryl group having 2 to 8 condensed atoms, and more preferably a monocyclic or condensed-cyclic heteroaryl group having 2 to 4 condensed atoms. As for the number of hetero atoms which comprise the ring of a heteroaryl group, 1-3 are preferable. The heteroatom constituting the ring of the heteroaryl group includes a nitrogen atom, an oxygen atom and a sulfur atom, and is preferably a nitrogen atom. 3-20 are preferable, as for the number of carbon atoms which comprise the ring of a heteroaryl group, 3-18 are more preferable, and 3-12 are more preferable. The heteroaryl group is preferably a 5- or 6-membered heteroaryl group. The heteroaryl group may have a substituent. The group mentioned as the substituent T mentioned above is mentioned, A halogen atom, an alkyl group, or an alkoxy group etc. are preferable. There may be two or more substituents.

The maximum absorption wavelength of the specific infrared absorbing compound in dichloromethane is preferably in the range of 1000 to 1600 nm, more preferably in the range of 1100 to 1550 nm, and in the range of 1200 to 1500 nm It is better to exist.

It is preferable that the slope of the long-wavelength end of the absorption spectrum of a specific infrared absorbing compound is steep. In the absorption spectrum normalized by the absorbance at the maximum absorption wavelength, the difference between the wavelength of absorbance 0.5 on the long wavelength side and the maximum absorption wavelength is preferably 200 nm or less, more preferably 150 nm or less, and more preferably 100 nm or less.

The molar extinction coefficient (ε) of a specific infrared absorbing compound is preferably high. The molar extinction coefficient at the maximum absorption wavelength is preferably 20000 or more, more preferably 50000 or more, and still more preferably 100000 or more.

As a specific example of a specific infrared absorbing compound, the compound of the structure shown below is mentioned. In the structural formulas below, Ph represents a phenyl group.

[Formula 6]

[Formula 7]

[Formula 8]

[Formula 9]

The infrared absorber used in the composition of the present invention may contain compounds other than the specific infrared absorbing compound described above (hereinafter, also referred to as other infrared absorbing compounds).

The other infrared absorbing compound may be a compound having a maximum absorption wavelength on the longer wavelength side than the specific infrared absorbing compound, but other The infrared absorbing compound is preferably a compound having a maximum absorption wavelength on a shorter wavelength side than a specific infrared absorbing compound.

The difference between the maximum absorption wavelength of a specific infrared absorbing compound and the maximum absorption wavelength of other infrared absorbing compounds is preferably 50 to 800 nm, more preferably 100 to 750 nm, and still more preferably 150 to 700 nm.

In addition, the maximum absorption wavelength of other infrared absorbing compounds is preferably in the range of 700 to 1500 nm, more preferably in the range of 750 to 1400 nm, and more preferably in the range of 800 to 1300 nm. desirable.

Other infrared absorbing compounds may be dyes or pigments. Examples of other infrared absorbing compounds include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, nium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethane compounds, anthraquinone compounds, dibenzofuranone compounds, dithiorene metal complexes, metal oxides, metal borides and the like, , pyrrolopyrrole compounds, squarylium compounds, and phthalocyanine because it is easy to promote the formation of associations of specific infrared absorbing compounds in the film during film formation and to easily form a film having excellent infrared shielding properties, heat resistance, and light resistance. A compound or an oxonol compound is preferable, and a pyrrolopyrrole compound is more preferable. As a pyrrolopyrrole compound, the compound of Paragraph No. 0016 of Unexamined-Japanese-Patent No. 2009-263614 - 0058, the compound of Paragraph No. 0037 of Unexamined-Japanese-Patent No. 2011-068731 - 0052, Paragraph No. of International Publication No. 2015/166873 The compound of 0010-0033, etc. are mentioned. As a squarylium compound, the compound described in Paragraph Nos. 0044 to 0049 of Unexamined-Japanese-Patent No. 2011-208101, the compound described in Paragraph Nos. 0060 to 0061 of Japanese Patent Publication No. 6065169, and Paragraph No. 0040 of International Publication No. 2016/181987 The compound described, the compound described in Japanese Unexamined Patent Publication No. 2015-176046, the compound described in Paragraph No. 0072 of International Publication No. 2016/190162, the compound described in Paragraph Nos. A compound described in Paragraph No. 0124 of Publication No. 2017-067963, a compound described in International Publication No. 2017/135359, a compound described in Japanese Unexamined Patent Publication No. 2017-114956, a compound described in Japanese Patent Publication No. 6197940, International Publication No. 2016 /120166, etc. are mentioned. As a cyanine compound, the compound described in Paragraph No. 0044 of Unexamined-Japanese-Patent No. 2009-108267 - 0045, the compound of Paragraph No. 0026 - 0030 of Unexamined-Japanese-Patent No. 2002-194040, and the compound described in Unexamined-Japanese-Patent No. 2015-172004 , a compound described in Japanese Laid-open Patent Publication No. 2015-172102, a compound described in Japanese Unexamined Patent Publication No. 2008-088426, a compound described in International Publication No. 2016/190162, Paragraph No. 0090, and a compound described in Japanese Unexamined Patent Publication No. 2017-031394 A compound etc. are mentioned. As a croconium compound, the compound of Unexamined-Japanese-Patent No. 2017-082029 is mentioned. Examples of the iminium compound include a compound described in Japanese Laid-Open Patent Publication No. 2008-528706, a compound described in Unexamined-Japanese-Patent No. 2012-012399, a compound described in Japanese Unexamined Patent Publication No. 2007-092060, and International Publication No. 2018 /043564, Paragraph No. 0048 - the compound of 0063 is mentioned. As a phthalocyanine compound, the compound of Paragraph No. 0093 of Unexamined-Japanese-Patent No. 2012-077153, the oxytitanium phthalocyanine of Unexamined-Japanese-Patent No. 2006-343631, Paragraph No. 0013 of Unexamined-Japanese-Patent No. 2013-195480 The compound described in -0029, the vanadium phthalocyanine compound described in Japanese Patent Publication No. 6081771, and the compound described in International Publication No. 2020/071470 are exemplified. As a naphthalocyanine compound, the compound of Paragraph No. 0093 of Unexamined-Japanese-Patent No. 2012-077153 is mentioned. Examples of the dithiorene metal complex include compounds described in Japanese Patent Publication No. 5733804. Examples of the metal oxide include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide. About the details of tungsten oxide, Paragraph No. 0080 of Unexamined-Japanese-Patent No. 2016-006476 can be considered into consideration, and this content is integrated in this specification. As a metal boride, lanthanum boride etc. are mentioned. As a commercial item of lanthanum boride, LaB ₆ -F (Nippon Shinginzoku Co., Ltd. product) etc. are mentioned. Moreover, as a metal boride, the compound of international publication 2017/119394 can also be used. As a commercial item of indium tin oxide, F-ITO (made by DOWA Hitec Co., Ltd.) etc. are mentioned.

Moreover, as another infrared ray absorbing compound, the squarylium compound described in Unexamined-Japanese-Patent No. 2017-197437, the squarylium compound described in Unexamined-Japanese-Patent No. 2017-025311, and the squarylium compound described in International Publication No. 2016/154782 A squarylium compound, a squarylium compound described in Japanese Patent Publication No. 5884953, a squarylium compound described in Japanese Patent Publication No. 6036689, a squarylium compound described in Japanese Patent Publication No. 5810604, and International Publication No. 2017/213047 The squarylium compounds described in Paragraph Nos. 0090 to 0107, the pyrrole ring-containing compounds described in Paragraphs Nos. 0019 to 0075 of Unexamined-Japanese-Patent No. 2018-054760, and the pyrrole ring-containing compounds described in Paragraphs Nos. 0078 to 0082 of Unexamined-Japanese-Patent No. 2018-040955 A compound, a pyrrole ring-containing compound described in Paragraph Nos. 0043 to 0069 of Unexamined-Japanese-Patent No. 2018-002773, a squarylium compound having an aromatic ring on the amide α described in Paragraph Nos. 0024 to 0086 of Unexamined-Japanese-Patent No. 2018-041047, Japan An amide-linked squarylium compound described in Japanese Patent Laid-Open No. 2017-179131, a compound having a pyrrolbis type squarylium skeleton or a croconium skeleton described in Japanese Unexamined Patent Publication No. 2017-141215, and Japanese Unexamined Patent Publication No. 2017-082029 The described dihydrocarbazole bis-type squarylium compound, the asymmetric compound described in paragraphs 0027 to 0114 of JP-A 2017-068120, and the pyrrole ring-containing compound described in JP-A 2017-067963 (carbazole type ), a phthalocyanine compound described in Japanese Patent Publication No. 6251530, a squarylium compound described in Japanese Unexamined Patent Publication No. 2020-075959, a copper complex described in Korean Unexamined Patent Publication No. 10-2019-0135217, etc. may also be used. there is.

It is preferable that it is 3 mass % or more, and, as for content of an infrared absorber, it is more preferable that it is 3-70 mass % in the total solids of the composition of this invention. It is preferable that it is 65 mass % or less, and, as for an upper limit, it is more preferable that it is 60 mass % or less. 4 mass % or more is preferable and, as for a minimum, 5 mass % or more is more preferable.

The content of the specific infrared absorbing compound is 3% by mass or more, more preferably 3 to 70% by mass or more, in the total solid content of the composition. It is preferable that it is 65 mass % or less, and, as for an upper limit, it is more preferable that it is 60 mass % or less. 4 mass % or more is preferable and, as for a minimum, 5 mass % or more is more preferable. The composition of the present invention may contain only one type of specific infrared absorbing compound, or may contain two or more types. When containing 2 or more types, it is preferable that those total amounts become the said range.

When the composition of the present invention contains another infrared absorbing compound, the content of the other infrared absorbing compound is preferably 10 to 1000 parts by mass with respect to 100 parts by mass of the specific infrared absorbing compound. It is preferable that it is 500 mass parts or less, and, as for an upper limit, it is more preferable that it is 300 mass parts or less. The lower limit is preferably 20 parts by mass or more, and more preferably 30 parts by mass or more. The composition of this invention may contain only 1 type of other infrared ray absorbing compounds, and may contain 2 or more types. When containing 2 or more types, it is preferable that those total amounts become the said range.

<<curable compound>>

The composition of the present invention contains a curable compound. As a curable compound, a polymeric compound, resin, etc. are mentioned. The resin may be a non-polymerizable resin (resin having no polymerizable group) or a polymerizable resin (resin having a polymerizable group). Examples of the polymerizable group include an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, and an alkoxymethyl group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a vinylphenyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, a (meth)acryloylamide group, and the like, ( A meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group are preferable, and a (meth)acryloyloxy group is more preferable. As a cyclic ether group, an epoxy group, an oxetanyl group, etc. are mentioned, and an epoxy group is preferable. It is preferable that a polymeric compound contains a polymerizable monomer.

It is preferable to use what contains resin at least as a hardenable compound. Further, when the composition of the present invention is used as a composition for photolithography, it is preferable to use a resin and a polymerizable monomer (monomer-type polymerizable compound) as the curable compound, and a resin and a polymer having an ethylenically unsaturated bond-containing group It is more preferable to use a polymerizable monomer (polymerizable compound of a monomer type).

(polymerizable compound)

Examples of the polymerizable compound include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, and a compound having an alkoxymethyl group. A compound having an ethylenically unsaturated bond-containing group can be preferably used as a radically polymerizable compound. In addition, a compound having a cyclic ether group can be preferably used as a cationically polymerizable compound.

Examples of the polymerizable compound of the resin type include a resin containing a repeating unit having a polymerizable group.

It is preferable that it is less than 2000, and, as for the molecular weight of a monomer type polymeric compound (polymerizable monomer), it is more preferable that it is 1500 or less. It is preferable that it is 100 or more, and, as for the lower limit of the molecular weight of a polymerizable monomer, it is more preferable that it is 200 or more. It is preferable that the weight average molecular weight (Mw) of a resin type polymeric compound is 2000-2000000. It is preferable that it is 1000000 or less, and, as for the upper limit of a weight average molecular weight, it is more preferable that it is 500000 or less. It is preferable that it is 3000 or more, and, as for the minimum of a weight average molecular weight, it is more preferable that it is 5000 or more.

The compound having an ethylenically unsaturated bond-containing group as the polymerizable monomer is preferably a tri- to hexa-functional (meth)acrylate compound, and more preferably a tri- to hexafunctional (meth)acrylate compound. As a specific example, Paragraph No. 0095 of Unexamined-Japanese-Patent No. 2009-288705 - 0108, Paragraph 0227 of Unexamined-Japanese-Patent No. 2013-029760, Paragraph No. 0254-0257 of Unexamined-Japanese-Patent No. 2008-292970, and Unexamined-Japanese-Patent No. 2013-253224 Paragraph Nos. 0034 to 0038, Paragraph No. 0477 of Japanese Unexamined Patent Publication No. 2012-208494, Japanese Unexamined Patent Publication No. 2017-048367, Japanese Patent Publication No. 6057891, Japanese Patent Publication No. 6031807, Japanese Unexamined Patent Publication No. 2017-194662 The compound described is mentioned, These content is integrated in this specification.

