JPWO2022130774A1 - - Google Patents
Info
- Publication number
- JPWO2022130774A1 JPWO2022130774A1 JP2022569741A JP2022569741A JPWO2022130774A1 JP WO2022130774 A1 JPWO2022130774 A1 JP WO2022130774A1 JP 2022569741 A JP2022569741 A JP 2022569741A JP 2022569741 A JP2022569741 A JP 2022569741A JP WO2022130774 A1 JPWO2022130774 A1 JP WO2022130774A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/12—Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
Landscapes
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020208235 | 2020-12-16 | ||
PCT/JP2021/038592 WO2022130774A1 (en) | 2020-12-16 | 2021-10-19 | Composition, film, optical filter, solid-state imaging element, image display device, and ir sensor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2022130774A1 true JPWO2022130774A1 (en) | 2022-06-23 |
Family
ID=82059742
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022569741A Pending JPWO2022130774A1 (en) | 2020-12-16 | 2021-10-19 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPWO2022130774A1 (en) |
KR (1) | KR20230106668A (en) |
TW (1) | TW202229233A (en) |
WO (1) | WO2022130774A1 (en) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011157478A (en) * | 2010-02-01 | 2011-08-18 | Toyo Ink Sc Holdings Co Ltd | Coloring composition, photosensitive coloring composition for color filter, color filter and color display device |
CN111560094A (en) * | 2015-05-29 | 2020-08-21 | 富士胶片株式会社 | Near-infrared absorbing pigment polymer, composition, film, optical filter, pattern forming method and device |
JP7041625B2 (en) * | 2016-08-29 | 2022-03-24 | 富士フイルム株式会社 | Composition, film, near-infrared cut filter, pattern forming method, laminate, solid-state image sensor, image display device, camera module and infrared sensor |
JP6824276B2 (en) * | 2016-08-30 | 2021-02-03 | 富士フイルム株式会社 | Photosensitive composition, cured film, optical filter, laminate, pattern formation method, solid-state image sensor, image display device and infrared sensor |
CN112358493B (en) * | 2020-11-16 | 2022-06-21 | 南京林业大学 | Micromolecular photothermal reagent based on boron-fluorine complex and preparation method and application thereof |
-
2021
- 2021-10-19 KR KR1020237019563A patent/KR20230106668A/en unknown
- 2021-10-19 WO PCT/JP2021/038592 patent/WO2022130774A1/en active Application Filing
- 2021-10-19 JP JP2022569741A patent/JPWO2022130774A1/ja active Pending
- 2021-10-27 TW TW110139791A patent/TW202229233A/en unknown
Also Published As
Publication number | Publication date |
---|---|
KR20230106668A (en) | 2023-07-13 |
WO2022130774A1 (en) | 2022-06-23 |
TW202229233A (en) | 2022-08-01 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240704 |