As the compound having an ethylenically unsaturated bond-containing group, dipentaerythritol tri(meth)acrylate (as a commercial product, KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (as a commercial product, KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (as a commercial product, KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate rate (as a commercial product, KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK ester A-DPH-12E; manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), and the (meth)acryloyl groups of these compounds are ethylene glycol and and/or a compound having a structure bonded via a propylene glycol residue (for example, SR454 and SR499 commercially available from Sartomer).

In addition, as a compound having an ethylenically unsaturated bond-containing group, diglycerin EO (ethylene oxide) modified (meth)acrylate (M-460 as a commercial product; manufactured by Toagosei), pentaerythritol tetraacrylate (Shin Nakamura Chemical Industry Co., Ltd.) Co., Ltd., NK ester A-TMMT), 1,6-hexanedioldiacrylate (Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (Nippon Kayaku Co., Ltd.), DPHA- 40H (Nippon Kayaku Co., Ltd.), Aronix TO-2349 (Toa Kosei Co., Ltd.), NK Oligo UA-7200 (Shin Nakamura Kagaku Kogyo Co., Ltd.), 8UH-1006, 8UH-1012 ( Daisei Fine Chemical Co., Ltd.), light acrylate POB-A0, UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (above, Kyoe Isha Chemical Co., Ltd.) or the like can also be used.

In addition, as a compound having an ethylenically unsaturated bond-containing group, trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide modified tri(meth)acrylate, trimethylolpropane ethylene oxide modified tri(meth)acrylate ) It is also preferable to use a trifunctional (meth)acrylate compound such as acrylate, isocyanuric acid ethylene oxide-modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate. As commercially available products of trifunctional (meth)acrylate compounds, Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305 , M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A -TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin Nakamura Kagaku Kogyo Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.) ) and the like.

Further, as the compound having an ethylenically unsaturated bond-containing group, a compound having an acid group such as a carboxyl group, a sulfo group, or a phosphoric acid group can also be used. As a commercial item of such a compound, Aronix M-305, M-510, M-520, Aronix TO-2349 (made by Toagosei Co., Ltd.), etc. are mentioned.

As the compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used. About the compound which has a caprolactone structure, Paragraph 0042 of Unexamined-Japanese-Patent No. 2013-253224 - description of 0045 can be considered into consideration, and this content is integrated in this specification. Examples of the compound having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120 commercially available as the KAYARAD DPCA series from Nippon Kayaku Co., Ltd.

As the compound having an ethylenically unsaturated bond-containing group, a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group can also be used. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and/or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and having an ethyleneoxy group of 4 to 4 It is more preferable that it is a tri-hexafunctional (meth)acrylate compound which has 20 pieces. Commercially available products include SR-494 (manufactured by Sartomer), which is a tetrafunctional (meth)acrylate having four ethyleneoxy groups, and KAYARAD TPA-330 (Nippon Kayaku, Inc.), which is a trifunctional (meth)acrylate having three isobutyleneoxy groups. Co., Ltd.) and the like.

As the compound having an ethylenically unsaturated bond-containing group, a polymerizable compound having a fluorene skeleton can also be used. As a commercial item, Ogsol EA-0200, EA-0300 (Osaka Gas Chemical Co., Ltd. product, (meth)acrylate monomer which has a fluorene skeleton), etc. are mentioned.

As the compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a compound that does not substantially contain environmental regulating substances such as toluene. As a commercial item of such a compound, KAYARAD DPHA LT, KAYARAD DPEA-12 LT (made by Nippon Kayaku Co., Ltd.), etc. are mentioned.

Examples of the compound having a cyclic ether group include a compound having an epoxy group and a compound having an oxetanyl group, and a compound having an epoxy group is preferable. As a compound which has an epoxy group, the compound which has 1-100 epoxy groups in 1 molecule is mentioned. The upper limit of the number of epoxy groups may be 10 or less, for example, or 5 or less. As for the lower limit of the number of epoxy groups, two or more are preferable. As a compound having an epoxy group, Paragraph Nos. 0034 to 0036 of Unexamined-Japanese-Patent No. 2013-011869, Paragraph Nos. 0147 to 0156 of Unexamined-Japanese-Patent No. 2014-043556, and Paragraph Nos. 0085 to 0092 of Unexamined-Japanese-Patent No. 2014-089408 are the compounds described. , The compound described in Unexamined-Japanese-Patent No. 2017-179172 can also be used, and these content is integrated in this specification.

The compound having a cyclic ether group may be a low molecular weight compound (for example, a molecular weight of less than 1000) or a macromolecule (for example, a molecular weight of 1000 or more, in the case of a polymer, a weight average molecular weight of 1000 or more). 200-100000 are preferable and, as for the weight average molecular weight of a cyclic ether group, 500-50000 are more preferable. 10000 or less are preferable, as for the upper limit of a weight average molecular weight, 5000 or less are more preferable, and 3000 or less are still more preferable.

As the compound having a cyclic ether group, the compounds described in paragraphs 0034 to 0036 of Japanese Patent Application Laid-Open No. 2013-011869, the compounds described in paragraphs 0147 to 0156 of Japanese Patent Application Laid-Open No. 2014-043556, and the compounds described in Japanese Patent Laid-Open No. 2014-089408 The compound described in Paragraph No. 0085 - 0092 and the compound described in Unexamined-Japanese-Patent No. 2017-179172 can also be used.

As commercially available products of compounds having a cyclic ether group, Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, EX- 850 (above, manufactured by Nagase Chemtex Co., Ltd.), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4011S (above, manufactured by ADEKA Co., Ltd.), NC-2000, NC-3000, NC- 7300, XD-1000, EPPN-501, EPPN-502 (above, manufactured by ADEKA Co., Ltd.), Celoxide 2021P, Celoxide 2081, Celoxide 2083, Celoxide 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (above, Daicel Co., Ltd.), Cyclomer P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (above, Daicel Co., Ltd.), jER1031S, jER157S65, jER152, jER154, jER157S70 (above, Mitsubishi Chemical Co., Ltd.), Aaron Oxetane OXT-121, OXT-221, OX-SQ, PNOX (above, Toagosei Co., Ltd. product), Adeka glycerol ED-505 (ADEKA Co., Ltd., epoxy group monomer), Maproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (Nichiyu ) agent, epoxy group-containing polymer), OXT-101, OXT-121, OXT-212, OXT-221 (above, Toagosei Co., Ltd. product, oxetanyl group-containing monomer), OXE-10, OXE-30 (above, Oxetanyl group-containing monomer) by Osaka Yuki Chemical Industry Co., Ltd., etc. are mentioned.

Examples of the compound having a methylol group (hereinafter also referred to as a methylol compound) include a compound in which a methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring.

Moreover, as a compound (henceforth also called an alkoxymethyl compound) which has an alkoxymethyl group, the compound which the alkoxymethyl group couple|bonds with the carbon atom which forms a nitrogen atom or an aromatic ring is mentioned. Examples of the compound having an alkoxymethyl group or a methylol group bonded to a nitrogen atom include alkoxymethylation melamine, methylolation melamine, alkoxymethylation benzoguanamine, methylolation benzoguanamine, alkoxymethylation glycoluril, methylolation glycoluril, and alkoxymethylolation. Methylation urea and methylolation urea are preferred. Moreover, Paragraph 0134 of Unexamined-Japanese-Patent No. 2004-295116 - 0147, Paragraph 0095 of Unexamined-Japanese-Patent No. 2014-089408 - the compound of 0126 can also be used.

(profit)

In the composition of the present invention, a resin can be used as a curable compound. It is preferable to use what contains resin at least as a hardenable compound. The resin is blended for, for example, a use for dispersing a pigment or the like in a composition or a use for a binder. In addition, a resin mainly used for dispersing a pigment or the like in a composition is also referred to as a dispersing agent. However, such a use of the resin is an example, and the resin may be used for purposes other than such a use. In addition, resin which has a polymeric group corresponds also to a polymeric compound.

As for the weight average molecular weight of resin, 3000-2000000 are preferable. 1000000 or less are preferable and, as for an upper limit, 500000 or less are more preferable. 4000 or more are preferable and, as for a minimum, 5000 or more are more preferable.

As the resin, (meth)acrylic resin, epoxy resin, ene thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene Etherphosphine oxide resin, polyimide resin, polyamide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, polyvinyl alcohol resin, polyvinyl acetal resin, poly oil Retane resin, polyurea resin, etc. are mentioned. These resins may be used individually by 1 type, or 2 or more types may be mixed and used. As cyclic olefin resin, norbornene resin is preferable from a viewpoint of improving heat resistance. As a commercial item of norbornene resin, JSR Co., Ltd. ARTON series (for example, ARTON F4520) etc. are mentioned, for example. Moreover, as resin, resin described in the Example of international publication 2016/088645, resin described in Unexamined-Japanese-Patent No. 2017-057265, resin described in Unexamined-Japanese-Patent No. 2017-032685, Unexamined-Japanese-Patent No. 2017-075248 , a resin described in Japanese Unexamined Patent Publication No. 2017-066240, a resin described in Japanese Unexamined Patent Publication No. 2017-167513, a resin described in Japanese Unexamined Patent Publication No. 2017-173787, a paragraph in Japanese Unexamined Patent Publication No. 2017-206689 Resin described in Nos. 0041 to 0060, resin described in paragraph Nos. 0022 to 0071 of Japanese Laid-open Patent Publication No. 2018-010856, block polyisocyanate resin described in Japanese Unexamined Patent Publication No. 2016-222891, Japanese Unexamined Patent Publication 2020-122052 , a resin described in Japanese Unexamined Patent Publication No. 2020-111656, a resin described in Japanese Unexamined Patent Publication No. 2020-139021, and a structural unit having a ring structure in the main chain and a side chain described in Japanese Unexamined Patent Publication No. 2017-138503 A resin containing a structural unit having a biphenyl group can also be used. Moreover, as resin, resin which has a fluorene skeleton can also be used suitably. About resin which has a fluorene skeleton, description of US Patent Application Publication No. 2017/0102610 can be considered into consideration, and this content is integrated in this specification.

As the resin, it is also preferable to use a resin having a glass transition temperature of 150°C or higher. By using such a resin, the association formation of the specific infrared absorbing compound in the film is more easily promoted during film formation, and a film having excellent infrared shielding properties, heat resistance, and light resistance can be formed. It is preferable that it is 180 degreeC or more, and, as for the glass transition temperature of resin, it is more preferable that it is 200 degreeC or more. In addition, in this specification, the glass transition temperature (Tg) of resin uses the theoretical value represented by the following formula about resin whose structure is known, and uses the catalog value about the thing whose structure is unknown.

1/Tg=(W1/Tg1)+(W2/Tg2)+... +(Wn/Tgn)

In the above formula, the resin is monomer 1, monomer 2, . . . , It is a calculation formula in the case of being composed of n types of monomer components of monomer n, in the above formula, Tg represents the glass transition temperature (unit: K) of the resin, and Tg1 to Tgn are the glass transition temperatures of the homopolymer of each monomer ( Unit: K), and W1 to Wn represent the mass fraction of all monomer components of each monomer.

As the resin, it is preferable to use a resin having an acid group. As an acidic group, a carboxyl group, a phosphoric acid group, a sulfo group, a phenolic hydroxyl group etc. are mentioned, for example. 1 type may be sufficient as these acidic radicals, and 2 or more types may be sufficient as them. Resin having an acid group can also be used as a dispersing agent. As for the acid value of resin which has an acid group, 30-500 mgKOH/g is preferable. 50 mgKOH/g or more is preferable and, as for a minimum, 70 mgKOH/g or more is more preferable. The upper limit is preferably 400 mgKOH/g or less, more preferably 200 mgKOH/g or less, still more preferably 150 mgKOH/g or less, and most preferably 120 mgKOH/g or less.

As the resin, it is also preferable to include a resin containing a repeating unit derived from a compound represented by formula (ED1) and/or a compound represented by formula (ED2) (hereinafter, these compounds may be referred to as "ether dimer"). do.

[Formula 10]

In Formula (ED1), R ¹ and R ² each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.

[Formula 11]

In Formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. As a specific example of formula (ED2), description of Unexamined-Japanese-Patent No. 2010-168539 can be referred.

About the specific example of an ether dimer, Paragraph No. 0317 of Unexamined-Japanese-Patent No. 2013-029760 can be considered into consideration, and this content is integrated in this specification.

As resin, it is also preferable to use resin having a polymerizable group. The polymerizable group is preferably an ethylenically unsaturated bond-containing group and a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.

As the resin, it is also preferable to use a resin containing a repeating unit derived from a compound represented by formula (X).

[Formula 12]

In the formula, R ¹ represents a hydrogen atom or a methyl group, R ²¹ and R ²² each independently represents an alkylene group, and n represents an integer of 0 to 15. The alkylene group represented by R ²¹ and R ²² preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, still more preferably 1 to 3 carbon atoms, and particularly preferably 2 or 3 carbon atoms. n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, and still more preferably an integer of 0 to 3.

As a compound represented by Formula (X), ethylene oxide or propylene oxide modified (meth)acrylate of paracumyl phenol, etc. are mentioned. As a commercial item, Aronix M-110 (Toagosei Co., Ltd. product) etc. are mentioned.

It is preferable that resin contains resin as a dispersing agent. As a dispersing agent, an acidic dispersing agent (acidic resin) and a basic dispersing agent (basic resin) are mentioned. Here, the acidic dispersant (acidic resin) represents a resin in which the amount of acid groups is larger than the amount of basic groups. As an acidic dispersing agent (acidic resin), when the total amount of the quantity of an acidic group and the quantity of a basic group is 100 mol%, resin whose amount of acidic groups is 70 mol% or more is preferable. The acid group that the acidic dispersant (acidic resin) has is preferably a carboxyl group. As for the acid value of an acidic dispersing agent (acidic resin), 10-105 mgKOH/g is preferable. Moreover, a basic dispersing agent (basic resin) shows resin with more basic group quantities than acid group quantities. As the basic dispersant (basic resin), a resin in which the amount of the basic group exceeds 50 mol% is preferable when the total amount of the amount of the acid group and the amount of the basic group is 100 mol%. The basic group of the basic dispersing agent is preferably an amino group.

It is also preferable that the resin used as a dispersing agent is a graft resin. About the detail of graft resin, Paragraph No. 0025 of Unexamined-Japanese-Patent No. 2012-255128 - description of 0094 can be considered into consideration, and this content is integrated in this specification.

It is also preferable that the resin used as a dispersing agent is a polyimine-based dispersing agent containing a nitrogen atom in at least one of the main chain and side chain. As the polyimine-based dispersant, a resin having a main chain having a partial structure having a functional group with a pKa of 14 or less and a side chain having 40 to 10,000 atoms and having a basic nitrogen atom in at least one of the main chain and the side chain is preferable. The basic nitrogen atom is not particularly limited as long as it is a nitrogen atom exhibiting basicity. About the polyimine type dispersing agent, Paragraph No. 0102 of Unexamined-Japanese-Patent No. 2012-255128 - description of 0166 can be considered into consideration, and this content is integrated in this specification.

It is also preferable that the resin used as a dispersing agent is a resin having a structure in which a plurality of polymer chains are bonded to a core portion. As such resin, a dendrimer (including a star-shaped polymer) is mentioned, for example. Moreover, as a specific example of a dendrimer, Paragraph No. 0196 of Unexamined-Japanese-Patent No. 2013-043962 - the high molecular compound C-1 - C-31 of 0209 etc. are mentioned.

It is also preferable that the resin used as a dispersing agent is a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in the side chain is preferably 10 mol% or more, more preferably 10 to 80 mol%, and still more preferably 20 to 70 mol%, based on all repeating units of the resin. .

Moreover, as a dispersing agent, block copolymers (EB-1) to (EB-9) described in Paragraph Nos. 0219 to 0221 of Japanese Patent Publication No. 6432077, a resin described in Japanese Unexamined Patent Publication No. 2018-087939, International Publication No. 2016 / 104803, a polyethyleneimine having a polyester side chain, a block copolymer described in International Publication No. 2019/125940, a block polymer having an acrylamide structural unit described in Japanese Patent Laid-Open No. 2020-066687, Japanese Laid-Open Patent Publication A block polymer having an acrylamide structural unit described in No. 2020-066688, a dispersant described in International Publication No. 2016/104803, a resin described in Japanese Unexamined Patent Publication No. 2019-095548, or the like can also be used.

The dispersing agent can also be obtained as a commercial item, and specific examples thereof include the DISPERBYK series manufactured by Big Chemie Japan, the SOLSPERSE series manufactured by Nippon Lubrizol, the Efka series manufactured by BASF, and the Ajisper series manufactured by Ajinomoto Fine Techno Co., Ltd. etc. can be mentioned. Moreover, the product of Paragraph No. 0129 of Unexamined-Japanese-Patent No. 2012-137564, and the product of Paragraph No. 0235 of Unexamined-Japanese-Patent No. 2017-194662 can also be used as a dispersing agent.

As for content of a curable compound, 1-95 mass % is preferable in the total solids of a composition. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, still more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, still more preferably 85% by mass or less, and particularly preferably 80% by mass or less.

As for content of a polymeric compound, when the composition of this invention contains a polymeric compound as a hardenable compound, 1-85 mass % is preferable in the total solids of a composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and still more preferably 5% by mass or more. 80 mass % or less is preferable and, as for an upper limit, 70 mass % or less is more preferable.

When the composition of this invention contains a polymerizable monomer as a curable compound, as for content of a polymerizable monomer, 1-50 mass % is preferable in the total solids of a composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and still more preferably 5% by mass or more. 30 mass % or less is preferable and, as for an upper limit, 20 mass % or less is more preferable.

When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group is preferably 1 to 70% by mass based on the total solids of the composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and still more preferably 5% by mass or more. 65 mass % or less is preferable and, as for an upper limit, 60 mass % or less is more preferable.

As for content of resin, when the composition of this invention contains resin as a curable compound, 1-85 mass % is preferable in total solids of a composition. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, still more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, still more preferably 70% by mass or less, and particularly preferably 40% by mass or less.

When the composition of this invention contains resin as a dispersing agent, as for content of resin as a dispersing agent, 0.1-40 mass % is preferable in the total solids of a composition. 25 mass % or less is preferable, and, as for an upper limit, 20 mass % or less is more preferable. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. Moreover, the content of the resin as a dispersant is preferably 1 to 100 parts by mass with respect to 100 parts by mass of the specific infrared absorbing compound described above. The upper limit is preferably 80 parts by mass or less, and more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, and more preferably 5 parts by mass or more.

The composition of this invention may contain only 1 type of sclerosing|hardenable compounds, and may contain 2 or more types. When two or more types of sclerosing|hardenable compounds are included, it is preferable that those total amounts become the said range.

<<Pigment Derivatives>>

The composition of the present invention may further contain a pigment derivative. The pigment derivative is used as a dispersing aid. As the dye derivative, a compound having a structure in which an acid group or a basic group is bonded to a dye skeleton is exemplified.

As the pigment skeleton constituting the pigment derivative, squarylium pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, quinacridone pigment skeleton, anthraquinone pigment skeleton, dianthraquinone pigment skeleton, benzisoindole pigment thiazine indigo pigment skeleton, azo pigment skeleton, quinophthalone pigment skeleton, phthalocyanine pigment skeleton, naphthalocyanine pigment skeleton, dioxazine pigment skeleton, perylene pigment skeleton, perrinone pigment skeleton, benzimida Jolon pigment skeleton, benzothiazole pigment skeleton, benzimidazole pigment skeleton and benzoxazole pigment skeleton, squarylium pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, phthalocyanine A pigment skeleton, a quinacridone pigment skeleton, and a benzimidazolone pigment skeleton are preferable, and a squarylium pigment skeleton and a pyrrolopyrrole pigment skeleton are more preferable.

As an acid group, a carboxyl group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imidic acid group, these salts, etc. are mentioned. As the atom or group of atoms constituting the salt, alkali metal ions (Li ⁺ , Na ⁺ , K ⁺ etc.), alkaline earth metal ions (Ca ²⁺ , Mg ²⁺ etc.), ammonium ion, imidazolium ion, pyridinium ion , phosphonium ions, and the like. As the carboxylic acid amide group, a group represented by -NHCOR ^X1 is preferable. As the sulfonic acid amide group, a group represented by -NHSO ₂ R ^X2 is preferable. As the imidic acid group, a group represented by -SO ₂ NHSO ₂ R ^X3 , -CONHSO ₂ R ^X4 , -CONHCOR ^X5 or -SO ₂ NHCOR ^X6 is preferable, and -SO ₂ NHSO ₂ R ^X3 is more preferable. R ^X1 to R ^X6 each independently represent an alkyl group or an aryl group. The alkyl group and aryl group represented by R ^X1 to R ^X6 may have a substituent. As a substituent, it is preferable that it is a halogen atom, and it is more preferable that it is a fluorine atom.

Examples of the basic group include an amino group, a pyridinyl group and a salt thereof, a salt of an ammonium group, and a phthalimide methyl group. Examples of atoms or groups of atoms constituting the salt include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, phenoxide ions and the like.

As a dye derivative, the compound described in Unexamined-Japanese-Patent No. 56-118462, the compound described in Unexamined-Japanese-Patent No. 63-264674, the compound described in Unexamined-Japanese-Patent No. 01-217077, and the compound described in Unexamined-Japanese-Patent No. 03- A compound described in Japanese Patent Laid-Open No. 009961, a compound described in Japanese Unexamined Patent Publication No. Hei 03-026767, a compound described in Japanese Patent Laid-Open No. Hei 03-153780, a compound described in Japanese Unexamined Patent Publication No. Hei 03-045662, Japanese Unexamined Patent Publication Hei A compound described in Japanese Unexamined Patent Publication No. 04-285669, a compound described in Japanese Unexamined Patent Publication No. Hei 06-145546, a compound described in Japanese Unexamined Patent Publication No. Hei 06-212088, a compound described in Japanese Unexamined Patent Publication No. Hei 06-240158, Japanese Patent Laid-Open A compound described in Japanese Patent Application Laid-Open No. 10-030063, a compound described in Japanese Patent Application Laid-open No. 10-195326, a compound described in International Publication No. 2011/024896 in Paragraph Nos. 0086 to 0098, and an International Publication No. 2012/102399 Paragraph No. A compound described in 0063 to 0094, a compound described in Paragraph No. 0082 of International Publication No. 2017/038252, a compound described in Paragraph No. 0171 of Unexamined-Japanese-Patent No. 2015-151530, and Paragraph Nos. 0162 to 0183 of Unexamined-Japanese-Patent No. 2011-252065 A compound described in, a compound described in Japanese Unexamined Patent Publication No. 2003-081972, a compound described in Japanese Patent Publication No. 5299151, a compound described in Japanese Unexamined Patent Publication No. 2015-172732, a compound described in Japanese Unexamined Patent Publication No. 2014-199308, A compound described in Japanese Unexamined Patent Publication No. 2014-085562, a compound described in Japanese Unexamined Patent Publication No. 2014-035351, a compound described in Japanese Unexamined Patent Publication No. 2008-081565, a compound described in Japanese Unexamined Patent Publication No. 2019-109512, Japanese Unexamined Patent Publication Compounds described in Patent Publication No. 2019-133154 and diketopyrrolopyrrole compounds having a thiol linking group described in International Publication No. 2020/002106 are exemplified.

The content of the dye derivative is preferably 1 to 50 parts by mass with respect to 100 parts by mass of the specific infrared absorbing compound described above. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. A pigment derivative may use only 1 type, and may use 2 or more types. When using 2 or more types, it is preferable that a total amount becomes the said range.

<<solvent>>

It is preferable that the composition of this invention contains a solvent. Examples of the solvent include water and organic solvents, and organic solvents are preferred. Examples of the organic solvent include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. About these details, Paragraph No. 0223 of International Publication No. 2015/166779 can be referred, and this content is integrated in this specification. In addition, an ester-based solvent in which a cyclic alkyl group is substituted and a ketone-based solvent in which a cyclic alkyl group is substituted can also be preferably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl Ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclo Hexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3- Methoxy-N,N-dimethylpropaneamide, 3-butoxy-N,N-dimethylpropaneamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone , sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate , diacetone alcohol, 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropyl alcohol and the like. However, there are cases in which it is preferable to reduce aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents for environmental reasons and the like (for example, 50 mass ppm relative to the total amount of organic solvents). (parts per million) or less, 10 mass ppm or less, or 1 mass ppm or less).

In this invention, it is preferable to use the organic solvent with little metal content, and it is preferable that the metal content of an organic solvent is 10 mass ppb (parts per billion) or less, for example. If necessary, an organic solvent at a ppt (parts per trillion) level may be used, and such an organic solvent is provided, for example, by Toyo Kosei Co., Ltd. (Kagaku Kogyo Nippo, November 13, 2015).

Examples of methods for removing impurities such as metals from organic solvents include distillation (molecular distillation, thin film distillation, etc.) or filtration using a filter. The filter hole diameter of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and still more preferably 3 μm or less. The material of the filter is preferably polytetrafluoroethylene, polyethylene or nylon.

The organic solvent may contain isomers (compounds having the same number of atoms but different structures). Moreover, only 1 type may be contained in an isomer, and plural types may be included.

It is preferable that the content rate of the peroxide in the organic solvent is 0.8 mmol/L or less, and it is more preferable that the peroxide is not substantially contained.

It is preferable that content of the solvent in a composition is 10-97 mass %. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, still more preferably 50% by mass or more, even more preferably 60% by mass or more, and particularly preferably 70% by mass or more. It is preferable that it is 96 mass % or less, and, as for an upper limit, it is more preferable that it is 95 mass % or less. The composition may contain only 1 type of solvent, and may contain 2 or more types. When containing 2 or more types, it is preferable that those total amounts become the said range.

<<Photoinitiator>>

When the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, compounds having photosensitivity to light rays in the visible range from the ultraviolet range are preferred. The photopolymerization initiator is preferably a radical photopolymerization initiator.

As the photopolymerization initiator, halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazoles, oxime compounds, organic peroxides, O compounds, ketone compounds, aromatic onium salts, α-hydroxy ketone compounds, α-amino ketone compounds, and the like. From the viewpoint of exposure sensitivity, the photopolymerization initiator is a trihalomethyltriazine compound, a benzyldimethylketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, and a metallocene. compounds, oxime compounds, triarylimidazole dimers, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethyloxadiazole compounds and 3-aryl substituted coumarins It is preferably a compound, more preferably a compound selected from oxime compounds, α-hydroxyketone compounds, α-amino ketone compounds, and acylphosphine compounds, and still more preferably an oxime compound. Moreover, as a photoinitiator, the compound of Paragraph 0065 of Unexamined-Japanese-Patent No. 2014-130173 - 0111, the compound of Unexamined-Japanese-Patent No. 6301489, MATERIAL STAGE 37-60p, vol. 19, no. 3, a peroxide-based photopolymerization initiator described in 2019, a photopolymerization initiator described in International Publication No. 2018/221177, a photopolymerization initiator described in International Publication No. 2018/110179, a photopolymerization initiator described in Japanese Unexamined Patent Publication No. 2019-043864, Photopolymerization initiator described in Japanese Unexamined Patent Publication No. 2019-044030, peroxide-based initiator described in Japanese Unexamined Patent Publication No. 2019-167313, aminoacetophenone-based initiator having an oxazolidine group described in Japanese Unexamined Patent Publication No. 2020-055992, Japanese Unexamined Patent Publication The oxime system photoinitiator of patent publication 2013-190459, etc. are mentioned, These content is integrated in this specification.

Commercially available products of the α-hydroxyketone compound include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (above, manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (above, manufactured by BASF), and the like. can Commercially available products of α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (above, manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (above, manufactured by BASF). there is. Examples of commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (above, manufactured by IGM Resins B.V.), Irgacure 819 and Irgacure TPO (above, manufactured by BASF) and the like.

As an oxime compound, the compound described in Unexamined-Japanese-Patent No. 2001-233842, the compound described in Unexamined-Japanese-Patent No. 2000-080068, the compound described in Unexamined-Japanese-Patent No. 2006-342166, J. C. S. Perkin II (1979, pp. 1653 -1660), compounds described in J. C. S. Perkin II (1979, pp. 156-162), compounds described in Journal of Photopolymer Science and Technology (1995, pp. 202-232), Japanese Unexamined Patent Publication 2000- A compound described in Japanese Patent Publication No. 066385, a compound described in Japanese Patent Publication No. 2004-534797, a compound described in Japanese Unexamined Patent Publication, 2017-019766, a compound described in Japanese Patent Publication No. 6065596, and International Publication No. 2015/152153 The compound described, the compound described in International Publication No. 2017/051680, the compound described in Japanese Patent Laid-Open No. 2017-198865, the compound described in Paragraph Nos. 0025 to 0038 of International Publication No. 2017/164127, International Publication No. 2013/ The compound of No. 167515, etc. are mentioned. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, and 2-acetoxyiminopentan-3-one. , 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, and 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one etc. are mentioned. As commercially available products, Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04 (above, manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Trolly New Electronic Materials Co., Ltd.), Adeka optomer N-1919 (made by ADEKA Co., Ltd., the photoinitiator 2 of Unexamined-Japanese-Patent No. 2012-014052) is mentioned. As the oxime compound, it is also preferable to use a compound having no colorability or a compound having high transparency and hardly discolored. As a commercial item, Adeka Akles NCI-730, NCI-831, NCI-930 (above, made by ADEKA Corporation), etc. are mentioned.

As the photopolymerization initiator, an oxime compound having a fluorene ring can also be used. As a specific example of the oxime compound which has a fluorene ring, the compound of Unexamined-Japanese-Patent No. 2014-137466, the compound of Unexamined-Japanese-Patent No. 6636081, and the compound of Korean Unexamined-Japanese-Patent No. 10-2016-0109444 are mentioned.

As the photopolymerization initiator, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is a naphthalene ring can also be used. As a specific example of such an oxime compound, the compound of international publication 2013/083505 is mentioned.

As the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. As a specific example of the oxime compound which has a fluorine atom, the compound described in Unexamined-Japanese-Patent No. 2010-262028, the compound described in Unexamined-Japanese-Patent No. 2014-500852, the compound 24, 36-40, and the compound described in Unexamined-Japanese-Patent No. 2013-164471 (C-3) etc. are mentioned.

As the photopolymerization initiator, an oxime compound having a nitro group can be used. It is also preferable to use the oxime compound which has a nitro group as a dimer. As specific examples of the oxime compound having a nitro group, the compounds described in Paragraph Nos. 0031 to 0047 of Unexamined-Japanese-Patent No. 2013-114249, Paragraph Nos. 0008 to 0012, and 0070 to 0079 of Unexamined-Japanese-Patent No. 2014-137466, Japanese Patent Publication The compound described in Paragraph No. 0007 - 0025 of 4223071, Adeka Akles NCI-831 (made by Adeka Co., Ltd.) is mentioned.

As the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. As a specific example, OE-01 described in international publication 2015/036910 - OE-75 is mentioned.

As the photopolymerization initiator, an oxime compound having a substituent having a hydroxyl group bonded to the carbazole skeleton can also be used. As such a photoinitiator, the compound of international publication 2019/088055, etc. are mentioned.

Although the specific example of the oxime compound preferably used in this invention is shown below, this invention is not limited to these.

[Formula 13]

[Formula 14]

[Formula 15]

The oxime compound is preferably a compound having a maximum absorption wavelength in a wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in a wavelength range of 360 to 480 nm. Further, the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or a wavelength of 405 nm is preferably high, more preferably 1000 to 300000, more preferably 2000 to 300000, and more preferably 5000 to 200000, from the viewpoint of sensitivity. is particularly preferred. The molar extinction coefficient of a compound can be measured using a known method. For example, it is preferable to measure at a concentration of 0.01 g/L using a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian) using an ethyl acetate solvent.

As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used. Since two or more radicals generate|occur|produce from one molecule of radical photopolymerization initiator by using such a radical photopolymerization initiator, favorable sensitivity is obtained. In addition, in the case of using a compound with an asymmetric structure, crystallinity is reduced, solubility in a solvent or the like is improved, and precipitation with time becomes difficult, and the stability with time of the composition can be improved. As a specific example of a bifunctional or trifunctional or more than trifunctional radical photopolymerization initiator, paragraphs of Japanese Patent Publication No. 2010-527339, Japanese Patent Publication No. 2011-524436, International Publication No. 2015/004565, Japanese Patent Publication No. 2016-532675 Dimers of oxime compounds described in No. 0407 to 0412, Paragraph Nos. 0039 to 0055 of International Publication No. 2017/033680, compounds (E) and compounds (G) described in Japanese Patent Publication No. 2013-522445, Cmpd 1 to 7 described in International Publication No. 2016/034963, oxime ester photoinitiator described in Paragraph No. 0007 of Japanese Patent Publication No. 2017-523465, Paragraph Nos. 0020 to 0033 of Japanese Unexamined Patent Publication No. 2017-167399 The photoinitiator described in, the photoinitiator (A) described in Paragraph Nos. 0017-0026 of Unexamined-Japanese-Patent No. 2017-151342, the oxime ester type photoinitiator described in Japanese Patent Publication No. 6469669, etc. are mentioned.

The content of the photopolymerization initiator is preferably 0.1 to 40% by mass, more preferably 0.5 to 35% by mass, and still more preferably 1 to 30% by mass, based on the total solids of the composition. The composition may contain only 1 type of photoinitiator, and may contain 2 or more types. When containing 2 or more types, it is preferable that those total amounts become the said range.

<<hardener>>

When the composition of the present invention contains a compound having a cyclic ether group, it is preferable to further contain a curing agent. Examples of the curing agent include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polyhydric carboxylic acids, and thiol compounds. Specific examples of the curing agent include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). As a hardening|curing agent, Paragraph No. 0072 of Unexamined-Japanese-Patent No. 2016-075720 - the compound of 0078, and the compound of Unexamined-Japanese-Patent No. 2017-036379 can also be used.

The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and still more preferably 0.1 to 6.0 parts by mass, based on 100 parts by mass of the compound having a cyclic ether group.

<<chromatic colorants>>

The composition of the present invention may contain a chromatic colorant. In the present invention, a chromatic colorant means a colorant other than a white colorant and a black colorant. The chromatic colorant is preferably a colorant having absorption in a wavelength range of 400 nm or more and less than 650 nm.

As chromatic colorants, red colorants, green colorants, blue colorants, yellow colorants, purple colorants and orange colorants are exemplified. The chromatic colorant may be a pigment or a dye. You may use a pigment and dye together. Moreover, any of an inorganic pigment and an organic pigment may be sufficient as a pigment. Further, as the pigment, a material in which a part of an inorganic pigment or an organic-inorganic pigment is substituted with an organic chromophore may be used. By replacing inorganic pigments or organic-inorganic pigments with organic chromophores, color design can be easily performed.

As for the average primary particle diameter of a pigment, 1-200 nm is preferable. 5 nm or more is preferable and, as for a minimum, 10 nm or more is more preferable. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and still more preferably 100 nm or less. When the average primary particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the composition is good. In addition, in this invention, the primary particle diameter of a pigment can be calculated|required from the image photograph obtained by observing the primary particle of a pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is obtained, and the equivalent circle diameter corresponding to the projected area is calculated as the primary particle diameter of the pigment. The average primary particle size in the present invention is the arithmetic mean value of the primary particle size of 400 pigment primary particles. In addition, the primary particle of a pigment refers to an independent particle without aggregation.

It is preferable that a chromatic colorant contains a pigment. The content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, still more preferably 80% by mass or more, and particularly preferably 90% by mass or more. As a pigment, what is shown below is mentioned.

Color Index (C.I.) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35 :1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94 ,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,13 7 ,138,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175, 176 , 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232 (methane), 233 (quinoline), 234 (aminoketone ), 235 (amino ketone), 236 (amino ketone), etc. (above, yellow pigment),

C. I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73 Etc. (ideal, orange pigment),

C. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4 , 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3 , 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 18 4 ,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279, 291 , 294 (Xanthene, Organo Ultramarine, Bluish Red), 295 (monoazo), 296 (diazo), 297 (amino ketone), etc. (above, red pigment),

C. I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine-based), 65 (phthalocyanine-based), 66 (phthalocyanine-based), etc. (above, green pigment),

C. I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane-based), 61 (xanthene-based), etc. (above, purple pigment),

C. I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo ), 88 (methane-based), etc. (above, blue pigment).

In addition, as a green colorant, a halogenated zinc phthalocyanine pigment having an average number of halogen atoms in one molecule of 10 to 14, an average number of bromine atoms of 8 to 12, and an average number of chlorine atoms of 2 to 5 may be used. there is. As a specific example, the compound of international publication 2015/118720 is mentioned. Further, as a green colorant, a compound described in Chinese Patent Application No. 106909027, a phthalocyanine compound having a phosphoric acid ester as a ligand described in International Publication No. 2012/102395, and a phthalocyanine described in Japanese Unexamined Patent Publication No. 2019-008014 A non-animal compound, a phthalocyanine compound described in Unexamined-Japanese-Patent No. 2018-180023, a compound described in Unexamined-Japanese-Patent No. 2019-038958, a core-shell type pigment described in Unexamined-Japanese-Patent No. 2020-076995, etc. can also be used.

Moreover, as a blue coloring agent, the aluminum phthalocyanine compound which has a phosphorus atom can also be used. As a specific example, Paragraph No. 0022 of Unexamined-Japanese-Patent No. 2012-247591 - 0030, and the compound of Paragraph No. 0047 of Unexamined-Japanese-Patent No. 2011-157478 are mentioned.

Moreover, as a yellow colorant, the compound described in Unexamined-Japanese-Patent No. 2017-201003, the compound described in Unexamined-Japanese-Patent No. 2017-197719, the compound described in Paragraph Nos. 0011-0062, 0137-0276 of Unexamined-Japanese-Patent No. 2017-171912 , Compounds described in Paragraph Nos. 0010 to 0062, 0138 to 0295 of Japanese Laid-open Patent Publication No. 2017-171913, Paragraph Nos. 0011 to 0062, 0139 to 0190 of Japanese Unexamined Patent Publication No. 2017-171914, Compounds described in Japanese Unexamined Patent Publication No. 2017-171915 Paragraph Nos. 0010 to 0065, 0142 to 0222, the compound described in Paragraph Nos. 0011 to 0034 of Japanese Patent Application Laid-Open No. 2013-054339, the quinophthalone compound described in Paragraph Nos. 0013 to 0058 of Unexamined-Japanese-Patent No. 2014-026228 A nophthalone compound, an isoindoline compound described in Japanese Unexamined Patent Publication No. 2018-062644, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2018-203798, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2018-062578, Japan A quinophthalone compound described in Patent Publication No. 6432076, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2018-155881, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2018-111757, Japanese Unexamined Patent Publication No. 2018-040835 A quinophthalone compound described in, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2017-197640, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2016-145282, a quinophthalone described in Japanese Unexamined Patent Publication No. 2014-085565 A compound, a quinophthalone compound described in Japanese Laid-Open Patent Publication No. 2014-021139, a quinophthalone compound described in Japanese Laid-Open Patent Publication No. 2013-209614, a quinophthalone compound described in Japanese Laid-Open Patent Publication No. 2013-209435, Japanese Laid-Open Patent A quinophthalone compound described in Publication No. 2013-181015, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2013-061622, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2013-032486, Japanese Unexamined Patent Publication No. 2012-226110 A quinophthalone compound described in, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2008-074987, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2008-081565, a quinophthalone described in Japanese Unexamined Patent Publication No. 2008-074986 Compound, quinophthalone compound described in Japanese Laid-Open Patent Publication No. 2008-074985, quinophthalone compound described in Japanese Patent Laid-Open No. 2008-050420, quinophthalone compound described in Japanese Patent Laid-Open No. 2008-031281, Japanese published patent A quinophthalone compound described in Publication No. 48-032765, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2019-008014, a quinophthalone compound described in Japanese Patent Publication No. 6607427, and Japanese Unexamined Patent Publication No. 2019-073695 The metamine dyes described, the methine dyes described in Japanese Laid-Open Patent Publication No. 2019-073696, the metamine dyes described in Japanese Patent Laid-Open No. 2019-073697, the metamine dyes described in Japanese Laid-Open Patent Publication No. 2019-073698, Korean Laid-Open Patent A compound described in Publication No. 10-2014-0034963, a compound described in Japanese Laid-Open Patent Publication No. 2017-095706, a compound described in Taiwanese Patent Application Laid-Open No. 201920495, a compound described in Japanese Patent Publication No. 6607427, Japanese Laid-Open Patent Publication A compound described in Japanese Patent Laid-Open No. 2020-033525, a compound described in Japanese Unexamined Patent Publication No. 2020-033524, a compound described in Japanese Unexamined Patent Publication No. 2020-033523, a compound described in Japanese Unexamined Patent Publication No. 2020-033522, Japanese Unexamined Patent Publication 2020- A compound described in International Publication No. 033521, a compound described in International Publication No. 2020/045200, a compound described in International Publication No. 2020/045199, a compound described in International Publication No. 2020/045197, Japanese Patent Laid-Open No. 2020-093994 An azo compound described in, a perylene compound described in Japanese Laid-open Patent Publication No. 2020-083982, a perylene compound described in International Publication No. 2020/105346, and a quinophthalone compound described in Japanese Patent Publication No. 2020-517791 may also be used. there is. Moreover, what multimerized these compounds is also used suitably from a viewpoint of color value improvement.

As a red colorant, diketopyrrolopyrrole compounds in which at least one bromine atom is substituted in the structure described in Japanese Laid-open Patent Publication No. 2017-201384, and diketopyrrolopyrrole compounds described in paragraph Nos. 0016 to 0022 of Japanese Patent Publication No. 6248838 , A diketopyrrolopyrrole compound described in International Publication No. 2012/102399, a diketopyrrolopyrrole compound described in International Publication No. 2012/117965, a naphthol azo compound described in Japanese Patent Laid-Open No. 2012-229344, Japan Red pigment described in Patent Publication No. 6516119, red pigment described in Japanese Patent Publication No. 6525101, brominated diketopyrrolopyrrole compound described in Paragraph No. 0229 of Japanese Patent Laid-Open No. 2020-090632, Korean Patent Laid-Open No. 10- An anthraquinone compound described in No. 2019-0140741, an anthraquinone compound described in Korean Patent Laid-Open No. 10-2019-0140744, a perylene compound described in Japanese Unexamined Patent Publication No. 2020-079396, or the like can also be used. As the red colorant, a compound having a structure in which an aromatic ring group in which a group in which an oxygen atom, a sulfur atom or a nitrogen atom is bonded to an aromatic ring is introduced is bonded to a diketopyrrolopyrrole skeleton can also be used.

Regarding the diffraction angle that various pigments preferably have, the descriptions of Japanese Patent Publication No. 6561862, Japanese Patent Publication No. 6413872, Japanese Patent Publication No. 6281345, and Japanese Unexamined Patent Publication No. 2020-026503 can be referred, and these contents is incorporated herein. As for the pyrrolopyrrole pigment, it is also preferable to use those having a crystallite size of 140 Å or less in the plane direction corresponding to the maximum peak in the X-ray diffraction pattern among eight planes (±1±1±1) of the crystal lattice plane. do. Moreover, it is also preferable to set as described in Paragraph No. 0028 of Unexamined-Japanese-Patent No. 2020-097744 - 0073 about the physical property of a pyrrolopyrrole type pigment.

A dye may be used for the chromatic colorant. The dye is not particularly limited, and known dyes can be used. For example, pyrazolazo dyes, anilinoazo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazolazo dyes, pyridonazo dyes dyes, cyanine-based dyes, phenothiazine-based dyes, pyrrolopyrazole azomethane-based dyes, xanthene-based dyes, phthalocyanine-based dyes, benzopyran-based dyes, indigo-based dyes, pyrromethene-based dyes, and the like. there is. In addition, in the dye, a thiazole compound described in Japanese Unexamined Patent Publication No. 2012-158649, an azo compound described in Japanese Unexamined Patent Publication No. 2011-184493, an azo compound described in Japanese Unexamined Patent Publication No. 2011-145540, Korean Patent Application Publication No. The triarylmethane dye polymer of 10-2020-0028160 and the xanthene compound of Unexamined-Japanese-Patent No. 2020-117638 can also be used suitably.

As a chromatic colorant, the phthalocyanine compound of International Publication No. 2020/174991 can be used.

When the composition of the present invention contains a chromatic colorant, the content of the chromatic colorant is preferably 1 to 50% by mass in the total solids of the composition of the present invention. When the composition of this invention contains 2 or more types of chromatic colorants, it is preferable that their total amount is in the said range.

<<Coloring material that transmits infrared rays and blocks visible light>>

The composition of the present invention may contain a color material that transmits infrared rays and blocks visible light (hereinafter, also referred to as a color material that blocks visible light). A composition containing a color material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.

The color material that blocks visible light is preferably a color material that absorbs light in a wavelength range from purple to red. In addition, it is preferable that the color material that blocks visible light is a color material that blocks light in a wavelength range of 450 to 650 nm. Moreover, it is preferable that the color material which blocks visible light is a color material which transmits light with a wavelength of 900-1500 nm. The color material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B).

(A): Black color is formed by the combination of 2 or more types of chromatic colorants including 2 or more types of chromatic colorants.

(B): Contains an organic black colorant.

As a chromatic colorant, those mentioned above are mentioned. Examples of the organic black colorant include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of the bisbenzofuranone compound include compounds described in Japanese Patent Publication No. 2010-534726, Japanese Patent Publication No. 2012-515233, Japanese Patent Publication No. 2012-515234, etc. For example, "Irgaphor Available as "Black". As a perylene compound, Paragraph No. 0016 of Unexamined-Japanese-Patent No. 2017-226821 - the compound of 0020, C. I. Pigment Black 31, 32, etc. are mentioned. As an azomethine compound, the compound of Unexamined-Japanese-Patent No. 01-170601, Unexamined-Japanese-Patent No. 02-034664 etc. is mentioned, For example, as "Chromo Fine Black A1103" by Dainichi Seika Co., Ltd. can be obtained

As a combination of a chromatic colorant in the case of forming black with a combination of 2 or more types of chromatic colorant, the following aspects (1)-(8) are mentioned, for example.

(1) An aspect containing a yellow colorant, a blue colorant, a purple colorant and a red colorant.

(2) An aspect containing a yellow colorant, a blue colorant and a red colorant.

(3) An aspect containing a yellow colorant, a purple colorant and a red colorant.

(4) An aspect containing a yellow colorant and a purple colorant.

(5) An aspect containing a green colorant, a blue colorant, a purple colorant and a red colorant.

(6) An aspect containing a purple colorant and an orange colorant.

(7) An aspect containing a green colorant, a purple colorant and a red colorant.

(8) An aspect containing a green colorant and a red colorant.

When the composition of the present invention contains a color material that blocks visible light, the content of the color material that blocks visible light is preferably 1 to 50% by mass based on the total solids of the composition. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, still more preferably 20% by mass or more, and particularly preferably 30% by mass or more.

<<surfactants>>

The composition of the present invention preferably contains a surfactant. As the surfactant, various surfactants such as fluorochemical surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone surfactants can be used. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. About surfactant, Paragraph No. 0238 of International Publication No. 2015/166779 - surfactant of 0245 and surfactant of Unexamined-Japanese-Patent No. 2020-008634 are mentioned, These content is integrated in this specification.

As a fluorochemical surfactant, the surfactant described in Paragraph No. 0060 - 0064 of Unexamined-Japanese-Patent No. 2014-041318 (paragraph No. 0060 - 0064 of corresponding International Publication No. 2014/017669) etc., Paragraph No. 2011-132503 The surfactant of 0117-0132 and the surfactant of Unexamined-Japanese-Patent No. 2020-008634 are mentioned, These content is integrated in this specification. As commercially available products of fluorine-based surfactants, for example, Megafac F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144, F -437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560, F -561, F-565, F-563, F-568, F-575, F-780, EXP, MFS-330, R-01, R-40, R-40-LM, R-41, R-41 -LM, RS-43, R-43,TF-1956, RS-90, R-94, RS-72-K, DS-21 (above, manufactured by DIC Co., Ltd.), Fluorad FC430, FC431, FC171 ( Above, Sumitomo 3M Co., Ltd.), Suffron S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH- 40 (above, manufactured by AGC Co., Ltd.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (above, manufactured by OMNOVA), Progent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 7 10FS, and FTX-218 (above, manufactured by NEOS Co., Ltd.).

Also, as the fluorine-based surfactant, an acrylic compound having a molecular structure having a functional group containing a fluorine atom and in which a portion of the functional group containing a fluorine atom is cut off and the fluorine atom volatilizes when heated is also preferably used. As such a fluorine-based surfactant, DIC Co., Ltd.'s Megafac DS series (Gagaku Kogyo Nippo (February 22, 2016), Nikkei Sangyo Shinbun (February 23, 2016)), for example Megafac DS -21 can be heard.

Moreover, it is also preferable to use the polymer of the vinyl ether compound containing a fluorine atom which has a fluorinated alkyl group or a fluorinated alkylene ether group, and a hydrophilic vinyl ether compound as a fluorochemical surfactant. As for such a fluorochemical surfactant, the fluorochemical surfactant of Unexamined-Japanese-Patent No. 2016-216602 is mentioned, This content is integrated in this specification.

As the fluorine-based surfactant, a block polymer can also be used. As a fluorine-based surfactant, a repeating unit derived from a (meth)acrylate compound having a fluorine atom and an alkyleneoxy group (preferably an ethyleneoxy group and a propyleneoxy group) having 2 or more (preferably 5 or more) (meth ) A fluorine-containing high molecular compound containing a repeating unit derived from an acrylate compound can also be preferably used. Moreover, the fluorine-containing surfactant of Paragraph No. 0016 of Unexamined-Japanese-Patent No. 2010-032698 - 0037 and the following compound are also illustrated as a fluorochemical surfactant used by this invention.

[Formula 16]

The weight average molecular weight of the above compound is preferably 3000 to 50000, for example 14000. Among the above compounds, % representing the ratio of repeating units is mol%.

Further, as the fluorine-based surfactant, a fluorine-containing polymer having an ethylenically unsaturated bond-containing group in the side chain can also be used. As specific examples, the compounds described in Paragraph Nos. 0050 to 0090 and Paragraph Nos. 0289 to 0295 of Japanese Unexamined Patent Publication No. 2010-164965, DIC Co., Ltd. Megafac RS-101, RS-102, RS-718K, RS-72- K etc. are mentioned. Moreover, as a fluorochemical surfactant, the compound of Paragraph No. 0015 of Unexamined-Japanese-Patent No. 2015-117327 - 0158 can also be used.

Moreover, it is also preferable from a viewpoint of environmental regulation to use the surfactant of international publication 2020/084854 as a substitute for the surfactant which has a C6 or more perfluoroalkyl group.

Moreover, it is also preferable to use the fluorine-containing imide salt compound represented by Formula (fi-1) as a surfactant.

[Formula 17]

In formula (fi-1), m represents 1 or 2, n represents an integer from 1 to 4, a represents 1 or 2, X ^a+ represents a valent metal ion, primary ammonium ion, secondary represents a quaternary ammonium ion, tertiary ammonium ion, quaternary ammonium ion or NH ₄ ⁺ .

Examples of nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane and their ethoxylates and propoxylates (for example, glycerol propoxylate and glycerol ethoxylate), polyoxyethylene lauryl Ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate , Sorbitan fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF), Solsperse 20000 (Nippon) Lubrizol Co., Ltd.), NCW-101, NCW-1001, NCW-1002 (Fujifilm Wako Junyaku Co., Ltd.), Pionein D-6112, D-6112-W, D-6315 (Takemoto Yushi Co., Ltd.), Olfin E1010, Surfynol 104, 400, 440 (Nisshin Chemical Co., Ltd. product), etc. are mentioned.

Examples of cationic surfactants include tetraalkylammonium salts, alkylamine salts, benzalkonium salts, alkylpyridium salts, and imidazolium salts. Specific examples include dihydroxyethyl stearylamine, 2-heptadecenyl-hydroxyethyl imidazoline, lauryldimethylbenzylammonium chloride, cetylpyridinium chloride, and stearamidemethylpyridium chloride.

Examples of the anionic surfactant include dodecylbenzenesulfonic acid, sodium dodecylbenzenesulfonate, sodium lauryl sulfate, sodium alkyldiphenylether disulfonate, sodium alkylnaphthalenesulfonate, sodium dialkylsulfosuccinate, sodium stearate, Potassium oleate, sodium dioctyl sulfosuccinate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkyl phenyl ether sulfate, sodium dialkyl sulfosuccinate, sodium stearate, oleic acid Sodium, t-octylphenoxyethoxy polyethoxyethyl sulfate sodium salt, etc. are mentioned.

As silicone surfactants, DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, SH8400, SH 8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (above, DuPont Toray Specialty Material Co., Ltd.), TSF-4300, TSF-4445, TSF-4460, TSF-4452 (above, manufactured by Momentive Performance Materials), KP-341, KF-6000, KF-6001, KF-6002 , KF-6003 (above, Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (above, Big Chemie priests), etc.

Moreover, the compound of the following structure can also be used for silicone type surfactant.

[Formula 18]

The content of the surfactant is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, and still more preferably 0.001 to 0.2% by mass in the total solids of the composition. The composition may contain only 1 type of surfactant, and may contain 2 or more types. When containing 2 or more types, it is preferable that those total amounts become the said range.

<<Polymerization Inhibitor>>

The composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6 -tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salt, cerium salt, etc.) , p-methoxyphenol is preferred. As for content of a polymerization inhibitor, 0.0001-5 mass % is preferable in the total solids of a composition. The composition may contain only 1 type of polymerization inhibitor, and may contain 2 or more types. When containing 2 or more types, it is preferable that those total amounts become the said range.

<<Silane coupling agent>>

The composition of the present invention may contain a silane coupling agent. In the present specification, a silane coupling agent means a silane compound having a hydrolyzable group and a functional group other than that. In addition, a hydrolyzable group refers to a substituent that is directly connected to a silicon atom and can generate a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. As a hydrolyzable group, a halogen atom, an alkoxy group, an acyloxy group etc. are mentioned, for example, An alkoxy group is preferable. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, as a functional group other than a hydrolyzable group, a vinyl group, a styryl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, A phenyl group etc. are mentioned, A (meth)acryloyl group and an epoxy group are preferable. Examples of the silane coupling agent include compounds described in Paragraph Nos. 0018 to 0036 of Unexamined-Japanese-Patent No. 2009-288703 and compounds described in Paragraph Nos. 0056 to 0066 of Unexamined-Japanese-Patent No. 2009-242604, the contents of which are described herein. is used The content of the silane coupling agent is preferably 0.01 to 15.0% by mass, and more preferably 0.05 to 10.0% by mass in the total solid content of the composition. The composition may contain only 1 type of silane coupling agent, and may contain 2 or more types. When containing 2 or more types, it is preferable that those total amounts become the said range.

<<UV absorber>>

The composition of the present invention may contain a UV absorber. Examples of the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, and the like. can As a specific example of such a compound, Paragraph Nos. 0038-0052 of Unexamined-Japanese-Patent No. 2009-217221, Paragraph No. 0052-0072 of Unexamined-Japanese-Patent No. 2012-208374, Paragraph No. 0317-0334 of Unexamined-Japanese-Patent No. 2013-068814, Japan Paragraph No. 0061 of Unexamined-Japanese-Patent No. 2016-162946 - the compound of 0080 are mentioned, These content is integrated in this specification. As a commercial item of a ultraviolet absorber, UV-503 (made by Daito Chemical Co., Ltd.), BASF Corporation's Tinuvin series, Uvinul (Uvinul) series, etc. are mentioned, for example. Moreover, as a benzotriazole compound, the MYUA series by Miyoshi Yushi Co., Ltd. (Kagaku Kogyo Nippo, February 1, 2016) is mentioned. In addition, the ultraviolet absorber is a compound described in paragraph numbers 0049 to 0059 of Japanese Patent Publication No. 6268967, a compound described in paragraph numbers 0059 to 0076 of international publication 2016/181987, and a thiothio An aryl group-substituted benzotriazole type UV absorber can also be used. The content of the ultraviolet absorber is preferably 0.01 to 30% by mass, and more preferably 0.05 to 25% by mass in the total solid content of the composition. The composition may contain only 1 type of ultraviolet absorber, and may contain 2 or more types. When containing 2 or more types, it is preferable that those total amounts become the said range.

<<Antioxidants>>

The composition of the present invention may contain an antioxidant. As an antioxidant, a phenol compound, a phosphite compound, a thioether compound, etc. are mentioned. As the phenolic compound, any phenolic compound known as a phenolic antioxidant can be used. As a preferable phenol compound, a hindered phenol compound is mentioned. A compound having a substituent at a site adjacent to the phenolic hydroxy group (ortho position) is preferred. As the substituent described above, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferable. Further, the antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Moreover, a phosphorus antioxidant can also be used suitably as an antioxidant. As the phosphorus antioxidant, tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepine-6- yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl) oxy]ethyl]amine, phosphorous acid ethylbis(2,4-di-tert-butyl-6-methylphenyl), and the like. As a commercial item of an antioxidant, Adeka Stab AO-20, Adeka Stab AO-30, Adeka Stab AO-40, Adeka Stab AO-50, Adeka Stab AO-50F, for example, Adeka Stab AO-60, Adeka Stab AO-60G, Adeka Stab AO-80, Adeka Stab AO-330 (above, made by ADEKA Co., Ltd.), etc. are mentioned. Moreover, as an antioxidant, the compound described in Paragraph No. 0023 - 0048 of Japanese Patent Publication No. 6268967, the compound described in International Publication No. 2017/006600, and the compound described in International Publication No. 2017/164024 can also be used. It is preferable that it is 0.01-20 mass % in the total solid content of a composition, and, as for content of antioxidant, it is more preferable that it is 0.3-15 mass %. The composition may contain only 1 type of antioxidant, and may contain 2 or more types. When including 2 or more types, it is preferable that those total amounts become the said range.

<<Other Ingredients>>

The composition of the present invention, if necessary, a sensitizer, a curing accelerator, a filler, a heat curing accelerator, a plasticizer, and other auxiliary agents (e.g., conductive particles, antifoaming agents, flame retardants, leveling agents, peeling accelerators, fragrances, surface tension adjusting agent, chain transfer agent, etc.) may be contained. By appropriately containing these components, properties such as membrane properties can be adjusted. These components are, for example, described in paragraph No. 0183 of Japanese Laid-open Patent Publication No. 2012-003225 (paragraph No. 0237 of corresponding US Patent Application Publication No. 2013/0034812), paragraph No. 2008-250074 Reference can be made to descriptions of 0101 to 0104 and 0107 to 0109, the contents of which are incorporated herein by reference. Moreover, the composition of this invention may contain a latent antioxidant as needed. The latent antioxidant is a compound in which a site functioning as an antioxidant is protected with a protecting group, and the protective group is released by heating at 100 to 250° C. or at 80 to 200° C. in the presence of an acid/base catalyst to function as an antioxidant. compounds can be mentioned. Examples of the latent antioxidant include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and Japanese Unexamined Patent Publication No. 2017-008219. As a commercial item of a latent antioxidant, Adeka Akles GPA-5001 (made by ADEKA Corporation) etc. are mentioned.

<Container container>

There is no limitation in particular as a container for the composition of the present invention, and a known container can be used. In addition, as a storage container, for the purpose of suppressing the mixing of impurities into raw materials or compositions, it is also possible to use a multi-layered bottle in which the inner wall of the container is made up of 6 types of 6-layer resin or a bottle made of 6 types of resin in a 7-layer structure. desirable. As such a container, the container of Unexamined-Japanese-Patent No. 2015-123351 is mentioned, for example. The inner wall of the container is also preferably made of glass or stainless steel for the purpose of preventing elution of metal from the inner wall of the container, enhancing the stability of the composition over time, or suppressing deterioration of components.

<Method for preparing the composition>

The composition of the present invention can be prepared by mixing the components described above. When preparing the composition, the composition may be prepared by simultaneously dissolving or dispersing all components in a solvent. If necessary, two or more solutions or dispersions in which each component is appropriately blended are prepared in advance, and at the time of use (application) You may prepare as a composition by mixing these.

At the time of preparation of a composition, you may include the process of dispersing a pigment. In the process of dispersing the pigment, examples of the mechanical force used for dispersing the pigment include compression, compression, impact, shear, cavitation, and the like. Specific examples of these processes include bead mill, sand mill, roll mill, ball mill, paint shaker, microfluidizer, high-speed impeller, sand grinder, float mixer, high-pressure wet atomization, ultrasonic dispersion, and the like. In addition, in pulverization of the pigment in a sand mill (bead mill), it is preferable to use beads with a small diameter or to treat under conditions in which the pulverization efficiency is increased by increasing the filling rate of the beads. In addition, it is preferable to remove coarse particles by filtration, centrifugation or the like after the crushing treatment. In addition, the process and disperser for dispersing the pigment are described in "Complete Collection of Dispersion Technology, published by Joho Kiko Co., Ltd., July 15, 2005" or "Dispersion Technology Centered on Suspension (High/Liquid Dispersion System) and Practice of Industrial Application" Comprehensive Data Collection, Keiei Kaihatsu Center Publishing, October 10, 1978", the process and disperser described in paragraph No. 0022 of Japanese Laid-open Patent Publication No. 2015-157893 can be suitably used. Further, in the process of dispersing the pigment, the pigment may be miniaturized in the salt milling step. For materials, equipment, processing conditions, and the like used in the salt milling process, descriptions of, for example, Japanese Unexamined Patent Publication No. 2015-194521 and Japanese Unexamined Patent Publication No. 2012-046629 can be referred.

In preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter or reducing defects. As a filter, it can be used without particular limitation as long as it is a filter conventionally used for filtration purposes or the like. For example, fluororesins such as polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF), polyamide-based resins such as nylon (eg nylon-6, nylon-6,6), polyethylene, Filters using materials such as polyolefin resins (including high-density, ultra-high molecular weight polyolefin resins) such as polypropylene (PP) are exemplified. Among these materials, polypropylene (including high-density polypropylene) and nylon are preferable.

The pore diameter of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and still more preferably 0.05 to 0.5 μm. When the pore diameter of the filter is within the above range, fine foreign matter can be removed more reliably. For the value of the pore diameter of the filter, reference can be made to the nominal value of the filter manufacturer. As the filter, various filters provided by Nippon Pole Co., Ltd. (DFA4201NIEY, DFA4201NAEY, DFA4201J006P, etc.), Advantech Toyo Co., Ltd., Nippon Entegris Co., Ltd. (formerly Nihon Microlis Co., Ltd.), Kitz Microfilter Co., Ltd., etc. can be used.

Moreover, it is also preferable to use a fibrous filter medium as a filter. As a fibrous filter medium, polypropylene fiber, nylon fiber, glass fiber etc. are mentioned, for example. Examples of commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by Rocky Techno.

When using a filter, you may combine different filters (for example, a 1st filter and a 2nd filter, etc.). In that case, filtration using each filter may be performed only once, or may be performed twice or more. Moreover, you may combine filters of different pore diameters within the above-mentioned range. In addition, filtration using the first filter may be performed only for the dispersion liquid, and after mixing other components, filtration may be performed with the second filter.

<Act>

Next, the film of the present invention will be described. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be suitably used as an optical filter. The use of the optical filter is not particularly limited, but an infrared cut filter, an infrared transmission filter, and the like are exemplified. As an infrared cut filter, for example, an infrared cut filter on the light-receiving side of a solid-state image sensor (for example, an infrared cut-off filter for a wafer level lens, etc.), a back side (light-receive side) of a solid-state image sensor an infrared cut filter on the opposite side), an infrared cut filter for an environmental light sensor (e.g., an illuminance sensor that senses the illuminance or color tone of the environment in which the information terminal device is placed and adjusts the color tone of the display, or sensor for color correction to be adjusted) and the like. In particular, it can be suitably used as an infrared cutoff filter on the light-receiving side of a solid-state imaging device. As the infrared transmission filter, a filter capable of blocking visible light and selectively transmitting infrared rays of a specific wavelength or higher is exemplified.

It is preferable that the average value of the transmittance|permeability of the film|membrane of this invention in the range of wavelength 700-1500nm is less than 10%, and it is more preferable that it is less than 5%.

The film of the present invention may have a pattern or may be a film without a pattern (flat film). In addition, the film of the present invention may be used by being laminated on a support, or the film of the present invention may be peeled from the support and used. As a support body, semiconductor substrates, such as a silicon substrate, and transparent substrates are mentioned.

A charge coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film or the like may be formed on the semiconductor substrate used as the support. Moreover, a black matrix which isolates each pixel may be formed on the semiconductor substrate. In addition, a base layer may be formed on the surface of the semiconductor substrate. The surface contact angle of the base layer is preferably 20 to 70° when measured with diiodomethane. Moreover, it is preferable that it is 30-80 degrees when measured with water.

The transparent substrate used as the support is not particularly limited as long as it is composed of a material capable of transmitting at least visible light. Examples include substrates made of materials such as glass and resin. Examples of the resin include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene vinyl acetate copolymers, and acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate. , urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, polyvinyl alcohol resin and the like. As glass, soda lime glass, borosilicate glass, non-alkali glass, quartz glass, glass containing copper, etc. are mentioned. Examples of copper-containing glass include copper-containing phosphate glass and copper-containing phosphate glass. A commercial item can also be used for glass containing copper. As a commercial item of glass containing copper, NF-50 (made by AGC Techno Glass Co., Ltd.) etc. are mentioned.

The thickness of the film of the present invention can be appropriately adjusted depending on the purpose. The thickness of the film is preferably 20 μm or less, more preferably 10 μm or less, and still more preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

The film of the present invention can also be used in combination with a color filter containing a chromatic colorant. A color filter can be manufactured using a coloring composition containing a chromatic coloring agent. When the film of the present invention is used as an infrared cutoff filter and the film of the present invention and a color filter are used in combination, it is preferable that a color filter is disposed on the optical path of the film of the present invention. For example, it is preferable to laminate the film of the present invention and the color filter and use it as a laminate. In the laminate, the film of the present invention and the color filter may or may not be adjacent to each other in the thickness direction. When the film of the present invention and the color filter are not adjacent in the thickness direction, the film of the present invention may be formed on a support different from the support on which the color filter is formed, and between the film of the present invention and the color filter, Other members constituting the solid-state imaging device (for example, a microlens, a flattening layer, etc.) may be interposed.

The film of the present invention can be used in various devices such as solid-state imaging devices such as CCD (charge-coupled device) and CMOS (complementary metal oxide semiconductor), infrared sensors, and image display devices.

<Method for producing membrane>

The film of the present invention can be produced through a step of applying the composition of the present invention.

As a support body, the above-mentioned thing is mentioned. As a method of applying the composition, a known method can be used. For example, the drop method (drop cast); slit coat method; spray method; roll coat method; spin coating (spin coating); flexible application; slit and spin method; Pre-wet method (for example, the method described in Unexamined-Japanese-Patent No. 2009-145395); various printing methods such as inkjet (for example, on demand method, piezo method, thermal method), discharge system printing such as nozzle jet, flexographic printing, screen printing, gravure printing, reverse offset printing, metal mask printing method; transfer method using a mold or the like; The nanoimprint method etc. are mentioned. The application method in inkjet is not particularly limited, and for example, the method shown in "Diffusion and Usable Inkjet -Infinite Possibilities Seen as Patents-, February 2005, Sumibe Techno Research" (particularly on page 115) to page 133), but Japanese Unexamined Patent Publication No. 2003-262716, Japanese Unexamined Patent Publication No. 2003-185831, Japanese Unexamined Patent Publication No. 2003-261827, Japanese Unexamined Patent Publication No. 2012-126830, Japanese Unexamined Patent Publication No. 2006-169325 The method described in etc. is mentioned.

The composition layer formed by applying the composition may be dried (prebaked). In the case of prebaking, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and still more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or 80°C or higher. The prebaking time is preferably from 10 seconds to 3000 seconds, more preferably from 40 seconds to 2500 seconds, and still more preferably from 80 seconds to 220 seconds. Drying can be performed with a hot plate, oven, or the like.

The method for producing a film may further include a step of forming a pattern. Examples of the pattern formation method include a pattern formation method using a photolithography method and a pattern formation method using a dry etching method, and a pattern formation method using a photolithography method is preferable. In addition, when using the film of the present invention as a flat film, it is not necessary to perform a step of forming a pattern. Hereinafter, the process of forming a pattern will be described in detail.

(In case of pattern formation by photolithography)

A pattern formation method using a photolithography method includes a step of exposing a composition layer formed by applying the composition of the present invention in a pattern (exposure step), and a step of developing and removing the composition layer in the unexposed area to form a pattern ( development process) is preferably included. If necessary, you may provide a process of baking the developed pattern (post-bake process). Hereinafter, each process is demonstrated.

In the exposure process, the composition layer is exposed in a pattern. For example, the composition layer can be exposed in a pattern by exposing through a mask having a predetermined mask pattern using a stepper exposure machine, a scanner exposure machine, or the like. In this way, the exposed portion can be cured.

Examples of the radiation (light) that can be used during exposure include g-ray and i-ray. In addition, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light having a wavelength of 300 nm or less include KrF rays (wavelength of 248 nm), ArF rays (wavelength of 193 nm), and the like, and KrF rays (wavelength of 248 nm) are preferable. In addition, a long-wave light source of 300 nm or more can also be used.

Moreover, at the time of exposure, you may expose by irradiating light continuously, and you may expose by irradiating and exposing light pulsewise (pulse exposure). Further, pulse exposure is an exposure method of a system in which light irradiation and pause are repeatedly exposed in cycles of a short time (eg, millisecond level or less).

The irradiation amount (exposure amount) is, for example, preferably 0.03 to 2.5 J/cm ² , and more preferably 0.05 to 1.0 J/cm ² . The oxygen concentration at the time of exposure can be appropriately selected, and besides performing under atmospheric conditions, for example, in a low-oxygen atmosphere in which the oxygen concentration is 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially oxygen-free) ), or in a high oxygen atmosphere in which the oxygen concentration exceeds 21% by volume (for example, 22% by volume, 30% by volume, or 50% by volume). In addition, the exposure illuminance can be set appropriately, and can be selected from the range of usually 1000 W/m ² to 100000 W/m ² (for example, 5000 W/m ² , 15000 W/m ² , or 35000 W/m ² ). . Oxygen concentration and exposure illuminance may suitably combine conditions, and, for example, an oxygen concentration of 10 vol% and an illuminance of 10000 W/m ² , an oxygen concentration of 35 vol% and an illuminance of 20000 W/m ² , and the like.

Next, the composition layer of the unexposed part in the composition layer after exposure is removed from development to form a pattern. The development and removal of the composition layer of the unexposed area can be performed using a developing solution. Thereby, the composition layer of the unexposed part in an exposure process is eluted in a developing solution, and only the photocured part remains on the support body. As for the temperature of a developing solution, 20-30 degreeC is preferable, for example. As for developing time, 20 to 180 second is preferable. Further, in order to improve residue removability, the process of shaking off the developer every 60 seconds and supplying a new developer may be repeated several more times.

Examples of the developing solution include organic solvents and alkaline developing solutions, and alkaline developing solutions are preferably used. As the alkali developing solution, an alkaline aqueous solution (alkali developing solution) obtained by diluting an alkali agent with pure water is preferable. As an alkali agent, for example, ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide Side, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyl trimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole , piperidine, organic alkaline compounds such as 1,8-diazabicyclo[5.4.0]-7-undecene, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium silicate, sodium metasilicate, etc. An inorganic alkaline compound is mentioned. The alkaline agent is preferably a compound having a large molecular weight from the viewpoint of environment and safety. 0.001-10 mass % is preferable, and, as for the density|concentration of the alkali agent of alkaline aqueous solution, 0.01-1 mass % is more preferable. Moreover, the developing solution may further contain a surfactant. As surfactant, a nonionic surfactant is preferable. The developing solution may be once prepared as a concentrated solution and diluted to a concentration necessary for use from the viewpoint of transportation or storage convenience. Although the dilution factor is not particularly limited, it can be set, for example, in the range of 1.5 to 100 times. Moreover, it is also preferable to wash (rinse) with pure water after image development. Further, the rinse is preferably performed by supplying a rinse liquid to the composition layer after development while rotating the support on which the composition layer after development is formed. It is also preferable to move the nozzle for discharging the rinse liquid from the center of the support to the periphery of the support. At this time, when the nozzle is moved from the central portion of the support body to the peripheral edge portion, the nozzle may be moved while gradually lowering the moving speed. By rinsing in this way, in-plane unevenness of the rinsing can be suppressed. Also, the same effect can be obtained by gradually lowering the rotational speed of the support while moving the nozzle from the center of the support to the periphery.

It is preferable to perform additional exposure treatment or heat treatment (post-bake) after drying after development. Additional exposure treatment and post-baking are curing treatments after development to complete curing. The heating temperature in post-baking is preferably 100 to 240°C, for example, and more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater so that the film after development meets the above conditions. When performing additional exposure processing, it is preferable that the light used for exposure is light with a wavelength of 400 nm or less. Moreover, you may perform additional exposure processing by the method described in Korean Unexamined Patent Publication No. 10-2017-0122130.

(In case of pattern formation by dry etching method)

In the pattern formation using the dry etching method, the composition layer formed by applying the composition on a support is cured to form a cured product layer, then a photoresist layer patterned on the cured product layer is formed, and then, Using the patterned photoresist layer as a mask, the cured material layer may be dry-etched using an etching gas, or the like. In formation of the photoresist layer, it is preferable to perform a prebaking process. About pattern formation using the dry etching method, Paragraph No. 0010 of Unexamined-Japanese-Patent No. 2013-064993 - description of 0067 can be considered into consideration, and this content is integrated in this specification.

<Optical filter>

The optical filter of the present invention has the film of the present invention described above. Examples of optical filters include infrared cut-off filters and infrared transmission filters.

The optical filter of the present invention may further have a copper-containing layer, a dielectric multilayer film, an ultraviolet ray absorbing layer, or the like, in addition to the film of the present invention described above. As an ultraviolet absorption layer, the absorption layer of Paragraph No. 0040 - 0070 of international publication 2015/099060, 0119 - 0145 is mentioned, for example. As a dielectric multilayer film, the dielectric multilayer film of Paragraph No. 0255 of Unexamined-Japanese-Patent No. 2014-041318 - 0259 is mentioned. As the copper-containing layer, a glass substrate made of copper-containing glass (copper-containing glass substrate) or a layer containing a copper complex (copper complex-containing layer) can also be used. Examples of the copper-containing glass substrate include copper-containing phosphate glass and copper-containing phosphate glass. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Techno Glass Co., Ltd.), BG-60, BG-61 (above, manufactured by Schott Corporation), and CD5000 (manufactured by HOYA Co., Ltd.).

<Solid-state imaging device>

The solid-state imaging device of the present invention includes the above-described film of the present invention. The configuration of the solid-state imaging device is not particularly limited as long as it has the film of the present invention and functions as a solid-state imaging device. For example, the following structures are mentioned.

On the support, there are a plurality of photodiodes constituting the light-receiving area of the solid-state imaging device and a transfer electrode made of polysilicon, etc., and on the photodiode and the transfer electrode, only the light-receiving portion of the photodiode is formed of tungsten or the like. It has a light shielding film, a device protective film formed of silicon nitride or the like formed to cover the entire surface of the light shielding film and the photodiode light receiving portion on the light shielding film, and a film of the present invention on the device protective film. In addition, a configuration having a concentrating means (for example, a microlens, etc., the same hereinafter) under the film of the present invention (closer to the support) on the device protective film, a constitution having a condensing means on the film of the present invention, etc. may be continued Further, the color filter may have a structure in which a film forming each pixel is embedded in a space partitioned in a lattice shape, for example, by barrier ribs. It is preferable that the partition in this case has a lower refractive index than each pixel. As an example of the imaging device which has such a structure, the apparatus of Unexamined-Japanese-Patent No. 2012-227478 and Unexamined-Japanese-Patent No. 2014-179577 is mentioned.

<Image Display Device>

The image display device of the present invention includes the film of the present invention. As an image display device, a liquid crystal display device, an organic electroluminescence (organic EL) display device, etc. are mentioned. For the definition and details of the image display device, for example, "Electronic Display Device (authored by Akio Sasaki, Kogyo Chosakai Co., Ltd., published in 1990)", "Display Device (authored by Sumiaki Ibuki, Sangyo Tosho Co., Ltd.) Hei Published in the first year of Seihi)", etc. Further, liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd., 1994)". The liquid crystal display device to which the present invention can be applied is not particularly limited, and for example, it can be applied to liquid crystal display devices of various types described in the above "next-generation liquid crystal display technology". The image display device may have a white organic EL element. As the white organic EL element, a tandem structure is preferable. Regarding the tandem structure of the organic EL element, Japanese Patent Laid-open Publication No. 2003-045676, supervised by Akiyoshi Mikami, "The forefront of organic EL technology development -high brightness, high precision, long lifespan and know-how-", Kijutsu Joho Kyokai, 326 ~328 pages, 2008, etc. The spectrum of white light emitted from the organic EL device preferably has a strong maximum emission peak in a blue region (430 to 485 nm), a green region (530 to 580 nm), and a yellow region (580 to 620 nm). In addition to these emission peaks, it is more preferable to further have a maximum emission peak in the red region (650 to 700 nm).

<Infrared sensor>

The infrared sensor of the present invention includes the film of the present invention described above. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, one embodiment of the infrared sensor of the present invention will be described using drawings.

In Fig. 1, reference numeral 110 denotes a solid-state imaging device. On the imaging area of the solid-state imaging element 110, an infrared cut filter 111 and an infrared transmission filter 114 are disposed. Further, on the infrared cut filter 111, a color filter 112 is disposed. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114 . A planarization layer 116 is formed to cover the micro lenses 115 .

The infrared cut filter 111 may be formed using the composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of a specific wavelength in the visible region, and there is no particular limitation, and a conventionally known color filter for forming pixels can be used. For example, a color filter including red (R), green (G), and blue (B) pixels is used. For example, Paragraph No. 0214 of Unexamined-Japanese-Patent No. 2014-043556 - description of 0263 can be considered into consideration, and this content is integrated in this specification. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 may be formed using the composition of the present invention.

In the infrared sensor shown in FIG. 1 , an infrared cut filter different from the infrared cut filter 111 (another infrared cut filter) may be further disposed on the flattening layer 116 . Other infrared cut filters include those having a copper-containing layer and/or a dielectric multilayer film. About these details, the thing mentioned above is mentioned. Moreover, you may use a dual band pass filter as another infrared cutoff filter.

Example

The present invention will be described in more detail by way of examples below. The materials, usage amount, ratio, processing content, processing procedure, etc. shown in the following examples can be appropriately changed as long as they do not deviate from the spirit of the present invention. In addition, Ph in structural formula represents a phenyl group.

<Measurement of weight average molecular weight and number average molecular weight>

The measurement of the weight average molecular weight of the resin was performed using HPC-8220 GPC (manufactured by Tosoh Corporation) as a measuring device, TSKguardcolumn SuperHZ-L as a guard column, and TSKgel SuperHZM-M, TSKgel SuperHZ4000, TSKgel SuperHZ3000, and TSKgel SuperHZ2000 as columns. Using a column, 10 μL of a tetrahydrofuran solution having a sample concentration of 0.1 mass% was injected into the column with the column temperature at 40 ° C., and tetrahydrofuran as an elution solvent was flowed at a flow rate of 0.35 mL per minute, and RI (time difference Refractive index) The sample peak was detected by the detection device and calculated using a calibration curve prepared using standard polystyrene.

<Preparation of Pigment Dispersion>

The materials shown in the table below were mixed in the formulation amounts shown in the table below, and using zirconia beads with a diameter of 0.3 mm, in a bead mill (high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon Biei Co., Ltd.)), Each pigment dispersion was prepared by mixing and dispersing for 3 hours.

[Table 1]

The detail of the raw material described in the table|surface is as follows.

(Pigment)

P001 to P004: Compound with the following structure (infrared absorber)

[Formula 19]

PR254: C. I. Pigment Red 254 (red pigment)

PB15:6: C. I. Pigment Blue 15:6 (blue pigment)

(pigment derivative)

B-1 to B-3: Compounds with the following structures

[Formula 20]

(dispersant)

D-1: Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain is the number of repeating units. Weight average molecular weight 28000)

[Formula 21]

D-2: Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain is the number of repeating units. Weight average molecular weight 28000)

[Formula 22]

(solvent)

S001: propylene glycol monomethyl ether acetate

<Preparation of composition>

Materials other than the solvents shown in the table below were mixed at the ratios shown in the table below, and the solvents shown in the table below were added to prepare a solid content concentration of 20% by mass, followed by stirring, and a nylon filter with a pore diameter of 0.45 μm (Nippon Pole manufactured by Co., Ltd.) to prepare a composition. The numerical value of the compounding quantity column in a table|surface is the value of the mass part in conversion of solid content.

[Table 2]

[Table 3]

[Table 4]

The detail of the raw material described in the said table|surface is as follows.

(infrared absorber)

[Compound represented by Formula (1)]

A001: Compound having the following structure (maximum absorption wavelength in dichloromethane: 920 nm)

A002: Compound having the following structure (maximum absorption wavelength in dichloromethane: 900 nm)

A003: Compound having the following structure (maximum absorption wavelength in dichloromethane: 910 nm)

A004: Compound having the following structure (maximum absorption wavelength in dichloromethane: 980 nm)

A005: Compound having the following structure (maximum absorption wavelength in dichloromethane: 990 nm)

A006: Compound having the following structure (maximum absorption wavelength in dichloromethane: 970 nm)

A007: Compound having the following structure (maximum absorption wavelength in dichloromethane: 1000 nm)

A008: Compound having the following structure (maximum absorption wavelength in dichloromethane: 990 nm)

A009: Compound having the following structure (maximum absorption wavelength in dichloromethane: 930 nm)

A010: Compound having the following structure (maximum absorption wavelength in dichloromethane: 960 nm)

A011: Compound having the following structure (maximum absorption wavelength in dichloromethane: 940 nm)

A012: Compound having the following structure (maximum absorption wavelength in dichloromethane: 900 nm)

A013: Compound having the following structure (maximum absorption wavelength in dichloromethane: 910 nm)

A014: Compound having the following structure (maximum absorption wavelength in dichloromethane: 870 nm)

A015: Compound having the following structure (maximum absorption wavelength in dichloromethane: 1080 nm)

A016: Compound having the following structure (maximum absorption wavelength in dichloromethane: 1010 nm)

A017: Compound having the following structure (maximum absorption wavelength in dichloromethane: 1030 nm)

[Formula 23]

[Formula 24]

[Formula 25]

[Formula 26]

[Infrared absorbers other than compounds represented by Formula (1)]

A101: a compound of the structure

[Formula 27]

(pigment dispersion)

IR1 to IR4, Red1, Blue1: the aforementioned pigment dispersion IR1 to IR4, Red1, Blue1

(profit)

B001: Polymethyl methacrylate (weight average molecular weight 24000, degree of dispersion 1.8, glass transition temperature 75°C)

B002: Resin having the following structure (Resin having an acid group. The numerical value added to the main chain is the molar ratio of the repeating unit. Weight average molecular weight 20000, dispersion degree 1.9, glass transition temperature 100°C)

[Formula 28]

B003: Resin having the following structure (resin having an acid group. The numerical values given to the main chain are the molar ratio of the repeating unit, weight average molecular weight 15000, dispersion degree 2.1, glass transition temperature 120°C)

[Formula 29]

B004: resin having the following structure (polyimide resin, weight average molecular weight 25000, degree of dispersion 2.2, glass transition temperature 310°C)

[Formula 30]

(polymerizable compound)

M-1: Aronix M-305 (manufactured by Toagosei Co., Ltd., a mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate. The content of pentaerythritol triacrylate is 55% by mass to 63% by mass .)

M-2: KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd., ethylene oxide-modified pentaerythritol tetraacrylate)

M-3: Aronix M-510 (manufactured by Toagosei Co., Ltd., polybasic acid modified acrylic oligomer)

(photopolymerization initiator)

C-1: Irgacure OXE01 (manufactured by BASF, oxime ester initiator)

C-2: Irgacure OXE02 (manufactured by BASF, oxime ester initiator)

(Surfactants)

F-1: Megafac RS-72-K (manufactured by DIC Co., Ltd., fluorine-based surfactant)

F-2: Compound having the following structure (weight average molecular weight: 14000, % numerical value representing the ratio of repeating units is mol%)

[Formula 31]

F-3: KF-6001 (manufactured by Shin-Etsu Chemical Industry Co., Ltd., carbinol-modified polydimethylsiloxane at both ends, hydroxyl value: 62 mgKOH/g)

(polymerization inhibitor)

G-1: p-methoxyphenol

(other additives)

U-1: Uvinul3050 (manufactured by BASF, ultraviolet absorber)

U-2: Tinuvin477 (manufactured by BASF, hydroxyphenyltriazine-based ultraviolet absorber)

U-3: Tinuvin326 (manufactured by BASF, ultraviolet absorber)

EP-1: Compound having the following structure (epoxy compound, weight average molecular weight 4000)

[Formula 32]

EP-2: EHPE3150 (manufactured by Daicel Co., Ltd., 1,2-epoxy-4-(2-oxiranyl)cyclohexane adduct of 2,2-bis(hydroxymethyl)-1-butanol)

(solvent)

S001: propylene glycol monomethyl ether acetate

S002: propylene glycol monomethyl ether

<Evaluation of infrared ray shielding properties, light resistance and heat resistance>

Each composition was spin-coated on a glass substrate so that the film thickness after film formation was 1.0 μm, and the entire surface was exposed at an exposure amount of 1000 mJ/cm ² using an i-line stepper exposure apparatus FPA-3000i5+ (manufactured by Canon Co., Ltd.). did. Next, using a hot plate, it was heated at 200°C for 2 minutes to prepare a film.

-About evaluation of infrared ray shielding property-

With respect to the glass base material on which the above film was formed, the transmittance was measured in a wavelength range of 400 to 1600 nm using an ultraviolet, visible, and near infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Co., Ltd.), and the wavelength range of 1000 to 1200 nm The average value of transmittance was obtained, and the infrared shielding property was evaluated according to the following criteria.

A: The average value of transmittance is less than 5%

B: The average value of transmittance is 5% or more and less than 10%

C: The average value of transmittance is 10% or more

-About evaluation of lightfastness-

The transmittance in the range of wavelength 400 to 1600 nm was measured for the glass substrate on which the above film was formed using a spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Co., Ltd.) for ultraviolet, visible, and near-infrared. Next, the glass substrate on which the film was formed was irradiated with light at 100,000 lux for 20 hours (equivalent to 2 million lux·h) using a xenon lamp, and then the transmittance of the film after irradiation with the xenon lamp was measured. Calculate the change in transmittance (ΔT1) at each wavelength in the range of 1000 to 1500 nm before and after irradiation with the xenon lamp, and evaluate the light resistance according to the following criteria based on the largest value of ΔT1 in the entire measured wavelength range did. The smaller the value of ΔT1, the better the light fastness.

Transmittance change (ΔT1) =|transmittance of the film before xenon lamp irradiation - film transmittance after xenon lamp irradiation|

A: ΔT1 is less than 3%

B: ΔT1 is 3% or more and less than 5%

C: ΔT1 is 5% or more

-About heat resistance evaluation-

The transmittance was measured in the wavelength range of 400 to 1600 nm using a spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Co., Ltd.) for the glass substrate on which the above film was formed. Next, the glass substrate on which the film was formed was heated at 200°C for 10 minutes using a hot plate. The amount of transmittance change (ΔT2) at each wavelength in the wavelength range of 1000 to 1500 nm before and after heating was determined, and heat resistance was evaluated based on the following criteria based on the largest value of ΔT2 in the entire measurement wavelength range. The smaller the value of ΔT2, the better the heat resistance.

Transmittance change (ΔT2) = |transmittance of the membrane before heating - transmittance of the membrane after heating|

A: ΔT2 is less than 5%

B: ΔT2 is 5% or more and less than 10%

C: ΔT2 is 10% or more

<Evaluation of Pattern Formability>

Each composition was spin-coated on a glass substrate so that the film thickness after film formation was 1.0 μm, and then heated on a hot plate at 100° C. for 2 minutes. Next, exposure was performed at an exposure amount of 1000 mJ/cm ² using an i-line stepper exposure apparatus FPA-3000i5+ (manufactured by Canon Co., Ltd.) through a mask having a 1 μm Bayer pattern. Next, puddle development was performed at 23°C for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). Then, after rinsing with spin shower and further washing with pure water, it heated at 200 degreeC for 5 minutes using the hot plate, and formed the pattern (pixel). The glass substrate on which the pixels were formed was observed at a magnification of 10000 using a microscope, and the pattern formation property was evaluated according to the following evaluation criteria.

A: Could form a pattern

B: Unable to form a pattern

[Table 5]

[Table 6]

As shown in the table above, the compositions of Examples were able to form films with excellent infrared shielding properties.

110: solid-state imaging device
111: infrared cut filter
112: color filter
114: infrared transmission filter
115: micro lens
116: planarization layer

Claims (17)

A composition containing an infrared absorber and a curable compound,
The infrared absorber includes a compound represented by formula (1),
a composition in which the content of the compound represented by the formula (1) in the total solid content of the composition is 3% by mass or more;
[Formula 1]

In Formula (1), Ar ¹ and Ar ² each independently represent a nitrogen-containing heterocycle which may be condensed to form a polycyclic ring;
R ¹ and R ² each independently represent a substituent;
n1 and n2 each independently represents an integer greater than or equal to 0;
Y ¹ and Y ² each independently represent -O-, -S-, or -NR ^Y1 -;
R ^Y1 represents a hydrogen atom or a substituent,
X ¹ and X ² each independently represent a hydrogen atom, -BR ^X1 R ^X2 , or a metal atom to which a ligand may be coordinated;
R ^X1 and R ^X2 each independently represent a hydrogen atom or a substituent;
R ^X1 and R ^X2 may be bonded to form a ring. The method of claim 1,
n1 and n2 in the above formula (1) each independently represent an integer of 1 or more,
R ¹ and R ² in the formula (1) each independently represent an aryl group or a heteroaryl group. According to claim 1 or claim 2,
Y ¹ and Y ² in Formula (1) are -O-, the composition. The method according to any one of claims 1 to 3,
X ¹ and X ² in the formula (1) each independently represent -BR ^X1 R ^X2 , R ^X1 and R ^X2 each independently represent a hydrogen atom or a substituent, and R ^X1 and R ^X2 are bonded to form a ring The composition which may be formed. The method according to any one of claims 1 to 4,
R ^X1 and R ^X2 each independently represent a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and even if R ^X1 and R ^X2 are bonded to form a ring, being, the composition. The method according to any one of claims 1 to 5,
The composition in which the maximum absorption wavelength in dichloromethane of the compound represented by the formula (1) exists in the range of 1000 to 1600 nm. The method according to any one of claims 1 to 6,
The composition in which the said infrared absorber contains compounds other than the compound represented by said Formula (1). According to any one of claims 1 to 7,
A composition further comprising a chromatic colorant. The method according to any one of claims 1 to 8,
The composition in which the said curable compound contains resin which has an acidic radical. The method according to any one of claims 1 to 9,
The curable compound is a composition comprising a polymerizable compound. The method according to any one of claims 1 to 10,
The composition of claim 1, wherein the curable compound includes a resin having a glass transition temperature of 150°C or higher. According to any one of claims 1 to 11,
A composition for an infrared sensor. A film obtained by using the composition according to any one of claims 1 to 12. An optical filter comprising the film according to claim 13. A solid-state imaging device comprising the film according to claim 13. An image display device comprising the film according to claim 13. An infrared sensor comprising the film according to claim 13.

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